CN101044563A - 光学记录媒体 - Google Patents

光学记录媒体 Download PDF

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CN101044563A
CN101044563A CNA2005800357639A CN200580035763A CN101044563A CN 101044563 A CN101044563 A CN 101044563A CN A2005800357639 A CNA2005800357639 A CN A2005800357639A CN 200580035763 A CN200580035763 A CN 200580035763A CN 101044563 A CN101044563 A CN 101044563A
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layer
record medium
optical record
middle layer
substrate
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片山和俊
宇佐美由久
角田毅
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Fujifilm Corp
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Fujifilm Corp
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Abstract

本发明提供一种光学记录媒体，其在基板上至少具备含有有机色素的记录层和光透过层，其特征在于，在所述记录层和所述光透过层之间具有由含有Ta的化合物或含有Nb的化合物构成的中间层，该中间层的层厚为1～80nm。

Description

光学记录媒体
技术领域
本发明涉及一种光学记录媒体，特别是涉及一种记录层含有有机色素的追记型光学记录媒体。
背景技术
因数字高保真广播的开始，可以预示图像数据量的进一步增加，与其相伴，对记录媒体也谋求高容量、高数据传播速度(例如，参照专利文献1)。要想在家庭中录像数字高保真广播时，据说DVD±R的容量业已不足，下一代DVD的开发正在盛行。作为一例，可以将BS数字高保真广播录像·再生2小时之类的蓝光光盘记录器正在销售。
该蓝光光盘记录器用的记录媒体也同时被销售，但其是具有相变化型的记录层的媒体。在相变化型的媒体的制造中需要大规模的真空成膜装置，其层构成复杂。考虑到这一点，尽管在还含有所述蓝光光盘的下一代DVD系统中，为了更廉价地制造记录媒体，正在进行使用有有机色素的追记型蓝光光盘媒体的开发。在采用通过旋涂将有机色素成膜的方法时，有可以继续使用CD-R及DVD-R的制造中使用的制造设备的优点。
另外，其另一面，对追记型蓝光光盘媒体也谋求与现有的CD-R及DVD-R同样高的保存性。
但是，追记型蓝光光盘媒体的构成，例如，在基板上依次层叠有反射层、记录层、透明片材(光透过层)。所述透明片材通过例如粘合剂贴合。为了防止由该粘合剂对记录层的影响，通常设置中间层。考虑光学特性及成膜速度、在相变化型光盘媒体中的使用成绩等，提案有中间层使用含有硫的材料。但是，其存在的问题在于，当中间层含有硫时，该硫和构成反射层的金属(例如Ag等)反应，生成硫化物使保存性降低。因此，本发明者提案有具有基本上不含硫的中间层的光学记录媒体(特愿2004-35363号)。由此，通过抑制Ag的腐蚀，使保存性提高，收到一定以上的成果，但还有改善的余地。
另外，在现有的CD-R及DVD-R中，由于贴合没有使用粘合剂，故不需要如上所述的中间层。
专利文献1：特开平11-120617号公报
发明内容
