CN1756772A - 具有“限定几何构型”芴基类配体的Ⅲb族金属络合物 - Google Patents
具有“限定几何构型”芴基类配体的Ⅲb族金属络合物 Download PDFInfo
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- CN1756772A CN1756772A CNA2004800058257A CN200480005825A CN1756772A CN 1756772 A CN1756772 A CN 1756772A CN A2004800058257 A CNA2004800058257 A CN A2004800058257A CN 200480005825 A CN200480005825 A CN 200480005825A CN 1756772 A CN1756772 A CN 1756772A
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- 229910052751 metal Inorganic materials 0.000 title claims abstract description 16
- 239000002184 metal Substances 0.000 title claims abstract description 16
- 239000003446 ligand Substances 0.000 title claims abstract description 13
- 125000003983 fluorenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3CC12)* 0.000 title claims description 10
- 239000012968 metallocene catalyst Substances 0.000 claims abstract description 18
- 238000000034 method Methods 0.000 claims abstract description 18
- 238000002360 preparation method Methods 0.000 claims abstract description 9
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 26
- 125000000217 alkyl group Chemical group 0.000 claims description 22
- 229910052799 carbon Inorganic materials 0.000 claims description 21
- 125000004432 carbon atom Chemical group C* 0.000 claims description 18
- 239000003054 catalyst Substances 0.000 claims description 18
- 238000006243 chemical reaction Methods 0.000 claims description 15
- 238000006116 polymerization reaction Methods 0.000 claims description 13
- 229910052739 hydrogen Inorganic materials 0.000 claims description 11
- 239000001257 hydrogen Substances 0.000 claims description 11
- 239000012190 activator Substances 0.000 claims description 10
- 229910052736 halogen Inorganic materials 0.000 claims description 10
- 150000002367 halogens Chemical class 0.000 claims description 10
- 229910052727 yttrium Inorganic materials 0.000 claims description 10
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 9
- 239000000203 mixture Substances 0.000 claims description 9
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical group [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 claims description 9
- 239000000178 monomer Substances 0.000 claims description 8
- 239000000725 suspension Substances 0.000 claims description 8
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- 125000004429 atom Chemical group 0.000 claims description 6
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- 238000005649 metathesis reaction Methods 0.000 claims description 6
- 238000001953 recrystallisation Methods 0.000 claims description 6
- 150000003839 salts Chemical class 0.000 claims description 6
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 claims description 5
- 239000004215 Carbon black (E152) Substances 0.000 claims description 5
- 125000003118 aryl group Chemical group 0.000 claims description 5
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- 239000012043 crude product Substances 0.000 claims description 5
- 239000000126 substance Substances 0.000 claims description 5
- 238000012546 transfer Methods 0.000 claims description 5
- SMBQBQBNOXIFSF-UHFFFAOYSA-N dilithium Chemical class [Li][Li] SMBQBQBNOXIFSF-UHFFFAOYSA-N 0.000 claims description 4
- 239000000843 powder Substances 0.000 claims description 4
- 229910052746 lanthanum Inorganic materials 0.000 claims description 3
