CN1826427A - 用于形成高质量光学涂层的高速沉积 - Google Patents

用于形成高质量光学涂层的高速沉积 Download PDF

Info

Publication number
CN1826427A
CN1826427A CNA2004800211469A CN200480021146A CN1826427A CN 1826427 A CN1826427 A CN 1826427A CN A2004800211469 A CNA2004800211469 A CN A2004800211469A CN 200480021146 A CN200480021146 A CN 200480021146A CN 1826427 A CN1826427 A CN 1826427A
Authority
CN
China
Prior art keywords
coating
substrate
powder coating
optical
reactant
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CNA2004800211469A
Other languages
English (en)
Chinese (zh)
Inventor
毕向欣
赫尔曼·A·洛佩兹
普拉萨德·纳拉西马
埃里克·尤夫拉尔德
罗纳德·J·莫索
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NIOPHOTONIX CORP
Original Assignee
Nanogram Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nanogram Corp filed Critical Nanogram Corp
Publication of CN1826427A publication Critical patent/CN1826427A/zh
Pending legal-status Critical Current

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/01—Other methods of shaping glass by progressive fusion or sintering of powdered glass onto a shaping substrate, i.e. accretion, e.g. plasma oxidation deposition
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/12—Optical coatings produced by application to, or surface treatment of, optical elements by surface treatment, e.g. by irradiation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/02—Processes for applying liquids or other fluent materials performed by spraying
    • B05D1/12—Applying particulate materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/06—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1415—Reactant delivery systems
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01—Manufacture of glass fibres or filaments
    • C03B37/012—Manufacture of preforms for drawing fibres or filaments
    • C03B37/0128—Manufacture of preforms for drawing fibres or filaments starting from pulverulent glass
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01—Manufacture of glass fibres or filaments
    • C03B37/012—Manufacture of preforms for drawing fibres or filaments
    • C03B37/0128—Manufacture of preforms for drawing fibres or filaments starting from pulverulent glass
    • C03B37/01291—Manufacture of preforms for drawing fibres or filaments starting from pulverulent glass by progressive melting, e.g. melting glass powder during delivery to and adhering the so-formed melt to a target or preform, e.g. the Plasma Oxidation Deposition [POD] process
    • C03B37/01294—Manufacture of preforms for drawing fibres or filaments starting from pulverulent glass by progressive melting, e.g. melting glass powder during delivery to and adhering the so-formed melt to a target or preform, e.g. the Plasma Oxidation Deposition [POD] process by delivering pulverulent glass to the deposition target or preform where the powder is progressively melted, e.g. accretion
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01—Manufacture of glass fibres or filaments
    • C03B37/012—Manufacture of preforms for drawing fibres or filaments
    • C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/01406—Deposition reactors therefor
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01—Manufacture of glass fibres or filaments
    • C03B37/012—Manufacture of preforms for drawing fibres or filaments
    • C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/01413—Reactant delivery systems
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01—Manufacture of glass fibres or filaments
    • C03B37/012—Manufacture of preforms for drawing fibres or filaments
    • C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/01413—Reactant delivery systems
    • C03B37/0142—Reactant deposition burners
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/48—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation
    • C23C16/482—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation using incoherent light, UV to IR, e.g. lamps
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/48—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation
    • C23C16/483—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation using coherent light, UV to IR, e.g. lasers
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/56—After-treatment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C24/00—Coating starting from inorganic powder
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C24/00—Coating starting from inorganic powder
    • C23C24/02—Coating starting from inorganic powder by application of pressure only
    • C23C24/04—Impact or kinetic deposition of particles
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/13—Integrated optical circuits characterised by the manufacturing method
    • G02B6/132—Integrated optical circuits characterised by the manufacturing method by deposition of thin films
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/08—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant
    • C03B2201/10—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant doped with boron
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/08—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant
    • C03B2201/12—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant doped with fluorine
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
    • C03B2201/28—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with phosphorus
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C03B2201/31—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with germanium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/30—For glass precursor of non-standard type, e.g. solid SiH3F
    • C03B2207/34—Liquid, e.g. mist or aerosol
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/02—Optical fibres with cladding with or without a coating
    • G02B6/036—Optical fibres with cladding with or without a coating core or cladding comprising multiple layers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P40/00—Technologies relating to the processing of minerals
    • Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
    • Y02P40/57—Improving the yield, e-g- reduction of reject rates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Plasma & Fusion (AREA)
  • General Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Surface Treatment Of Glass (AREA)
  • Optical Integrated Circuits (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Chemical Vapour Deposition (AREA)
CNA2004800211469A 2003-06-06 2004-05-27 用于形成高质量光学涂层的高速沉积 Pending CN1826427A (zh)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US47690603P 2003-06-06 2003-06-06
US60/476,906 2003-06-06
US10/854,019 2004-05-26
US10/854,019 US8865271B2 (en) 2003-06-06 2004-05-26 High rate deposition for the formation of high quality optical coatings
PCT/US2004/016534 WO2004110737A2 (en) 2003-06-06 2004-05-27 High rate deposition for the formation of high quality optical coatings

