TW447035B - Modular plate plasma source device - Google Patents

Abstract

A modular plate plasma source device is disclosed, which comprises at least two long plate-like antennas, at least a radio frequency power source and a reference potential, wherein the long plate-like antennas are mutually arranged in parallel and can induce plasma, and each long plate-like antenna comprises a main body plate and an inductive coil. The inductive coil winds from one end of the main body plate to the other end in a tilted direction. The radio frequency power source is connected to the inductive coil in parallel or serial manner. The reference potential connects to the inductive coil corresponding to the radio frequency power source.

Description

44703 5 V. Description of the invention (1) [Field of the invention] The present invention relates to a modular plate-shaped plasma source device, in particular, a high-density plasma source device. It is especially suitable for the plasma source device in the plasma processing chamber during the manufacture of large liquid crystal panels (such as TFT LCD, TN LCD, STN LCD, etc.). The plasma source device is modular. [Previous technology] At present, plasma source devices in high-density plasma systems are mainly divided into two categories: microwave coupling and inductively coupled plasma. Among them, induction coils for inductively coupled plasmas are Shihua Republic Patent Gazette No. 34577, which can be divided into cylindrical spiral coils, flat disc spiral coils, dome spiral coils, and the above-mentioned hybrid coils. The main processing is disc semiconductor wafers, so The processing cavity is generally cylindrical, and the column wall or the top is wound with at least one set of induction coils.

Surface, so it is not suitable for square plate substrates. · When plasma processing large-size substrates such as 1000x 1 0 0 mm2, plasma reaction chambers above 1 400 X 1 400 mm2, conventional plasma source induction coils need to be tailored for different reaction chambers. The uniformity of plasma generation in a large-sized reaction chamber is difficult to control. If the accuracy is not enough, it must be reworked and cannot be installed in a modular manner. In addition, 'If you want to make a plasma source with such a large size in a plasma processing chamber, Dielectric windows are extremely difficult and costly. [Objective of the Invention] The first object of the present invention is to provide a modular plate plasma source device.

C: \ Logo-5 \ Five Continents \ PK7347.ptd Page 4 44 70 35 V. Description of the invention (2) Set up the use of diversified and unrestricted connection arrangement of long plate antenna and RF power to achieve modularization Effect, and can be used for plasma processing of different size substrates. A second object of the present invention is to provide a long-plate antenna. The long-plate antenna includes a coil spring-shaped induction coil and a dielectric sleeve covering the coil, so that a plasma source device can be modularized. 〇 The third object of the present invention is to provide a plasma processing chamber, which uses a modular plate plasma source device, so that a relatively small-sized dielectric window can be used to reduce costs. [Technical means of the invention The modular plate-shaped plasma source device of the present invention mainly includes at least two long plate-shaped antennas, at least one radio frequency power source, and at least one reference potential. The long plate-shaped antennas are arranged adjacent to each other in parallel and can induce the plasma. —The long plate antenna includes a body plate and an induction coil. The induction coil is diagonally wound from one end of the body plate to the other end. The radio frequency power supply is connected to the induction coils in parallel or in series. The reference potential corresponds to the radio frequency power supply. Connect the induction coil ^ [Embodiment] Please refer to the attached drawings to illustrate the present invention by the following embodiments: As shown in Figs. 1 to 3, an embodiment of the modular plate plasma source device according to the present invention It mainly includes six long plate antennas 61, 62, 63, 64, 65 '66, a radio frequency power source 72, 82, and two reference potentials M, 83. Each long plate antenna 61, 62, 63, 64, 65, 66 is adjacent to each other and arranged parallel to each other. 'In order to enable the electric source device of the present invention to be modularized, each long plate antenna 61, 62, 63, 64, 65, 66 have the same structure

C: \ Logo-5 \ Five Continents \ PK7347, ptd Page 5 447035______ 5. Explanation of the invention (3) As shown in Figure 2, one of the long plate antennas 61 is used as an example. The long plate antenna 61 mainly includes A body plate 6 12 and an induction coil 611. The body plate 6 1 2 is a long plate and is made of a dielectric material such as quartz or oxide or a magnetically permeable material containing iron, iron, or nickel. The coil 611 is obliquely wound from one end of the body plate 6 1 2 to the other end, so the long plate antenna 61 can sense the plasma. In addition, the body plate 612 has the functions of being easy to place and adjust, and shaping the induction coil 611. RF power supply 7 2, 8 2 is an alternating current connected to the induction coils in parallel or in series. In this embodiment [as shown in Figure 3], the long plate antennas 61, 62, and 63, 64, 65, 66 induction coils 611, 621, 631, 641, 651, 661, that is, one of the long plate antennas 61, 63, 65 is connected in parallel to the first RF power source 72 and the other end is connected to a reference potential 73 'At the same time, one end of the long plate antennas 62, 64, 66 is connected in parallel to the second RF power source 82 and the other end is connected to another reference potential 83 to form a modular plasma source device suitable for a larger plasma processing chamber. Since the two radio frequency power sources 72, 82 are connected in a staggered parallel manner to the long plate antennas 61, 62, Weng 0 64, 65, 66 and are located on different sides, they have better uniformity of inductance. When the power switching frequency is adjustable between 100KΗζ to 40MHz and high frequency, the electrons are used to obtain energy free gas in a radio frequency electric field (Radio Frequency), and a high-density plasma is induced [1〇ιι ~ l〇 i2cra-3]. . In addition, 'because the long plate antennas 6 1, 6, 2, 6, 3, 6, 4, 6, 5, and 6.6 correspond to the square substrate 40 and are arranged in parallel with each other, when the two RF power sources 72 and 82 are activated, uniform energy will be generated. Plasma treatment of square substrates 40 to prevent dead corners.