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical group [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 claims description 3
- 230000000379 polymerizing effect Effects 0.000 claims description 3
- 229910052779 Neodymium Chemical group 0.000 claims description 2
- 150000001335 aliphatic alkanes Chemical class 0.000 claims description 2
- 229910052784 alkaline earth metal Inorganic materials 0.000 claims description 2
- 150000001342 alkaline earth metals Chemical class 0.000 claims description 2
- 229910052728 basic metal Inorganic materials 0.000 claims description 2
- 150000003818 basic metals Chemical class 0.000 claims description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 claims description 2
- 230000005595 deprotonation Effects 0.000 claims description 2
- 238000010537 deprotonation reaction Methods 0.000 claims description 2
- 238000003379 elimination reaction Methods 0.000 claims description 2
- 238000001704 evaporation Methods 0.000 claims description 2
- 230000008020 evaporation Effects 0.000 claims description 2
- 229910052744 lithium Inorganic materials 0.000 claims description 2
- 229910052749 magnesium Inorganic materials 0.000 claims description 2
- QEFYFXOXNSNQGX-UHFFFAOYSA-N neodymium atom Chemical group [Nd] QEFYFXOXNSNQGX-UHFFFAOYSA-N 0.000 claims description 2
- 238000011084 recovery Methods 0.000 claims description 2
- 229910052708 sodium Inorganic materials 0.000 claims description 2
- 230000000737 periodic effect Effects 0.000 abstract 1
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 68
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 33
- 150000001875 compounds Chemical class 0.000 description 32
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 15
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 12
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 12
- 238000005160 1H NMR spectroscopy Methods 0.000 description 10
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 10
- 239000000463 material Substances 0.000 description 9
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- 238000005481 NMR spectroscopy Methods 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- 239000003153 chemical reaction reagent Substances 0.000 description 6
- 239000000047 product Substances 0.000 description 6
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- 238000001644 13C nuclear magnetic resonance spectroscopy Methods 0.000 description 5
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 4
- 239000013078 crystal Substances 0.000 description 4
- 229910052809 inorganic oxide Inorganic materials 0.000 description 4
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- 238000003756 stirring Methods 0.000 description 4
- 230000002152 alkylating effect Effects 0.000 description 3
- UHOVQNZJYSORNB-MZWXYZOWSA-N benzene-d6 Chemical compound [2H]C1=C([2H])C([2H])=C([2H])C([2H])=C1[2H] UHOVQNZJYSORNB-MZWXYZOWSA-N 0.000 description 3
- AIXAANGOTKPUOY-UHFFFAOYSA-N carbachol Chemical group [Cl-].C[N+](C)(C)CCOC(N)=O AIXAANGOTKPUOY-UHFFFAOYSA-N 0.000 description 3
- 230000003197 catalytic effect Effects 0.000 description 3
- ZSWFCLXCOIISFI-UHFFFAOYSA-N cyclopentadiene Chemical compound C1C=CC=C1 ZSWFCLXCOIISFI-UHFFFAOYSA-N 0.000 description 3
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 3
- 229910052747 lanthanoid Inorganic materials 0.000 description 3
- 150000002602 lanthanoids Chemical class 0.000 description 3
- 125000002524 organometallic group Chemical group 0.000 description 3
