CN1590583B - 三甲基铟的填充方法及填充容器 - Google Patents
三甲基铟的填充方法及填充容器 Download PDFInfo
- Publication number
- CN1590583B CN1590583B CN2004100638127A CN200410063812A CN1590583B CN 1590583 B CN1590583 B CN 1590583B CN 2004100638127 A CN2004100638127 A CN 2004100638127A CN 200410063812 A CN200410063812 A CN 200410063812A CN 1590583 B CN1590583 B CN 1590583B
- Authority
- CN
- China
- Prior art keywords
- vector gas
- filling container
- organometallic compound
- trimethyl indium
- solid organometallic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000000034 method Methods 0.000 title claims abstract description 106
- IBEFSUTVZWZJEL-UHFFFAOYSA-N trimethylindium Chemical compound C[In](C)C IBEFSUTVZWZJEL-UHFFFAOYSA-N 0.000 title claims description 81
- 238000012856 packing Methods 0.000 claims abstract description 20
- 239000002245 particle Substances 0.000 claims description 99
- 239000000463 material Substances 0.000 claims description 24
- 238000007599 discharging Methods 0.000 claims description 2
- 150000002902 organometallic compounds Chemical class 0.000 abstract description 247
- 239000007787 solid Substances 0.000 abstract description 241
- 238000002488 metal-organic chemical vapour deposition Methods 0.000 abstract description 18
- 150000001875 compounds Chemical class 0.000 abstract description 13
- 230000012010 growth Effects 0.000 abstract description 4
- 239000012808 vapor phase Substances 0.000 abstract description 4
- 239000004615 ingredient Substances 0.000 abstract 1
- 239000007789 gas Substances 0.000 description 215
- 238000004033 diameter control Methods 0.000 description 8
- 229920006395 saturated elastomer Polymers 0.000 description 7
- -1 trimethyl indium Chemical class 0.000 description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 230000007774 longterm Effects 0.000 description 6
- 229910001220 stainless steel Inorganic materials 0.000 description 6
- 239000010935 stainless steel Substances 0.000 description 6
- 238000012360 testing method Methods 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 5
- 239000007788 liquid Substances 0.000 description 5
- 239000012299 nitrogen atmosphere Substances 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 230000007246 mechanism Effects 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 238000000926 separation method Methods 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000004821 distillation Methods 0.000 description 3
- 239000000945 filler Substances 0.000 description 3
- WSFSSNUMVMOOMR-UHFFFAOYSA-N formaldehyde Substances O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- 230000008676 import Effects 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 150000003304 ruthenium compounds Chemical class 0.000 description 3
- 238000000927 vapour-phase epitaxy Methods 0.000 description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- ZSWFCLXCOIISFI-UHFFFAOYSA-N cyclopentadiene Chemical compound C1C=CC=C1 ZSWFCLXCOIISFI-UHFFFAOYSA-N 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 238000000605 extraction Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000001307 helium Substances 0.000 description 2
- 229910052734 helium Inorganic materials 0.000 description 2
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000013112 stability test Methods 0.000 description 2
