CN1521749A - 光记录介质及其制造方法 - Google Patents

光记录介质及其制造方法 Download PDF

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CN1521749A
CN1521749A CNA2003101181345A CN200310118134A CN1521749A CN 1521749 A CN1521749 A CN 1521749A CN A2003101181345 A CNA2003101181345 A CN A2003101181345A CN 200310118134 A CN200310118134 A CN 200310118134A CN 1521749 A CN1521749 A CN 1521749A
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optical recording
recording media
pigment
manufacture method
substrate
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CN100356469C (zh
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柴田路弘
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Fujifilm Corp
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Fujifilm Corp
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Priority claimed from JP2002353467A external-priority patent/JP4156914B2/ja
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Abstract

一种光记录介质的制造方法,是具有用旋涂法在基板上喷出涂布色素溶液形成色素记录层的工序的光记录介质的制造方法,所述的色素溶液从喷出开始至结束为止使基板的旋转速度处于400rpm以上。另一种光记录介质的制造方法,是具有用旋涂法在基板上喷出涂布色素溶液,涂布后使之干燥形成色素记录层的工序的光记录介质的制造方法,其中包括以所述的色素溶液从喷出开始至干燥结束的顺序,使基板的旋转速度比所述的色素溶液喷出开始时和喷出结束时的旋转速度低的低速旋转阶段。

Description

光记录介质及其制造方法
技术领域
本发明涉及光记录介质及其制造方法,特别涉及记录层使用色素的光记录介质及其制造方法。
背景技术
过去知道,用激光光线只限一次信息记录的光记录介质(光盘)。这种光盘也称作补充记录型CD(所谓CD-R)和DVD-R,其代表性结构是在透明园盘状基板上依次层叠由有机色素形成的记录层、由金等金属形成的光线反射层以及树脂保护层。而且在这种CD-R中的信息记录,是利用近红外区域的激光光线(通常为780nm附近波长的激光光线)对CD-R等照射方式进行的。记录层的照射部分因吸收这种光线而使局部温度上升,产生物理或化学变化(例如生成纹孔),导致该部分的光学特性发生变化,以这种方式记录信息。另一方面,信息的读取(再生),也是用与记录用激光光线相同波长的激光光线照射CD-R等的方式进行的,通过检出记录层光学特性变化的部位(记录部分)与未发生变化的部位(未记录部分)的反射率差异的方式进行。