- 238000010298 pulverizing process Methods 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- MZRVEZGGRBJDDB-UHFFFAOYSA-N N-Butyllithium Chemical compound [Li]CCCC MZRVEZGGRBJDDB-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 238000002441 X-ray diffraction Methods 0.000 description 2
- 230000029936 alkylation Effects 0.000 description 2
- 238000005804 alkylation reaction Methods 0.000 description 2
- 239000004411 aluminium Substances 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- 239000012141 concentrate Substances 0.000 description 2
- 125000004122 cyclic group Chemical group 0.000 description 2
- 125000000058 cyclopentadienyl group Chemical group C1(=CC=CC1)* 0.000 description 2
- 238000010528 free radical solution polymerization reaction Methods 0.000 description 2
- 238000005984 hydrogenation reaction Methods 0.000 description 2
- 238000007327 hydrogenolysis reaction Methods 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- KWGKDLIKAYFUFQ-UHFFFAOYSA-M lithium chloride Chemical compound [Li+].[Cl-] KWGKDLIKAYFUFQ-UHFFFAOYSA-M 0.000 description 2
- OFXSXYCSPVKZPF-UHFFFAOYSA-N methoxyperoxymethane Chemical compound COOOC OFXSXYCSPVKZPF-UHFFFAOYSA-N 0.000 description 2
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 2
- PARWUHTVGZSQPD-UHFFFAOYSA-N phenylsilane Chemical compound [SiH3]C1=CC=CC=C1 PARWUHTVGZSQPD-UHFFFAOYSA-N 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 239000004926 polymethyl methacrylate Substances 0.000 description 2
- 229920000098 polyolefin Polymers 0.000 description 2
- 238000001556 precipitation Methods 0.000 description 2
- 238000012797 qualification Methods 0.000 description 2
- 229910000077 silane Inorganic materials 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 229960001866 silicon dioxide Drugs 0.000 description 2
- 239000002002 slurry Substances 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- 229910006400 μ-Cl Inorganic materials 0.000 description 2
- HTSGKJQDMSTCGS-UHFFFAOYSA-N 1,4-bis(4-chlorophenyl)-2-(4-methylphenyl)sulfonylbutane-1,4-dione Chemical compound C1=CC(C)=CC=C1S(=O)(=O)C(C(=O)C=1C=CC(Cl)=CC=1)CC(=O)C1=CC=C(Cl)C=C1 HTSGKJQDMSTCGS-UHFFFAOYSA-N 0.000 description 1
- MEKOFIRRDATTAG-UHFFFAOYSA-N 2,2,5,8-tetramethyl-3,4-dihydrochromen-6-ol Chemical compound C1CC(C)(C)OC2=C1C(C)=C(O)C=C2C MEKOFIRRDATTAG-UHFFFAOYSA-N 0.000 description 1
- AQZWEFBJYQSQEH-UHFFFAOYSA-N 2-methyloxaluminane Chemical compound C[Al]1CCCCO1 AQZWEFBJYQSQEH-UHFFFAOYSA-N 0.000 description 1
- AODPIQQILQLWGS-FDSHTENPSA-N 5a-Tetrahydrocortisol Chemical compound C1[C@H](O)CC[C@]2(C)[C@H]3[C@@H](O)C[C@](C)([C@@](CC4)(O)C(=O)CO)[C@@H]4[C@@H]3CC[C@H]21 AODPIQQILQLWGS-FDSHTENPSA-N 0.000 description 1
- BTBUEUYNUDRHOZ-UHFFFAOYSA-N Borate Chemical compound [O-]B([O-])[O-] BTBUEUYNUDRHOZ-UHFFFAOYSA-N 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000002841 Lewis acid Substances 0.000 description 1
- 229910012506 LiSi Inorganic materials 0.000 description 1
- 229910052765 Lutetium Inorganic materials 0.000 description 1
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 229910052772 Samarium Inorganic materials 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- 229910052769 Ytterbium Inorganic materials 0.000 description 1
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 125000003368 amide group Chemical group 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 238000012662 bulk polymerization Methods 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 150000004696 coordination complex Chemical class 0.000 description 1
