CN1771110A - 抛光垫设备和方法 - Google Patents

抛光垫设备和方法 Download PDF

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Publication number
CN1771110A
CN1771110A CNA2004800048310A CN200480004831A CN1771110A CN 1771110 A CN1771110 A CN 1771110A CN A2004800048310 A CNA2004800048310 A CN A2004800048310A CN 200480004831 A CN200480004831 A CN 200480004831A CN 1771110 A CN1771110 A CN 1771110A
Authority
CN
China
Prior art keywords
pad
porous
polishing pad
polishing
wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CNA2004800048310A
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English (en)
Chinese (zh)
Inventor
A·S·拉文
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
DuPont Electronic Materials Holding Inc
Original Assignee
Rohm and Haas Electronic Materials CMP Holdings Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rohm and Haas Electronic Materials CMP Holdings Inc filed Critical Rohm and Haas Electronic Materials CMP Holdings Inc
Publication of CN1771110A publication Critical patent/CN1771110A/zh
Pending legal-status Critical Current

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B53/00—Devices or means for dressing or conditioning abrasive surfaces
    • B24B53/017—Devices or means for dressing, cleaning or otherwise conditioning lapping tools
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P52/00—Grinding, lapping or polishing of wafers, substrates or parts of devices

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Grinding-Machine Dressing And Accessory Apparatuses (AREA)
CNA2004800048310A 2003-02-25 2004-02-23 抛光垫设备和方法 Pending CN1771110A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/373,513 2003-02-25
US10/373,513 US6899612B2 (en) 2003-02-25 2003-02-25 Polishing pad apparatus and methods

Publications (1)

Publication Number Publication Date
CN1771110A true CN1771110A (zh) 2006-05-10

Family

ID=32868728

Family Applications (1)

Application Number Title Priority Date Filing Date
CNA2004800048310A Pending CN1771110A (zh) 2003-02-25 2004-02-23 抛光垫设备和方法

Country Status (6)

Country Link
US (1) US6899612B2 (https=)
JP (1) JP2006518943A (https=)
KR (1) KR20050107760A (https=)
CN (1) CN1771110A (https=)
TW (1) TW200505634A (https=)
WO (1) WO2004077520A2 (https=)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107877359A (zh) * 2016-09-29 2018-04-06 罗门哈斯电子材料Cmp控股股份有限公司 用于使化学机械抛光垫表面成形的装置
CN119167661A (zh) * 2024-11-20 2024-12-20 苏州大学 球形抛光头氧化铈抛光液斜轴抛光加工表面形貌预测方法

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102005012684A1 (de) * 2005-03-18 2006-09-21 Infineon Technologies Ag Verfahren zum Steuern eines CMP-Prozesses und Poliertuch
US7241206B1 (en) * 2006-02-17 2007-07-10 Chien-Min Sung Tools for polishing and associated methods
US7494404B2 (en) * 2006-02-17 2009-02-24 Chien-Min Sung Tools for polishing and associated methods
US7569268B2 (en) * 2007-01-29 2009-08-04 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Chemical mechanical polishing pad
DE102007024954A1 (de) 2007-05-30 2008-12-04 Siltronic Ag Poliertuch für DSP und CMP
WO2015037606A1 (ja) * 2013-09-11 2015-03-19 富士紡ホールディングス株式会社 研磨パッド及びその製造方法
CN105745261B (zh) * 2013-12-25 2018-09-28 Dic株式会社 多孔体和研磨垫
JP6809779B2 (ja) * 2015-08-25 2021-01-06 株式会社フジミインコーポレーテッド 研磨パッド、研磨パッドのコンディショニング方法、パッドコンディショニング剤、それらの利用
US9802293B1 (en) * 2016-09-29 2017-10-31 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Method to shape the surface of chemical mechanical polishing pads
JP7118841B2 (ja) * 2018-09-28 2022-08-16 富士紡ホールディングス株式会社 研磨パッド

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US182401A (en) * 1876-09-19 Thomas baeeett
US5569062A (en) 1995-07-03 1996-10-29 Speedfam Corporation Polishing pad conditioning
EP0769350A1 (en) 1995-10-19 1997-04-23 Ebara Corporation Method and apparatus for dressing polishing cloth
US6245679B1 (en) 1996-08-16 2001-06-12 Rodel Holdings, Inc Apparatus and methods for chemical-mechanical polishing of semiconductor wafers
US6224465B1 (en) 1997-06-26 2001-05-01 Stuart L. Meyer Methods and apparatus for chemical mechanical planarization using a microreplicated surface
US6139402A (en) 1997-12-30 2000-10-31 Micron Technology, Inc. Method and apparatus for mechanical and chemical-mechanical planarization of microelectronic substrates
WO2000030159A1 (en) 1998-11-18 2000-05-25 Rodel Holdings, Inc. Method to decrease dishing rate during cmp in metal semiconductor structures
US6419553B2 (en) 2000-01-04 2002-07-16 Rodel Holdings, Inc. Methods for break-in and conditioning a fixed abrasive polishing pad
US6679769B2 (en) * 2000-09-19 2004-01-20 Rodel Holdings, Inc Polishing pad having an advantageous micro-texture and methods relating thereto
US6641471B1 (en) 2000-09-19 2003-11-04 Rodel Holdings, Inc Polishing pad having an advantageous micro-texture and methods relating thereto
US20020182401A1 (en) 2001-06-01 2002-12-05 Lawing Andrew Scott Pad conditioner with uniform particle height
US6659846B2 (en) * 2001-09-17 2003-12-09 Agere Systems, Inc. Pad for chemical mechanical polishing

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107877359A (zh) * 2016-09-29 2018-04-06 罗门哈斯电子材料Cmp控股股份有限公司 用于使化学机械抛光垫表面成形的装置
CN119167661A (zh) * 2024-11-20 2024-12-20 苏州大学 球形抛光头氧化铈抛光液斜轴抛光加工表面形貌预测方法

Also Published As

Publication number Publication date
US20040166780A1 (en) 2004-08-26
WO2004077520A3 (en) 2004-10-14
TW200505634A (en) 2005-02-16
WO2004077520A2 (en) 2004-09-10
US6899612B2 (en) 2005-05-31
JP2006518943A (ja) 2006-08-17
KR20050107760A (ko) 2005-11-15

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WD01 Invention patent application deemed withdrawn after publication