本发明是鉴于以上的现有问题而完成的，以达到以下目的为课题。即，
本发明的目的在于，提供一种可以良好地维持抖晃等特性的保存性高的光学记录媒体。
用于解决所述课题的办法如下所述。
<1>一种光学记录媒体，其在基板上至少具备含有有机色素的记录层和光透过层，其特征在于，在所述记录层和所述光透过层之间具有由含有Ta的化合物或含有Nb的化合物构成的中间层，该中间层的厚度为1～80nm。
<2>如<1>所述的光学记录媒体，其特征在于，所述含有Ta的化合物是Ta的氧化物，所述含有Nb的化合物是Nb的氧化物。
<3>如<1>所述的光学记录媒体，其特征在于，所述中间层的层厚为1.5～20nm。
<4>如<1>所述的光学记录媒体，其特征在于，在所述基板和所述记录层之间还具有反射层。
<5>如<1>所述的光学记录媒体，其特征在于，在所述基板和所述记录层之间还具有反射层，并且，在所述基板的反射层侧的面形成槽，该槽的深度为20～70nm。
<6>一种光学记录媒体，其在基板上至少具备含有有机色素的记录层和光透过层，其特征在于，在所述记录层和所述光透过层之间具有由含有Ta及/或Nb的复合氧化物构成的中间层，该中间层的厚度为1～80nm。
<7>如<6>所述的光学记录媒体，其特征在于，所述含有Ta及/或Nb的复合氧化物是选自由Nb2O5-SiO2、Nb2O5-AL2O3、Nb2O5-Ta2O5及Ta2O5-SiO2构成的群组中的至少1种。
<8>如<6>所述的光学记录媒体，其特征在于，所述中间层的厚度为1.5～20nm。
<9>如<6>所述的光学记录媒体，其特征在于，在所述基板和所述记录层之间还具有反射层。
<10>如<6>所述的光学记录媒体，其特征在于，在所述基板和所述记录层之间还具有反射层，并且，在所述基板的反射层侧的面上形成槽，该槽的深度为20～70nm。
依据本发明，可以提供一种可以良好地维持抖晃等特性的保存性高的光学记录媒体。
具体实施方式
本发明的光学记录媒体在基板上至少具备含有有机色素的记录层和光透过层。而且，在记录层和光透过层之间，依据第1方式具有由含有Ta的化合物或含有Nb的化合物构成的中间层，依据第2方式具有由含有Ta及/或Nb的复合氧化物构成的中间层，任一种方式的所述中间层的层厚都为1～80nm。
在任一种方式中，通过设置这样的中间层，可以提高保存性、特别是湿热保存性。其原因推测如下：由于中间层自身不因水分而变质，故水分向记录层的行进因中间层的存在而停止。而且，其结果，可以一边良好地维持抖晃(jitter)等特性，一边发挥高的保存性。
在本发明的第1方式中，成为所述中间层的构成成分的含有Ta的化合物或含有Nb的化合物，可以分别列举Ta或Nb的各氧化物、氮化物，其中，优选氧化物。氧化物优选Ta2O5、Nb2Ox、NbO、TaO。
在本发明的第2方式中，成为所述中间层的构成成分的含有Ta及/或Nb的复合氧化物可以例举：Nb2O5-SiO2、Nb2O5-Al2O3、Nb2O5-Ta2O5、Ta2O5-SiO2、Ta2O5-Al2O3等，其中，优选Nb2O5-SiO2、Nb2O5-Al2O3、Nb2O5-Ta2O5、Ta2O5-SiO2。
如上所述，通过在中间层的构成成分中使用复合氧化物，可以根据使用的复合氧化物及其组成变化折射率。可以由此调节光学记录媒体的反射率。
在本发明中，在任一种方式中，将中间层的层厚设定为1～80nm，通过将中间层的层厚设定为该范围，可以谋求在形成记录时的坑时容易产生空隙、提高抖晃。如果其低于1nm，则记录层中的有机色素和粘合层的分离能不充分，当其超过80nm时，记录再生特性变差。中间层的层厚更优选设定为1～50nm，进一步优选设定为1.5～20nm。
中间层例如可以通过将含有Ta的化合物或含有Nb的化合物、或Ta的氧化物、Nb的氧化物、其它元素的氧化物作为目的物(target)的溅射进行成膜。此时，成膜时的压力优选设定为1×10-2～1×10-5torr，速度(溅射速度)优选设定为0.1～10nm/sec。气体的种类可以使用Ar等，气体流量优选设定为1～50sccm(1～50ml/min)。溅射功率优选0.2～4kW，更优选设定为0.4～3kW，进一步优选设为0.5～2.5kW。