- 238000007334 copolymerization reaction Methods 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
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- 238000013461 design Methods 0.000 description 1
- UHOVQNZJYSORNB-MICDWDOJSA-N deuteriobenzene Chemical compound [2H]C1=CC=CC=C1 UHOVQNZJYSORNB-MICDWDOJSA-N 0.000 description 1
- 238000010494 dissociation reaction Methods 0.000 description 1
- 230000005593 dissociations Effects 0.000 description 1
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- 150000002170 ethers Chemical class 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
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- 125000000524 functional group Chemical group 0.000 description 1
- 125000005842 heteroatom Chemical group 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 150000007517 lewis acids Chemical class 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- 229910000474 mercury oxide Inorganic materials 0.000 description 1
- UKWHYYKOEPRTIC-UHFFFAOYSA-N mercury(ii) oxide Chemical compound [Hg]=O UKWHYYKOEPRTIC-UHFFFAOYSA-N 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- CPOFMOWDMVWCLF-UHFFFAOYSA-N methyl(oxo)alumane Chemical compound C[Al]=O CPOFMOWDMVWCLF-UHFFFAOYSA-N 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 238000000655 nuclear magnetic resonance spectrum Methods 0.000 description 1
- 125000001181 organosilyl group Chemical group [SiH3]* 0.000 description 1
- -1 polyethylene Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 238000004537 pulping Methods 0.000 description 1
- 229910052761 rare earth metal Inorganic materials 0.000 description 1
- 150000002910 rare earth metals Chemical class 0.000 description 1
- KZUNJOHGWZRPMI-UHFFFAOYSA-N samarium atom Chemical compound [Sm] KZUNJOHGWZRPMI-UHFFFAOYSA-N 0.000 description 1
- 229910052706 scandium Inorganic materials 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 235000012222 talc Nutrition 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- JLTRXTDYQLMHGR-UHFFFAOYSA-N trimethylaluminium Chemical compound C[Al](C)C JLTRXTDYQLMHGR-UHFFFAOYSA-N 0.000 description 1
- OHSJPLSEQNCRLW-UHFFFAOYSA-N triphenylmethyl radical Chemical compound C1=CC=CC=C1[C](C=1C=CC=CC=1)C1=CC=CC=C1 OHSJPLSEQNCRLW-UHFFFAOYSA-N 0.000 description 1
- 238000010792 warming Methods 0.000 description 1
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- 238000010626 work up procedure Methods 0.000 description 1
- 239000004711 α-olefin Substances 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F4/00—Polymerisation catalysts
- C08F4/42—Metals; Metal hydrides; Metallo-organic compounds; Use thereof as catalyst precursors
- C08F4/44—Metals; Metal hydrides; Metallo-organic compounds; Use thereof as catalyst precursors selected from light metals, zinc, cadmium, mercury, copper, silver, gold, boron, gallium, indium, thallium, rare earths or actinides
- C08F4/52—Metals; Metal hydrides; Metallo-organic compounds; Use thereof as catalyst precursors selected from light metals, zinc, cadmium, mercury, copper, silver, gold, boron, gallium, indium, thallium, rare earths or actinides selected from boron, aluminium, gallium, indium, thallium or rare earths
