CN1544713A - 一种碳化硅晶体生长装置 - Google Patents
一种碳化硅晶体生长装置 Download PDFInfo
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- CN1544713A CN1544713A CNA200310113521XA CN200310113521A CN1544713A CN 1544713 A CN1544713 A CN 1544713A CN A200310113521X A CNA200310113521X A CN A200310113521XA CN 200310113521 A CN200310113521 A CN 200310113521A CN 1544713 A CN1544713 A CN 1544713A
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- silicon carbide
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- 239000013078 crystal Substances 0.000 title claims abstract description 38
- 229910010271 silicon carbide Inorganic materials 0.000 title claims description 33
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 title claims description 32
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 38
- 239000010439 graphite Substances 0.000 claims abstract description 38
- 229910002804 graphite Inorganic materials 0.000 claims abstract description 26
- 238000007789 sealing Methods 0.000 claims abstract description 3
- 239000012774 insulation material Substances 0.000 claims description 15
- 239000002826 coolant Substances 0.000 claims description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 5
- 230000000740 bleeding effect Effects 0.000 claims description 4
- 239000000498 cooling water Substances 0.000 claims description 4
- 238000009434 installation Methods 0.000 claims description 2
- 239000007769 metal material Substances 0.000 claims description 2
- 239000000463 material Substances 0.000 abstract description 8
- 230000006698 induction Effects 0.000 abstract description 7
- 230000008859 change Effects 0.000 abstract description 2
- 239000011810 insulating material Substances 0.000 abstract 2
- 230000007547 defect Effects 0.000 abstract 1
- 238000005086 pumping Methods 0.000 abstract 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 30
- 239000010410 layer Substances 0.000 description 14
- 238000000034 method Methods 0.000 description 13
- 241000209456 Plumbago Species 0.000 description 12
- 239000000377 silicon dioxide Substances 0.000 description 9
- 238000010438 heat treatment Methods 0.000 description 8
- 230000008878 coupling Effects 0.000 description 5
- 238000010168 coupling process Methods 0.000 description 5
- 238000005859 coupling reaction Methods 0.000 description 5
- 230000008569 process Effects 0.000 description 3
- 238000005130 seeded sublimation method Methods 0.000 description 3
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 239000012071 phase Substances 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000005553 drilling Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000000407 epitaxy Methods 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 238000002309 gasification Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 229910003465 moissanite Inorganic materials 0.000 description 1
- 239000003208 petroleum Substances 0.000 description 1