Publications (1)

Publication Number Publication Date
CN1826427A true CN1826427A (zh) 2006-08-30

Family

ID=33555434

Family Applications (1)

Application Number Title Priority Date Filing Date
CNA2004800211469A Pending CN1826427A (zh) 2003-06-06 2004-05-27 用于形成高质量光学涂层的高速沉积

Country Status (6)

Country Link
US (2) US8865271B2 (ja)
EP (1) EP1644553A4 (ja)
JP (1) JP2007525592A (ja)
KR (1) KR101276391B1 (ja)
CN (1) CN1826427A (ja)
WO (1) WO2004110737A2 (ja)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110620213A (zh) * 2018-06-20 2019-12-27 深圳市贝特瑞新能源材料股份有限公司 四氯铝酸锂和碳纳米管包覆钛酸锂的复合材料、其制备方法及用途
CN113003929A (zh) * 2021-04-03 2021-06-22 南京至淳宏远科技有限公司 一种用于掺稀土预制棒制备的气相蒸发装置
CN114057390A (zh) * 2020-08-06 2022-02-18 贺利氏石英玻璃有限两合公司 用于生产氟化石英玻璃的替代氟化剂
CN114057387A (zh) * 2020-08-06 2022-02-18 贺利氏石英玻璃有限两合公司 用于制备氟化石英玻璃的方法

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6952504B2 (en) * 2001-12-21 2005-10-04 Neophotonics Corporation Three dimensional engineering of planar optical structures
US20030202770A1 (en) * 2002-01-03 2003-10-30 Garito Anthony F. Optical waveguide amplifiers
KR100577094B1 (ko) * 2003-12-31 2006-05-08 주식회사 삼양제넥스 식물 세포 배양에서 알카노산 또는 이의 염을 이용한 이차대사산물의 대량 생산방법
WO2006015360A1 (en) * 2004-07-30 2006-02-09 President And Fellows Of Harvard College Fluid waveguides and uses thereof
WO2006086551A2 (en) * 2005-02-08 2006-08-17 President And Fellows Of Harvard College Microfluidic lasers
US20070240454A1 (en) 2006-01-30 2007-10-18 Brown David P Method and apparatus for continuous or batch optical fiber preform and optical fiber production
US20080020232A1 (en) * 2006-07-20 2008-01-24 Lisa Yvonne Winckler Solar Control Polymer Films Comprising an Aluminum Oxide Coating
US10808319B1 (en) * 2010-02-26 2020-10-20 Quantum Innovations, Inc. System and method for vapor deposition of substrates with circular substrate frame that rotates in a planetary motion and curved lens support arms
US10550474B1 (en) 2010-02-26 2020-02-04 Quantum Innovations, Inc. Vapor deposition system
US9120700B2 (en) * 2010-03-26 2015-09-01 Corning Incorporated Non-contact etching of moving glass sheets
US9512036B2 (en) 2010-10-26 2016-12-06 Massachusetts Institute Of Technology In-fiber particle generation
CN104053811B (zh) 2011-11-18 2017-04-12 第一太阳能有限公司 用于材料共沉积的气相传输沉积方法及系统
US9450239B1 (en) * 2012-03-15 2016-09-20 Erik K. Koep Methods for fabrication of intercalated lithium batteries
CA2879971A1 (en) * 2012-03-20 2013-09-26 Quantum Innovations, Inc. Vapor deposition system and method
EP2833167B1 (en) * 2012-03-30 2017-01-11 HOYA Corporation Method of manufacturing eyeglass lens
DE102012103077B4 (de) * 2012-04-10 2017-06-22 Schott Ag Infrarot-absorbierender Glas-Wafer und Verfahren zu dessen Herstellung
US10406723B2 (en) 2013-03-13 2019-09-10 University Of Central Florida Research Foundation Dynamic in-fiber particle production with precise dimensional control
US10241409B2 (en) 2015-12-22 2019-03-26 AZ Electronic Materials (Luxembourg) S.à.r.l. Materials containing metal oxides, processes for making same, and processes for using same
WO2017210478A1 (en) 2016-06-01 2017-12-07 Arizona Board Of Regents On Behalf Of Arizona State University System and methods for deposition spray of particulate coatings
US9956587B2 (en) * 2016-08-29 2018-05-01 The Aerospace Corporation Fabrication assembly and methods for fabricating composite mirror objects
US10697914B2 (en) * 2016-09-19 2020-06-30 Energy Storage & Retention Solutions Holdings, Llc Rapid high temperature thermal analysis
EP3708998A1 (en) * 2019-03-13 2020-09-16 Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V. Apparatus and methods for particle testing
EP4359585A4 (en) * 2021-07-30 2024-06-19 Versum Materials US, LLC MULTI-ZONE HEATING HOUSING FOR OPTIMIZED SUBLIMATION OF SOLID PHASE PRECURSORS

