CN1499992A - 含水镀液的脱气方法 - Google Patents

含水镀液的脱气方法 Download PDF

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Publication number
CN1499992A
CN1499992A CNA028075315A CN02807531A CN1499992A CN 1499992 A CN1499992 A CN 1499992A CN A028075315 A CNA028075315 A CN A028075315A CN 02807531 A CN02807531 A CN 02807531A CN 1499992 A CN1499992 A CN 1499992A
Authority
CN
China
Prior art keywords
solution
shell
degasser
composition
fiber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CNA028075315A
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English (en)
Chinese (zh)
Inventor
ƽ
拜平·帕雷赫
萨克塞斯·利
吴群伟
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Entegris Inc
Original Assignee
Mykrolis Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mykrolis Corp filed Critical Mykrolis Corp
Publication of CN1499992A publication Critical patent/CN1499992A/zh
Pending legal-status Critical Current

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D19/00—Degasification of liquids
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D19/00—Degasification of liquids
    • B01D19/0031—Degasification of liquids by filtration
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D19/00—Degasification of liquids
    • B01D19/0068—General arrangements, e.g. flowsheets
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D63/00—Apparatus in general for separation processes using semi-permeable membranes
    • B01D63/02—Hollow fibre modules
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
    • B01D71/06—Organic material
    • B01D71/30—Polyalkenyl halides
    • B01D71/32—Polyalkenyl halides containing fluorine atoms
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/12—Process control or regulation
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/38—Electroplating: Baths therefor from solutions of copper

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Automation & Control Theory (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)
  • Degasification And Air Bubble Elimination (AREA)
CNA028075315A 2001-02-07 2002-01-31 含水镀液的脱气方法 Pending CN1499992A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US26729501P 2001-02-07 2001-02-07
US60/267,295 2001-02-07

Publications (1)

Publication Number Publication Date
CN1499992A true CN1499992A (zh) 2004-05-26

Family

ID=23018184

Family Applications (1)

Application Number Title Priority Date Filing Date
CNA028075315A Pending CN1499992A (zh) 2001-02-07 2002-01-31 含水镀液的脱气方法

Country Status (7)

Country Link
US (1) US7014679B2 (cg-RX-API-DMAC10.html)
EP (1) EP1357989A4 (cg-RX-API-DMAC10.html)
JP (1) JP2004531640A (cg-RX-API-DMAC10.html)
KR (1) KR100824910B1 (cg-RX-API-DMAC10.html)
CN (1) CN1499992A (cg-RX-API-DMAC10.html)
TW (1) TW593783B (cg-RX-API-DMAC10.html)
WO (1) WO2002062446A1 (cg-RX-API-DMAC10.html)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102400196A (zh) * 2010-09-09 2012-04-04 诺发系统有限公司 在穿硅通孔镀敷中减少副产品
CN106145231A (zh) * 2015-03-24 2016-11-23 通用电气公司 用于除氧的装置和方法
US9816196B2 (en) 2012-04-27 2017-11-14 Novellus Systems, Inc. Method and apparatus for electroplating semiconductor wafer when controlling cations in electrolyte
US9816193B2 (en) 2011-01-07 2017-11-14 Novellus Systems, Inc. Configuration and method of operation of an electrodeposition system for improved process stability and performance
CN107427743A (zh) * 2015-03-31 2017-12-01 株式会社杰希优 处理液的脱气判定方法
CN108754605A (zh) * 2018-06-22 2018-11-06 东北大学 水溶液电解质中电沉积定向生长金属单晶体的装置和方法

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KR100824910B1 (ko) 2001-02-07 2008-04-23 엔테그리스, 아이엔씨. 수성 도금액의 탈기 방법
JP4173306B2 (ja) * 2001-11-30 2008-10-29 東京エレクトロン株式会社 信頼性評価試験装置、信頼性評価試験システム及び信頼性評価試験方法
US7189146B2 (en) * 2003-03-27 2007-03-13 Asm Nutool, Inc. Method for reduction of defects in wet processed layers
US6939392B2 (en) 2003-04-04 2005-09-06 United Technologies Corporation System and method for thermal management
JP2006524133A (ja) * 2003-04-22 2006-10-26 インテグリス・インコーポレーテッド 気体移送薄膜をもたらすためのプリ−ツ形構造
US7393388B2 (en) 2005-05-13 2008-07-01 United Technologies Corporation Spiral wound fuel stabilization unit for fuel de-oxygenation
US7435283B2 (en) * 2005-05-18 2008-10-14 United Technologies Corporation Modular fuel stabilization system
US7377112B2 (en) 2005-06-22 2008-05-27 United Technologies Corporation Fuel deoxygenation for improved combustion performance
US7632338B2 (en) * 2006-10-05 2009-12-15 United Technologies Corporation Electrochemical oxygen pump for fuel stabilization unit
US8962085B2 (en) 2009-06-17 2015-02-24 Novellus Systems, Inc. Wetting pretreatment for enhanced damascene metal filling
US9455139B2 (en) 2009-06-17 2016-09-27 Novellus Systems, Inc. Methods and apparatus for wetting pretreatment for through resist metal plating
US9677188B2 (en) 2009-06-17 2017-06-13 Novellus Systems, Inc. Electrofill vacuum plating cell
US9138784B1 (en) 2009-12-18 2015-09-22 Novellus Systems, Inc. Deionized water conditioning system and methods
KR102113883B1 (ko) * 2012-03-13 2020-05-22 노벨러스 시스템즈, 인코포레이티드 관통 레지스트 금속 도금을 위한 웨팅 전처리의 방법들 및 장치
US9613833B2 (en) 2013-02-20 2017-04-04 Novellus Systems, Inc. Methods and apparatus for wetting pretreatment for through resist metal plating
TWI517935B (zh) * 2013-04-16 2016-01-21 國立台灣科技大學 氣體添加硏磨液的供應系統及其方法
US9435049B2 (en) 2013-11-20 2016-09-06 Lam Research Corporation Alkaline pretreatment for electroplating
US9481942B2 (en) 2015-02-03 2016-11-01 Lam Research Corporation Geometry and process optimization for ultra-high RPM plating
US9617648B2 (en) 2015-03-04 2017-04-11 Lam Research Corporation Pretreatment of nickel and cobalt liners for electrodeposition of copper into through silicon vias
US10527011B2 (en) * 2017-06-06 2020-01-07 Hamilton Sundstrand Corporation Sonication-assisted fuel deoxygenation
TWI774797B (zh) * 2017-07-10 2022-08-21 美商應用材料股份有限公司 具有減少的夾帶空氣的電鍍系統
JP7588959B2 (ja) * 2020-02-27 2024-11-25 日東電工株式会社 エマルションの製造方法および製造装置
KR102468371B1 (ko) * 2021-01-29 2022-11-18 (주) 테크윈 수전해 장치
CN115867696A (zh) * 2021-04-15 2023-03-28 朗姆研究公司 对电镀浴中溶解气体浓度的控制

