CN1904588B - 微型芯片测定装置 - Google Patents
微型芯片测定装置 Download PDFInfo
- Publication number
- CN1904588B CN1904588B CN2006101057888A CN200610105788A CN1904588B CN 1904588 B CN1904588 B CN 1904588B CN 2006101057888 A CN2006101057888 A CN 2006101057888A CN 200610105788 A CN200610105788 A CN 200610105788A CN 1904588 B CN1904588 B CN 1904588B
- Authority
- CN
- China
- Prior art keywords
- light
- mentioned
- microchip
- light quantity
- lamp
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000005259 measurement Methods 0.000 title claims abstract description 26
- 238000001514 detection method Methods 0.000 claims abstract description 34
- 239000007788 liquid Substances 0.000 claims abstract description 14
- 238000002835 absorbance Methods 0.000 claims description 18
- 238000012360 testing method Methods 0.000 claims description 18
- 238000004321 preservation Methods 0.000 claims description 3
- 230000005540 biological transmission Effects 0.000 claims description 2
- 230000000694 effects Effects 0.000 abstract description 9
- 238000004458 analytical method Methods 0.000 abstract description 5
- 230000008033 biological extinction Effects 0.000 abstract description 2
- 238000010586 diagram Methods 0.000 description 16
- 238000011481 absorbance measurement Methods 0.000 description 13
- 230000003287 optical effect Effects 0.000 description 11
- 238000000034 method Methods 0.000 description 10
- 238000012544 monitoring process Methods 0.000 description 9
- 239000000203 mixture Substances 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 229910052724 xenon Inorganic materials 0.000 description 4
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 238000007689 inspection Methods 0.000 description 3
- 230000005855 radiation Effects 0.000 description 3
- 230000003321 amplification Effects 0.000 description 2
- 230000007812 deficiency Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000003199 nucleic acid amplification method Methods 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 238000003556 assay Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 238000001311 chemical methods and process Methods 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000023077 detection of light stimulus Effects 0.000 description 1
- 238000000295 emission spectrum Methods 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 230000003862 health status Effects 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 238000005395 radioluminescence Methods 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 238000010206 sensitivity analysis Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 150000003376 silicon Chemical class 0.000 description 1
- 238000004088 simulation Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000010189 synthetic method Methods 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 230000004304 visual acuity Effects 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/27—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands using photo-electric detection ; circuits for computing concentration
- G01N21/274—Calibration, base line adjustment, drift correction
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/33—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using ultraviolet light
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
Abstract
Description
Claims (2)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005214789A JP4764969B2 (ja) | 2005-07-25 | 2005-07-25 | マイクロチップ測定装置 |
JP2005-214789 | 2005-07-25 | ||
JP2005214789 | 2005-07-25 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1904588A CN1904588A (zh) | 2007-01-31 |
CN1904588B true CN1904588B (zh) | 2012-09-19 |
Family
ID=37440285
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2006101057888A Expired - Fee Related CN1904588B (zh) | 2005-07-25 | 2006-07-25 | 微型芯片测定装置 |
Country Status (5)
Country | Link |
---|---|
US (1) | US7400406B2 (zh) |
EP (1) | EP1748291B1 (zh) |
JP (1) | JP4764969B2 (zh) |
CN (1) | CN1904588B (zh) |
DE (1) | DE602006014768D1 (zh) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4852762B2 (ja) * | 2007-03-13 | 2012-01-11 | 国立大学法人島根大学 | 光ファイバ照明装置 |
JP5351742B2 (ja) * | 2009-12-18 | 2013-11-27 | 三菱重工業株式会社 | ガス中の煤塵濃度計測方法及び燃焼設備の運転方法 |
CN102614823B (zh) * | 2011-01-27 | 2014-08-06 | 财团法人交大思源基金会 | 具有气泡的微流体系统及其气体放电方法与气体反应方法 |
EP3095709B1 (en) * | 2015-05-20 | 2018-01-10 | Goodrich Lighting Systems GmbH | Exterior aircraft lighting device |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5485061A (en) * | 1993-04-12 | 1996-01-16 | Mitsubishi Denki Kabushiki Kaisha | Discharge lamp lighting device capable of preventing a flicker due to arc movement |