在这种CD-R的制造中,形成记录层的情况下,例如一边使基板旋转一边用旋涂法在基板上涂布色素溶液的方式进行。对于这种记录层的形成方法而言,有人为提高记录层的性能而提出了各种方案。例如特开2000-155994号公报公开了一种方法,该方法在基板内周侧涂布时通过增大基板的旋转速度能以少量喷出量涂布色素。而且特开平8-31026号公报公开了一种将色素溶液的表面张力X、涂布时的转数Y和色素溶液的粘度Z设定满足X≥20达因/厘米,60rpm≥Y≥40rpm,而且1000rpm·mPa·s≥Y≥Z≥400rpm·mPa·s关系的方法。
但是,根据这种已有的方法,因涂布液的浓度和涂布温湿度往往使色素记录层的内周侧与外周侧在记录特性上的差别增大。特别是当涂布液浓度低的情况下,内周侧层厚变薄,内周侧记录特性有不同的倾向。
而且还发现,例如以200rpm左右速度低速旋转时,从内周侧向外周侧产生放射状厚度不均。于是由于这种厚度不均,使外周侧反射信号产生噪音。上述厚度不均在色素溶液浓度低时更显著。
发明内容
如上所述,本发明正是为解决上述问题而提出的,并以达成以下目的为本发明课题。
本发明目的在于提供一种能够制造噪音电平低、具有良好记录再生特性的光记录介质的光记录介质的制造方法。而且本发明目的还在于提供一种内周侧和外周侧记录特性差别小的光记录介质及其制造方法。
解决上述课题的手段如下。即,
本发明的第一种实施方式是一种光记录介质的制造方法,是具有利用旋涂法在基板上喷出涂布色素溶液,形成色素记录层的工序的光记录介质的制造方法,
其特征在于,所述的色素溶液从喷出开始至结束为止使基板的旋转速度处于400rpm以上。
本发明的第二种实施方式是所述的第一种实施方式中记载的光记录介质的制造方法,其特征在于,所述的色素溶液的色素浓度为0.2~1.2重量%。
本发明的第三种实施方式是一种光记录介质的制造方法,是具有利用旋涂法在基板上喷出涂布色素溶液,涂布后使之干燥形成色素记录层的工序的光记录介质的制造方法,
其特征在于,其中包括以所述的色素溶液从喷出开始至干燥结束的顺序,使基板的旋转速度比所述的色素溶液喷出开始时和喷出结束时的旋转速度低的低速旋转阶段。
本发明的第四种实施方式是所述的第三种实施方式中记载的光记录介质的制造方法,其特征在于,所述的低速旋转阶段从所述的色素溶液喷出结束后开始。
本发明的第五种实施方式是所述的第三或第四种实施方式中记载的光记录介质的制造方法,其特征在于,所述的色素溶液浓度处于1重量%以下。
本发明的第六种实施方式是所述的第三至第五种实施方式中任何一种实施方式记载的光记录介质的制造方法,其特征在于,所述的色素溶液喷出开始时基板的旋转速度处于400pm以上。
本发明的第七种实施方式,是利用所述的第三至第六种实施方式中任何一种实施方式记载的光记录介质的制造方法制造的光记录介质。
以下说明本发明的光记录介质的制造方法的实施方式。本发明的光记录介质的制造方法,包含大体分成的两种方式。第一种方式是具有用旋涂法在基板上喷出涂布色素溶液,形成色素记录层的工序的光记录介质的制造方法,其特征在于,所述的色素溶液从喷出开始至结束为止使基板的旋转速度处于400rpm以上。
本发明的光记录介质的制造方法中的第二种方式,是具有用旋涂法在基板上喷出涂布色素溶液,涂布后使之干燥形成色素记录层的工序的光记录介质的制造方法,其特征在于,其中包括以所述的色素溶液从喷出开始至干燥结束的顺序,使基板的旋转速度比所述的色素溶液喷出开始时和喷出结束时的旋转速度低的低速旋转阶段。
以下,首先就利用本发明的第一种和第二种光记录介质的制造方法得到的光记录介质加以说明。
所述的光记录介质是基板上至少具有色素记录层以及必要时的其他层的光记录介质,例如可以举出CD-R、DVD-R等补记型光记录介质。以下说明基板和各层。
[光记录介质]
<基板>
基板可以任意选择使用过去作为光记录介质基板材料用的各种材料。
具体讲,可以举出玻璃、聚碳酸酯、聚甲基丙烯酸甲酯等丙烯树脂,聚氯乙烯、氯乙烯共聚物等氯乙烯系树脂,环氧树脂,无定形聚烯烃,聚酯,铝等金属等,而且还可以根据需要并用这些物质。
上述材料中,从耐湿性、尺寸稳定性和价格低廉等观点来看,优选聚碳酸酯和无定形聚烯烃,特别优选聚碳酸酯。而且基板的厚度优选定为0.5~1.4mm。
基板上形成随纹用导向沟槽或表示地址等信息的凹凸(纹道)。