- 238000011144 upstream manufacturing Methods 0.000 description 2
- NBWXPIGEYOQIAA-UHFFFAOYSA-M C(=O)[O-].C(CCCC)(=O)[Sr+] Chemical compound C(=O)[O-].C(CCCC)(=O)[Sr+] NBWXPIGEYOQIAA-UHFFFAOYSA-M 0.000 description 1
- BGUWNPKEWSVBFL-UHFFFAOYSA-N C(CCCC)(=O)[Ca] Chemical compound C(CCCC)(=O)[Ca] BGUWNPKEWSVBFL-UHFFFAOYSA-N 0.000 description 1
- MHYQBXJRURFKIN-UHFFFAOYSA-N C1(C=CC=C1)[Mg] Chemical compound C1(C=CC=C1)[Mg] MHYQBXJRURFKIN-UHFFFAOYSA-N 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- BDAGIHXWWSANSR-UHFFFAOYSA-M Formate Chemical compound [O-]C=O BDAGIHXWWSANSR-UHFFFAOYSA-M 0.000 description 1
- UTCGVPHBUNUKQS-UHFFFAOYSA-N [Ba].C(C)C(=O)C(=O)C Chemical class [Ba].C(C)C(=O)C(=O)C UTCGVPHBUNUKQS-UHFFFAOYSA-N 0.000 description 1
- LYZXPESLKLEBSY-UHFFFAOYSA-N [Ca].CCC(=O)C(C)=O Chemical compound [Ca].CCC(=O)C(C)=O LYZXPESLKLEBSY-UHFFFAOYSA-N 0.000 description 1
- CDTKPYIJEPAMEH-UHFFFAOYSA-N [Cl].[In] Chemical compound [Cl].[In] CDTKPYIJEPAMEH-UHFFFAOYSA-N 0.000 description 1
- DEIHRWXJCZMTHF-UHFFFAOYSA-N [Mn].[CH]1C=CC=C1 Chemical compound [Mn].[CH]1C=CC=C1 DEIHRWXJCZMTHF-UHFFFAOYSA-N 0.000 description 1
- RUTFURLVCIRTKY-UHFFFAOYSA-N [Sr].C(C)C(=O)C(=O)C Chemical compound [Sr].C(C)C(=O)C(=O)C RUTFURLVCIRTKY-UHFFFAOYSA-N 0.000 description 1
- UPQMOVQINWIVQC-UHFFFAOYSA-N [Y].C(CCCC)(=O)C(=O)O Chemical compound [Y].C(CCCC)(=O)C(=O)O UPQMOVQINWIVQC-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 239000004411 aluminium Substances 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 1
- 239000012159 carrier gas Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- CFRRTSPMWJTHBQ-UHFFFAOYSA-N copper pentane-2,3-dione Chemical compound [Cu].CCC(=O)C(C)=O CFRRTSPMWJTHBQ-UHFFFAOYSA-N 0.000 description 1
- 230000006837 decompression Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- KTWOOEGAPBSYNW-UHFFFAOYSA-N ferrocene Chemical compound [Fe+2].C=1C=C[CH-]C=1.C=1C=C[CH-]C=1 KTWOOEGAPBSYNW-UHFFFAOYSA-N 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 238000005429 filling process Methods 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 150000002484 inorganic compounds Chemical class 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- UBJFKNSINUCEAL-UHFFFAOYSA-N lithium;2-methylpropane Chemical compound [Li+].C[C-](C)C UBJFKNSINUCEAL-UHFFFAOYSA-N 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 239000011236 particulate material Substances 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- RGCLLPNLLBQHPF-HJWRWDBZSA-N phosphamidon Chemical compound CCN(CC)C(=O)C(\Cl)=C(/C)OP(=O)(OC)OC RGCLLPNLLBQHPF-HJWRWDBZSA-N 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- JLTRXTDYQLMHGR-UHFFFAOYSA-N trimethylaluminium Chemical compound C[Al](C)C JLTRXTDYQLMHGR-UHFFFAOYSA-N 0.000 description 1
- XCZXGTMEAKBVPV-UHFFFAOYSA-N trimethylgallium Chemical compound C[Ga](C)C XCZXGTMEAKBVPV-UHFFFAOYSA-N 0.000 description 1
- BSRUTWLOBPCVAB-UHFFFAOYSA-N trimethylindigane;trimethylphosphane Chemical class CP(C)C.C[In](C)C BSRUTWLOBPCVAB-UHFFFAOYSA-N 0.000 description 1
- ZHXAZZQXWJJBHA-UHFFFAOYSA-N triphenylbismuthane Chemical group C1=CC=CC=C1[Bi](C=1C=CC=CC=1)C1=CC=CC=C1 ZHXAZZQXWJJBHA-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/048—Interaction techniques based on graphical user interfaces [GUI]