在利用RF溅射法成膜时，调整其调谐(协调)，设定相对于FWD的REF为10％以下、优选5％以下、更优选2.5％以下。另外，氧化物及氮化物的情况，有时将这些气体混合于溅射气体中，利用反应性溅射进行成膜。
另外，利用目的物，也可以通过DC溅射进行成膜。此时，优选使脉冲溅射和利用断路器(chopper)等瞬间除去目的物的带电的方法组合在一起。
本发明的光学记录媒体的优选层构成如下：在基板上依次设置(中间层)、反射层、(中间层)、记录层、中间层、粘接层、光透过层、(硬涂层)。需要说明的是，除此之外，为了提高粘合性·记录特性·保存性等，也可以在各层之间设置其它层。另外，上述构成中，括号内所述的层是指根据需要形成的层。
在本发明的光学记录媒体中，在基板和所述记录层之间具有反射层，并且，在所述基板的反射层侧的面形成槽，该槽的深度为20～70nm，通过设定这样的构成，可以设定为蓝光光盘的构成。
在将记录磁轨(track)设定为上槽部时，槽深度优选为20～50nm，在将记录磁轨设定为内槽部时，槽深度优选为30～70nm。
下面，以上述光学记录媒体为具体例，对本发明的光学记录媒体的基板及其它层等进行说明。需要说明的是，本发明并不限定于这些。
(基板)
基板材料的具体例可以列举：玻璃；聚碳酸酯、聚甲基丙烯酸甲酯等丙烯酸树脂；聚氯乙烯、氯乙烯共聚物等氯乙烯类树脂；环氧树脂；非晶聚烯烃；聚酯；铝等金属等，可以根据需要将这些同时使用。
在上述材料中，从耐湿性、尺寸稳定性及低价格等方面来考虑，优选聚碳酸酯、非晶聚烯烃，特别优选聚碳酸酯。另外，基板的厚度(形成记录层的区域的平均厚度)优选设定为1.1±0.3mm的范围。
在基板上形成表示跟踪用的引导槽或地址信号等信息的凹凸(将基板的凸部称为在上槽上，将凹部称为在内槽。在此，“在上槽”有时也称为“槽”。)。为了达到更高的记录密度，与CD-R及DVD-R相比，优选使用形成有更窄的磁轨间距的槽的基板。
槽的磁轨间距优选为300～360nm的范围。更优选为310～340nm的范围。
另外，槽的深度(槽深)优选为20～70nm的范围。在记录磁轨为上槽部时，槽深度优选为20～50nm，在记录磁轨为内槽部时，槽深度优选为30～70nm。通过设定为所述的范围，跟踪(tracking)错误信号减小，可以防止跟踪变难，同时可以防止成形变难。在记录磁轨为上槽部时，更优选为25～40nm，在记录磁轨为内槽部时，更优选为35～60nm。为25～40nm。
基板的记录的磁轨部分的半值宽度优选50～200nm的范围。通过设定为所述的范围，可以防止跟踪错误，同时可以降低抖晃。更优选为70～190nm的范围，进一步优选90～180nm。
需要说明的是，在设置后述的反射层的侧的基板表面上，为了改善平面性，提高粘合力，可以形成下涂层。
该下涂层的材料可以列举例如：聚甲基丙烯酸甲酯、丙烯酸·甲基丙烯酸共聚物、苯乙烯·马来酸酐共聚物、聚乙烯醇、N-羟甲基丙烯酰胺、苯乙烯·乙烯基甲苯共聚物、氯磺化聚乙烯、硝基纤维素、聚氯乙烯、氯化聚烯烃、聚酯、聚酰亚胺、醋酸乙烯酯·氯乙烯共聚物、乙烯·醋酸乙烯酯共聚物、聚乙烯、聚丙烯、聚碳酸酯等高分子物质；硅烷耦合剂等表面改性剂。
下涂层可以通过如下方法来形成：将上述材料溶解或分散于适当的溶剂而配制成涂敷液后，将该涂敷液利用旋压涂敷、浸渍涂敷、挤压涂敷等涂敷法涂敷于基板表面。下涂层的厚度一般为0.005～20μm的范围，优选为0.01～10μm的范围。
(反射层)
在反射层中，使用相对于激光的反射率高的光反射性物质。该反射率优选为70％以上。