在DVD-R的情况下,预制纹道的随纹间距优选处于300~900纳米范围内,更优选处于350~850纳米范围内,最好处于400~800纳米范围内。
而且预制纹道深度(沟槽深度)优选处于100~160nm范围内,更优选处于120~150nm范围内,最好处于130~140nm范围内。
此外预制纹道的半宽度优选处于200~400nm范围内,更优选处于230~380nm范围内,最好处于250~350nm范围内。
在CD-R的情况下,预制纹道的随纹间距优选处于1.2~2.0微米范围内,更优选处于1.4~1.8微米范围内,最好处于1.55~1.65微米范围内。
预制纹道深度(沟槽深度)优选处于100~250nm范围内,更优选处于150~230nm范围内,最好处于170~210nm范围内。
预制纹道的半宽度优选处于400~650nm范围内,更优选处于2480~600nm范围内,最好处于500~580nm范围内。
以上的预制纹道的随纹间距和沟槽深度等虽然是对CD-R和DVD-R情况的说明,但是本发明并不限于CD-R和DVD-R,即使是上述数值范围之外的基板也能适用。
为了改善平面性并防止在粘着力方向上变质和色素记录层变质,也可以在设有色素记录层侧的基板表面上设置底涂层。作为底涂层材料,例如可以举出聚甲基丙烯酸甲酯、丙烯酸—甲基丙烯酸共聚物、苯乙烯—马来酸酐共聚物、聚乙烯醇、N-羟甲基丙烯酰胺、苯乙烯—乙烯基甲苯共聚物、氯磺酰化聚乙烯、硝基纤维素、聚氯乙烯、氯代聚烯烃、聚酯、聚酰亚胺、醋酸乙烯酯—氯乙烯共聚物、乙烯—醋酸乙烯酯共聚物、聚乙烯、聚丙烯、聚碳酸酯等高分子物质,以及硅烷偶合剂等表面改性剂。底涂层,可以采用将上述物质溶解或者分散在适当溶剂中制成涂布液后,利用旋涂法、浸涂法、挤压涂布法等涂布方法在基板表面上涂布这种涂布液的方式形成。底涂层的厚度,一般处于0.005~20微米范围内,优选处于0.01~10微米范围内。
<色素记录层>
色素记录层使用的色素并无特别限制,作为可以使用的色素实例可以举出花青色素、酞青色素、咪唑并噁唑啉色素、吡喃翁系·硫代吡喃翁系色素、甘菊环翁系色素、角鲨烯翁系色素、镍、铬等金属配位化合物色素、萘醌系色素、蒽醌系色素、靛酚系色素、靛苯胺系色素、三苯甲烷系色素、部花青系色素、噁唑系色素、胺翁盐·diimmonium系色素和亚硝基化合物等。这些色素中,优选花青色素、酞青色素、甘菊环翁系色素、角鲨烯翁系色素、噁唑系色素和、咪唑并噁唑啉色素。
色素记录层可以是单层或多层。而且色素记录层的层厚,一般处于20~500nm范围内,优选处于30~300nm范围内,更优选处于50~200nm范围内。
<反射层>
必要时,为了提高信息再生时的反射率可以在色素记录层上设置光反射层。作反射层用的材料是对激光光线具有高反射率的物质,作为其实例可以举出Mg、Se、Y、Ti、Zr、Hf、V、Nb、Ta、Cr、Mo、W、Mn、Re、Fe、Co、Ni、Ru、Rh、Pd、Ir、Pt、Cu、Ag、Au、Zn、Cd、Al、Ga、In、Si、Ge、Te、Pb、Po、Sn、Bi等金属和准金属或不锈钢。这些物质中优选Cr、Ni、Pt、Cu、Ag、Au、Al和不锈钢。这些物质可以单独使用或者两种以上组合使用,或者以合金形式使用。特别优选Au、Ag或其合金。反射层的厚度一般处于10~800nm范围内,优选处于20~500nm范围内,更优选处于50~300nm范围内。
<保护层>
为了保护记录层等防止产生物理和化学变化优选在反射层或记录层上设置保护层。其中在与DVD-R型光记录介质制造时同样的形态下,即制成以记录层为内侧粘合两块基板的这种结构的情况下,不一定设置保护层。可以使用SiO2、MgF2、SnO2、Si3N4等无机物质,以及热塑性树脂、热固性树脂、UV固化性树脂等有机物质作为保护层用材料。保护层的层厚一般为0.1~100微米范围。
而且根据记录层的特性,还可以在反射层与记录层之间设置例如提高与记录层之间粘着性用的透光层。
也可以使用在激光波长下透过率处于90%以上的任何材料作为透光层。
