CN1699964A - 用于测量镀覆的衬底的光学性质的测量装置 - Google Patents

用于测量镀覆的衬底的光学性质的测量装置 Download PDF

Info

Publication number
CN1699964A
CN1699964A CNA2004100751952A CN200410075195A CN1699964A CN 1699964 A CN1699964 A CN 1699964A CN A2004100751952 A CNA2004100751952 A CN A2004100751952A CN 200410075195 A CN200410075195 A CN 200410075195A CN 1699964 A CN1699964 A CN 1699964A
Authority
CN
China
Prior art keywords
measurement mechanism
substrate
dividing wall
measurement
plating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CNA2004100751952A
Other languages
English (en)
Inventor
汉斯-格奥尔格·洛茨
彼得·索尔
斯特凡·海因
彼得·斯库克
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Materials GmbH and Co KG
Original Assignee
Applied Films GmbH and Co KG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Films GmbH and Co KG filed Critical Applied Films GmbH and Co KG
Publication of CN1699964A publication Critical patent/CN1699964A/zh
Pending legal-status Critical Current

Links

Images

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/8806Specially adapted optical and illumination features
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54Controlling or regulating the coating process
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/55Specular reflectivity

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Investigating Or Analysing Materials By The Use Of Chemical Reactions (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Physical Vapour Deposition (AREA)
  • Surface Treatment Of Glass Fibres Or Filaments (AREA)

Abstract

本发明涉及一种测量装置,其包括几个依次设置的镀覆腔,用于测量镀覆的衬底的光学性质。这些镀覆腔相互之间被隔离壁隔开,隔离壁的自由端安装在靠近衬底的上方。衬底最好是连续的薄膜。通过在各个镀覆腔之间测量衬底的反射、透射等,使得在仅仅部分完成的层系统中实现测量成为可能。这就实现了对镀覆过程的技术操作进行控制的优点。

Description

用于测量镀覆的衬底的光学性质的测量装置
镀覆的衬底,例如镀覆的建筑玻璃或镀覆的合成薄膜,在其镀覆以后具有改变了的光学性质。这些光学性质是否符合人们所期望的性质,可以通过相应的测量来确定。在衬底上已经沉积一层或几层以后,即对其光学性质的后续确定此时只能起到将优质镀层与劣质镀层分开的作用。因此,本发明的目的是如果可能的话,在镀覆过程中就已经获得其光学性质,以便在必要时干预镀覆过程本身。
人们已经知道的是,当采用单一的测量和评估系统来保持测量精度时,相对较多数量的测量对象可以在封闭腔(DE 34 06 645 C2)内通过分光光度计装置加以探测。其中,设置在封闭腔中的几个测量点,通过几根纤维光缆连接到光分辨系统中。事实上,通过相关的可动光阑,任何所期望数量的测量点或测量对象都可以通过此单一的光分辨系统得以探测,而且这里所得到的测量结果能够被评估。
然而,对于即将镀覆的、途经几个腔的衬底的在线测量,上述光度计并不适用。
因此,本发明着手解决这样一个问题,即,在包括几个腔的镀覆装置中,即使在镀覆过程本身中也可对镀覆的衬底的光学性质进行测量的问题。
该问题可按照本发明权利要求1所述的特征来解决。
因此,本发明涉及一种测量装置,其包括几个依次布置的镀覆腔,用于测量镀覆的衬底的光学性质。这些镀覆腔相互之间被隔离壁隔开,该隔离壁的自由端都设置在靠近衬底的上方。衬底最好是连续的薄膜。通过在各个镀覆腔之间测量衬底的反射、透射等,就可能在仅仅部分完成的层系统内实现测量。这就实现了对镀覆过程的技术操作进行控制的优点。
通过本发明可获得的优点包括特别地改善了过程控制。在复杂的光学层系统中,对第一层、第二层、第三层等以后的部分层系统的反射进行测量是可能的。这就使得能对于直至测量时的所完成层的层厚质量给出直接的结论。
附图显示了本发明的实施例,下面进一步对实施例进行具体的描述。附图中:
图1是用于薄片或薄膜的镀覆装置的侧视截面图;
图2是经过内设有测量头的隔离壁的截面图;
图3是设置在隔离壁内的光学波导管。
图1所示的是薄片或薄膜的镀覆装置1,该镀覆装置1包括几个镀覆腔2、3、4、5和6,每个腔内设置有溅射装置7、8、9、10、11。除了镀覆腔2-6以外,镀覆装置1还包括送料和卷绕腔12。每个镀覆腔2-6分别设有用于使镀覆腔2-6内成为真空的泵13-17。在各个镀覆腔2-6之间,朝着送料和卷绕腔12的方向设有隔离壁18-23,这些隔离壁在靠近镀覆鼓24的前面终止。镀覆鼓24的旋转轴线垂直于图纸平面,即,送料和卷绕腔设置在上面,而镀覆腔2-6设置在下面。
送料和卷绕腔12里面设有辊25,将要镀覆的薄膜26从该辊传送出来。该薄膜由几个小的张力和引导滚筒27-35引导至镀覆鼓24的表面。当薄膜26环绕镀覆鼓24之后,它经由几个滚筒36-44被卷绕到卷绕辊45上。在接近滚筒40处设有反射测量仪器46,其包括光源47和传感器48。
隔离壁18-23设在镀覆鼓24的附近,分别有加宽出去的支脚49-54,支脚的外轮廓形状与镀覆鼓24的圆形轮廓相一致。每个支脚49-54上都装有反射测量头(图1中未示)。
当薄膜26绕镀覆鼓24移动时,它可以在每个镀覆腔2-6中提供不同的层,最好是通过溅射提供。因此,未镀覆的或镀覆的薄膜26的光学性质就可以在其从一个腔到下一个腔的每一次传送时进行测量。
图2具体地显示了隔离壁22的支脚53。显而易见,支脚53上有几个孔60-63,冷却介质可以从这些孔中流过。此外,在支脚53的中心有一个孔64,该孔内设有反射测量头65。该反射测量头65包括反射测量仪器,该测量仪器在本质上相当于图1的反射测量仪器46,然而,该测量仪器上连接有线缆束66,接近该线缆束的下部绕有螺旋状的弹簧67。隔离壁22内设有侧部凹陷68,线缆束66从该凹陷中穿过。所述线缆束66包括两个光纤束,其中一个光纤束用于将光照到镀覆的衬底上,而另一个则收集反射光。收集到的反射光被投射到设在镀覆装置外面的接收器上,该接收器产生电信号且该信号被传导至中央评估点。
与倾斜面71相邻接的是垂直面72。密封件70将隔离壁22的下部封闭。
图3描述的是沿着垂直于图1和2绘图方向上的视图。
镀覆鼓24或其旋转轴线沿着水平方向延伸。在镀覆鼓24的上方安装着支脚53,其具有沿垂直方向延伸的侧部73及其倾斜延伸的邻接部74。支脚53上支撑着反射测量头65的外壳69。线缆束66从凹陷68内开始,然后被平行地引导向密封件70,随后穿透外腔壁80伸到外面。在外腔壁内有冷却水的进口和出口。线缆束66靠隔离壁22上部的固定器83、84和85来固定。