反射率高的光反射性物质可以列举Mg、Se、Y、Ti、Zr、Hf、V、Nb、Ta、Cr、Mo、W、Mn、Re、Fe、Co、Ni、Ru、Rh、Pd、Ir、Pt、Cu、Ag、Au、Zn、Cd、Al、Ga、In、Si、Ge、Te、Pb、Po、Sn、Bi等金属及准金属或不锈钢。这些光反射性物质可以单独使用，或可以两种以上的组合，或可以作为合金使用。其中优选的物质是Cr、Ni、Pt、Cu、Ag、Au、Al及不锈钢。特别优选Au、Ag、Al或它们的合金，最优选Ag或以Ag为主要成分的合金(Ag：50质量％以上)。
例如，可以通过将上述光反射性物质蒸镀、溅射或离子电镀，在基板上形成反射层。反射层的层厚一般为10～300nm的范围，优选50～200nm的范围。
(记录层)
记录层是在反射层上形成的、可以利用波长为500nm以下的激光进行信息记录的层，是含有有机色素的色素型。
所述有机色素的具体例例如有：赛安宁(cyanine)色素、尿囊黄醇(オキソノ一ル)色素、金属配位化合物类色素、偶氮色素及酞菁(phthalocyanine)色素等。
另外，有机色素适合使用特开平4-74690号公报、特开平8-127174号公报、同11-53758号公报、同11-334204号公报、同11-334205号公报、同11-334206号公报、同11-334207号公报、特开2000-43423号公报、同2000-108513号公报及同2000-158818号公报等所述的色素。
而且，三唑化合物、三嗪化合物、赛安宁化合物、份菁化合物、氨基丁二烯化合物、酞菁化合物、肉桂酸化合物、氧化还原化合物、偶氮化合物、赛安宁苯并噁唑化合物、苯并三唑化合物等有机化合物也适合用作记录层原材料。在这些化合物中，特别优选赛安宁化合物、氨基丁二烯化合物、苯并三唑化合物、酞菁化合物。
将作为有机色素的记录物质与粘合剂等一同溶解于适当的溶剂，配制涂敷液，然后，将该涂敷液涂敷于在基板表面形成的反射层上，形成涂膜后，进行干燥，由此形成记录层。涂敷液中的记录物质的浓度一般为0.01～15质量％的范围，优选0.1～10质量％的范围，更优选0.5～5质量％的范围，最优选0.5～3质量％的范围。
涂敷液的溶剂可以列举：醋酸丁酯、乳酸乙酯、溶纤剂乙酸酯等酯；丁酮、环己酮、甲基异丁基甲酮等酮；二氯甲烷、1，2-二氯乙烷、氯仿等氯化烃；二甲基甲酰胺等酰胺；甲基环己烷等烃；四氢呋喃、乙醚、二噁烷等醚；乙醇、正丙醇、异丙醇、正丁醇二丙酮醇等醇；2，2，3，3-四氟丙醇等氟系溶剂；乙二醇一甲醚、乙二醇一乙醚、丙二醇一甲醚等二醇醚类等。
考虑使用的记录物质的溶解性，上述溶剂可以单独或将两种以上组合在一起使用。在涂敷液中，还可以根据目的进一步添加抗氧化剂、UV吸收剂、增塑剂、润滑剂等各种添加剂。
在使用粘合剂时，粘合剂的实例可以列举：明胶、纤维素衍生物、葡聚糖、松香、橡胶等天然有机高分子物质；聚乙烯、聚丙烯、聚苯乙烯、聚异丁烯等烃系树脂、聚氯乙烯、聚偏氯乙烯、聚氯乙烯·聚醋酸乙烯酯共聚物等乙烯基系树脂、聚丙烯酸甲酯、聚甲基丙烯酸甲酯等丙烯酸树脂、聚乙烯醇、氯化聚乙烯、环氧树脂、丁缩醛树脂、橡胶衍生物、苯酚·甲醛树脂等热固性树脂的初期缩合物等合成有机高分子。在作为记录层的材料并用粘合剂时，粘合剂的使用量一般相对于记录物质在0.01倍量～50倍量(质量比)的范围，优选在0.1倍量～5倍量(质量比)的范围。这样配制的涂敷液中的记录物质的浓度一般在0.01～10质量％的范围，优选位于0.1～5质量％的范围。
涂敷方法可以列举喷雾法、旋涂法、浸渍法、辊涂法、刮刀涂敷法、刮刀辊法、丝网印刷法等。记录层可以是单层，也可以是双层。另外，记录层的层厚一般在20～500nm的范围，优选在30～300nm的范围，更优选位于50～100nm的范围。
在记录层中，为了提高该记录层的耐光性，可以使其含有各种褪色抑制剂。
褪色抑制剂一般使用单态氧骤冷剂(クエンチヤ一)。单态氧骤冷剂可以利用已经公知的专利说明书等刊物所述的骤冷剂。