上述透光层能够采用过去公知的方法形成,透光层的厚度优选2~50nm。
[光记录介质的制造方法]
以下详细说明能够制造以下光记录介质用的本发明的第一种方式光记录介质的制造方法。
<基板的成形>
基板的成形,可以使用上述的基板材料,采用注射成形法、压缩成形法或注射压缩成形法进行。而且将捣实器安装在油压机的成形模具的一侧,利用将加热至熔点附近的树脂热压的方法也能够将其压缩成形。
<色素记录层的形成>
色素记录层,可以采用将上述色素等记录物质与粘合剂一起溶解在适当溶剂中制成色素溶液后,在基板表面上涂布此色素溶液,形成膜后经过干燥形成。
本发明的光记录介质制造方法中,作为色素溶液的涂布方法,可以采用旋涂法。而且在用旋涂法涂布时,从开始喷出色素溶液至喷出结束之前将基板的旋转速度设定在400rpm以上。具体讲,用喷出色素溶液的喷嘴喷出色素溶液开始涂布后至结束之前,将基板的旋转速度设定在400rpm以上,在开始涂布后至结束之外的时间内设定在400rpm以下。通过将基板的旋转速度设定在400rpm以上,能够防止选择成分色素记录层上产生放射状厚度不均,因而能够减小因这种厚度不均造成的噪声。
所述的旋转速度更优选设定在420rpm以上,特别优选设定在450rpm以上。所述的旋转速度若低于400rpm,则会产生放射状厚度不均,因而成为噪声的起因。其中所述的旋转速度上限为1000rpm。
如上所述,在本发明的光记录介质的制造方法中,一旦将色素溶液涂布时基板的旋转速度设定在400rpm以上,与通常相比以高速旋转,通过使之高速旋转,即使将色素溶液的色素浓度设定在低浓度下,也能抑制涂布膜产生厚度不均。作为色素溶液的色素浓度,可以制成0.2~.2重量%,优选制成0.4~1.0重量%。通过将色素溶液中的色素浓度设定在0.5~0.9重量%,能够更加有效地抑制厚度不均的产生。
在以上的色素溶液喷出结束后对基板的旋转速度虽然没有特别限制,但是优选在色素溶液喷出结束后,进一步提高基板的旋转速度,使达到基板外周部分的多余色素溶液被离心力甩去,使之干燥。
而且作为对记录物质等溶解处理的方法,可以采用超声波处理法、均质器法和加热法等。
制备色素溶液时使用的溶剂,可以举出乙酸丁酯、乳酸乙酯、乙酸溶纤剂等酯类,甲基乙基酮、环己酮、甲基异丁基酮等酮类,二氯甲烷、1,2-二氯乙烷、氯仿等氯代烃类,二甲基甲酰胺等酰胺类,甲基环己烷等烃类,四氢呋喃、乙醚、二噁烷等醚类,乙醇、正丙醇、异丙醇、正丁醇、二丙酮醇等醇类,2,2,3,3-四氟丙醇等含氟溶剂,乙二醇单甲醚、乙二醇单乙醚、丙二醇单甲醚等二醇醚类等。
上述溶剂,考虑到使用记录物质的溶解性能,可以单独使用或者两种以上组合使用。而且还可以根据需要在涂布液中添加抗氧化剂、UV吸收剂、增塑剂、润滑剂等各种添加剂。
为了提高色素记录层的耐光性,可以使该色素记录层中含有各种褪色防止剂。
褪色防止剂一般可以采用单态氧猝灭剂(quencher)。而作为单态氧猝灭剂可以利用已经公知的专利说明书等出版物上述载的那些。
其具体实例,例如可以举出特开昭58-175693、同59-81194、同60-18387、同60-19586、同60-19587、同60-35054、同60-36190、同60-36191、同60-44554、同60-44555、同60-44389、同60-44390、同60-54892、同60-47069、同63-229995、特开平4-25492、特公平1-38680和同6-26028等号各公报,和德国专利350399号说明书以及日本化学会志1992年10月号第1141页等上述载的物质。
上述单态氧猝灭剂等褪色防止剂的用量,相对于记录用化合物量一般处于0.1~50重量%范围内,优选处于0.5~45重量%范围内,更优选处于3~40重量%范围内,特别优选处于5~25重量%范围内。
褪色防止剂的代表性实例,可以举出亚硝基化合物、金属配位化合物、diimmonium盐、胺翁盐等。这些实例例如记载在特开平2-300288号、同3-224793号和同4-146189号等公报之中。