C: \ Logo-5 \ Five C〇ntinents \ PK7347, ptd Page 6 447035 V. Description of the invention (4) Reference potentials 73 and 83 'are corresponding to the induction lines 圏 611, 621, 631, 641, 6Sl frequency power supply 72, 82 and connect the potential. 6 61 'It is preferably grounded. In addition, the modular plate-shaped electric water source device of the present invention further includes matching regimes 71, 81, which correspond to RF power sources 72, 82, and "Network 82 and induction coils." Between 611, 621, 63i, 64i, 65i, and 6j, the second one is as shown in the figure! 'When the above-mentioned modular plate plasma source device of the present invention is installed in a -plasma processing room', the electric destruction process The chamber is square, and it is used to process substrates such as liquid crystal panels (TFT LCD, TN LCD, STN LCD) or other glass slides (such as FED, EL, etc.). The size of the current 35th generation glass slide is 680x 880 mm2 'and the plasma treatment can be applied to semiconductor processes such as physical vapor deposition, chemical vapor deposition and coin carving; the plasma processing chamber contains at least: a plasma cavity 10, which contains plasma gas · The plasma cavity 10 is provided with several uniform dielectric windows. In this embodiment, there are six dielectric windows 5 1, 5 2, 5 3 54, 55, 56, and each of the dielectric windows 51, 52, 53, 54, 55, 56 'Ο are made of dielectric materials such as quartz or alumina, and each dielectric window is 5 1, 5 2, 5 3, 5 4, 5 The 5, 5 and 6 series correspond to each of the long plate antennas 61, 62, 63, 64, 65, and 66, respectively, for the installation of the above-mentioned plate-shaped plasma source device. An air pump 20 is provided in Denso The cavity 10 is used for decompression to 1 m Torr to 100 Torr, and becomes a pressure suitable for plasma generation, and the pressure is detected by a vacuum gauge 21. A substrate stage 30 is provided in the plasma cavity 10 for To carry the substrate 40.

C: \ Logo-5 \ Five Continents \ PK7347.ptd Page 7 447035

A bias RF power source 31 and a matching network 32 are connected to the formula 30 'to increase controllable parameters during processing. The soil plate carrier port can use the plasma processing chamber to uniformly handle the large-sized beauty and install the necessary equipment and appropriate operations by using electrical systems. ^ ^; Other types of plate-shaped electro-polymerization source devices can be modularized ^ Special疋 Can be processed for liquid crystal square panels' In addition, the modular plate-shaped electric device of the present invention is equipped with poem-plasma processing: the long plate-shaped antennas 61, 62, 63, 64, 65, 66 each have their own counterparts. Of the electricity, ports 51, 52, 53, 54, 55, and 56 can use dielectrics that originally required a large ^ polar south cost! | J port is changed to several smaller and more economical plate-shaped dielectric windows ’so that it can reduce costs and be easy to manufacture and maintain. In the present invention, the number of components such as long plate antennas 61, 62, 63, 64, 65:66 and RF power sources 72, 82 are not limited. For example, the plasma source device of the present invention is intended to be installed in a small room. When processing a small substrate in a processing chamber, as shown in FIG. 4, it can be appropriately reduced to four long plate antennas 6 丨, 6 2, ^ 〇63, 64, and an RF power source 71, each plate 61, 62, 63, 64 are two pairs. They are arranged in parallel. One end is connected in parallel to the RF power source 71 and the other end is connected to a reference potential 73. Therefore, the spacing of each tube 61, 62, 63, 64 can be adjusted to the required plasma uniformity. It can easily replace long plate antennas with different coil densities, so it can form a modular plate-shaped electro-polymerization source device that is suitable for small plastic plasma processing chambers. Therefore, it can be re-produced as the demand increases or decreases. The present invention may be implemented in other different forms without departing from the main spirit and characteristics. Therefore, the above-mentioned preferred embodiments are merely mentioned by way of example 'and should not be considered as a limitation of the present invention. The scope of the invention is given by