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DE3822093C2 (de) * 1987-06-30 1997-11-06 Fuji Photo Film Co Ltd Verfahren zur Entgasung und Entschäumung einer lichtempfindlichen Überzugslösung und Vorrichtung zur Durchführung dieses Verfahrens
US4869732A (en) * 1988-12-23 1989-09-26 Texaco Inc. Deoxygenation of aqueous polymer solutions used in enhanced oil recovery processes
US5584914A (en) * 1992-08-07 1996-12-17 Miura Co., Ltd Membrane deaerator apparatus
US5266639A (en) * 1992-08-28 1993-11-30 E. I. Du Pont De Nemours And Company Low-melting tetrafluorethylene copolymer and its uses
US5383483A (en) * 1992-10-14 1995-01-24 Shibano; Yoshihide Ultrasonic cleaning and deburring apparatus
US5762684A (en) * 1995-11-30 1998-06-09 Dainippon Screen Mfg. Co., Ltd. Treating liquid supplying method and apparatus
JPH09162118A (ja) * 1995-12-11 1997-06-20 Dainippon Screen Mfg Co Ltd 基板用処理液の脱気装置
JP2969075B2 (ja) * 1996-02-26 1999-11-02 ジャパンゴアテックス株式会社 脱気装置
US5695545A (en) * 1996-05-10 1997-12-09 Hoechst Celanese Corporation Degassing liquids: apparatus and method
US6001189A (en) * 1996-09-30 1999-12-14 Micron Technology, Inc. Method for reducing gaseous species of contamination in wet processes
US6171367B1 (en) * 1997-06-05 2001-01-09 Taiwan Semiconductor Manufacturing Co., Ltd Method and apparatus for delivering and recycling a bubble-free liquid chemical
TW522455B (en) * 1998-11-09 2003-03-01 Ebara Corp Plating method and apparatus therefor
JP2000176261A (ja) * 1998-12-11 2000-06-27 Fuji Photo Film Co Ltd 水系塗工液の脱気方法
ES2267508T3 (es) * 1999-01-29 2007-03-16 Entegris, Inc. Membranas de fibra hueca envueltas y metodo de fabricacion.
JP2001073182A (ja) * 1999-07-15 2001-03-21 Boc Group Inc:The 改良された酸性銅電気メッキ用溶液
US6391209B1 (en) * 1999-08-04 2002-05-21 Mykrolis Corporation Regeneration of plating baths
US6217634B1 (en) * 1999-08-27 2001-04-17 Electric Power Research Institute, Inc. Apparatus and method for monitoring and purifying dielectric fluids
JP4384762B2 (ja) * 1999-12-07 2009-12-16 日本パイオニクス株式会社 液体原料の供給システム及び供給方法
KR100824910B1 (ko) 2001-02-07 2008-04-23 엔테그리스, 아이엔씨. 수성 도금액의 탈기 방법
US20040026255A1 (en) * 2002-08-06 2004-02-12 Applied Materials, Inc Insoluble anode loop in copper electrodeposition cell for interconnect formation

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102400196A (zh) * 2010-09-09 2012-04-04 诺发系统有限公司 在穿硅通孔镀敷中减少副产品
US9816193B2 (en) 2011-01-07 2017-11-14 Novellus Systems, Inc. Configuration and method of operation of an electrodeposition system for improved process stability and performance
US10745817B2 (en) 2011-01-07 2020-08-18 Novellus Systems, Inc. Configuration and method of operation of an electrodeposition system for improved process stability and performance
US9816196B2 (en) 2012-04-27 2017-11-14 Novellus Systems, Inc. Method and apparatus for electroplating semiconductor wafer when controlling cations in electrolyte
CN106145231A (zh) * 2015-03-24 2016-11-23 通用电气公司 用于除氧的装置和方法
CN107427743A (zh) * 2015-03-31 2017-12-01 株式会社杰希优 处理液的脱气判定方法
CN108754605A (zh) * 2018-06-22 2018-11-06 东北大学 水溶液电解质中电沉积定向生长金属单晶体的装置和方法

Also Published As

Publication number Publication date
WO2002062446A1 (en) 2002-08-15
US7014679B2 (en) 2006-03-21
KR20040020882A (ko) 2004-03-09
KR100824910B1 (ko) 2008-04-23
US20040060436A1 (en) 2004-04-01
TW593783B (en) 2004-06-21
EP1357989A4 (en) 2005-05-18
JP2004531640A (ja) 2004-10-14
EP1357989A1 (en) 2003-11-05

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