其具体例可以列举：特开昭58-175693号公报、同59-81194号公报、同60-18387号公报、同60-19586号公报、同60-19587号公报、同60-35054号公报、同60-36190号公报、同60-36191号公报、同60-44554号公报、同60-44555号公报、同60-44389号公报、同60-44390号公报、同60-54892号公报、同60-47069号公报、同63-209995号公报、特开平4-25492号公报、特公平1-38680号公报及同6-26028号公报等各公报、德国专利350399号说明书、而且日本化学会杂志1992年10月号第1141页等所述的单态氧骤冷剂。
所述单态氧骤冷剂等褪色抑制剂的使用量相对于有机色素的量通常为0.1～50质量％的范围，优选0.5～45质量％的范围，进一步优选3～40质量％的范围，特别优选5～25质量％的范围。
(中间层)
中间层是使用已述的材料利用已述的方法在记录层上形成的。需要说明的是，中间层必须在记录层和光透过层之间形成，除此之外，也可以在“基板和反射层之间”及“反射层和记录层之间”的至少任一处中形成。
(光透过层)
光透过层是为了防止光学记录媒体内部受污染、伤害及冲击等、或为了防止水分的侵入等而形成的。其材料只要是透明的材质就没有特别限定，但优选可以列举由聚碳酸酯、三醋酸纤维素等构成的透明片材，在至少一个面上赋予了粘合剂的材质。
需要说明的是，所谓“透明”，是指透过记录光和再生光(透过率：90％以上)那样的透明。
在透明片材的赋予了粘合剂的面的相反面上，为了防止透明片材受伤，可以形成硬涂层。在记录层上形成所述的透明片材，优选如下进行。
首先，在卷绕成滚筒状的透明片材的一个面上连续地涂敷放射线固化树脂涂敷液。对利用涂敷形成的涂膜连续地照射放射线，使其固化，在透明片材上设置硬涂层。然后，在透明片材的另一个面上连续地设置由粘合剂构成的粘合层，将设置有硬涂层及粘合层的透明片材冲切成规定的形状(盘状)。将该盘状的透明片材的粘合层作为贴合面，在记录层上设置该透明片材，形成光透过层。需要说明的是，透明片材的贴合方法等仅仅是例示，可以应用各种方法。
透明片材的厚度优选为0.03～0.15mm的范围，更优选为0.05～0.12mm的范围。通过设定为这样的范围，具有操作容易、且可以抑制彗差(コマ収差)之类的优点。
粘合剂可以使用丙烯酸类、橡胶类、硅类的粘合剂，但从透明性、耐久性的观点来考虑，优选丙烯酸类的粘合剂。所述的丙烯酸类的粘合剂以丙烯酸2-乙基己酯、丙烯酸正丁酯等为主要成分，为了提高凝聚力，优选使用将短链的丙烯酸烷基酯及甲基丙烯酸酯进行共聚而成的物质，例如：能成为丙烯酸甲酯、丙烯酸乙酯、甲基丙烯酸甲酯和交联剂的交联点的丙烯酸、甲基丙烯酸、丙烯酰胺衍生物、马来酸、丙烯酸羟乙酯、丙烯酸缩水甘油酯等。通过适当调节主要成分、短链成分和用于附加交联点的成分的混合比率、种类，可以改变玻璃化温度(Tg)及交联密度。需要说明的是，也可以使用预先赋予了粘合剂的市售的透明片材。
另外，在硬涂层中使用的放射线固化树脂，只要是利用放射线照射可以固化的树脂即可，更详细地来讲，优选在分子中具有2个以上的放射线官能性的双键的树脂。
例如有：丙烯酸酯类、丙烯酰胺类、甲基丙烯酸酯类、甲基丙烯酸酰胺类、烯丙基化合物、乙烯醚类、乙烯酯类等。其中，优选2官能以上的丙烯酸酯化合物、甲基丙烯酸酯化合物。
下面，对本发明的光学记录媒体的信息记录方法及记录的信息的再生方法进行说明。
例如，向光学记录媒体记录信息，可以如下进行。
首先，一边以恒定线速度使光学记录媒体旋转，一边从透明片材侧(基板的相反侧)照射记录用的350～500nm(优选400～440nm)的激光。通过该激光的照射，记录层吸收该光局部温度上升，产生物理性或化学性变化(例如凹坑的形成)，改变其光学特性。利用该光学特性的变化记录信息。
具有350～500nm的振动波长的激光光源，例如可以列举：具有390～415nm的范围的振荡波长的蓝紫色半导体激光、中心振荡波长约430nm的蓝紫色SHG激光等。
