CN1729428A - 通过施加电场在光固化组合物中加工纳米级图形的方法和系统 - Google Patents

通过施加电场在光固化组合物中加工纳米级图形的方法和系统 Download PDF

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Publication number
CN1729428A
CN1729428A CN02810019.0A CN02810019A CN1729428A CN 1729428 A CN1729428 A CN 1729428A CN 02810019 A CN02810019 A CN 02810019A CN 1729428 A CN1729428 A CN 1729428A
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China
Prior art keywords
substrate
template
polymerizable composition
electric field
composition
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Pending
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CN02810019.0A
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English (en)
Chinese (zh)
Inventor
C·G·威尔森
S·V·斯里尼维圣
R·T·博纳卡兹
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University of Texas System
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University of Texas System
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Publication of CN1729428A publication Critical patent/CN1729428A/zh
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping

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  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Theoretical Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Mathematical Physics (AREA)
  • Manufacturing & Machinery (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Polymerisation Methods In General (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Casting Or Compression Moulding Of Plastics Or The Like (AREA)
  • Moulding By Coating Moulds (AREA)
CN02810019.0A 2001-05-16 2002-05-16 通过施加电场在光固化组合物中加工纳米级图形的方法和系统 Pending CN1729428A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US29166401P 2001-05-16 2001-05-16
US60/291,664 2001-05-16

Publications (1)

Publication Number Publication Date
CN1729428A true CN1729428A (zh) 2006-02-01

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ID=32710708

Family Applications (1)

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CN02810019.0A Pending CN1729428A (zh) 2001-05-16 2002-05-16 通过施加电场在光固化组合物中加工纳米级图形的方法和系统

Country Status (7)

Country Link
EP (1) EP1512048B1 (enExample)
JP (1) JP2005520220A (enExample)
CN (1) CN1729428A (enExample)
AT (1) ATE356374T1 (enExample)
AU (1) AU2002368430A1 (enExample)
DE (1) DE60218755T2 (enExample)
WO (1) WO2004063815A2 (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101446762B (zh) * 2008-12-31 2011-07-27 西安交通大学 非接触式模板约束下的电场诱导微复型方法
CN102253435A (zh) * 2011-07-11 2011-11-23 西安交通大学 一种利用电场诱导制造聚合物柱面微透镜的微加工方法
WO2020073632A1 (en) * 2018-10-11 2020-04-16 Boe Technology Group Co., Ltd. Imprint template, method of fabricating imprint template, apparatus for performing method of fabricating imprint template, imprint mold for fabricating an imprint template

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7077992B2 (en) 2002-07-11 2006-07-18 Molecular Imprints, Inc. Step and repeat imprint lithography processes
MY144124A (en) * 2002-07-11 2011-08-15 Molecular Imprints Inc Step and repeat imprint lithography systems
US6871558B2 (en) 2002-12-12 2005-03-29 Molecular Imprints, Inc. Method for determining characteristics of substrate employing fluid geometries
US7122079B2 (en) 2004-02-27 2006-10-17 Molecular Imprints, Inc. Composition for an etching mask comprising a silicon-containing material
US7654816B2 (en) * 2004-10-07 2010-02-02 Hewlett-Packard Development Company, L.P. Lithographic mask alignment
CN100395121C (zh) * 2004-11-19 2008-06-18 鸿富锦精密工业（深圳）有限公司 热压印方法
JP4742665B2 (ja) * 2005-04-28 2011-08-10 旭硝子株式会社 エッチング処理された処理基板の製造方法
JP4736522B2 (ja) * 2005-04-28 2011-07-27 旭硝子株式会社 エッチング処理された処理基板の製造方法
JP5002211B2 (ja) * 2005-08-12 2012-08-15 キヤノン株式会社 インプリント装置およびインプリント方法
JP5268239B2 (ja) * 2005-10-18 2013-08-21 キヤノン株式会社 パターン形成装置、パターン形成方法
DE102006007800B3 (de) 2006-02-20 2007-10-04 MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. Strukturierungsverfahren und Bauteil mit einer strukturierten Oberfläche
CN101496106A (zh) * 2006-07-28 2009-07-29 国际商业机器公司 用于使聚合物层的表面图案化的器件和方法
KR101322133B1 (ko) * 2006-11-24 2013-10-25 엘지디스플레이 주식회사 임프린트 리소그래피용 스탬프 및 이를 이용한 임프린트리소그래피 방법
JP5328869B2 (ja) * 2011-10-21 2013-10-30 東芝機械株式会社 転写用の型の製造方法
JP6273860B2 (ja) * 2014-01-27 2018-02-07 大日本印刷株式会社 インプリントモールド及び半導体デバイスの製造方法
JP6980478B2 (ja) * 2017-09-29 2021-12-15 キヤノン株式会社 インプリント装置、インプリント方法および物品の製造方法
NL2021092B1 (en) * 2018-06-08 2019-12-13 Qlayers Holding B V Application of a coating on a base structure

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IT1068535B (it) * 1975-11-03 1985-03-21 Ibm Apparecchio e processo elettrolito grafico
WO2000021689A1 (en) * 1998-10-09 2000-04-20 The Trustees Of Princeton University Microscale patterning and articles formed thereby
DE60019974T2 (de) * 1999-12-23 2005-11-10 The University Of Massachusetts, Boston Verfahren zur herstellung von submikron mustern auf filmen

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101446762B (zh) * 2008-12-31 2011-07-27 西安交通大学 非接触式模板约束下的电场诱导微复型方法
CN102253435A (zh) * 2011-07-11 2011-11-23 西安交通大学 一种利用电场诱导制造聚合物柱面微透镜的微加工方法
WO2020073632A1 (en) * 2018-10-11 2020-04-16 Boe Technology Group Co., Ltd. Imprint template, method of fabricating imprint template, apparatus for performing method of fabricating imprint template, imprint mold for fabricating an imprint template
US11420361B2 (en) 2018-10-11 2022-08-23 Boe Technology Group Co., Ltd. Imprint template, method of fabricating imprint template, apparatus for performing method of fabricating imprint template, imprint mold for fabricating an imprint template

Also Published As

Publication number Publication date
WO2004063815A2 (en) 2004-07-29
AU2002368430A1 (en) 2004-08-10
JP2005520220A (ja) 2005-07-07
DE60218755T2 (de) 2007-11-15
ATE356374T1 (de) 2007-03-15
EP1512048A2 (en) 2005-03-09
WO2004063815A3 (en) 2004-12-29
EP1512048B1 (en) 2007-03-07
DE60218755D1 (de) 2007-04-19

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