- G06F3/0487—Interaction techniques based on graphical user interfaces [GUI] using specific features provided by the input device, e.g. functions controlled by the rotation of a mouse with dual sensing arrangements, or of the nature of the input device, e.g. tap gestures based on pressure sensed by a digitiser
- G06F3/0488—Interaction techniques based on graphical user interfaces [GUI] using specific features provided by the input device, e.g. functions controlled by the rotation of a mouse with dual sensing arrangements, or of the nature of the input device, e.g. tap gestures based on pressure sensed by a digitiser using a touch-screen or digitiser, e.g. input of commands through traced gestures
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
- C04B41/46—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with organic materials
- C04B41/49—Compounds having one or more carbon-to-metal or carbon-to-silicon linkages ; Organo-clay compounds; Organo-silicates, i.e. ortho- or polysilicic acid esters ; Organo-phosphorus compounds; Organo-inorganic complexes
- C04B41/4905—Compounds having one or more carbon-to-metal or carbon-to-silicon linkages ; Organo-clay compounds; Organo-silicates, i.e. ortho- or polysilicic acid esters ; Organo-phosphorus compounds; Organo-inorganic complexes containing silicon
- C04B41/4922—Compounds having one or more carbon-to-metal or carbon-to-silicon linkages ; Organo-clay compounds; Organo-silicates, i.e. ortho- or polysilicic acid esters ; Organo-phosphorus compounds; Organo-inorganic complexes containing silicon applied to the substrate as monomers, i.e. as organosilanes RnSiX4-n, e.g. alkyltrialkoxysilane, dialkyldialkoxysilane
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/133308—Support structures for LCD panels, e.g. frames or bezels
- G02F1/133311—Environmental protection, e.g. against dust or humidity
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Theoretical Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Ceramic Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Human Computer Interaction (AREA)
- Materials Engineering (AREA)
- Structural Engineering (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
- Devices And Processes Conducted In The Presence Of Fluids And Solid Particles (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP273784/03 | 2003-07-11 | ||
JP273784/2003 | 2003-07-11 | ||
JP2003273784A JP4585182B2 (ja) | 2003-07-11 | 2003-07-11 | トリメチルインジウムの充填方法および充填容器 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1590583A CN1590583A (zh) | 2005-03-09 |
CN1590583B true CN1590583B (zh) | 2010-04-28 |
Family
ID=34210922
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2004100638127A Expired - Fee Related CN1590583B (zh) | 2003-07-11 | 2004-07-09 | 三甲基铟的填充方法及填充容器 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP4585182B2 (ja) |
KR (2) | KR101072108B1 (ja) |
CN (1) | CN1590583B (ja) |
TW (1) | TW200503080A (ja) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5655874B2 (ja) * | 2006-03-15 | 2015-01-21 | 宇部興産株式会社 | 気相成長用担体担持有機金属化合物及びその製法、並びに当該化合物を充填した気相成長用有機金属化合物充填装置 |
JP5431649B2 (ja) * | 2006-03-15 | 2014-03-05 | 宇部興産株式会社 | 気相成長用担体担持有機金属化合物充填装置、気相成長用担体担持有機金属化合物の製法および気相成長用担体担持有機金属化合物の供給方法 |
US20090159003A1 (en) * | 2006-05-30 | 2009-06-25 | Ube Industries Ltd | Device for supplying organic metal compound |
JP5045062B2 (ja) * | 2006-10-30 | 2012-10-10 | 住友化学株式会社 | 固体有機金属化合物の供給方法 |
