ATE201721T1 - Verfahren und vorrichtung zur zuführung von reagenzien in dampfform in einen cvd-reaktor - Google Patents
Verfahren und vorrichtung zur zuführung von reagenzien in dampfform in einen cvd-reaktorInfo
- Publication number
- ATE201721T1 ATE201721T1 AT94913894T AT94913894T ATE201721T1 AT E201721 T1 ATE201721 T1 AT E201721T1 AT 94913894 T AT94913894 T AT 94913894T AT 94913894 T AT94913894 T AT 94913894T AT E201721 T1 ATE201721 T1 AT E201721T1
- Authority
- AT
- Austria
- Prior art keywords
- vaporization
- vaporizer
- source reagent
- liquid
- reagent
- Prior art date
Links
- 239000003153 chemical reaction reagent Substances 0.000 title abstract 5
- 238000000034 method Methods 0.000 title abstract 4
- 239000007788 liquid Substances 0.000 abstract 5
- 230000008016 vaporization Effects 0.000 abstract 4
- 238000009834 vaporization Methods 0.000 abstract 4
- 239000006200 vaporizer Substances 0.000 abstract 3
- 238000005229 chemical vapour deposition Methods 0.000 abstract 2
- 230000015572 biosynthetic process Effects 0.000 abstract 1
- 238000004140 cleaning Methods 0.000 abstract 1
- 238000005260 corrosion Methods 0.000 abstract 1
- 230000007797 corrosion Effects 0.000 abstract 1
- 238000000354 decomposition reaction Methods 0.000 abstract 1
- 230000009931 harmful effect Effects 0.000 abstract 1
- 230000002401 inhibitory effect Effects 0.000 abstract 1
- 238000006864 oxidative decomposition reaction Methods 0.000 abstract 1
- 230000002028 premature Effects 0.000 abstract 1
- 239000007787 solid Substances 0.000 abstract 1
- 239000012265 solid product Substances 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
- C23C16/4483—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material using a porous body
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
- B01F23/10—Mixing gases with gases
- B01F23/12—Mixing gases with gases with vaporisation of a liquid
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/408—Oxides of copper or solid solutions thereof
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/409—Oxides of the type ABO3 with A representing alkali, alkaline earth metal or lead and B representing a refractory metal, nickel, scandium or a lanthanide
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
- C23C16/4407—Cleaning of reactor or reactor parts by using wet or mechanical methods
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N60/00—Superconducting devices
- H10N60/01—Manufacture or treatment
- H10N60/0268—Manufacture or treatment of devices comprising copper oxide
- H10N60/0296—Processes for depositing or forming copper oxide superconductor layers
- H10N60/0436—Processes for depositing or forming copper oxide superconductor layers by chemical vapour deposition [CVD]
- H10N60/0464—Processes for depositing or forming copper oxide superconductor layers by chemical vapour deposition [CVD] by metalloorganic chemical vapour deposition [MOCVD]
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Inorganic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Chemical Vapour Deposition (AREA)
- Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
- Porous Artificial Stone Or Porous Ceramic Products (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