- 230000004223 radioprotective effect Effects 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 238000005728 strengthening Methods 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
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Abstract
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CN 200310113521 CN1247831C (zh) | 2003-11-14 | 2003-11-14 | 一种碳化硅晶体生长装置 |
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CN 200310113521 CN1247831C (zh) | 2003-11-14 | 2003-11-14 | 一种碳化硅晶体生长装置 |
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CN1544713A true CN1544713A (zh) | 2004-11-10 |
CN1247831C CN1247831C (zh) | 2006-03-29 |
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Cited By (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101805927A (zh) * | 2010-04-20 | 2010-08-18 | 中国科学院上海硅酸盐研究所 | 一种高纯半绝缘碳化硅体单晶的生长装置 |
WO2010149017A1 (zh) * | 2009-06-22 | 2010-12-29 | 中国科学院上海硅酸盐研究所 | 双室结构碳化硅晶体生长装置 |
CN101591803B (zh) * | 2008-05-28 | 2011-05-11 | 中国科学院半导体研究所 | 一种高温碳化硅双室热壁式外延生长装置 |
CN102260934A (zh) * | 2011-02-24 | 2011-11-30 | 西安诚瑞科技发展有限公司 | 连续感应加热式纤维高温碳化装置 |
CN102292475A (zh) * | 2009-01-21 | 2011-12-21 | 光伏硅研究和生产有限责任公司 | 用于生产硅细棒的方法和设备 |
CN102644105A (zh) * | 2012-05-14 | 2012-08-22 | 吴晟 | 一种pvt法生长碳化硅晶体的方法及其装置 |
CN102691109A (zh) * | 2012-06-19 | 2012-09-26 | 东莞市天域半导体科技有限公司 | 一种垂直式碳化硅高温氧化装置 |
CN102747425A (zh) * | 2012-07-02 | 2012-10-24 | 东莞市天域半导体科技有限公司 | 一种水平式碳化硅高温氧化装置 |
CN102965724A (zh) * | 2012-12-18 | 2013-03-13 | 福建福晶科技股份有限公司 | 一种双层石英管密封结构提拉法单晶炉 |
CN103184514A (zh) * | 2013-04-11 | 2013-07-03 | 中国科学院苏州纳米技术与纳米仿生研究所 | 晶体生长炉 |
CN103249877A (zh) * | 2010-11-10 | 2013-08-14 | 株式会社藤仓 | 氮化铝单晶的制造装置和制造方法 |
CN103628140A (zh) * | 2013-10-09 | 2014-03-12 | 东莞市天域半导体科技有限公司 | 一种超高温双层水冷石英管真空室用双密封结构 |
CN104357908A (zh) * | 2014-10-28 | 2015-02-18 | 西安建筑科技大学 | 晶体生长设备及其作为氟代硼铍酸钾晶体生长设备的应用 |
CN104534874A (zh) * | 2014-12-25 | 2015-04-22 | 合肥科晶材料技术有限公司 | 真空中频感应炉 |
CN104775149A (zh) * | 2015-05-05 | 2015-07-15 | 山东天岳先进材料科技有限公司 | 一种生长高纯半绝缘碳化硅单晶的方法及装置 |
US9644286B2 (en) | 2011-07-28 | 2017-05-09 | Denso Corporation | Silicon carbide single crystal manufacturing apparatus |
RU2710176C1 (ru) * | 2019-03-05 | 2019-12-24 | Акционерное Общество "НПК "Химпроминжиниринг" | Печь проходного типа для высокотемпературной обработки углеволокнистых материалов с индукционным способом нагрева рабочей зоны |
CN111411401A (zh) * | 2020-05-22 | 2020-07-14 | 北京北方华创微电子装备有限公司 | 碳化硅晶体生长装置 |
CN115198366A (zh) * | 2022-09-14 | 2022-10-18 | 青禾晶元(天津)半导体材料有限公司 | 一种大尺寸碳化硅晶体的生长装置及生长方法 |
-
2003
- 2003-11-14 CN CN 200310113521 patent/CN1247831C/zh not_active Expired - Lifetime
Cited By (28)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101591803B (zh) * | 2008-05-28 | 2011-05-11 | 中国科学院半导体研究所 | 一种高温碳化硅双室热壁式外延生长装置 |
CN102292475A (zh) * | 2009-01-21 | 2011-12-21 | 光伏硅研究和生产有限责任公司 | 用于生产硅细棒的方法和设备 |
CN102292475B (zh) * | 2009-01-21 | 2014-05-28 | 光伏硅研究和生产有限责任公司 | 用于生产硅细棒的方法和设备 |
