CN1647214A - 用于动态页编程的更新设计 - Google Patents
用于动态页编程的更新设计 Download PDFInfo
- Publication number
- CN1647214A CN1647214A CNA038077442A CN03807744A CN1647214A CN 1647214 A CN1647214 A CN 1647214A CN A038077442 A CNA038077442 A CN A038077442A CN 03807744 A CN03807744 A CN 03807744A CN 1647214 A CN1647214 A CN 1647214A
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- China
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- 230000015654 memory Effects 0.000 claims abstract description 35
- 238000000034 method Methods 0.000 claims abstract description 31
- 230000008859 change Effects 0.000 claims description 21
- 230000009977 dual effect Effects 0.000 abstract description 6
- 230000008672 reprogramming Effects 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 22
- 238000007667 floating Methods 0.000 description 11
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- 238000010586 diagram Methods 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- 229910052581 Si3N4 Inorganic materials 0.000 description 5
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 5
- 230000005684 electric field Effects 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 4
- 230000006870 function Effects 0.000 description 4
- 238000001802 infusion Methods 0.000 description 4
- 239000011229 interlayer Substances 0.000 description 4
- 150000004767 nitrides Chemical class 0.000 description 4
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 4
- 229920005591 polysilicon Polymers 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 230000008901 benefit Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 230000014509 gene expression Effects 0.000 description 3
- 238000007430 reference method Methods 0.000 description 3
- 235000012239 silicon dioxide Nutrition 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 2
- 229910052785 arsenic Inorganic materials 0.000 description 2
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 2
- 230000002146 bilateral effect Effects 0.000 description 2
- 229910052796 boron Inorganic materials 0.000 description 2
- 230000001427 coherent effect Effects 0.000 description 2
- 238000010276 construction Methods 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 230000008676 import Effects 0.000 description 2
- 238000012163 sequencing technique Methods 0.000 description 2
- 230000003068 static effect Effects 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000000712 assembly Effects 0.000 description 1
- 238000000429 assembly Methods 0.000 description 1
- 230000001413 cellular effect Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 239000000523 sample Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C16/00—Erasable programmable read-only memories
- G11C16/02—Erasable programmable read-only memories electrically programmable
- G11C16/04—Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C16/00—Erasable programmable read-only memories
- G11C16/02—Erasable programmable read-only memories electrically programmable
- G11C16/06—Auxiliary circuits, e.g. for writing into memory
- G11C16/34—Determination of programming status, e.g. threshold voltage, overprogramming or underprogramming, retention
- G11C16/3418—Disturbance prevention or evaluation; Refreshing of disturbed memory data
- G11C16/3431—Circuits or methods to detect disturbed nonvolatile memory cells, e.g. which still read as programmed but with threshold less than the program verify threshold or read as erased but with threshold greater than the erase verify threshold, and to reverse the disturbance via a refreshing programming or erasing step
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C16/00—Erasable programmable read-only memories
- G11C16/02—Erasable programmable read-only memories electrically programmable
- G11C16/06—Auxiliary circuits, e.g. for writing into memory
- G11C16/10—Programming or data input circuits
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C16/00—Erasable programmable read-only memories
- G11C16/02—Erasable programmable read-only memories electrically programmable
- G11C16/06—Auxiliary circuits, e.g. for writing into memory
- G11C16/26—Sensing or reading circuits; Data output circuits
