CN1839308A - 晶圆检测用的方法和装置 - Google Patents

晶圆检测用的方法和装置 Download PDF

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Publication number
CN1839308A
CN1839308A CNA2004800239479A CN200480023947A CN1839308A CN 1839308 A CN1839308 A CN 1839308A CN A2004800239479 A CNA2004800239479 A CN A2004800239479A CN 200480023947 A CN200480023947 A CN 200480023947A CN 1839308 A CN1839308 A CN 1839308A
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CN
China
Prior art keywords
image
wafer
size
image field
measured
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CNA2004800239479A
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English (en)
Chinese (zh)
Inventor
艾伯特·苛立
贺宁·贝克后斯
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
KLA Tencor MIE GmbH
Original Assignee
Vistec Semiconductor Systems GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Vistec Semiconductor Systems GmbH filed Critical Vistec Semiconductor Systems GmbH
Publication of CN1839308A publication Critical patent/CN1839308A/zh
Pending legal-status Critical Current

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    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00—Image analysis
    • G06T7/0002—Inspection of images, e.g. flaw detection
    • G06T7/0004—Industrial image inspection
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/0004—Microscopes specially adapted for specific applications
    • G02B21/0016—Technical microscopes, e.g. for inspection or measuring in industrial production processes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/36—Microscopes arranged for photographic purposes or projection purposes or digital imaging or video purposes including associated control and data processing arrangements
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00—Indexing scheme for image analysis or image enhancement
    • G06T2207/30—Subject of image; Context of image processing
    • G06T2207/30108—Industrial image inspection
    • G06T2207/30148—Semiconductor; IC; Wafer

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Multimedia (AREA)
  • Quality & Reliability (AREA)
  • Theoretical Computer Science (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
CNA2004800239479A 2003-09-18 2004-08-27 晶圆检测用的方法和装置 Pending CN1839308A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10343148A DE10343148A1 (de) 2003-09-18 2003-09-18 Verfahren und Vorrichtung zur Inspektion eines Wafers
DE10343148.9 2003-09-18

Publications (1)

Publication Number Publication Date
CN1839308A true CN1839308A (zh) 2006-09-27

Family

ID=34352925

Family Applications (1)

Application Number Title Priority Date Filing Date
CNA2004800239479A Pending CN1839308A (zh) 2003-09-18 2004-08-27 晶圆检测用的方法和装置

Country Status (5)

Country Link
US (1) US20070064224A1 (enExample)
JP (1) JP2007506081A (enExample)
CN (1) CN1839308A (enExample)
DE (1) DE10343148A1 (enExample)
WO (1) WO2005029052A1 (enExample)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101964316B (zh) * 2009-07-24 2012-05-23 中芯国际集成电路制造(上海)有限公司 晶圆测试方法
CN102759334A (zh) * 2011-04-25 2012-10-31 范玉兰 一种测量晶体管尺寸的装置
CN102980897A (zh) * 2012-12-10 2013-03-20 深圳市华星光电技术有限公司 检测方法及检测装置
CN101358935B (zh) * 2007-08-02 2014-05-07 联达科技设备私人有限公司 图案化晶圆缺点检测系统及其方法
US9164043B2 (en) 2012-12-10 2015-10-20 Shenzhen China Star Optoelectronics Technology Co., Ltd. Detecting method and detecting device