- Details Of Reciprocating Pumps (AREA)
- Feeding And Controlling Fuel (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US08/032,984 US5337651A (en) | 1990-07-06 | 1993-03-18 | Apparatus and method for protection of pumps used for delivery of air- or moisture-sensitive liquids |
| US08/178,933 US5362328A (en) | 1990-07-06 | 1994-01-07 | Apparatus and method for delivering reagents in vapor form to a CVD reactor, incorporating a cleaning subsystem |
| PCT/US1994/002512 WO1994021840A1 (en) | 1993-03-18 | 1994-03-07 | Apparatus and method for delivering reagents in vapor form to a cvd reactor |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE201721T1 true ATE201721T1 (de) | 2001-06-15 |
Family
ID=26709139
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT94913894T ATE201721T1 (de) | 1993-03-18 | 1994-03-07 | Verfahren und vorrichtung zur zuführung von reagenzien in dampfform in einen cvd-reaktor |
Country Status (7)
| Country | Link |
|---|---|
| EP (1) | EP0689619B1 (de) |
| JP (1) | JP3103596B2 (de) |
| KR (1) | KR100320762B1 (de) |
| AT (1) | ATE201721T1 (de) |
| CA (1) | CA2158434A1 (de) |
| DE (1) | DE69427346T2 (de) |
| WO (1) | WO1994021840A1 (de) |
Families Citing this family (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5951923A (en) * | 1996-05-23 | 1999-09-14 | Ebara Corporation | Vaporizer apparatus and film deposition apparatus therewith |
| AU8401698A (en) * | 1997-07-14 | 1999-02-10 | Advanced Technology Materials, Inc. | Fluid delivery apparatus and method |
| US6216708B1 (en) | 1998-07-23 | 2001-04-17 | Micron Technology, Inc. | On-line cleaning method for CVD vaporizers |
| US7163197B2 (en) | 2000-09-26 | 2007-01-16 | Shimadzu Corporation | Liquid substance supply device for vaporizing system, vaporizer, and vaporization performance appraisal method |
| JP2003137512A (ja) * | 2001-11-02 | 2003-05-14 | Rigaku Corp | 金属酸化物の製造方法，半導体装置及び金属酸化物製造装置 |
| US6921062B2 (en) | 2002-07-23 | 2005-07-26 | Advanced Technology Materials, Inc. | Vaporizer delivery ampoule |
| US8865271B2 (en) * | 2003-06-06 | 2014-10-21 | Neophotonics Corporation | High rate deposition for the formation of high quality optical coatings |
| US20080241805A1 (en) | 2006-08-31 | 2008-10-02 | Q-Track Corporation | System and method for simulated dosimetry using a real time locating system |
| KR20210135341A (ko) | 2012-05-31 | 2021-11-12 | 엔테그리스, 아이엔씨. | 배취식 침착을 위한 고 물질 플럭스를 갖는 유체의 소스 시약-기반 수송 |
| US10443128B2 (en) * | 2015-04-18 | 2019-10-15 | Versum Materials Us, Llc | Vessel and method for delivery of precursor materials |
| KR102643986B1 (ko) | 2017-09-29 | 2024-03-07 | 사빅 에스케이 넥슬렌 컴퍼니 피티이 엘티디 | 신규한 인덴계 전이금속 화합물, 이를 포함하는 전이금속 촉매 조성물, 및 이를 이용한 에틸렌 단독중합체 또는 에틸렌과 α-올레핀의 공중합체의 제조방법 |
| JP6943911B2 (ja) | 2019-03-07 | 2021-10-06 | 古河電気工業株式会社 | 気化器の洗浄方法および気化装置 |
| KR20210069578A (ko) | 2019-12-03 | 2021-06-11 | 사빅 에스케이 넥슬렌 컴퍼니 피티이 엘티디 | 전이금속 화합물, 이를 포함하는 촉매 조성물 및 이를 이용하는 올레핀 중합체의 제조방법 |
| US11661653B2 (en) | 2019-12-18 | 2023-05-30 | L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude | Vapor delivery systems for solid and liquid materials |
| KR20210086505A (ko) | 2019-12-30 | 2021-07-08 | 사빅 에스케이 넥슬렌 컴퍼니 피티이 엘티디 | 전자 당김 그룹을 갖는 금속-리간드 착체, 이를 포함하는 에틸렌계 중합체 제조용 촉매 조성물 및 이를 이용한 에틸렌계 중합체의 제조방법 |