- G11C16/28—Sensing or reading circuits; Data output circuits using differential sensing or reference cells, e.g. dummy cells
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C16/00—Erasable programmable read-only memories
- G11C16/02—Erasable programmable read-only memories electrically programmable
- G11C16/06—Auxiliary circuits, e.g. for writing into memory
- G11C16/34—Determination of programming status, e.g. threshold voltage, overprogramming or underprogramming, retention
- G11C16/3418—Disturbance prevention or evaluation; Refreshing of disturbed memory data
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C16/00—Erasable programmable read-only memories
- G11C16/02—Erasable programmable read-only memories electrically programmable
- G11C16/04—Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS
- G11C16/0466—Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells with charge storage in an insulating layer, e.g. metal-nitride-oxide-silicon [MNOS], silicon-oxide-nitride-oxide-silicon [SONOS]
- G11C16/0475—Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells with charge storage in an insulating layer, e.g. metal-nitride-oxide-silicon [MNOS], silicon-oxide-nitride-oxide-silicon [SONOS] comprising two or more independent storage sites which store independent data
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Read Only Memory (AREA)
- Non-Volatile Memory (AREA)
- Semiconductor Memories (AREA)
Abstract
Description
操作 | 单元 | 栅极 | 位线0 | 位线1 | 批注 |
读取 | C0 | 4.7v | 0v | 1.2v至2v | 新增位 |
读取 | C1 | 4.7v | 1.2v至2v | 0v | 正常位 |
编程 | C0 | Vpp | 0v | 5.6v | 热电子 |
双边擦除 | 所有单元 | -6v | 6v | 6v | 热空穴注入 |
单边擦除 | C0,读取列 | -6v | 6v | 0v | 热空穴注入 |
Claims (7)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/119,273 US6700815B2 (en) | 2002-04-08 | 2002-04-08 | Refresh scheme for dynamic page programming |
US10/119,273 | 2002-04-08 | ||
PCT/US2003/004610 WO2003088259A1 (en) | 2002-04-08 | 2003-02-14 | Refresh scheme for dynamic page programming |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1647214A true CN1647214A (zh) | 2005-07-27 |
CN1647214B CN1647214B (zh) | 2010-04-28 |
Family
ID=28674559
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN038077442A Expired - Lifetime CN1647214B (zh) | 2002-04-08 | 2003-02-14 | 用于动态页编程的更新设计 |
Country Status (9)
Country | Link |
---|---|
US (1) | US6700815B2 (zh) |
EP (1) | EP1493159B1 (zh) |
JP (1) | JP4252464B2 (zh) |
KR (1) | KR100953993B1 (zh) |
CN (1) | CN1647214B (zh) |
AU (1) | AU2003219771A1 (zh) |
DE (1) | DE60329834D1 (zh) |
TW (1) | TWI321324B (zh) |
WO (1) | WO2003088259A1 (zh) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7466590B2 (en) * | 2004-02-06 | 2008-12-16 | Sandisk Corporation | Self-boosting method for flash memory cells |
US7161833B2 (en) * | 2004-02-06 | 2007-01-09 | Sandisk Corporation | Self-boosting system for flash memory cells |
US7038948B2 (en) * | 2004-09-22 | 2006-05-02 | Spansion Llc | Read approach for multi-level virtual ground memory |
US7068204B1 (en) | 2004-09-28 | 2006-06-27 | Spansion Llc | System that facilitates reading multi-level data in non-volatile memory |
WO2006103734A1 (ja) * | 2005-03-28 | 2006-10-05 | Fujitsu Limited | 不揮発性半導体メモリおよびその読み出し方法並びにマイクロプロセッサ |
US7289359B2 (en) * | 2005-09-09 | 2007-10-30 | Macronix International Co., Ltd. | Systems and methods for using a single reference cell in a dual bit flash memory |
US7428165B2 (en) | 2006-03-30 | 2008-09-23 | Sandisk Corporation | Self-boosting method with suppression of high lateral electric fields |
US7511995B2 (en) * | 2006-03-30 | 2009-03-31 | Sandisk Corporation | Self-boosting system with suppression of high lateral electric fields |
US7836364B1 (en) | 2006-05-30 | 2010-11-16 | Marvell International Ltd. | Circuits, architectures, apparatuses, systems, methods, algorithms, software and firmware for using reserved cells to indicate defect positions |
US8767450B2 (en) * | 2007-08-21 | 2014-07-01 | Samsung Electronics Co., Ltd. | Memory controllers to refresh memory sectors in response to writing signals and memory systems including the same |
KR20100123136A (ko) * | 2009-05-14 | 2010-11-24 | 삼성전자주식회사 | 비휘발성 메모리 장치 |
KR20100134375A (ko) * | 2009-06-15 | 2010-12-23 | 삼성전자주식회사 | 리프레쉬 동작을 수행하는 메모리 시스템 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5163021A (en) | 1989-04-13 | 1992-11-10 | Sundisk Corporation | Multi-state EEprom read and write circuits and techniques |