GB2444143B (en) * | 2006-11-27 | 2009-10-28 | Sumitomo Chemical Co | Apparatus of supplying organometallic compound |
CN105063570A (zh) * | 2015-08-31 | 2015-11-18 | 清远先导材料有限公司 | 一种提高三甲基铟利用率的方法 |
TWI617764B (zh) * | 2017-06-06 | 2018-03-11 | 江蘇南大光電材料股份有限公司 | 固體金屬有機化合物的封裝容器 |
KR102027179B1 (ko) * | 2018-05-08 | 2019-10-02 | 주식회사 레이크머티리얼즈 | 유기금속 화합물 공급 장치 |
KR102208303B1 (ko) * | 2019-09-25 | 2021-01-28 | 주식회사 레이크머티리얼즈 | 유기금속 화합물 공급 장치 |
CN114059038B (zh) * | 2020-08-07 | 2024-02-09 | 吕宝源 | 固态金属有机化合物转态方法及其转态系统 |
JP6879607B1 (ja) | 2020-10-30 | 2021-06-02 | 株式会社三秀 | 転造加工装置 |
KR102407768B1 (ko) * | 2021-07-01 | 2022-06-10 | 주식회사 레이크머티리얼즈 | 유기금속 화합물 공급 장치 |
FI130131B (en) | 2021-09-07 | 2023-03-09 | Picosun Oy | Precursor container |
KR20230061592A (ko) * | 2021-10-28 | 2023-05-09 | 주식회사 레이크머티리얼즈 | 유기금속 화합물 공급 장치 |
KR20230061591A (ko) * | 2021-10-28 | 2023-05-09 | 주식회사 레이크머티리얼즈 | 유기금속 화합물 공급 장치 |
KR20230061593A (ko) * | 2021-10-28 | 2023-05-09 | 주식회사 레이크머티리얼즈 | 유기금속 화합물 공급 장치 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5989305A (en) * | 1995-03-09 | 1999-11-23 | Shin-Etsu Chemical Co., Ltd. | Feeder of a solid organometallic compound |
CN1300876A (zh) * | 1999-08-20 | 2001-06-27 | 莫顿国际公司 | 双烧结扩散器 |
JP2003160865A (ja) * | 2001-11-27 | 2003-06-06 | Mitsubishi Materials Corp | 有機金属化学蒸着法用ルテニウム化合物及び該化合物により得られたルテニウム含有薄膜 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0176537B1 (en) * | 1984-03-26 | 1989-01-25 | The Secretary of State for Defence in Her Britannic Majesty's Government of the United Kingdom of Great Britain and | The preparation of metal alkyls |
JPS6464314A (en) * | 1987-09-04 | 1989-03-10 | Mitsubishi Electric Corp | Sublimator |
JPH01168331A (ja) * | 1987-12-24 | 1989-07-03 | Mitsui Toatsu Chem Inc | 有機金属化合物の飽和方法 |
JP2651530B2 (ja) * | 1988-04-15 | 1997-09-10 | 住友化学工業株式会社 | 気相成長用有機金属化合物供給装置 |
JPH0269389A (ja) * | 1988-08-31 | 1990-03-08 | Toyo Stauffer Chem Co | 有機金属気相成長法における固体有機金属化合物の飽和蒸気生成方法 |
JP2964313B2 (ja) * | 1995-03-09 | 1999-10-18 | 信越化学工業株式会社 | 固体有機金属化合物供給装置及びその製造方法 |
JPH10223540A (ja) * | 1997-02-03 | 1998-08-21 | Sony Corp | 有機金属気相成長装置 |
-
2003
- 2003-07-11 JP JP2003273784A patent/JP4585182B2/ja not_active Expired - Fee Related
-
2004
- 2004-02-10 TW TW093103076A patent/TW200503080A/zh not_active IP Right Cessation
- 2004-02-12 KR KR1020040009277A patent/KR101072108B1/ko active IP Right Grant
- 2004-07-09 CN CN2004100638127A patent/CN1590583B/zh not_active Expired - Fee Related
-
2011
- 2011-08-12 KR KR1020110080409A patent/KR101358204B1/ko active IP Right Grant
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5989305A (en) * | 1995-03-09 | 1999-11-23 | Shin-Etsu Chemical Co., Ltd. | Feeder of a solid organometallic compound |
CN1300876A (zh) * | 1999-08-20 | 2001-06-27 | 莫顿国际公司 | 双烧结扩散器 |
JP2003160865A (ja) * | 2001-11-27 | 2003-06-06 | Mitsubishi Materials Corp | 有機金属化学蒸着法用ルテニウム化合物及び該化合物により得られたルテニウム含有薄膜 |
Also Published As
Publication number | Publication date |
---|---|
JP2005033146A (ja) | 2005-02-03 |
KR20110099079A (ko) | 2011-09-06 |
CN1590583A (zh) | 2005-03-09 |
JP4585182B2 (ja) | 2010-11-24 |
KR101072108B1 (ko) | 2011-10-10 |
KR20050008456A (ko) | 2005-01-21 |
TW200503080A (en) | 2005-01-16 |
KR101358204B1 (ko) | 2014-02-05 |
TWI345263B (ja) | 2011-07-11 |
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