Claims (12)

1.一种用于测量在镀覆装置内的镀覆的衬底的光学性质的测量装置,所述镀覆装置包括几个依次设置的镀覆腔,这些镀覆腔之间设有隔离壁,隔离壁的自由端安装在靠近衬底的上方,衬底从一个腔传送到另一个腔,其特征在于,测量装置(65,66,67)安装在隔离壁(18-23)的自由端(49-54)上。
2.如权利要求1所述的测量装置,其特征在于,它与隔离壁(18-23)的自由端(49-54)结合为一体。
3.如权利要求1所述的测量装置,其特征在于,所述光学性质为反射特性。
4.如权利要求1所述的测量装置,其特征在于,其包括反射测量头(65)。
5.如权利要求4所述的测量装置,其特征在于,所述反射测量头与线缆束(66)相连接,所述线缆束包括两个光纤束。
6.如权利要求5所述的测量装置,其特征在于,所述线缆束(66)被沿着隔离壁(80)引导。
7.如权利要求6所述的测量装置,其特征在于,所述线缆束(66)从镀覆腔(2-6)引出,经由光电转换器供给到评估单元。
8.如权利要求1所述的测量装置,其特征在于,所述镀覆装置包括卷绕和送料腔(12)和几个镀覆腔(2-6)。
9.如权利要求1所述的测量装置,其特征在于,所述镀覆装置包括镀覆鼓(24),其设在卷绕和送料腔(12)和镀覆腔(2-6)之间。
10.如权利要求9所述的测量装置,其特征在于,所述镀覆腔(2-6)环绕设置在镀覆鼓(24)周围。
11.如权利要求1所述的测量装置,其特征在于,所述衬底为柔性薄膜。
12.如权利要求1所述的测量装置,其特征在于,所述卷绕和送料腔(12)中进一步设有光学测量单元(47,48)。
CNA2004100751952A 2004-05-22 2004-09-02 用于测量镀覆的衬底的光学性质的测量装置 Pending CN1699964A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP04012165.9 2004-05-22
EP04012165A EP1598660B1 (de) 2004-05-22 2004-05-22 Beschichtungsanlage mit einer Messvorrichtung für die Messung von optischen Eigenschaften von beschichteten Substraten

