CN1871373A - 等离子体生成设备和方法以及具有可调工作周期的rf驱动电路 - Google Patents

等离子体生成设备和方法以及具有可调工作周期的rf驱动电路 Download PDF

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Publication number
CN1871373A
CN1871373A CNA2004800232588A CN200480023258A CN1871373A CN 1871373 A CN1871373 A CN 1871373A CN A2004800232588 A CNA2004800232588 A CN A2004800232588A CN 200480023258 A CN200480023258 A CN 200480023258A CN 1871373 A CN1871373 A CN 1871373A
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CN
China
Prior art keywords
reactance
plasma body
plasma
power supply
ohm
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Pending
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CNA2004800232588A
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English (en)
Chinese (zh)
Inventor
帕特里克·普莱拜尔
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Plasma Control Systems LLC
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Plasma Control Systems LLC
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Application filed by Plasma Control Systems LLC filed Critical Plasma Control Systems LLC
Publication of CN1871373A publication Critical patent/CN1871373A/zh
Pending legal-status Critical Current

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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/32—Plasma torches using an arc
    • H05H1/34—Details, e.g. electrodes, nozzles
    • H05H1/36—Circuit arrangements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01Q—ANTENNAS, i.e. RADIO AERIALS
    • H01Q1/00—Details of, or arrangements associated with, antennas
    • H01Q1/12—Supports; Mounting means
    • H01Q1/22—Supports; Mounting means by structural association with other equipment or articles
    • H01Q1/26—Supports; Mounting means by structural association with other equipment or articles with electric discharge tube
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B31/00—Electric arc lamps
    • H05B31/02—Details
    • H05B31/26—Influencing the shape of arc discharge by gas blowing devices

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Electromagnetism (AREA)
  • Plasma Technology (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
  • Drying Of Semiconductors (AREA)
CNA2004800232588A 2003-06-19 2004-06-21 等离子体生成设备和方法以及具有可调工作周期的rf驱动电路 Pending CN1871373A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US48033803P 2003-06-19 2003-06-19
US60/480,338 2003-06-19

Publications (1)

Publication Number Publication Date
CN1871373A true CN1871373A (zh) 2006-11-29

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ID=33539287

Family Applications (1)

Application Number Title Priority Date Filing Date
CNA2004800232588A Pending CN1871373A (zh) 2003-06-19 2004-06-21 等离子体生成设备和方法以及具有可调工作周期的rf驱动电路

Country Status (6)

Country Link
EP (1) EP1689907A4 (ja)
JP (1) JP2007524963A (ja)
KR (1) KR20060029621A (ja)
CN (1) CN1871373A (ja)
CA (1) CA2529794A1 (ja)
WO (1) WO2004114461A2 (ja)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103311648A (zh) * 2013-06-18 2013-09-18 浙江大学 一种超宽带等离子发射天线装置
CN103456591A (zh) * 2012-05-31 2013-12-18 中微半导体设备(上海)有限公司 自动频率调谐源和偏置射频电源的电感耦合等离子处理室
WO2017035926A1 (zh) * 2015-09-01 2017-03-09 沈阳拓荆科技有限公司 一种射频等离子体设备匹配器
CN107710869A (zh) * 2015-07-03 2018-02-16 东洋制罐集团控股株式会社 高频感应加热装置
TWI816759B (zh) * 2018-03-14 2023-10-01 美商蘭姆研究公司 無匹配式電漿源的功率輸出最佳化系統及方法