| KR20220094138A (ko) | 2020-12-28 | 2022-07-05 | 사빅 에스케이 넥슬렌 컴퍼니 피티이 엘티디 | 금속-리간드 착체, 이를 포함하는 에틸렌계 중합체 제조용 촉매 조성물 및 이를 이용한 에틸렌계 중합체의 제조방법 |
| KR20230101717A (ko) | 2021-12-29 | 2023-07-06 | 사빅 에스케이 넥슬렌 컴퍼니 피티이 엘티디 | 금속-리간드 착체, 이를 포함하는 에틸렌계 중합체 제조용 촉매 조성물 및 이를 이용한 에틸렌계 중합체의 제조방법 |
| KR20230101716A (ko) | 2021-12-29 | 2023-07-06 | 사빅 에스케이 넥슬렌 컴퍼니 피티이 엘티디 | 전이금속 화합물, 이를 포함하는 촉매 조성물 및 이를 이용하는 올레핀 중합체의 제조방법 |
| KR20240049151A (ko) | 2022-10-07 | 2024-04-16 | 사빅 에스케이 넥슬렌 컴퍼니 피티이 엘티디 | 전이금속 화합물, 이를 포함하는 촉매 조성물 및 이를 이용하는 올레핀 중합체의 제조방법 |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR1097534A (fr) * | 1953-04-02 | 1955-07-06 | Burckhardt Ag Maschf | Procédé pour maintenir exempte d'huile la tige de piston dans les machines à piston, et machine à piston agencée pour la mise en oeuvre de ce procédé |
| US4036915A (en) * | 1973-01-02 | 1977-07-19 | Meloy Laboratories, Inc. | Temperature-controlled apparatus for fluid permeation or the like |
| GB1584814A (en) * | 1976-08-23 | 1981-02-18 | Champion Chemicals Inc | Stream testing and treating system and method |
| US4174929A (en) * | 1977-03-11 | 1979-11-20 | Dudin Jury A | High pressure pump |
| US4212663A (en) * | 1978-01-26 | 1980-07-15 | Corning Glass Works | Reactants delivery system for optical waveguide manufacturing |
| US4288396A (en) * | 1978-11-17 | 1981-09-08 | Ottestad Nils T | Method and device for conditioning of breathing air for divers |
| NO152764C (no) * | 1983-07-25 | 1985-11-13 | Kleven Loland As | Tetningsanordning for en hoeytrykks aksialstempelpumpe. |
| JP2662993B2 (ja) * | 1988-08-10 | 1997-10-15 | 株式会社高純度化学研究所 | 液体原料気化装置 |
| EP0420596B1 (de) * | 1989-09-26 | 1996-06-19 | Canon Kabushiki Kaisha | Gasversorgungsvorrichtung und ihre Verwendung für eine Filmabscheidungsanlage |
| US5204314A (en) * | 1990-07-06 | 1993-04-20 | Advanced Technology Materials, Inc. | Method for delivering an involatile reagent in vapor form to a CVD reactor |
| GB9116381D0 (en) * | 1991-07-30 | 1991-09-11 | Shell Int Research | Method for deposition of a metal |
| US5259995A (en) * | 1991-10-30 | 1993-11-09 | Liquid Carbonic Industries Corporation | Vapor pressure device |
-
1994
- 1994-03-07 AT AT94913894T patent/ATE201721T1/de not_active IP Right Cessation
- 1994-03-07 EP EP94913894A patent/EP0689619B1/de not_active Expired - Lifetime
- 1994-03-07 JP JP06521092A patent/JP3103596B2/ja not_active Expired - Fee Related
- 1994-03-07 DE DE69427346T patent/DE69427346T2/de not_active Expired - Fee Related
- 1994-03-07 WO PCT/US1994/002512 patent/WO1994021840A1/en active IP Right Grant
- 1994-03-07 KR KR1019950703951A patent/KR100320762B1/ko not_active IP Right Cessation
- 1994-03-07 CA CA002158434A patent/CA2158434A1/en not_active Abandoned
Also Published As
| Publication number | Publication date |
|---|---|
| JPH08508315A (ja) | 1996-09-03 |
| EP0689619A1 (de) | 1996-01-03 |
| KR100320762B1 (ko) | 2002-08-08 |
| JP3103596B2 (ja) | 2000-10-30 |
| DE69427346T2 (de) | 2001-09-13 |
| KR960701235A (ko) | 1996-02-24 |
| EP0689619A4 (de) | 1998-07-15 |
| DE69427346D1 (de) | 2001-07-05 |
| CA2158434A1 (en) | 1994-09-29 |
| EP0689619B1 (de) | 2001-05-30 |
| WO1994021840A1 (en) | 1994-09-29 |
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