Family Cites Families (64)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2047422C1 (de) * 1970-09-26 1978-04-27 Messerschmitt-Boelkow-Blohm Gmbh, 8000 Muenchen Auslösevorrichtung für elektrische Zünder von Minen mit vorgegebener einstellbarer Ansprechempfindlichkeit
US3806570A (en) 1972-03-30 1974-04-23 Corning Glass Works Method for producing high quality fused silica
US3934061A (en) 1972-03-30 1976-01-20 Corning Glass Works Method of forming planar optical waveguides
US3923484A (en) 1974-01-11 1975-12-02 Corning Glass Works Flame method of producing glass
US3883336A (en) 1974-01-11 1975-05-13 Corning Glass Works Method of producing glass in a flame
US4011067A (en) 1974-01-30 1977-03-08 Minnesota Mining And Manufacturing Company Filter medium layered between supporting layers
US3923162A (en) * 1974-02-11 1975-12-02 John J Hussey Shower caddy
US3924061A (en) * 1974-06-11 1975-12-02 Comfax Communications Inc Facsimile transceiver utilizing single light source
US3932162A (en) 1974-06-21 1976-01-13 Corning Glass Works Method of making glass optical waveguide
JPS51102014A (en) 1974-11-01 1976-09-09 Komatsu Denshi Kinzoku Kk Kojundotomeigarasutaino seizohoho
JPS5263213A (en) 1975-11-20 1977-05-25 Komatsu Denshi Kinzoku Kk Process for preparing highhpurity transparent silica glass products
US4363647A (en) * 1981-05-14 1982-12-14 Corning Glass Works Method of making fused silica-containing material
US4581248A (en) 1984-03-07 1986-04-08 Roche Gregory A Apparatus and method for laser-induced chemical vapor deposition
CA1255382A (en) 1984-08-10 1989-06-06 Masao Kawachi Hybrid optical integrated circuit with alignment guides
DE3442790A1 (de) 1984-11-23 1986-06-05 Dieter Prof. Dr. Linz Bäuerle Verfahren zur herstellung von duennschichtkondensatoren
US4782787A (en) 1986-01-08 1988-11-08 Roche Gregory A Apparatus for laser-induced chemical vapor deposition
US4868005A (en) 1986-04-09 1989-09-19 Massachusetts Institute Of Technology Method and apparatus for photodeposition of films on surfaces
US4681640A (en) 1986-08-06 1987-07-21 The United States Of America As Represented By The Secretary Of The Army Laser-induced chemical vapor deposition of germanium and doped-germanium films
US5060595A (en) 1988-04-12 1991-10-29 Ziv Alan R Via filling by selective laser chemical vapor deposition
JP2511503B2 (ja) 1988-08-22 1996-06-26 沖電気工業株式会社 タングステン膜の形成方法
JPH02310363A (ja) 1989-05-24 1990-12-26 Mitsubishi Electric Corp レーザ蒸着装置
US5017317A (en) 1989-12-04 1991-05-21 Board Of Regents, The Uni. Of Texas System Gas phase selective beam deposition
US5059475A (en) 1990-06-29 1991-10-22 Photonic Integration Research, Inc. Apparatus and method of forming optical waveguides on metalized substrates
EP0508060A3 (en) 1991-02-12 1993-01-13 Ngk Spark Plug Co. Ltd. Method of forming oxide superconducting films and oxide superconducting members having said films
FR2674768B1 (fr) * 1991-04-02 1994-09-02 France Telecom Procede de traitement photochimique d'un materiau utilisant une source de lumiere a tubes a eclairs.
JPH05273426A (ja) 1991-12-06 1993-10-22 Sumitomo Electric Ind Ltd 光導波膜の作製方法およびこれを用いた光導波路の作製方法
US5174826A (en) 1991-12-06 1992-12-29 General Electric Company Laser-assisted chemical vapor deposition
US5246745A (en) 1991-12-23 1993-09-21 International Business Machines Corporation Laser-induced chemical vapor deposition of thin-film conductors
TW263566B (ja) 1993-01-14 1995-11-21 Sumitomo Electric Industries
ATE201721T1 (de) * 1993-03-18 2001-06-15 Advanced Tech Materials Verfahren und vorrichtung zur zuführung von reagenzien in dampfform in einen cvd-reaktor
US5858465A (en) 1993-03-24 1999-01-12 Georgia Tech Research Corporation Combustion chemical vapor deposition of phosphate films and coatings
EP0689618B1 (en) 1993-03-24 2003-02-26 Georgia Tech Research Corporation Method and apparatus for the combustion chemical vapor deposition of films and coatings
US5622750A (en) 1994-10-31 1997-04-22 Lucent Technologies Inc. Aerosol process for the manufacture of planar waveguides
US5744777A (en) 1994-12-09 1998-04-28 Northwestern University Small particle plasma spray apparatus, method and coated article
US5510141A (en) 1995-01-26 1996-04-23 Central Glass Company, Limited Coating composition and method for forming thin film on substrate using same
US5800860A (en) 1995-06-28 1998-09-01 Lucent Technologies Inc. Method of manufacturing planar optical waveguides
BR9610069A (pt) 1995-08-04 2000-05-09 Microcoating Technologies Disposição de vapor quìmico e formação de pó usando-se pulverização térmica com soluções de fluido quase super-crìticas e super-crìticas
US5874134A (en) 1996-01-29 1999-02-23 Regents Of The University Of Minnesota Production of nanostructured materials by hypersonic plasma particle deposition
US5896484A (en) 1996-02-15 1999-04-20 Corning Incorporated Method of making a symmetrical optical waveguide
US6011981A (en) 1996-03-12 2000-01-04 International Superconductivity Technology Center Oxide superconductor multilayered film and oxide superconductor josephson device
US5885904A (en) 1997-02-14 1999-03-23 Advanced Micro Devices, Inc. Method to incorporate, and a device having, oxide enhancement dopants using gas immersion laser doping (GILD) for selectively growing an oxide layer
US5958348A (en) 1997-02-28 1999-09-28 Nanogram Corporation Efficient production of particles by chemical reaction
DE19730231A1 (de) 1997-07-15 1999-01-21 Abb Research Ltd Verfahren zum elektrostatischen Beschichten
US7164818B2 (en) * 2001-05-03 2007-01-16 Neophontonics Corporation Integrated gradient index lenses
US7226966B2 (en) 2001-08-03 2007-06-05 Nanogram Corporation Structures incorporating polymer-inorganic particle blends
US6290735B1 (en) 1997-10-31 2001-09-18 Nanogram Corporation Abrasive particles for surface polishing
US6726990B1 (en) 1998-05-27 2004-04-27 Nanogram Corporation Silicon oxide particles
US6849334B2 (en) 2001-08-17 2005-02-01 Neophotonics Corporation Optical materials and optical devices
US20010051118A1 (en) 1999-07-21 2001-12-13 Ronald J. Mosso Particle production apparatus
US6788866B2 (en) * 2001-08-17 2004-09-07 Nanogram Corporation Layer materials and planar optical devices
US7384680B2 (en) 1997-07-21 2008-06-10 Nanogram Corporation Nanoparticle-based power coatings and corresponding structures
US6020458A (en) * 1997-10-24 2000-02-01 Quester Technology, Inc. Precursors for making low dielectric constant materials with improved thermal stability
JP2963993B1 (ja) 1998-07-24 1999-10-18 工業技術院長 超微粒子成膜法
US6074888A (en) 1998-08-18 2000-06-13 Trw Inc. Method for fabricating semiconductor micro epi-optical components
US6636676B1 (en) * 1998-09-30 2003-10-21 Optomec Design Company Particle guidance system
US6097144A (en) 1998-10-28 2000-08-01 International Lead Zinc Research Organization, Inc. Cathode ray tubes having reduced glass browning properties
US6254928B1 (en) 1999-09-02 2001-07-03 Micron Technology, Inc. Laser pyrolysis particle forming method and particle forming method
WO2001032799A1 (en) 1999-11-04 2001-05-10 Nanogram Corporation Particle dispersions
JP4160229B2 (ja) * 2000-02-28 2008-10-01 株式会社リコー マイクロレンズの製造方法および製造装置
JP2001281487A (ja) 2000-03-30 2001-10-10 Furukawa Electric Co Ltd:The 光導波路装置およびその製造方法
US6467313B1 (en) 2000-06-09 2002-10-22 Corning Incorporated Method for controlling dopant profiles
US6466707B1 (en) 2000-08-21 2002-10-15 Corning Incorporated Phasar athermalization using a slab waveguide
CN1251809C (zh) 2000-10-17 2006-04-19 尼奥弗托尼克斯公司 通过反应沉积形成涂覆的装置及方法
CN100484752C (zh) 2000-10-26 2009-05-06 尼奥弗托尼克斯公司 多层光学结构