作为上述结合剂的实例,例如可以举出明胶、纤维素衍生物、糊精、松香、橡胶等天然有机高分子物质,以及聚乙烯、聚丙烯、聚苯乙烯、聚异丁烯等烃类树脂,聚氯乙烯、聚偏氯乙烯、聚氯乙烯·聚醋酸乙烯酯共聚物等乙烯基系树脂,聚丙烯酸甲酯、聚甲基丙烯酸甲酯等丙烯系树脂,聚乙烯醇、氯代聚乙烯、环氧树脂、丁醛树脂、橡胶衍生物、酚醛树脂等热固性树脂的初期缩合物等合成有机高分子。使用结合剂的情况下,结合剂用量相对于100重量份色素而言一般处于0.2~20重量份范围内,优选处于0.5~10重量份范围内,更优选处于1~5重量范围内。
涂布温度只要处于20~40℃范围内就没有问题,但是优选25~35℃,更优选27~33℃。而且涂布时的相对湿度,可以处于20~60RH%范围内,优选30~50RH%,更优选35~45RH%。
<反射层的形成>
反射层,例如可以采用将上述反射性物质蒸镀、溅射或离子镀在色素记录层上的方法形成。本发明中,为了提高保存性或者为了改变外观,反射层既可以层叠单层上述材料,也可以将两种以上材料层叠多层。
<保护层的形成>
保护层是无机物质的情况下,可以采用真空蒸镀、溅射、涂布等方法形成,是有机物质的情况下可以采用层叠塑料膜或涂布溶解在溶剂中的涂布液和干燥等方法形成。或者保护层也采用借助于粘着剂将塑料挤压加工得到的薄膜层叠在反射层上的方法形成。而且在热塑性树脂、热固性树脂的情况下,还将其溶解在适当的溶剂中制成涂布液后,涂布此涂布液,经过干燥的方式形成。在UV固化性树脂的情况下,可以将其直接或者溶解在适当溶剂中制成涂布液后,涂布此涂布液,利用UV光线照射使之固化的方法形成。这些涂布液中也可以根据需要添加抗静电剂、抗氧化剂和UV吸收剂等各种添加剂。
为了控制粘度,涂布温度优选处于23~50℃范围内,更优选处于24~40℃范围内,最优选处于25~37℃范围内。
为了防止光盘翘曲,对涂布膜照射紫外线时优选采用脉冲型光照设备(优选UV照射器)进行。脉冲间隔优选处于毫秒以下,更优选处于微秒以下。每个脉冲照射的光量虽然没有特别限制,但是优选处于3kW/cm以下,更优选处于2kW/cm以下。
而且比较射次数并无特别限制,但是优选20次以下,更优选10次以下。
以下就本发明的第二种实施方式的光记录介质作详细说明。
<基板的成形>
基板的成形可以与上述的第一种实施方式同样进行。
<色素记录层的形成>
色素记录层,可以采用将上述色素等记录物质与结合剂一起溶解在适当溶剂中制成色素溶液后,将这种色素溶液涂布在基板表面上形成涂膜,然后干燥的方法形成。
本发明的光记录介质的制造方法中,采用旋涂法作为色素溶液的涂布方法。而且利用旋涂法涂布时,在色素溶液从喷出开始至干燥终了的顺序中,包括使基板的旋转速度比色素溶液喷出开始时或喷出结束时的旋转速度低的阶段(以下称作“低速旋转阶段”)。一旦维持基板高速旋转,在离心力作用下越靠近外周侧层厚越厚,但是通过包括低速旋转阶段能够抑制离心力的影响,抑制层厚的内外周差。特别是,即使色素溶液的浓度低,也可以抑制层厚的内外周差。也就是说,根据本发明的制造方法可以得到一种遍及光记录层整个表面的层厚大体均匀、内周与外周记录特性差别小的光记录介质。色素记录层的层厚分布可以具体控制在±2%以下。
低速旋转阶段中基板的旋转速度,具体优选比喷出开始时的旋转速度低50~400rpm,更优选低100~300rpm。而且向低速旋转阶段的过渡时间越短越好。
低速旋转阶段虽然可以包含在从色素溶液喷出开始至干燥结束的顺序之中,但是优选使之在色素溶液喷出结束后开始。这是因为在色素溶液喷出结束后未干燥的色素溶液富有流动性,容易受离心力影响,当色素溶液喷出结束后将基板的旋转速度降低为低速,能够抑制离心力的影响,使涂膜更加均匀的缘故。
而且低速旋转阶段的持续时间,优选1~15秒钟,更优选3~10秒钟。
低速旋转阶段结束后再将旋转速度设定为高速(例如200~2500rpm),使达到基板外周边缘部分的多余部分色素溶液被离心力甩掉,并将其干燥。