C: \ Logo-5 \ Five Continents \ PK7347.ptd Page 8 447035

C: \ Logo-5 \ Five Continents \ PK7347.ptd Page 9 447035 Brief description of the drawings [Illustration of the drawings] Figure 1: A plasma system includes a sectional view of the plasma source device of the present invention; Figure 2: A perspective view of the long plate antenna of the present invention; FIG. 3: a schematic diagram of a circuit connection between the long plate antenna and a radio frequency power source according to the embodiment of the present invention; and FIG. 4: a long plate antenna and a radio frequency power source according to another embodiment of the present invention Circuit connection diagram. [Illustration of drawing number] 10 Plasma cavity 20 Pump pump 21 30 Substrate stage 31 4 0 Substrate 51 ~ 56_ Dielectric window 61, 62, 63, 64, 65 61 1 '621, 631, 641 612' 622 632 '642 71 Matching network 72 81 Matching network 82 Vacuum gauge bias RF power supply 3 2 Matching network 66 651, 661 652, 662 RF power supply RF power supply Long plate antenna Induction coil body plate 73 Reference potential 83 Reference potential

C: \ Logo-5 \ Five Continents \ PK7347.ptd Page 10

Claims (1)

447〇35 6. Scope of patent application, a kind of module plasma, which is at least two long, each length of the induction wire is at least one ray circle; According to the application, 'where the application is applied', where the application is applied, where the electrical material is based on the application, and the material is made of a kind of long plate and long plate. The sky-shaped plate plasma device mainly includes a plate antenna. The antenna loop of the plate antenna is based on the body frequency [RF] electric test potential. The frequency power source makes the beneficial range the first. The RF power source is the antenna's inductive benefit range. The first RF power source's other beneficial range is the first reference potential. The long plate antenna is made into the first long plate antenna in the beta range. A wire-shaped antenna includes: a source device 'for generating in a processing chamber containing: its grandchildren arranged in parallel to each other and capable of inducing a plasma containing a body plate and an induction coil, wherein one end of the plate is obliquely wound to the other end; the source' Connect the induction in parallel or series to the radio coil. The modular plate plasma source device described in the item includes a matching network β. The modular plate plasma source device is connected to a ground potential. The modular body board described in the item is connected to the induction coil by a rock power source to generate plasma. The module type is connected to the plate-shaped plasma staggered parallel source device in the form of plate-shaped plasma. The modular body board mentioned in the item is iron-containing plate-shaped plasma, drill or nickel. The magnetic permeability of the source device is connected to the RF power source to induce the plasma. C: \ Logo-5 \ Five C〇ntinents \ PK7347.ptd Page 11 447〇35 6 10 11 12 Patent Application Families-Sense: 圈 Circle System: made of dielectric materials such as English or oxide; and . * '' ,,,,,, and 糸 are obliquely wound from one end of the body plate to the other end 8. A type of plasma processing chamber, with an electrical installation cavity, which contains electricity = a physical substrate, which contains at least; a window, where the Dielectric window # 八 ° 海 Plasma cavity is equipped with several plate-shaped dielectric-substrate carriers, which are made of electro-electric material; a gas pump is installed in the plasma to support the substrate, a modular type The plate-shaped plasma source device is used to extract air and reduce pressure. · The line, at least one radio frequency power source and w ', mainly include at least two long plate-shaped antennas arranged in parallel with each other from two to a reference potential. The long plate can Induction plasma, each-length f should be in the dielectric window of the plasma cavity, and the coil should be, and the induction coil == the antenna includes a body plate and an inductive other two ends, and the RF power source is inclined obliquely to one end of the body plate. Winding to the upper reference potential corresponds to the ♦ or series connection of the induction coil. The helium buccal power source connects the induction coil to the induction coil. According to the eighth generation of the patent application, the m-frequency power source of the plasma is two or more, and the plasma processing room, in which the radiation induction Coil. The father-in-parallel connection is used to connect the long plate-shaped antenna. According to the eighth patent application, the frequency power supply also includes a matching network. [The plasma processing room, where the radio and plasma according to item 8 of the scope of the patent application; the test potential is the ground potential, and the electric purple processing room, where the reference and the plasma area of the patent application, item 8 / _ I's plasma Processing room where the long C: \ Logo-5 \ Five Continents \ PK7347.ptd 44703S 6. The scope of patent application The antenna plate of the plate antenna is made of quartz or oxidized dielectric materials. Room, where the body of the long plate antenna is made of a magnetically conductive material of iron, cobalt, or nickel = the plasma processing room described in item 8 of the patent β scope, wherein the plasma processing room further includes- A biased RF power supply, which is a substrate stage. The RF power supply according to the plasma processing room described in item 14 of the scope of patent application also includes a matching network. The plasma processing chamber according to item 8 of the scope of the patent application, the cavity of the plasma processing chamber is square, and is used to process liquid crystal flat glass panels. The utility model relates to a plasma source module for processing a square substrate, which mainly comprises a plurality of long plate antennas wound with an induction coil and at least one radio frequency power source, wherein the parallel arrangement of the long plate antennas corresponds to the square substrate. The plasma source module according to item 17 of the scope of the patent application, wherein each long plate antenna is a plate-shaped dielectric window corresponding to the plasma cavity. The plasma source mold according to item 17 or 18 of the scope of the patent application, wherein the square substrate is a glass substrate. The plasma source module according to item 19 of the patent application scope, wherein the glass substrate is a liquid crystal panel. 14 15 16 17 18 19 20 Which the partial which the electric 〇