另外，为了提高记录密度，优选在拾波器中使用的物镜的开口率(NA)为0.7以上，更优选为0.80以上。
另一方面，记录好的信息的再生可以通过如下方法进行：一边以与上述相同的恒定线速度使光学记录媒体旋转，一边从透明片材侧照射与在信息的记录中使用的激光相同波长或其以下的波长的激光，检测其反射光。
实施例
下面，利用实施例进一步详细地说明本发明，但本发明并不限定于下面的实施例。
[实施例1]
使用帝人化成(株)社制聚碳酸酯树脂(パンライトAD5503)，通过注塑成形为厚1.1mm的基板。基板的槽磁轨间距为320nm，上槽部的半值宽度为120nm，槽深度为35nm。
在该基板上使用由Ag：98.4at％、Nd：0.7at％、Cu：0.9at％构成的目的物，利用真空成膜法以100nm的厚度将反射层进行成膜。在投入功率为2kW、Ar流量为5sccm下进行。
称量下述化学式表示的有机色素A(折射率＝1.85)，以使其相对于TFP100ml为2g的比率，使其溶解。对该液照射2小时超声波，使色素溶解后，在23℃、50％的环境静置0.5小时以上，用0.2μm的过滤器进行过滤。使用该液用旋涂法在反射层上形成厚度为110nm的记录层。然后，在80℃的纯净炉中进行加热处理1小时。
[化1]
Figure A20058003576300131
有机色素A
在加热处理后，利用真空成膜法使用由Ta2O5构成的目的物成膜10nm厚的中间层。投入功率为2kW、Ar流量为50sccm，将RF的调谐进行最适化的结果，相对于FWD＝1000，REF＝20。另外，中间层的折射率为2.0。
在形成中间层后，在另一个面上使形成有厚20μm的粘合层的聚碳酸酯薄膜(厚度80μm)贴合，制作光学记录媒体。
将制作好的光学记录媒体固定在装载有波长为403nm、NA＝0.85的激光光学系统的DDU-1000(バルステツク工业(株)制)上，将以5.5mW的功率1-7调制好的无规信号(2T～8T)进行记录，以0.35mW的功率再生，评价抖晃。此时，线速度为5.28m/s，将记录时的激光的发光图案进行最佳化。使用普通平衡器测定抖晃。将结果示于下述表1。
另外，将制作好的光学记录媒体在60℃90％RH的环境中保存168小时后，在与保存前相同的条件下测定记录终结磁轨的抖晃，与保存前的抖晃进行比较(保存抖晃(archival jitter)变化)。将结果示于下述表1。
而且，在保存后，相对于新型未记录磁轨与保存前同样地评价抖晃，与保存前的抖晃进行比较(壳抖晃变化)。
以保存前后的抖晃的增加为5％以下为○、以其以上为×，判断保存性。
[实施例2]
在中间层形成时，使用由Nb2O4.83构成的目的物，除此之外，与实施例1同样操作，制作实施例2的光学记录媒体，进行评价。将结果示于下述表1。需要说明的是，中间层的折射率为2.1。
[实施例3]
在中间层形成时，使用由Nb2O4.83构成的目的物，及将层厚设定为50nm，除此之外，与实施例1同样操作，制作实施例3的光学记录媒体，进行评价。将结果示于下述表1。需要说明的是，中间层的折射率为2.1。
[实施例4]
在中间层形成时，使用由Nb2O4.83构成的目的物，及将层厚设定为70nm，除此之外，与实施例1同样操作，制作实施例4的光学记录媒体，进行评价。将结果示于下述表1。需要说明的是，中间层的折射率为2.1。
[实施例5]
在中间层形成时，使用由Nb2O4.83构成的目的物，及将层厚设定为1.5nm，除此之外，与实施例1同样操作，制作实施例5的光学记录媒体，进行评价。将结果示于下述表1。需要说明的是，中间层的折射率为2.1。
[实施例6]
在中间层形成时，使用由Nb2O5：70at％、SiO2：30at％构成的目的物，除此之外，与实施例1同样操作，制作实施例6的光学记录媒体，进行评价。将结果示于下述表1。需要说明的是，中间层的折射率为2。
[实施例7]