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JP4773165B2 (ja) * 2005-08-31 2011-09-14 株式会社ダイヘン 高周波電源装置
CN100411496C (zh) * 2005-09-21 2008-08-13 大连理工大学 一种实现脉冲电源与等离子体负载间匹配的方法
JP5241578B2 (ja) * 2009-03-19 2013-07-17 株式会社日清製粉グループ本社 誘導熱プラズマ発生方法及び装置
KR101757922B1 (ko) 2009-10-27 2017-07-14 도쿄엘렉트론가부시키가이샤 플라즈마 처리 장치
US9313872B2 (en) 2009-10-27 2016-04-12 Tokyo Electron Limited Plasma processing apparatus and plasma processing method
JP5694721B2 (ja) * 2009-10-27 2015-04-01 東京エレクトロン株式会社 プラズマ処理装置及びプラズマ処理方法
JP5592098B2 (ja) 2009-10-27 2014-09-17 東京エレクトロン株式会社 プラズマ処理装置及びプラズマ処理方法
JP5957816B2 (ja) * 2011-02-23 2016-07-27 株式会社村田製作所 インピーダンス変換デバイス、アンテナ装置および通信端末装置
JP6267989B2 (ja) * 2013-02-18 2018-01-24 東京エレクトロン株式会社 プラズマ処理方法及び容量結合型プラズマ処理装置
JP2016046391A (ja) * 2014-08-22 2016-04-04 株式会社アルバック プラズマエッチング装置
US10211522B2 (en) * 2016-07-26 2019-02-19 Smartsky Networks LLC Density and power controlled plasma antenna
US10734195B2 (en) * 2017-06-08 2020-08-04 Lam Research Corporation Systems and methods for transformer coupled plasma pulsing with transformer coupled capacitive tuning switching
US20190108976A1 (en) * 2017-10-11 2019-04-11 Advanced Energy Industries, Inc. Matched source impedance driving system and method of operating the same
KR20200100642A (ko) 2017-11-17 2020-08-26 에이이에스 글로벌 홀딩스 피티이 리미티드 플라즈마 프로세싱을 위한 이온 바이어스 전압의 공간 및 시간 제어
US11437221B2 (en) 2017-11-17 2022-09-06 Advanced Energy Industries, Inc. Spatial monitoring and control of plasma processing environments
KR102381323B1 (ko) * 2020-05-15 2022-03-31 (주)엘오티씨이에스 유도결합 플라즈마 반응기 및 유도결합 플라즈마 반응기의 안테나 코일용 와이어 구조물
WO2021257374A1 (en) * 2020-06-17 2021-12-23 Lam Research Corporation Protection system for switches in direct drive circuits of substrate processing systems
WO2022173626A1 (en) * 2021-02-09 2022-08-18 Advanced Energy Industries, Inc. Spatial monitoring and control of plasma processing environments
US11942309B2 (en) 2022-01-26 2024-03-26 Advanced Energy Industries, Inc. Bias supply with resonant switching
US11670487B1 (en) 2022-01-26 2023-06-06 Advanced Energy Industries, Inc. Bias supply control and data processing
US11978613B2 (en) 2022-09-01 2024-05-07 Advanced Energy Industries, Inc. Transition control in a bias supply

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JPH0773105B2 (ja) * 1987-02-16 1995-08-02 日電アネルバ株式会社 プラズマ処理装置
JP3283476B2 (ja) * 1989-09-22 2002-05-20 株式会社日立製作所 放電状態変動量モニタ
DE69304522T2 (de) * 1992-04-16 1997-01-23 Advanced Energy Ind Inc Stabilisator fuer schalt-mode geleistet radio-frequenz plasma einrichtung
US5473291A (en) * 1994-11-16 1995-12-05 Brounley Associates, Inc. Solid state plasma chamber tuner
US6264812B1 (en) * 1995-11-15 2001-07-24 Applied Materials, Inc. Method and apparatus for generating a plasma
JP2884056B2 (ja) * 1995-12-07 1999-04-19 パール工業株式会社 放電プラズマ発生用高周波電源装置及び半導体製造装置
US5654679A (en) * 1996-06-13 1997-08-05 Rf Power Products, Inc. Apparatus for matching a variable load impedance with an RF power generator impedance
JP2001073149A (ja) * 1999-09-01 2001-03-21 Shimadzu Corp Ｅｃｒ成膜装置
JP2001332534A (ja) * 2000-05-25 2001-11-30 Matsushita Electric Ind Co Ltd プラズマ処理方法及びプラズマ処理装置
US6305316B1 (en) * 2000-07-20 2001-10-23 Axcelis Technologies, Inc. Integrated power oscillator RF source of plasma immersion ion implantation system
JP4711543B2 (ja) * 2001-05-22 2011-06-29 キヤノンアネルバ株式会社 放電を利用した処理装置における放電検出の方法と装置
US7132996B2 (en) * 2001-10-09 2006-11-07 Plasma Control Systems Llc Plasma production device and method and RF driver circuit
JP3574104B2 (ja) * 2001-11-27 2004-10-06 三容真空工業株式会社 プラズマ発生のためのマッチング回路を利用したプラズマ発生駆動装置

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103456591A (zh) * 2012-05-31 2013-12-18 中微半导体设备(上海)有限公司 自动频率调谐源和偏置射频电源的电感耦合等离子处理室
CN103456591B (zh) * 2012-05-31 2016-04-06 中微半导体设备(上海)有限公司 自动频率调谐源和偏置射频电源的电感耦合等离子处理室
CN103311648A (zh) * 2013-06-18 2013-09-18 浙江大学 一种超宽带等离子发射天线装置
CN107710869A (zh) * 2015-07-03 2018-02-16 东洋制罐集团控股株式会社 高频感应加热装置
WO2017035926A1 (zh) * 2015-09-01 2017-03-09 沈阳拓荆科技有限公司 一种射频等离子体设备匹配器
TWI816759B (zh) * 2018-03-14 2023-10-01 美商蘭姆研究公司 無匹配式電漿源的功率輸出最佳化系統及方法

Also Published As

Publication number Publication date
WO2004114461A2 (en) 2004-12-29
EP1689907A2 (en) 2006-08-16
JP2007524963A (ja) 2007-08-30
KR20060029621A (ko) 2006-04-06
CA2529794A1 (en) 2004-12-29
EP1689907A4 (en) 2008-07-23
WO2004114461A3 (en) 2006-07-06

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