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F17/00—Metallocenes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F10/00—Homopolymers and copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
- C08F20/10—Esters
- C08F20/12—Esters of monohydric alcohols or phenols
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F4/00—Polymerisation catalysts
- C08F4/42—Metals; Metal hydrides; Metallo-organic compounds; Use thereof as catalyst precursors
- C08F4/44—Metals; Metal hydrides; Metallo-organic compounds; Use thereof as catalyst precursors selected from light metals, zinc, cadmium, mercury, copper, silver, gold, boron, gallium, indium, thallium, rare earths or actinides
- C08F4/60—Metals; Metal hydrides; Metallo-organic compounds; Use thereof as catalyst precursors selected from light metals, zinc, cadmium, mercury, copper, silver, gold, boron, gallium, indium, thallium, rare earths or actinides together with refractory metals, iron group metals, platinum group metals, manganese, rhenium technetium or compounds thereof
- C08F4/62—Refractory metals or compounds thereof
- C08F4/64—Titanium, zirconium, hafnium or compounds thereof
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F4/00—Polymerisation catalysts
- C08F4/42—Metals; Metal hydrides; Metallo-organic compounds; Use thereof as catalyst precursors
- C08F4/44—Metals; Metal hydrides; Metallo-organic compounds; Use thereof as catalyst precursors selected from light metals, zinc, cadmium, mercury, copper, silver, gold, boron, gallium, indium, thallium, rare earths or actinides
- C08F4/60—Metals; Metal hydrides; Metallo-organic compounds; Use thereof as catalyst precursors selected from light metals, zinc, cadmium, mercury, copper, silver, gold, boron, gallium, indium, thallium, rare earths or actinides together with refractory metals, iron group metals, platinum group metals, manganese, rhenium technetium or compounds thereof
- C08F4/619—Component covered by group C08F4/60 containing a transition metal-carbon bond
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Abstract
本发明公开了一种基于周期表的IIIb族金属和桥连杂原子芴基配体的茂金属催化剂组分。本发明还公开了其制备方法及其在聚合中的用途。
Description
本发明涉及基于周期表IIIb族金属的“限定几何构型(constrainedgeometry)催化剂”体系的领域。本发明还涉及所述体系的合成及其在烯烃聚合中的用途。
“限定几何构型催化剂”(CGC)是半夹心状(half-sandwich)的络合物,其带有双异官能团环戊二烯基-酰氨基配体。它们由于下列几种原因而受到关注:
-由给电子性较弱的酰胺基代替连接的双(环戊二烯基)配体中的环戊二烯基部分,这导致具有较高Lewis酸度的类柄型茂金属络合物(ansa-metallocene-like complexes)的形成;因此潜在地提高了对Lewis碱性物的催化活性。
-通过选择环戊二烯基、桥连原子和侧链杂原子上的合适取代基,可以更大可能地设计新型催化几何结构。
已经在例如Shapiro等的(P.J.Shapiro,W.D.Cotter,W.P.Schaefer,J.A.Labinger,J.E.Bercaw;J.Am Chem.Soc.,1994,116,4623.),或Hultzsch等的(K.C.Hultzsch,P.Voth,K.Beckerle,T.P.Spaniol,J.Okuda;Organometallics,2000,19,228.),或Tian等的(S.Tian,V.M.Arredondo,C.L Stern,T.J.Marks;Organometallics,1999,18,2568.),或Mu等的(Y.Mu,W.Piers,M.-A.MacDonald,M.J.Zaworotko;Can.J.Chem.,1995,73,2233.),或Arndt和Okuda的(S.Arndt,J.Okuda,Chem.Rev.,2002,102,1953.)中描述了III族金属(Sc、Y、Yb、Lu)的环戊二烯基-酰氨基络合物的合成和聚合能力。
然而,所有这些公开物都限于具有组合环戊二烯基-酰氨基配体的镧系化合物。没有一份公开物涉及芴基-酰氨基领域。
本发明的一个目的是以高产率制备基于芴基-杂原子配体和基于周期表IIIb族金属的桥连的半夹心的茂金属组分。
本发明的另一目的是制备在苯乙烯的可控聚合中有效的催化剂组分。
本发明的又一目的是制备能够制备聚甲基丙烯酸甲酯的催化剂组分。
更一般地,本发明旨在制备在极性或非极性单体的可控聚合中有效的催化剂体系。
因此,本发明公开了基于周期表的IIIb族金属和桥连的限定几何构型芴基类配体的茂金属催化剂组分。
在第一实施方案中,本发明公开了具有以下通式的茂金属催化剂组分
[(Flu-SiR2-N-R′)M(R″)(L)n]m (I)
其中Flu是取代或未取代的芴基,M是周期表的IIIb族金属,SiR2是N和Flu(9-位)之间的结构桥,赋予该组分立构刚性(stereorigidity),其中每个R相同或相异,且为具有1~20个碳原子的烷基,R′为氢或具有ZR$ 3形式,其中Z是C或Si,R$是具有1~20个碳原子的烃基,R″是氢或具有1~20个碳原子的烃基或卤素,所述烃基可以含有1个或多个Si原子,L是配位溶剂,n是0、1或2,m是1或2。
芴基上的取代基没有具体限制,它们可以相同或相异且具有上述限定的ZR$ 3形式,它们特别包括具有1~20个碳原子的烃基。优选地,它们位于3和6位,或者位于4和5位,或者2和7位,更优选地,它们是相同的。