Publications (1)

Publication Number Publication Date
CN1699964A true CN1699964A (zh) 2005-11-23

Family

ID=34925089

Family Applications (1)

Application Number Title Priority Date Filing Date
CNA2004100751952A Pending CN1699964A (zh) 2004-05-22 2004-09-02 用于测量镀覆的衬底的光学性质的测量装置

Country Status (10)

Country Link
US (1) US7450233B2 (zh)
EP (1) EP1598660B1 (zh)
JP (1) JP3905102B2 (zh)
KR (1) KR100813572B1 (zh)
CN (1) CN1699964A (zh)
AT (1) ATE348331T1 (zh)
DE (1) DE502004002296D1 (zh)
PL (1) PL1598660T3 (zh)
RU (1) RU2285912C2 (zh)
TW (1) TWI257477B (zh)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105239052A (zh) * 2015-11-17 2016-01-13 广东腾胜真空技术工程有限公司 双放双收卷绕镀膜装置及方法
CN108351306A (zh) * 2015-10-28 2018-07-31 应用材料公司 用以处理基板上的材料的设备、用于处理设备的冷却配置、和用以测量于基板上处理的材料的性质的方法

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ES2336870B1 (es) * 2007-08-20 2011-02-18 Novogenio, S.L. Sistema y procedimiento para el recubrimiento en vacio y en continuo de un material en forma de banda.
CN102197159B (zh) * 2008-11-05 2013-07-10 株式会社爱发科 卷绕式真空处理装置
EP2402481A1 (en) * 2010-06-29 2012-01-04 Applied Materials, Inc. Method and system for manufacturing a transparent body for use in a touch panel
JP5604525B2 (ja) * 2010-10-06 2014-10-08 株式会社アルバック 真空処理装置
JP5694023B2 (ja) * 2011-03-23 2015-04-01 小島プレス工業株式会社 積層構造体の製造装置
JP5868309B2 (ja) 2012-12-21 2016-02-24 株式会社神戸製鋼所 基材搬送ロール
DE102013100809A1 (de) 2013-01-28 2014-07-31 Von Ardenne Anlagentechnik Gmbh Verfahren zur Messung von optischen Eigenschaften an transparenten flexiblen Substraten
EP2784176B1 (en) 2013-03-28 2018-10-03 Applied Materials, Inc. Deposition platform for flexible substrates
DE102013106225A1 (de) 2013-06-14 2014-12-18 Von Ardenne Gmbh Verfahren und Vorrichtung zur Messung optischer Schichteigenschaften an flexiblen Substraten
EP2883980B1 (en) * 2013-12-10 2017-02-08 Applied Materials, Inc. Vacuum processing apparatus with substrate spreading device and method for operating same
US20230137506A1 (en) * 2020-08-21 2023-05-04 Applied Materials, Inc. Processing system for processing a flexible substrate and method of measuring at least one of a property of a flexible substrate and a property of one or more coatings on the flexible substrate
US11677511B2 (en) 2021-11-10 2023-06-13 Qualcomm Incorporated Mechanism to recover receiver radio link control after multiple unsuccessful automatic repeat query attempts

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1074710A (fr) * 1951-12-29 1954-10-07 Western Electric Co Procédé et appareil pour la fabrication de conducteurs multiples
US2810663A (en) 1951-12-29 1957-10-22 Bell Telephone Labor Inc Fabrication of laminated transmission lines
US2773412A (en) * 1953-04-16 1956-12-11 Huck Company Electro-optical device for measuring thicknesses of coatings on materials
US3496359A (en) * 1966-02-09 1970-02-17 Unit Process Assemblies Portable beta backscatter type measuring instrument
DE2225946C3 (de) * 1972-05-27 1980-12-04 Klaus 4803 Steinhagen Kalwar Vorrichtung zur Oberflächenbehandlung von folienartigen Werkstoffen mit Koronaentladungen
SU952373A2 (ru) * 1981-03-31 1982-08-23 Специальное Конструкторско-Технологическое Бюро Химико-Фотографической Промышленности Многощелева головка дл нанесени фотоэмульсии на подложку
DE3406645A1 (de) 1984-02-24 1985-08-29 Leybold-Heraeus GmbH, 5000 Köln Spektralfotometeranordnung
GB8408023D0 (en) * 1984-03-28 1984-05-10 Gen Eng Radcliffe Ltd Vacuum coating apparatus
US5154810A (en) * 1991-01-29 1992-10-13 Optical Coating Laboratory, Inc. Thin film coating and method
US5277928A (en) * 1991-07-05 1994-01-11 Strandberg John A Method and apparatus for controlling yarn coatings
JP3073327B2 (ja) * 1992-06-30 2000-08-07 キヤノン株式会社 堆積膜形成方法
RU2087861C1 (ru) * 1995-07-13 1997-08-20 Товарищество с ограниченной ответственностью "Фрактал" Способ контроля параметров пленочного покрытия в процессе изменения толщины пленки на подложке и устройство для его осуществления
US5772861A (en) * 1995-10-16 1998-06-30 Viratec Thin Films, Inc. System for evaluating thin film coatings
JPH09136323A (ja) * 1995-11-15 1997-05-27 Toray Ind Inc 樹脂塗布シートの製造装置及び製造方法
US6231732B1 (en) * 1997-08-26 2001-05-15 Scivac Cylindrical carriage sputtering system
DE19928171B4 (de) * 1999-06-19 2011-01-05 Leybold Optics Gmbh Verfahren zur kontinuierlichen Bestimmung der optischen Schichtdicke von Beschichtungen
DE10019258C1 (de) * 2000-04-13 2001-11-22 Fraunhofer Ges Forschung Verfahren zur Vakuumbeschichtung bandförmiger transparenter Substrate
WO2002063064A1 (fr) * 2001-02-07 2002-08-15 Asahi Glass Company, Limited Dispositif de projection et procede pour realiser un film de projection