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102005017642B4 (de) * 2005-04-15 2010-04-08 Vistec Semiconductor Systems Jena Gmbh Verfahren zur Inspektion eines Wafers
JP5099848B2 (ja) * 2006-08-10 2012-12-19 芝浦メカトロニクス株式会社 円盤状基板の検査装置及び検査方法
DE102007060355A1 (de) 2007-12-12 2009-06-25 Vistec Semiconductor Systems Gmbh Verfahren und Vorrichtung zur Verarbeitung der von mindestens einer Kamera aufgenommenen Bilddaten der Oberfläche eines Wafers
SG164292A1 (en) 2009-01-13 2010-09-29 Semiconductor Technologies & Instruments Pte System and method for inspecting a wafer
DE102011051355A1 (de) * 2011-06-27 2012-12-27 Hseb Dresden Gmbh Inspektionsvorrichtung
US9546862B2 (en) * 2012-10-19 2017-01-17 Kla-Tencor Corporation Systems, methods and metrics for wafer high order shape characterization and wafer classification using wafer dimensional geometry tool
WO2017171651A1 (en) * 2016-03-30 2017-10-05 Agency For Science, Technology And Research System and method for imaging a surface defect on an object
WO2018071747A1 (en) * 2016-10-13 2018-04-19 Life Technologies Holdings Pte Limited Systems, methods, and apparatuses for optimizing field of view
US11600504B2 (en) * 2020-06-29 2023-03-07 Taiwan Semiconductor Manufacturing Company, Ltd. Detecting damaged semiconductor wafers utilizing a semiconductor wafer sorter tool of an automated materials handling system
JP7431694B2 (ja) * 2020-07-28 2024-02-15 キヤノン株式会社 情報処理装置、膜形成装置、物品の製造方法、およびプログラム
US12462375B2 (en) * 2022-08-05 2025-11-04 Tokyo Electron Limited Methods to automatically adjust one or more parameters of a camera system for optimal 3D reconstruction of features formed within/on a semiconductor substrate

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6273716A (ja) * 1985-09-27 1987-04-04 Fujitsu Ltd 検査装置
WO1991018313A1 (en) * 1990-05-21 1991-11-28 Interactive Video Systems, Inc. Projected image focus system and method of use
US5529623A (en) * 1994-09-28 1996-06-25 Ciba-Geigy Corporation Pigmentary solid solutions of pyrrolo[3,4-c]pyrroles and quinacridones
KR960015001A (ko) * 1994-10-07 1996-05-22 가나이 쓰토무 반도체 기판의 제조방법과 피검사체상의 패턴결함을 검사하기 위한 방법 및 장치
JP3744966B2 (ja) * 1994-10-07 2006-02-15 株式会社ルネサステクノロジ 半導体基板の製造方法
JP3683298B2 (ja) * 1995-02-02 2005-08-17 オリンパス株式会社 欠陥検出用顕微鏡装置
US6895109B1 (en) * 1997-09-04 2005-05-17 Texas Instruments Incorporated Apparatus and method for automatically detecting defects on silicon dies on silicon wafers
JP2001144148A (ja) * 2001-05-12 2001-05-25 Advantest Corp 半導体試験装置のウエハマップ表示装置
JP2003098112A (ja) * 2001-09-25 2003-04-03 Hitachi Ltd 薄膜デバイスの表面画像の検出・出力方法及びその装置並びにそれを用いた薄膜デバイスの製造方法及びその製造装置
US7558419B1 (en) * 2003-08-14 2009-07-07 Brion Technologies, Inc. System and method for detecting integrated circuit pattern defects

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101358935B (zh) * 2007-08-02 2014-05-07 联达科技设备私人有限公司 图案化晶圆缺点检测系统及其方法
CN101964316B (zh) * 2009-07-24 2012-05-23 中芯国际集成电路制造(上海)有限公司 晶圆测试方法
CN102759334A (zh) * 2011-04-25 2012-10-31 范玉兰 一种测量晶体管尺寸的装置
CN102980897A (zh) * 2012-12-10 2013-03-20 深圳市华星光电技术有限公司 检测方法及检测装置
US9164043B2 (en) 2012-12-10 2015-10-20 Shenzhen China Star Optoelectronics Technology Co., Ltd. Detecting method and detecting device

Also Published As

Publication number Publication date
DE10343148A1 (de) 2005-04-21
WO2005029052A1 (de) 2005-03-31
JP2007506081A (ja) 2007-03-15
US20070064224A1 (en) 2007-03-22

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