在中间层形成时，使用由Nb2O5：30at％、SiO2：70at％构成的目的物，除此之外，与实施例1同样操作，制作实施例7的光学记录媒体，进行评价。将结果示于下述表1。需要说明的是，中间层的折射率为1.8。
[实施例8]
在中间层形成时，使用由Nb2O5：70at％、Al2O3：30at％构成的目的物，除此之外，与实施例1同样操作，制作实施例8的光学记录媒体，进行评价。将结果示于下述表1。需要说明的是，中间层的折射率为2。
[实施例9]
在中间层形成时，使用由Nb2O5：50at％、Ta2O5：50at％构成的目的物，除此之外，与实施例1同样操作，制作实施例9的光学记录媒体，进行评价。将结果示于下述表1。需要说明的是，中间层的折射率为2.1。
[实施例10]
在中间层形成时，使用由Ta2O5：70at％、SiO2：30at％构成的目的物，除此之外，与实施例1同样操作，制作实施例10的光学记录媒体，进行评价。将结果示于下述表1。需要说明的是，中间层的折射率为2。
[比较例1]
在中间层形成时，使用由ZnO：30at％、Ga2O3：70at％构成的目的物，除此之外，与实施例1同样操作，制作比较例1的光学记录媒体，进行评价。将结果示于下述表1。需要说明的是，中间层的折射率为1.8。
[比较例2]
在中间层形成时，使用由Nb2O4.83构成的目的物，及将层厚设定为100nm，除此之外，与实施例1同样操作，制作比较例2的光学记录媒体，进行评价。需要说明的是，中间层的折射率为2.1。
[比较例3]
在中间层形成时，使用由Nb2O4.83构成的目的物，及将层厚设定为0.9nm，除此之外，与实施例1同样操作，制作比较例3的光学记录媒体，进行评价。需要说明的是，中间层的折射率为2.1。
[表1]
中间层的材质 层厚 折射率   保存前记录保存前评价   保存前记录保存后评价   保存后记录保存后评价   判断
实施例1     Ta2O5   10nm   2.0   12.5％   12.9％   14.3％   ○
实施例2     Nb2O4.83   10nm   2.1   12.9％   13.0％   13.6％   ○
实施例3     Nb2O4.83   50nm   2.1   16.5％   16.4％   16.8％   ○
实施例4     Nb2O4.83   70nm   2.1   17.1％   17.1％   17.3％   ○
实施例5     Nb2O4.83   1.5nm   2.1   15.1％   16.5％   17.2％   ○
实施例6     Nb2O5-SiO2(7∶3)   10nm   2   13.4％   13.6％   14％   ○
实施例7     Nb2O5-SiO2(3.7)   10nm   1.8   13.9％   14.3％   14.4％   ○
实施例8     Nb2O5-Al2O3(7∶3)   10nm   2   14％   14％   14.6％   ○
实施例9     Nb2O5-Ta2O5(5∶5)   10nm   2.1   16.1％   16％   16.9％   ○
实施例10     Ta2O5-SiO2(7∶3)   10nm   2   13.5％   13.7％   14.2％   ○
比较例1     ZnO-Ga2O3   10nm   1.8   11.1％   11.4％   19.3％   ×
比较例2     Nb2O4.83   100nm   2.1   不能测定   -   不能测定   ×
比较例3     Nb2O4.83   0.9nm   2.1   17.3％   18.5％   不能测定   ×
由表1可知，实施例1～10的光学记录媒体在保存前后抖晃都没有显著的差别，其保存性优良。相对于此，比较例1～3的光学记录媒体在保存前后的抖晃变化大或不能测定。
 权利要求书