色素溶液的浓度并无特别限制,本发明中由于即使在低浓度下也能使层厚均匀,所以设定在1重量%以下,可以进一步设定在0.6~0.8重量%。也就是说,由于色素溶液浓度即使低达1重量%以下因而能够适当形成色素记录层,所以能够将在色素记录层形成时制备的色素溶液浓度范围设定得比已有技术更宽。
而且优选将色素溶液喷出开始时的基板旋转速度设定在400rpm以上。通过将该旋转速度设定在400rpm以上,能够防止色素记录层上产生放射状厚度不均,而且还能减低因这种厚度不均产生的噪声。该旋转速度更优选420~600rpm,最好为440~550rpm。该旋转速度低于400rpm时,将会产生放射状厚度不均,是产生噪声的起因。
而且作为对记录物质等溶解处理的方法,可以采用超声波处理法、均质器法和加热法等。
制备色素溶液时使用的溶剂,可以举出乙酸丁酯、乳酸乙酯、乙酸溶纤剂等酯类,甲基乙基酮、环己酮、甲基异丁基酮等酮类,二氯甲烷、1,2-二氯乙烷、氯仿等氯代烃类,二甲基甲酰胺等酰胺类,甲基环己烷等烃类,四氢呋喃、乙醚、二噁烷等醚类,乙醇、正丙醇、异丙醇、正丁醇、二丙酮醇等醇类,2,2,3,3-四氟丙醇等含氟溶剂,乙二醇单甲醚、乙二醇单乙醚、丙二醇单甲醚等二醇醚类等。
考虑到使用记录物质的溶解性能,上述溶剂可以单独使用或者两种以上组合使用。而且还可以根据需要在涂布液中添加抗氧化剂、UV吸收剂、增塑剂、润滑剂等各种添加剂。
为了提高色素记录层的耐光性,可以使该色素记录层中含有各种褪色防止剂。
作为褪色防止剂一般可以采用单态氧猝灭剂。而作为单态氧猝灭剂可以利用已经公知的专利说明书等出版物上述载的那些。
其具体实例,例如可以举出特开昭58-175693、同59-81194、同60-18387、同60-19586、同60-19587、同60-35054、同60-36190、同60-36191、同60-44554、同60-44555、同60-44389、同60-44390、同60-54892、同60-47069、同63-229995、特开平4-25492、特公平1-38680和同6-26028等号各公报,和德国专利350399号说明书以及日本化学会志1992年10月号第1141页等上述载的物质。
上述单态氧猝灭剂等褪色防止剂的用量,相对于记录用化合物量一般处于0.1~50重量%范围内,优选处于0.5~45重量%范围内,更优选处于3~40重量%范围内,特别优选处于5~25重量%范围内。
褪色防止剂的代表性实例,可以举出亚硝基化合物、金属配位化合物、diimmonium盐、胺翁盐等。这些实例例如记载在特开平2-300288号、同3-224793号和同4-146189号等公报之中。
作为上述结合剂的实例,例如可以举出明胶、纤维素衍生物、糊精、松香、橡胶等天然有机高分子物质,以及聚乙烯、聚丙烯、聚苯乙烯、聚异丁烯等烃类树脂,聚氯乙烯、聚偏氯乙烯、聚氯乙烯·聚醋酸乙烯酯共聚物等乙烯基系树脂,聚丙烯酸甲酯、聚甲基丙烯酸甲酯等丙烯系树脂,聚乙烯醇、氯代聚乙烯、环氧树脂、丁醛树脂、橡胶衍生物、酚醛树脂等热固性树脂的初期缩合物等合成有机高分子。使用结合剂的情况下,结合剂用量相对于100重量份色素而言一般处于0.2~20重量份范围内,优选处于0.5~10重量份范围内,更优选处于1~5重量范围内。
涂布温度只要处于20~40℃范围内就没有问题,但是优选25~35℃,更优选27~33℃。而且涂布时的相对湿度,可以处于20~60RH%范围内,优选30~50RH%,更优选35~45RH%。
<反射层的形成>
反射层可以与上述第一种实施方式中记载的同样方式形成。
<保护层的形成>
保护层可以与上述第一种实施方式中记载的同样方式形成。
附图说明
图1A是表示实施例4中从色素溶液喷出开始至干燥结束之间涂布顺序的曲线图。图1B是表示色素记录层径向光学浓度的曲线图。
图2A是表示比较例5中从色素溶液喷出开始至干燥结束之间涂布顺序的曲线图,图2B是表示色素记录层径向光学浓度的曲线图。
图3A是表示比较例6中从色素溶液喷出开始至干燥结束之间涂布顺序的曲线图,图3B是表示色素记录层径向光学浓度的曲线图。