US5856665A (en) * | 1991-07-12 | 1999-01-05 | Jeffrey H. Price | Arc lamp stabilization and intensity control for imaging microscopy |
US6130748A (en) * | 1996-03-05 | 2000-10-10 | Forschungszentrum Julich Gmbh | Chemical sensor based on porous silicon |
Family Cites Families (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6016567B2 (ja) * | 1978-03-07 | 1985-04-26 | ミノルタ株式会社 | 光学的測定装置 |
JPS59116830U (ja) * | 1983-01-28 | 1984-08-07 | 株式会社日立製作所 | 分光光度計 |
US4602193A (en) * | 1984-08-10 | 1986-07-22 | Emory University | Method and apparatus for the stabilization of direct current arc lamps |
JP2656564B2 (ja) * | 1988-08-26 | 1997-09-24 | 株式会社日立製作所 | 免疫分析方法 |
JPH0359427A (ja) * | 1989-07-27 | 1991-03-14 | Shimadzu Corp | ダブルビーム方式の分光光度計 |
JP2880581B2 (ja) * | 1991-04-03 | 1999-04-12 | ウシオ電機株式会社 | ショートアーク型キセノン放電灯 |
JPH05273118A (ja) * | 1992-03-24 | 1993-10-22 | Hitachi Ltd | 被検試料液の濃度又は成分の分析方法及び分析装置 |
JPH06307934A (ja) * | 1993-04-27 | 1994-11-04 | Shimadzu Corp | 分光蛍光光度計 |
US5716852A (en) * | 1996-03-29 | 1998-02-10 | University Of Washington | Microfabricated diffusion-based chemical sensor |
JP3329172B2 (ja) * | 1996-02-22 | 2002-09-30 | 松下電器産業株式会社 | 放電ランプ点灯装置 |
US5948684A (en) * | 1997-03-31 | 1999-09-07 | University Of Washington | Simultaneous analyte determination and reference balancing in reference T-sensor devices |
US6224830B1 (en) * | 1998-01-30 | 2001-05-01 | The Governors Of The University Of Alberta | Absorbance cell for microfluid devices |
US7316899B2 (en) * | 2000-01-31 | 2008-01-08 | The Board Of Regents Of The University Of Texas System | Portable sensor array system |
JP3696141B2 (ja) | 2001-09-27 | 2005-09-14 | 株式会社東芝 | 化学分析装置、分析方法 |
JP2003207454A (ja) * | 2002-01-15 | 2003-07-25 | Minolta Co Ltd | 透過光検出装置 |
JP2004109099A (ja) | 2002-09-16 | 2004-04-08 | Jun Kikuchi | 血液分析方法、血液分析装置および血液分析装置の製造方法 |
JP2004311199A (ja) * | 2003-04-07 | 2004-11-04 | Plus Vision Corp | アーク安定化機能を備えたランプ駆動回路及びそれを用いたプロジェクタ |
JP2004341445A (ja) * | 2003-05-19 | 2004-12-02 | Sharp Corp | 画像投影装置 |
JP4695851B2 (ja) | 2003-07-10 | 2011-06-08 | シチズンホールディングス株式会社 | マイクロ化学チップ温度調節装置 |
-
2005
- 2005-07-25 JP JP2005214789A patent/JP4764969B2/ja not_active Expired - Fee Related
-
2006
- 2006-07-24 EP EP06015354A patent/EP1748291B1/en not_active Not-in-force
- 2006-07-24 DE DE602006014768T patent/DE602006014768D1/de active Active
- 2006-07-25 US US11/459,767 patent/US7400406B2/en not_active Expired - Fee Related
- 2006-07-25 CN CN2006101057888A patent/CN1904588B/zh not_active Expired - Fee Related
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5856665A (en) * | 1991-07-12 | 1999-01-05 | Jeffrey H. Price | Arc lamp stabilization and intensity control for imaging microscopy |
US5485061A (en) * | 1993-04-12 | 1996-01-16 | Mitsubishi Denki Kabushiki Kaisha | Discharge lamp lighting device capable of preventing a flicker due to arc movement |
US6130748A (en) * | 1996-03-05 | 2000-10-10 | Forschungszentrum Julich Gmbh | Chemical sensor based on porous silicon |
Also Published As
Publication number | Publication date |
---|---|
EP1748291A1 (en) | 2007-01-31 |
US20070019184A1 (en) | 2007-01-25 |
JP4764969B2 (ja) | 2011-09-07 |
US7400406B2 (en) | 2008-07-15 |
EP1748291B1 (en) | 2010-06-09 |
DE602006014768D1 (de) | 2010-07-22 |
JP2007033148A (ja) | 2007-02-08 |
CN1904588A (zh) | 2007-01-31 |
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C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
ASS | Succession or assignment of patent right |
Owner name: ROHM CO., LTD. Free format text: FORMER OWNER: USHIO DENKI KABUSHIKI KAISHA Effective date: 20110609 |
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C41 | Transfer of patent application or patent right or utility model | ||
COR | Change of bibliographic data |
Free format text: CORRECT: ADDRESS; FROM: CHIYODA-KU, TOKYO METROPOLITAN, STATE OF JAPAN TO: KYOTO, JAPAN |
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TA01 | Transfer of patent application right |
Effective date of registration: 20110609 Address after: Kyoto Japan Applicant after: Rohm Co., Ltd. Address before: Japan's Tokyo Chiyoda Applicant before: Ushio Denki Kabushiki Kaisha |
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C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20120919 Termination date: 20140725 |
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EXPY | Termination of patent right or utility model |