M优选为钇、镧或镧系元素,在整个描述中,术语“镧系”指原子序数为58~71的稀土系元素。在镧系中M优选钕、钐。更优选M为钇。
优选N被取代,更优选该取代基为叔丁基。
优选R″是氢或烷基或芳基或烯丙基或卤素,当R″是烷基或芳基或烯丙基时,m为1,当R″为氢或卤素时,m为2。当R″为卤素时,其优选为Cl、I或Br。
配位溶剂通常为醚,例如四氢呋喃(THF)、二甲氧基醚(DME)或乙醚(Et2O)。
为了在聚合中表现出活性,必须首先使用足够的试剂对(I)类化合物(其中R″是卤素)进行烷基化。典型的试剂可选自LiR*、R*MgX、MgR* 2、AlR* 3、AlR* nX3-n、[Li]+[AIR* nX3-n]-和甲基铝氧烷(methylalumoxane)(MAO),其中R*为具有1~20个碳原子的烷基、芳基或烯丙基,X是卤素,优选Cl。上述列表不应看作是限制性的。
在第二实施方案中,本发明公开了具有以下通式的茂金属催化剂组分
[(Flu-SiR2-N-R′)2M]-[Q(L)p]+ (II)
其中所有的符号都和式(I)中限定的一样,Q是碱金属、碱土金属或周期表IIIa族的金属,p为2~4。
Q优选为Li、Na、Mg或Al。
当络合物II中的离子对完全解离时,p为4,而当离子对部分缔合时,p为2或3。
本发明公开了基于盐的复分解反应的、用于制备催化剂组分(I)或(II)的第一种方法,其包括如下步骤:
a)在醚中悬浮MX3(THF)n;
b)在同种或另一种醚中悬浮去质子的(deprotonated)二锂盐[Flu-SiR2-N-R′]Li2;
c)在-80℃~60℃的温度下使悬浮液a)和b)发生盐的复分解反应;
d)蒸发挥发物之后,在-60℃~-0℃的温度下从醚或醚和烃的混合物中重结晶获自c)的粗产物;
e)回收式(I)或式(II)的结晶粉末。
在本发明的另一实施方案中,络合物(I)(其中R″是卤素)可以包括与烷基化试剂进行烷基化以得到络合物(I)(其中R″是如上述限定的烷基)的额外步骤。合适的烷基化试剂可选自LiR+、R+MgX、MgR+ 2、AlR+ 3、AlR+ nX3-n和[Li]+[AIR+ nX3-n]-,其中R+为具有1~20个碳原子的烷基、芳基或烯丙基,X是卤素,优选Cl。
本发明公开了基于烷烃的消去反应的、具体用于制备以下催化剂组分的第二种方法
[(Flu-SiR2-N-R′)M(R″)(L)n]m (I)
其中R″具体为具有1~20个碳原子的烃基,所述烃基可含有一个或多个Si原子,所述方法包括如下步骤:使原位预合成或生成的三(二价碳基)络合物(triscarbyl complex)M(R″)s(L)n与1当量的双质子配体(diproteo ligand)(FluH-SiR2-NH-R′)反应。
三(二价碳基)络合物M(R″)3(L)n优选作为MCl3(THF)n和3当量LiR″的反应产物在原位生成。用于制备络合物(I)的反应温度为0~75℃,优选为40~50℃。对于上述第二种制备方法,M优选为钇,而桥SiR2优选为二烷基甲硅烷基。
这两种方法可以包括一个额外步骤,即氢解(hydrogenolising)二价碳基络合物(I)以制备络合物:
[(Flu-SiR2-N-R′)M(H)(L)n]m (I′)。
合适的氢解试剂可选自二氢或氢硅烷(hydrosilane),例如苯基硅烷。反应优选在约25℃的室温和大气压下在烃溶剂(如苯或甲苯)中进行。反应产物在极性(醚类)或非极性(烃类)溶剂中都是不溶的。
本发明还公开了基于任意一种或多种式(I)和/或式(II)的催化剂组分以及合适的活化剂和/或转移剂的催化剂体系。
本发明公开了一种聚合的方法,包括以下步骤:
a)向反应器中引入催化剂体系,所述催化剂体系基于任意一种或多种式(I)和/或式(II)的催化剂组分;
b)任选向反应器中引入活化剂或转移剂;
c)加入单体和任选的共聚单体;
d)将系统保持在聚合条件下;
e)回收需要的聚合物。
任选的活化剂包括具有电离作用且具有低配位能力或无配位能力的Lewis酸。通常,在本发明中可以使用所有与周期表的IV族金属一起使用的活化剂。合适的含铝活化剂包括铝氧烷、烷基铝或烷基铝酸盐[Li]+[AlR* nX3-n]-。
可用于本发明的铝氧烷是公知的并优选包括直链和/或环状低聚烷基铝氧烷,对于直链低聚铝氧烷,由式(III)表示:
对于环状低聚铝氧烷,由式(IV)表示:
其中,n为1~40,优选为10~20;m为3~40,优选为3~20;R是C1~C8烷基,优选甲基。通常,在例如由三甲基铝和水制备铝氧烷时,得到直链和环状化合物的混合物。
合适的含硼活化剂可包括三苯基碳正离子硼酸盐(triphenylcarbeniumboronate),例如EP-A-0427696中描述的四-五氟苯基-硼-三苯基碳正离子(tetrakis-pentafluorophenyl-borato-triphenylcarbenium):
或者,EP-A-0277004(第6页第30行至第7页第7行)中描述的具有以下通式中的物质:
其它优选的活化剂包括羟基异丁基铝和金属铝氧酸盐(metalaluminoxinate)。
MgR= 2类型的烷基化试剂也可用作活化剂,其中每个R=相同或相异,且为具有1~20个碳原子的烃基,并任选包含一个或多个Si原子。
转移剂包括例如H2和具有式HSiR3形式的氢硅烷,其中每个R相同或相异,且为H原子或具有1~20个碳原子的烃基。根据欲聚合的单体对其进行选择。
可用于本发明的单体包括非极性单体例如乙烯、α-烯烃、苯乙烯,以及极性单体例如(甲基)丙烯酸酯或二烯烃。优选使用苯乙烯和甲基丙烯酸甲酯。
本发明的催化剂体系可以应用在任何类型的均聚或共聚方法中,条件是所需的催化活性不受破坏。在本发明的优选实施方式中,将所述催化剂体系应用于均相的本体聚合法或溶液聚合法中,或应用于多相淤浆聚合法中。在溶液聚合法中,典型的溶剂包括THF或具有4~7个碳原子的烃如庚烷、甲苯或环己烷。在淤浆聚合法中,需要将催化剂体系固定在惰性载体(具体为多孔固体载体如滑石、无机氧化物,和树脂载体材料如聚烯烃)上。优选地,载体材料是具有精细粉碎形式(finely divided form)的无机氧化物。
根据本发明,需要使用的合适的无机氧化物材料包括IIA、IIIA、IVA或IVB族的金属氧化物,例如二氧化硅、氧化铝及其混合物。可以单独使用或者与二氧化硅或氧化铝组合使用的其它无机氧化物为氧化镁、二氧化钛、氧化锆等。但可以使用其它合适的载体材料,例如精细粉碎的官能化聚烯烃如精细粉碎的聚乙烯。
优选地,载体是表面积为200~700m2/g、孔体积为0.5~3ml/g的二氧化硅载体。
聚合温度为-20℃至100℃。
本发明还包括可在上述催化剂组分的存在下通过聚合得到的聚合物。
附图说明
图1表示分子[3,6-di-tBu-C13H6-SiMe2-NtBu]Y(CH2SiMe3)(THF)2(1)的晶体结构。
图2表示络合物[3,6-di-tBu-C13H6-SiMe2-NtBu]Y-(CH2SiMe3)(THF)2(1)在25℃的C6D6中的1H NMR谱图。
图3表示络合物[3,6-di-tBu-C13H6-SiMe2-NtBu]Y-(CH2SiMe3)(THF)2(1)在25℃的C6D6中的13C NMR谱图。
图4表示络合物[3,6-di-tBu-C13H6-SiMe2-NtBu]Y-(CH2SiMe3)(THF)2(1)在-70℃的C6D6中的1H NMR谱图。
图5表示络合物[{(tBu2-C13H6)-SiMe2-NtBu}2Y]-[Li(THF)4]+(2)在25℃的THF-d8中的1H NMR谱图。
图6表示络合物[{(tBu2-C13H6)-SiMe2-NtBu}2Y]-[Li(THF)4]+(2)在25℃的THF-d8中的13C NMR谱图。
图7表示分子[{3,6-di-tBu-C13H6-SiMe2-NtBu}2La]-[Li(OEt2)2]+(4)的晶体结构。