US5497354A (en) * | 1994-06-02 | 1996-03-05 | Intel Corporation | Bit map addressing schemes for flash memory |
AU2593595A (en) * | 1994-06-02 | 1996-01-04 | Intel Corporation | Sensing schemes for flash memory with multilevel cells |
US5528543A (en) * | 1994-09-16 | 1996-06-18 | Texas Instruments Incorporated | Sense amplifier circuitry |
US5537358A (en) * | 1994-12-06 | 1996-07-16 | National Semiconductor Corporation | Flash memory having adaptive sensing and method |
DE69702256T2 (de) | 1996-06-24 | 2001-01-18 | Advanced Micro Devices Inc | Verfahren für einen merhfachen, bits pro zelle flash eeprom, speicher mit seitenprogrammierungsmodus und leseverfahren |
US5675537A (en) * | 1996-08-22 | 1997-10-07 | Advanced Micro Devices, Inc. | Erase method for page mode multiple bits-per-cell flash EEPROM |
US5848026A (en) * | 1997-12-08 | 1998-12-08 | Atmel Corporation | Integrated circuit with flag register for block selection of nonvolatile cells for bulk operations |
US5963477A (en) * | 1997-12-09 | 1999-10-05 | Macronix International Co., Ltd. | Flash EPROM erase algorithm with wordline level retry |
JP3336985B2 (ja) | 1999-01-29 | 2002-10-21 | 日本電気株式会社 | 半導体記憶装置 |
KR100346991B1 (ko) * | 1999-07-13 | 2002-07-31 | 산요 덴키 가부시키가이샤 | 반도체 기억 장치 |
KR100577380B1 (ko) * | 1999-09-29 | 2006-05-09 | 삼성전자주식회사 | 플래시 메모리와 그 제어 방법 |
US6525969B1 (en) * | 2001-08-10 | 2003-02-25 | Advanced Micro Devices, Inc. | Decoder apparatus and methods for pre-charging bit lines |
JP4017118B2 (ja) * | 2004-01-23 | 2007-12-05 | パイオニア株式会社 | 強誘電体を用いた記録媒体、記録装置および再生装置 |
-
2002
- 2002-04-08 US US10/119,273 patent/US6700815B2/en not_active Expired - Lifetime
-
2003
- 2003-02-14 AU AU2003219771A patent/AU2003219771A1/en not_active Abandoned
- 2003-02-14 JP JP2003585102A patent/JP4252464B2/ja not_active Expired - Lifetime
- 2003-02-14 DE DE60329834T patent/DE60329834D1/de not_active Expired - Lifetime
- 2003-02-14 KR KR1020047015997A patent/KR100953993B1/ko active IP Right Grant
- 2003-02-14 EP EP03716045A patent/EP1493159B1/en not_active Expired - Fee Related
- 2003-02-14 CN CN038077442A patent/CN1647214B/zh not_active Expired - Lifetime
- 2003-02-14 WO PCT/US2003/004610 patent/WO2003088259A1/en active Application Filing
- 2003-03-28 TW TW092107074A patent/TWI321324B/zh not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
AU2003219771A1 (en) | 2003-10-27 |
KR100953993B1 (ko) | 2010-04-21 |
CN1647214B (zh) | 2010-04-28 |
WO2003088259A1 (en) | 2003-10-23 |
US6700815B2 (en) | 2004-03-02 |
EP1493159A1 (en) | 2005-01-05 |
TW200306585A (en) | 2003-11-16 |
JP4252464B2 (ja) | 2009-04-08 |
EP1493159B1 (en) | 2009-10-28 |
JP2005522816A (ja) | 2005-07-28 |
KR20040106332A (ko) | 2004-12-17 |
US20030189843A1 (en) | 2003-10-09 |
TWI321324B (en) | 2010-03-01 |
DE60329834D1 (de) | 2009-12-10 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
ASS | Succession or assignment of patent right |
Owner name: SPANSION CO., LTD. Free format text: FORMER OWNER: SPANSION CO.,LTD. Effective date: 20070413 Owner name: SPANSION CO.,LTD. Free format text: FORMER OWNER: ADVANCED MICRO DEVICES INC. Effective date: 20070413 |
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C41 | Transfer of patent application or patent right or utility model | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20070413 Address after: California, USA Applicant after: Spanson Co. Address before: California, USA Applicant before: ADVANCED MICRO DEVICES, Inc. Effective date of registration: 20070413 Address after: California, USA Applicant after: SPANSION LLC Address before: California, USA Applicant before: Spanson Co. |
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C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
C41 | Transfer of patent application or patent right or utility model | ||
TR01 | Transfer of patent right |
Effective date of registration: 20160411 Address after: California, USA Patentee after: CYPRESS SEMICONDUCTOR Corp. Address before: California, USA Patentee before: SPANSION LLC |
|
CX01 | Expiry of patent term | ||
CX01 | Expiry of patent term |
Granted publication date: 20100428 |