WO2010149017A1 (zh) * | 2009-06-22 | 2010-12-29 | 中国科学院上海硅酸盐研究所 | 双室结构碳化硅晶体生长装置 |
US20120192790A1 (en) * | 2009-06-22 | 2012-08-02 | Zhizhan Chen | Apparatus with Two-Chamber Structure for Growing Silicon Carbide Crystals |
US9228275B2 (en) | 2009-06-22 | 2016-01-05 | Research And Development Center, Shanghai Institute Of Ceramics | Apparatus with two-chamber structure for growing silicon carbide crystals |
CN101805927A (zh) * | 2010-04-20 | 2010-08-18 | 中国科学院上海硅酸盐研究所 | 一种高纯半绝缘碳化硅体单晶的生长装置 |
CN103249877A (zh) * | 2010-11-10 | 2013-08-14 | 株式会社藤仓 | 氮化铝单晶的制造装置和制造方法 |
CN102260934A (zh) * | 2011-02-24 | 2011-11-30 | 西安诚瑞科技发展有限公司 | 连续感应加热式纤维高温碳化装置 |
US9644286B2 (en) | 2011-07-28 | 2017-05-09 | Denso Corporation | Silicon carbide single crystal manufacturing apparatus |
CN102644105A (zh) * | 2012-05-14 | 2012-08-22 | 吴晟 | 一种pvt法生长碳化硅晶体的方法及其装置 |
CN102644105B (zh) * | 2012-05-14 | 2016-04-27 | 吴晟 | 一种pvt法生长碳化硅晶体的方法及其装置 |
CN102691109A (zh) * | 2012-06-19 | 2012-09-26 | 东莞市天域半导体科技有限公司 | 一种垂直式碳化硅高温氧化装置 |
CN102691109B (zh) * | 2012-06-19 | 2015-05-20 | 东莞市天域半导体科技有限公司 | 一种垂直式碳化硅高温氧化装置 |
CN102747425A (zh) * | 2012-07-02 | 2012-10-24 | 东莞市天域半导体科技有限公司 | 一种水平式碳化硅高温氧化装置 |
CN102965724A (zh) * | 2012-12-18 | 2013-03-13 | 福建福晶科技股份有限公司 | 一种双层石英管密封结构提拉法单晶炉 |
CN103184514A (zh) * | 2013-04-11 | 2013-07-03 | 中国科学院苏州纳米技术与纳米仿生研究所 | 晶体生长炉 |
CN103184514B (zh) * | 2013-04-11 | 2016-07-06 | 中国科学院苏州纳米技术与纳米仿生研究所 | 晶体生长炉 |
CN103628140B (zh) * | 2013-10-09 | 2016-08-17 | 东莞市天域半导体科技有限公司 | 一种超高温双层水冷石英管真空室用双密封结构 |
CN103628140A (zh) * | 2013-10-09 | 2014-03-12 | 东莞市天域半导体科技有限公司 | 一种超高温双层水冷石英管真空室用双密封结构 |
CN104357908A (zh) * | 2014-10-28 | 2015-02-18 | 西安建筑科技大学 | 晶体生长设备及其作为氟代硼铍酸钾晶体生长设备的应用 |
CN104357908B (zh) * | 2014-10-28 | 2017-07-28 | 西安建筑科技大学 | 晶体生长设备及其作为氟代硼铍酸钾晶体生长设备的应用 |
CN104534874A (zh) * | 2014-12-25 | 2015-04-22 | 合肥科晶材料技术有限公司 | 真空中频感应炉 |
CN104775149A (zh) * | 2015-05-05 | 2015-07-15 | 山东天岳先进材料科技有限公司 | 一种生长高纯半绝缘碳化硅单晶的方法及装置 |
RU2710176C1 (ru) * | 2019-03-05 | 2019-12-24 | Акционерное Общество "НПК "Химпроминжиниринг" | Печь проходного типа для высокотемпературной обработки углеволокнистых материалов с индукционным способом нагрева рабочей зоны |
CN111411401A (zh) * | 2020-05-22 | 2020-07-14 | 北京北方华创微电子装备有限公司 | 碳化硅晶体生长装置 |
CN115198366A (zh) * | 2022-09-14 | 2022-10-18 | 青禾晶元(天津)半导体材料有限公司 | 一种大尺寸碳化硅晶体的生长装置及生长方法 |
CN115198366B (zh) * | 2022-09-14 | 2022-11-25 | 青禾晶元(天津)半导体材料有限公司 | 一种大尺寸碳化硅晶体的生长装置及生长方法 |
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CN1247831C (zh) | 2006-03-29 |
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Application publication date: 20041110 Assignee: Shenzhen Reinvested Tianke Semiconductor Co.,Ltd. Assignor: TANKEBLUE SEMICONDUCTOR Co.,Ltd.|BEIJING TIANKE HEDA NEW MATERIAL CO.,LTD. Contract record no.: X2023990000681 Denomination of invention: A silicon carbide crystal growth device Granted publication date: 20060329 License type: Common License Record date: 20230725 |
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