图8表示分子[(3,6-di-tBu-C13H6-SiMe2-NtBu)Nd(μ-Cl)(THF)]2(5)的晶体结构。
实施例
[3,6-di-tBu-C13H6-SiMe2-NtBu]Y-(CH2SiMe3)(THF)2(1)的合成
(a)NMR规模的反应:在配置有聚四氟乙烯阀门的NMR管中加入Y[CH2SiMe3)]3(THF)2(32.4mg,0.065mmol)和3,6-di-tBu-C13H6H-SiMe2-NHtBu(26.7mg,0.065mmol),加入苯-d6(~0.6mL),并在-196℃下冷凝。用阀门封闭该管,并将管加热至室温。定期通过1H NMR光谱监测反应的进展。
(b)制备规模的反应:将无水YCl3(338mg,1.73mmol)在THF(15mL)中混合成浆并在80℃搅拌1小时。在真空下除去溶剂,将固体残留物悬浮在戊烷(20mL)中。冷却该悬浮液至-78℃,加入LiCH2SiMe3溶液(5.2mL 1M戊烷溶液,5.2mmol),在0℃下搅拌该悬浮液2小时。将悬浮液过滤,用戊烷(2×10mL)萃取白色固体。将LiCl过滤出来,在0℃加入3,6-di-tBu-C13H6H-SiMe2-NHtBu(578mg,1.42mmol)于戊烷(30mL)中形成的溶液。将反应混合物升温至室温并搅拌30小时。过滤溶液并在真空中浓缩。粗产物为[C13H6-SiMe2-NtBu]Y-(CH2SiMe3)(THF)2(1)(0.63g,68%)。络合物(1)的1H NMR谱图示于图2并得到如下结果:(苯-d6,200MHz,25℃):δ8.34(d,2H,4JHH=2.0Hz,4,5-H),7.97(d,2H,3JHH=8.3Hz,1,8-H),7.57(dd,2H,JHH=2.0,8.3Hz,2,7-H),3.0(m,8H,α-CH2,THF)1.61(s,9H,NCCH3),1.50(s,18H,CCH3(Flu)),1.17(m,8H,β-CH2,THF),0.78(s,6H,SiCH3),0.00(s,9H,CH2SiCH3),-0.89(d,JYH=3.3Hz,2H,YCH2).络合物(1)的13C NMR谱图示于图3并得到以下结果。(苯-d6,75MHz,25℃):δ140.7,139.4,130.3,123.9,117.8,116.7,115.5(C-1,-2,-3,-4,-5,-6,-7,-8),82.2(C-9),69.7(α-THF),54.3(NCCH3),36.4(NCCH3),34.7(Flu-CCH3),32.3(Flu-CCH3),30.2(d,1J(Y,C)=45.2Hz,YCH2),25.1(β-THF),6.2(SiCH3),4.6(CH2SiCH3)。络合物(1)的1H NMR谱图(苯-d6,200MHz,-70℃)示于图3。该NMR谱图表明在NMR时间量程(time scale)上,络合物(1)在25℃苯中是对称的,而在低于-30℃的温度下表现为不对称的。
络合物(1)单晶的X衍射研究表明,芴基部分以不寻常的环外η3方式键合,其涉及中心环的桥头碳原子(C(9A))和一个六元环的两个相邻碳原子(C(9),C(1)),其中所述碳原子如图1所示进行编号,图1示出分子(1)的结构。与Hultzsch等(K.C.Hultzsch,P.Voth,K.Beckerle,T.P.Spaniol,J.Okuda;Organometallics,2000,19,228.)描述的14电子单溶剂化络合物(14-electronmono-solvated complex)[η5:η1-C5Me4-SiMe2-NtBu]Y(CH2SiMe3)(THF)比较,在分子(1)中每个金属原子配位了两个THF分子。另外,分子(1)可以在形式上看作是14电子络合物,且钇原子的配位数为6。根据X-射线衍射数据,两个配位的THF配体并不等价;在两个Y-O键距离之间的差值为0.05,表明有一个THF分子参与解离过程。
[3,6-di-tBu-C13H6-SiMe2-NtBulLi2和YCl3(THF)n之间的盐复分解反应。
[(tBu2-C13H6)-SiMe2-NtBu}2Y]-[Li(THF)4]+(2)的制备
在-10℃,在剧烈搅拌下,向tBu2-C13H6H-SiMe2-NHtBu(108mg,0.265mmol)的乙醚(20mL)溶液中加入两当量的nBuLi(0.33mL 1.6M己烷溶液,0.530mmol)。使反应混合物升至室温并搅拌8小时。向所得的橙色的二锂盐醚溶液(冷却至-20℃)加入YCl3THF-加成物(由52.0mg,0.265mmol YCl3制备)与醚(30mL)的悬浮液。剧烈搅拌该混合物并升至室温;30~40分钟后溶液的颜色变为黄色。将黄色溶液从沉淀中滗出,在真空中除去挥发物,所得的残留物用戊烷(2×20mL)洗涤,得到黄色粉末(101.2mg)。粗络合物(2)的1H NMR谱图显示,溶液中存在两种物质,结果如下。(THF-d8,200MHz,25℃):第一产物:δ7.90(d,2H,4JHH=2.1Hz,4,5-H),7.69(d,2H,3JHH=8.6Hz,1,8-H),6.90(dd,2H,JHH=2.1,8.6Hz,2,7-H),1.36(s,18H,CCH3(Flu)),1.20(s,9H,NCCH3),0.38(s,6H,SiCH3);第二产物:δ7.83(m,2H,4JHH=2.1Hz,4,5-H),7.54(d,2H,3JHH=8.6Hz,1,8-H),6.84(dd,2H,JHH=2.1,8.6Hz,2,7-H),1.35(s,18H,CCH3(Flu)),1.11(s,9H,NCCH3),0.40(s,6H,SiCH3)。由Et2O∶THF∶戊烷(~0.5∶1∶3)重结晶该粗产物,得到黄色晶体(88.2mg,55%)。重结晶的络合物(2)的1H NMR谱图示于图5中,得到以下结果,该结果表明只存在单一的物质。(THF-d8,300MHz,25℃):δ7.94(d,2H,4JHH=1.8Hz,4,5-H),7.72(d,2H,3JHH=8.3Hz,1,8-H),7.13(dd,2H,JHH=1.8,8.3Hz,2,7-H),1.43(s,9H,NCCH3),1.36(s,18H,CCH3(Flu)),0.27(s,6H,SiCH3)。络合物(2)的13C NMR谱图示于图6且得到以下结果。(THF-d8,75MHz,25℃):δ144.6,137.8,133.7,121.1(C-1,-8),120.0(C-2,-7),115.5(C-4,-5),79.0(C-9),54.7(NCCH3),36.9(NCCH3),35.4(Flu-CCH3),33.2(Flu-CCH3),6.2(SiCH3)。[3,6-di-tBu-C3H6-SiMe2-NtBu]Li2和LaCl3(THF)n之间的盐复分解反应。[{(tBu2-C13H6)-SiMe2-NtBu}2La]-[Li(THF)4]+(3)的制备