(按照条约第19条的修改)
1.一种光学记录媒体，其在基板上至少具备含有有机色素的记录层和光透过层，其特征在于，
在所述记录层和所述光透过层之间，具有由含有Ta的化合物或含有Nb的化合物构成的中间层，该中间层的层厚为1～80nm。
2.如权利要求1所述的光学记录媒体，其特征在于，所述含有Ta的化合物是Ta的氧化物，所述含有Nb的化合物是Nb的氧化物。
3.(修改后)如权利要求2所述的光学记录媒体，其特征在于，所述Ta的氧化物是Ta2O5，所述Nb的氧化物是Nb2O4.83。
4.(修改后)如权利要求1所述的光学记录媒体，其特征在于，所述中间层的层厚为1.5～20nm。
5.(修改后)如权利要求1所述的光学记录媒体，其特征在于，在所述基板和所述记录层之间还具有反射层。
6.(修改后)如权利要求1所述的光学记录媒体，其特征在于，在所述基板和所述记录层之间还具有反射层，并且，在所述基板的反射层侧的面形成有槽，该槽的深度为20～70nm。
7.(修改后)一种光学记录媒体，其在基板上至少具备含有有机色素的记录层和光透过层，其特征在于，
在所述记录层和所述光透过层之间，具有由含有Ta及/或Nb的复合氧化物构成的中间层，该中间层的层厚为1～80nm。
8.(修改后)如权利要求7所述的光学记录媒体，其特征在于，所述含有Ta及/或Nb的复合氧化物是选自由Nb2O5-SiO2、Nb2O5-Al2O3、Nb2O5-Ta2O5及Ta2O5-SiO2构成的群组中的至少1种。
9.(修改后)如权利要求7所述的光学记录媒体，其特征在于，所述中间层的层厚为1.5～20nm。
10.(修改后)如权利要求7所述的光学记录媒体，其特征在于，在所述基板和所述记录层之间还具有反射层。
11.(追加)如权利要求7所述的光学记录媒体，其特征在于，在所述基板和所述记录层之间还具有反射层，并且，在所述基板的反射层侧的面形成有槽，该槽的深度为20～70nm。
12.(追加)如权利要求7所述的光学记录媒体，其特征在于，所述有机色素是选自由赛安宁色素、尿囊黄醇色素、金属配位化合物类色素、偶氮色素及酞菁色素构成的群组中的至少1种。

Claims (10)

1.一种光学记录媒体，其在基板上至少具备含有有机色素的记录层和光透过层，其特征在于，
在所述记录层和所述光透过层之间，具有由含有Ta的化合物或含有Nb的化合物构成的中间层，该中间层的层厚为1～80nm。
2.如权利要求l所述的光学记录媒体，其特征在于，所述含有Ta的化合物是Ta的氧化物，所述含有Nb的化合物是Nb的氧化物。
3.如权利要求1所述的光学记录媒体，其特征在于，所述中间层的层厚为1.5～20nm。
4.如权利要求1所述的光学记录媒体，其特征在于，在所述基板和所述记录层之间还具有反射层。
5.如权利要求1所述的光学记录媒体，其特征在于，在所述基板和所述记录层之间还具有反射层，并且，在所述基板的反射层侧的面形成有槽，该槽的深度为20～70nm。
6.一种光学记录媒体，其在基板上至少具备含有有机色素的记录层和光透过层，其特征在于，
在所述记录层和所述光透过层之间，具有由含有Ta及/或Nb的复合氧化物构成的中间层，该中间层的层厚为1～80nm。
7.如权利要求6所述的光学记录媒体，其特征在于，
所述含有Ta及/或Nb的复合氧化物是选自由Nb2O5-SiO2、Nb2O5-Al2O3、Nb2O5-Ta2O5及Ta2O5-SiO2构成的群组中的至少1种。
8.如权利要求6所述的光学记录媒体，其特征在于，所述中间层的层厚为1.5～20nm。
9.如权利要求6所述的光学记录媒体，其特征在于，在所述基板和所述记录层之间还具有反射层。
10.如权利要求6所述的光学记录媒体，其特征在于，
在所述基板和所述记录层之间还具有反射层，并且，在所述基板的反射层侧的面形成有槽，该槽的深度为20～70nm。
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