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110620213A (zh) * 2018-06-20 2019-12-27 深圳市贝特瑞新能源材料股份有限公司 四氯铝酸锂和碳纳米管包覆钛酸锂的复合材料、其制备方法及用途
CN110620213B (zh) * 2018-06-20 2022-03-25 贝特瑞新材料集团股份有限公司 四氯铝酸锂和碳纳米管包覆钛酸锂的复合材料、其制备方法及用途
CN114057390A (zh) * 2020-08-06 2022-02-18 贺利氏石英玻璃有限两合公司 用于生产氟化石英玻璃的替代氟化剂
CN114057387A (zh) * 2020-08-06 2022-02-18 贺利氏石英玻璃有限两合公司 用于制备氟化石英玻璃的方法
CN114057390B (zh) * 2020-08-06 2023-12-22 贺利氏石英玻璃有限两合公司 用于生产氟化石英玻璃的替代氟化剂
CN114057387B (zh) * 2020-08-06 2023-12-22 贺利氏石英玻璃有限两合公司 用于制备氟化石英玻璃的方法
CN113003929A (zh) * 2021-04-03 2021-06-22 南京至淳宏远科技有限公司 一种用于掺稀土预制棒制备的气相蒸发装置
CN113003929B (zh) * 2021-04-03 2023-04-28 南京至淳宏远科技有限公司 一种用于掺稀土预制棒制备的气相蒸发装置