使用LaCl3THF-加成物(由186mg,0.758mmol的LaCl3制备)和tBu2-C13H6H-SiMe2-NHtBu(310mg,0.760mmol)进行和上述相同的过程,得到黄色微晶固体(440mg)。粗络合物的NMR谱图表明,溶液中存在两种物质,且得到如下结果。1H NMR(THF-d8,200MHz,25℃):第一产物:δ7.93(d,2H,4JHH=2.0Hz,4,5-H),7.73(dd,2H,JHH=0.5,8.6Hz,1,8-H),6.94(dd,2H,JHH=2.1,8.6Hz,2,7-H),1.41(s,18H,CCH3(Flu)),1.25(s,9H,NCCH3),0.43(s,6H,SiCH3);第二产物:δ7.83(m,2H,4JHH=2.1Hz,4,5-H),7.54(d,2H,JHH=8.6Hz,1,8-H),6.84(dd,2H,JHH=2.1,8.6Hz,2,7-H),1.35(s,18H,CCH3(Flu)),1.16(s,9H,NCCH3),0.45(s,6H,SiCH3)。由THF-戊烷(~1∶4)混合物重结晶所述粗产物得到淡橙色晶体(0.38g,77%)。重结晶的络合物的NMR表明,在溶液中仅存在单一的物质,并得到以下结果。1H NMR(图5)(THF-d8,300MHz,25℃):δ7.82(d,2H,4JHH=1.8Hz,4,5-H),7.53(d,2H,3JHH=8.2Hz,1,8-H),6.84(dd,2H,JHH=1.8,8.2Hz,2,7-H),1.35(s,18H,CCH3(Flu)),1.19(s,18H,NCCH3),0.39(s,6H,SiCH3)。13C NMR(THF-d8,75MHz,25℃):δ144.4,131.4,127.7,119.5(C-1,-8),118.5(C-2,-7),114.9(C-4,-5),84.4(C-9),50.7(NCCH3),35.5(Flu-CCH3),35.4(NCCH3),34.1(Flu-CCH3),6.9(SiCH3)。C70H110N2O4LiSi2La的元素分析计算值为:C,67.49;H,8.90;N,2.25;测量值为:C,67.31;H,8.37;N,2.40。
[{tBu-C13H6-SiMe2-NtBu}2La]-[Li(Et2O)2]+(4)的合成
在-10℃,在剧烈搅拌下向tBu2-C13H6H-SiMe2-NHtBu(340mg,0.834mmol)的乙醚(30mL)溶液中加入两当量的nBuLi(1.0mL 1.6M的正己烷溶液,1.66mmol)。将反应混合物升至室温并搅拌8小时。在手套箱中,向所得的橙色的二锂盐的醚溶液(冷却至-35℃)中加入LaCl3(THF)1.5粉末(295mg,0.834mmol)。剧烈搅拌混合物并升至室温;20分钟后溶液的颜色变为桔黄色。将黄色溶液从沉淀中滗出并在真空下浓缩。将己烷(约2~3mL)加入所述醚溶液中,桔黄色晶体开始生长,在之后的10个小时后得到分子(4)的微晶(0.30g,33%)。1H NMR(THF-d8,200MHz,60℃):δ7.79(d,4H,4JHH=2.0Hz,4,5-H),7.25(d,4H,JHH=8.4Hz,1,8-H),7.00(dd,4H,JHH=2.0,8.4Hz,2,7-H),3.36(q,8H,CH2OCH3),1.51(s,18H,NCCH3),1.36(s,36H,CCH3(Flu)),1.08(t,12H,CH2OCH3),0.17(s,12H,SiCH3)。
[(tBu2-C13H6-SiMe2-NtBu}Nd(μ-Cl)(THF)]2(5)的合成
使用NdCl3THF-加成物(由156mg,0.623mmol NdCl3制备)和tBu2-C13H6H-SiMe2-NHtBu(255mg,0.623mmol)进行和上述相同的过程,得到呈色微晶固体的分子(5)(0.45g,77%)。使用Et2O-己烷混合物结晶反应混合物,到适于X-射线衍射分析的分子(5)的绿色晶体(0.15g,26%)。
[3,6-di-tBu-C13H6-SiMe2-NtBu]Y(CH2SiMe3)(THF)2(1)与PhSiH3或H2反应得到氢化钇(6)
方法A 在25℃向[C13H8-SiMe2-NtBu]Y(CH2TMS)(THF)2(0.100g,0.137mmol)的苯(5mL)溶液中加入苯基硅烷(85μL,0.688mmol)。在该温度下搅拌该混合物1小时。过滤形成的黄色沉淀,用苯(2mL)洗涤并在真空下干燥,得到0.070g不溶于THF和烃的淡黄色微晶产物。
方法B 将[C13H8-SiMe2-NtBu]Y(CH2TMS)(THF)2(0.125g,0.172mmol)的苯(5mL)溶液暴露在氢气气氛(1atm,25℃)中达12小时,在相似的实验操作(workup)之后得到30mg淡黄色不溶性产物。聚合
使用络合物(1)、(2)和(6)进行甲基丙烯酸甲酯(MMA)和苯乙烯的聚合。络合物(1)和(2)的制备如上所述。络合物(6)是氢化钇络合物。在室温和50℃下络合物(2)与MMA本体反应平稳,得到分子量分布(MWD)窄的无规立构PMMA。用多分散指数D定义分子量分布,多分散指数D是重均分子量Mw和数均分子量Mn之比Mw/Mn。烷基络合物(1)缓慢地引发MMA和苯乙烯的聚合。在表1中列出了聚合结果。
表1
络合物 | 条件 | 单体 | 温度℃ | 转化率% | Mw103 | MWD | 立构规整度 | ||
rr | mr | mm | |||||||
221111611 | 本体“““甲苯“甲苯本体“ | MMA““““““苯乙烯“ | 255025502550252550 | 2665痕量痕量2213痕量3 | 250216-不溶不溶19-455 | 2.853.60----2.8-1.81 | 2621--293233- | 4040--292926- | 3439--424041- |
反应条件:MMA/[金属]=200~500,t=12h。
Claims (16)
1.一种茂金属催化剂组分,其基于周期表的IIIb族金属和桥连的限定几何构型芴基类配体。
2.权利要求1的茂金属催化剂组分,其具有通式:
[(Flu-SiR2-N-R′)M(R″)(L)n]m (I)
其中Flu是取代或未取代的芴基,M是周期表的IIIb族金属,SiR2是N和Flu(9-位)之间的结构桥,其赋予该组分立构刚性,其中每个R相同或相异,且为具有1~20个碳原子的烷基,R′为氢或具有ZR$ 3形式,其中Z是C或Si,R$是具有1~20个碳原子的烃基,R″是氢或具有1~20个碳原子的烃基或卤素,所述烃基可以含有1个或多个Si原子,L是配位溶剂,n是0、1或2,m是1或2。
3.权利要求2的茂金属催化剂组分,其中R″选自氢或烷基或芳基或烯丙基。
4.权利要求2的茂金属催化剂组分,其中R″是卤素。
5.权利要求1的茂金属催化剂组分,其具有通式:
[(Flu-SiR2-N-R′)2M]-[Q(L)p]+ (II)
其中Flu是取代或未取代的芴基,M是周期表的IIIb族金属,SiR2是N和Flu(9-位)之间的结构桥,其赋予该组分立构刚性,其中每个R相同或相异,且为具有1~20个碳原子的烷基,R′为氢或具有ZR$ 3形式,其中Z是C或Si,R$是具有1~20个碳原子的烃基,L是配位溶剂,Q是碱金属、碱土金属或周期表的IIIa族金属,p为2~4。
6.权利要求2~5中任一项的茂金属催化剂组分,其中M是钇、镧或镧系元素(原子序数为58~71的元素)。
7.权利要求6的茂金属催化剂组分,其中M是钇、镧或钕。
8.权利要求2~7中任一项的茂金属催化剂组分,其中芴基上的取代基是相同的且为具有1~20个碳原子的烃基。
9.权利要求2~8中任一项的茂金属催化剂组分,其中N被取代且取代基为叔丁基。
10.权利要求5~9中任一项的茂金属催化剂组分,其中Q选自Li、Na、Mg或Al。
11.一种制备上述权利要求中任一项的茂金属催化剂组分的方法,其基于盐的复分解反应。
12.权利要求11的方法,其包括以下步骤:
a)在醚中悬浮MX3(THF)n;
b)在同种或另一种醚中悬浮去质子的二锂盐[Flu-SiR2-N-R′]Li2;
c)在-80℃~60℃的温度下使悬浮液a)和b)发生盐的复分解反应;
d)蒸发挥发物之后,在-60℃~-0℃的温度下从醚或醚和烃的混合物中重结晶获自c)的粗产物;
e)回收式(I)或式(II)的结晶粉末。
13.一种制备权利要求2的茂金属催化剂组分的方法,其基于烷烃的消去反应。
14.一种茂金属催化剂体系,其由权利要求1~10中任一项的茂金属催化剂组分和活化剂和/或转移剂制备。
15.一种聚合方法,其包括以下步骤:
a)向反应器中引入催化剂体系,所述催化剂体系基于任意一种或多种式(I)和/或式(II)的催化剂组分;
b)任选向反应器中引入活化剂和/或转移剂;
c)加入单体和任选的共聚单体;
d)将体系保持在聚合条件下;
e)回收所需的聚合物。
16.可通过权利要求15的方法获得的聚合物。
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