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108351306A (zh) * 2015-10-28 2018-07-31 应用材料公司 用以处理基板上的材料的设备、用于处理设备的冷却配置、和用以测量于基板上处理的材料的性质的方法
CN105239052A (zh) * 2015-11-17 2016-01-13 广东腾胜真空技术工程有限公司 双放双收卷绕镀膜装置及方法

Also Published As

Publication number Publication date
EP1598660B1 (de) 2006-12-13
EP1598660A1 (de) 2005-11-23
TW200538714A (en) 2005-12-01
JP3905102B2 (ja) 2007-04-18
JP2005338047A (ja) 2005-12-08
KR100813572B1 (ko) 2008-03-17
TWI257477B (en) 2006-07-01
US7450233B2 (en) 2008-11-11
US20060192964A1 (en) 2006-08-31
DE502004002296D1 (de) 2007-01-25
ATE348331T1 (de) 2007-01-15
PL1598660T3 (pl) 2007-04-30
RU2004137999A (ru) 2006-06-10
KR20050111513A (ko) 2005-11-25
RU2285912C2 (ru) 2006-10-20

Similar Documents

Publication Publication Date Title
CN1699964A (zh) 用于测量镀覆的衬底的光学性质的测量装置
KR100972769B1 (ko) 광학 막 두께 제어 방법, 광학 막 두께 제어 장치, 유전체 다층막 제조 장치, 및 이러한 제어 장치 또는 제조 장치로 제조된 유전체 다층막
US5396080A (en) Thin film thickness monitoring with the intensity of reflected light measured at at least two discrete monitoring wavelengths
US20060126991A1 (en) In-fiber whitelight interferometry using long-period fiber grating
DE4112404A1 (de) On-line-system zur optischen messung von eigenschaften eines bandes
CA2697543A1 (en) Web thickness measurement device
CN108180840A (zh) 一种光纤微位移传感及校正装置与方法
RU2016122191A (ru) Использование полноформатного матричного датчика изображения для измерения толщины пленки в реальном времени на оборудовании для изготовления пленки
CN104655278B (zh) 一种波长定标仪
US7316482B2 (en) Reflecting mirror and projection image display apparatus using the same
CN102221328B (zh) 一种基于导模共振结构设计的高分辨率角度测量方法
GB2313909A (en) Colour measuring device
KR101252396B1 (ko) 비접촉 광학 간섭계식 증발량 측정 장치
CN104792733B (zh) 一种快速定标模块及应用
US7414738B2 (en) Measuring device for measuring the degree of transmission of a coating
CN108917857A (zh) 一种基于无芯光纤的长程表面等离激元共振传感器
WO2009028896A1 (en) Apparatus measuring stress of coating
JP4196136B2 (ja) 成膜装置
JP2000241127A (ja) 膜厚測定方法及び巻取式真空成膜装置
CN105403482B (zh) 一种相对面密度的光学算法
Paladino et al. Effects of thickness and external refractive index in coated tilted fiber Bragg gratings
FI66494C (fi) Anordning foer maetning av opaciteten eller vitheten hos pappersbana
SU1439394A1 (ru) Пневматическое устройство дл измерени толщины покрыти
CN202101661U (zh) 一种高分辨率导模共振角度测微仪
RU2142124C1 (ru) Способ определения показателя преломления оптического материала

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C02 Deemed withdrawal of patent application after publication (patent law 2001)
WD01 Invention patent application deemed withdrawn after publication