Also Published As

Publication number Publication date
WO2004110737A3 (en) 2005-06-30
EP1644553A2 (en) 2006-04-12
JP2007525592A (ja) 2007-09-06
US8865271B2 (en) 2014-10-21
KR20060026039A (ko) 2006-03-22
US20050019504A1 (en) 2005-01-27
EP1644553A4 (en) 2010-10-20
WO2004110737A2 (en) 2004-12-23
KR101276391B1 (ko) 2013-06-19
US20150037513A1 (en) 2015-02-05

Similar Documents

Publication Publication Date Title
CN1826427A (zh) 用于形成高质量光学涂层的高速沉积
CN1289286C (zh) 光学材料及光学装置
CN1251809C (zh) 通过反应沉积形成涂覆的装置及方法
US9939579B2 (en) Multilayered optical structures
CN101119807A (zh) 通过反应性沉积形成致密涂层
JP2005500242A5 (ja)
US20120244060A9 (en) Methods for synthesizing submicron doped silicon particles
US20080026220A9 (en) Nanoparticle-based power coatings and corresponding structures
CN1831189A (zh) 通过反应沉积形成涂覆方法
US20070218290A1 (en) Method for Doping Material and Doped Material
CN1820090A (zh) 电化学单元电池制造的反应沉积

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C41 Transfer of patent application or patent right or utility model
TA01 Transfer of patent application right

Effective date of registration: 20070608

Address after: American California

Applicant after: Niophotonix Corp.

Address before: American California

Applicant before: Nanogram Corp.

C41 Transfer of patent application or patent right or utility model
TA01 Transfer of patent application right

Effective date of registration: 20071019

Address after: American California

Applicant after: Niophotonix Corp.

Address before: American California

Applicant before: Nanogram Corp.

C02 Deemed withdrawal of patent application after publication (patent law 2001)
WD01 Invention patent application deemed withdrawn after publication

Open date: 20060830