具体实施方式
实施例
以下详细说明本发明的实施例,但是本发明并不受这些实施例的丝毫限制。
(实施例1)
将捣实器设置在注塑成形机(住友重工机械工业株式会社制造)上,以聚碳酸酯作原料成形为具有螺旋状纹道(沟槽深度:130nm、沟槽宽度:320nm、纹道间距:0.74微米)的厚度0.6毫米、直径120毫米的基板。同时成形了与该基板同样的虚设基板。
在30℃温度和45%RH下利用旋涂法,将作为色素溶液的下记色素A的2,2,3,3一四氟丙醇溶液(0.68重量%)涂布在基板的纹道形成面上,形成层厚150nm的色素记录层。此时,从色素溶液喷出开始至喷出结束将基板的旋转速度,对于每个实施例和比较例设定为表1所示数值上。然后,用溅射法在色素记录层上层叠大约150nm厚度银形成反射层。进而用紫外线固化性粘着剂(大日本油墨化学工业株式会社制造,ダイキユアクリアSD-640)将反射层与虚设基板(厚度0.6毫米)粘合在一起。用以上方式制成了实施例1~3和比较例1~4的光记录介质。
【化1】
色素A
(评价)
对于制成的实施例1~3和比较例1~4的光记录介质,在未记录状态下测定了半径55毫米处反射信号的噪声电平及其频率数目。具体讲,用光盘驱动装置(PULSETECH工业株式会社制造,DDU1000型),在3.5米/秒线速度下使光记录介质旋转,用广谱分析仪测定了反射信号的噪声频率数和噪声电平。结果示于表1之中。
表1
喷出时的旋转数(rpm)     半径55毫米下的噪声电平
    电平(dB)   频率数(kHz)
  实施例1     400     0.0     -
  实施例2     450     0.0     -
  实施例3     500     0.0     -
  比较例1     200     29.7     16.6
  比较例2     218     27.6     16.4
  比较例3     300     16.6     22.2
  比较例4     350     7.9     26.8
表1中数据说明,色素溶液从喷出开始比喷出结束之间的基板旋转速度越高,噪声频率越高,而且噪声电平减低。
(实施例4)
将捣实器设置在注塑成形机(住友重工机械工业株式会社制造)上,以聚碳酸酯树脂作为材料成形为具有螺旋状纹道(沟槽深度:130nm、沟槽宽度:320nm、纹道间距:0.74微米)的厚度0.6毫米、直径120毫米的基板。同时成形了与该基板同样的虚设基板。
在30℃温度和45%RH下利用旋涂法,将作为色素溶液的上记色素A的2,2,3,3-四氟丙醇溶液(0.78重量%)涂布在基板的纹道形成面上,形成层厚150nm的色素记录层。此时,关于实施例4和比较例5和比较例6,从色素溶液喷出开始至喷出结束的涂布顺序分别为如图1A、2A和3A所示。图1A~3A纵轴表示基板的旋转速度(rpm),横轴表示从溶液喷出开始后经过的时间,图中表示旋转速度随经过时间的变化情况。然后在色素记录层上溅射银层叠形成大约150nm厚度反射层。进而用紫外线固化性粘着剂(大日本油墨化学工业株式会社制造,ダイキユアクリアSD-640)将反射层与虚设基板(厚度0.6毫米)粘合在一起。用以上方式制成了实施例4和比较例5~6的光记录介质。
(评价)
(评价1)
通过测定使波长580nm的光线透过制成的实施例4和比较例5~6中光记录介质的色素记录层的层厚时的透过率求出的光学浓度,进行光学浓度的评价(光学浓度与色素记录层层厚之间的比例关系)。结果说明,在实施例4中,如图1B所示,从内周到外周厚度均匀,与此相比,比较例5、6中,如图2B和3B所示,内周侧较薄。特别是比较例6中,内外周的层厚差别显著。
(评价2)
利用光盘驱动装置(PULSETECH工业株式会社制造,DDU1000型),对实施例4和比较例5~6中光记录介质研究了半径24毫米、40毫米和55毫米处的记录和反射率、变调度、晃动等各种记录特性。结果示于表2之中。
表2
    不同半径(mm)处反射率(%)     不同半径(mm)处变调度   不同半径(mm)处晃动(%)
    24     40     55     24     40     55     24     40     55
实施例4     47     46     46     0.61     0.62     0.62     7.8     7.5     7.6
比较例5     48     46     45     0.57     0.61     0.61     8.2     7.4     7.5
比较例6     50     47     45     0.50     0.61     0.64     9.2     7.5     7.8
表2中数据说明,在实施例4中,不管测定位置如何都能得到几乎相同的光记录介质。与此相比,在比较例5和6中,由于色素记录层靠近内周侧较薄,所以内周侧的变调度小,晃动大。特别是在比较例6中,由于层厚在内周与外周差别大,所以记录特性的差别也显著。
根据本发明,可以提供一种能够用于制造噪声电平小、具有良好记录再生特性的光记录介质的光记录介质的制造方法。而且根据本发明还能提供一种内周侧与外周侧记录特性差别小的光记录介质及其制造方法。

Claims (12)

1.一种光记录介质的制造方法,是具有利用旋涂法在基板上喷出涂布色素溶液形成色素记录层的工序的光记录介质的制造方法,
其特征在于,所述的色素溶液从喷出开始至结束为止使基板的旋转速度处于400rpm以上。
2.根据权利要求1所述的光记录介质的制造方法,其特征在于,所述的色素溶液的色素浓度为0.2~1.2重量%。
3.一种光记录介质的制造方法,是具有利用旋涂法在基板上喷出涂布色素溶液,涂布后使之干燥形成色素记录层的工序的光记录介质的制造方法,
其特征在于,其中包括以所述的色素溶液从喷出开始至干燥结束的顺序,使基板的旋转速度比所述的色素溶液喷出开始时和喷出结束时的旋转速度低的低速旋转阶段。
4.根据权利要求3所述的光记录介质的制造方法,其特征在于,所述的低速旋转阶段从所述的色素溶液喷出结束后开始。
5.根据权利要求3所述的光记录介质的制造方法,其特征在于,所述的色素溶液浓度处于1重量%以下。
6.根据权利要求3所述的光记录介质的制造方法,其特征在于,所述的色素溶液喷出开始时基板的旋转速度处于400pm以上。
7.根据权利要求3所述的光记录介质的制造方法,其特征在于,所述的低速旋转阶段中的基板旋转速度,是比喷出开始时的旋转速度低50~400rpm的低旋转速度。
8.根据权利要求3所述的光记录介质的制造方法,其特征在于,所述的低速旋转阶段持续1~15秒钟。
9.根据权利要求3所述的光记录介质的制造方法,其特征在于,所述的低速旋转阶段结束后,将旋转速度提高到高速时的旋转速度为200~2500rpm。
10.根据权利要求3所述的光记录介质的制造方法,其特征在于,其中所述的色素溶液涂布时的温度为20~40℃。
11.根据权利要求3所述的光记录介质的制造方法,其特征在于,其中所述的色素溶液涂布时的相对湿度为20~60%RH。
12.利用权利要求3所述的光记录介质的制造方法制造的光记录介质。
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KR20040047639A (ko) 2004-06-05
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EP1424692A3 (en) 2006-12-20
CN100356469C (zh) 2007-12-19
EP1424692B1 (en) 2011-01-05
TW200501138A (en) 2005-01-01
US20040166237A1 (en) 2004-08-26

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