CN1313884C - 光刻术的方法和装置 - Google Patents

光刻术的方法和装置 Download PDF

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Publication number
CN1313884C
CN1313884C CNB03809147XA CN03809147A CN1313884C CN 1313884 C CN1313884 C CN 1313884C CN B03809147X A CNB03809147X A CN B03809147XA CN 03809147 A CN03809147 A CN 03809147A CN 1313884 C CN1313884 C CN 1313884C
Authority
CN
China
Prior art keywords
exposure
groove
substrate
lithographic
axle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CNB03809147XA
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English (en)
Chinese (zh)
Other versions
CN1646993A (zh
Inventor
伦纳特·奥尔森
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Obducat AB
Original Assignee
Obducat AB
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from SE0201242A external-priority patent/SE522183C2/sv
Application filed by Obducat AB filed Critical Obducat AB
Publication of CN1646993A publication Critical patent/CN1646993A/zh
Application granted granted Critical
Publication of CN1313884C publication Critical patent/CN1313884C/zh
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B11/00—Recording on or reproducing from the same record carrier wherein for these two operations the methods are covered by different main groups of groups G11B3/00 - G11B7/00 or by different subgroups of group G11B9/00; Record carriers therefor
    • G11B11/10—Recording on or reproducing from the same record carrier wherein for these two operations the methods are covered by different main groups of groups G11B3/00 - G11B7/00 or by different subgroups of group G11B9/00; Record carriers therefor using recording by magnetic means or other means for magnetisation or demagnetisation of a record carrier, e.g. light induced spin magnetisation; Demagnetisation by thermal or stress means in the presence or not of an orienting magnetic field
    • G11B11/105—Recording on or reproducing from the same record carrier wherein for these two operations the methods are covered by different main groups of groups G11B3/00 - G11B7/00 or by different subgroups of group G11B9/00; Record carriers therefor using recording by magnetic means or other means for magnetisation or demagnetisation of a record carrier, e.g. light induced spin magnetisation; Demagnetisation by thermal or stress means in the presence or not of an orienting magnetic field using a beam of light or a magnetic field for recording by change of magnetisation and a beam of light for reproducing, i.e. magneto-optical, e.g. light-induced thermomagnetic recording, spin magnetisation recording, Kerr or Faraday effect reproducing
    • G11B11/10582—Record carriers characterised by the selection of the material or by the structure or form
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/8404—Processes or apparatus specially adapted for manufacturing record carriers manufacturing base layers
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/855—Coating only part of a support with a magnetic layer
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
    • G11B7/261—Preparing a master, e.g. exposing photoresist, electroforming
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2059—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a scanning corpuscular radiation beam, e.g. an electron beam

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Manufacturing Optical Record Carriers (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
CNB03809147XA 2002-04-24 2003-04-24 光刻术的方法和装置 Expired - Fee Related CN1313884C (zh)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
SE0201242A SE522183C2 (sv) 2002-04-24 2002-04-24 Förfarande, anordning och datorprogramprodukt för litografi
SE02012425 2002-04-24
US37504702P 2002-04-25 2002-04-25
US60/375,047 2002-04-25
PCT/SE2003/000654 WO2003091805A1 (en) 2002-04-24 2003-04-24 Method, device and computer program product for lithography

Publications (2)

Publication Number Publication Date
CN1646993A CN1646993A (zh) 2005-07-27
CN1313884C true CN1313884C (zh) 2007-05-02

Family

ID=29272466

Family Applications (1)

Application Number Title Priority Date Filing Date
CNB03809147XA Expired - Fee Related CN1313884C (zh) 2002-04-24 2003-04-24 光刻术的方法和装置

Country Status (6)

Country Link
US (1) US7468784B2 (enExample)
EP (1) EP1497698A1 (enExample)
JP (2) JP2005524104A (enExample)
CN (1) CN1313884C (enExample)
AU (1) AU2003224565A1 (enExample)
WO (1) WO2003091805A1 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006070555A1 (ja) * 2004-12-28 2006-07-06 Pioneer Corporation ビーム記録方法及び装置
JP4542953B2 (ja) 2005-06-10 2010-09-15 株式会社東芝 磁気ディスク媒体および磁気記録再生装置
JP4746677B2 (ja) * 2006-11-06 2011-08-10 パイオニア株式会社 ディスク原盤製造方法
WO2010013348A1 (ja) * 2008-08-01 2010-02-04 パイオニア株式会社 電子ビーム記録装置及びその制御装置並びに制御方法
JP5191542B2 (ja) 2008-08-01 2013-05-08 パイオニア株式会社 電子ビーム記録装置及びその制御装置並びに制御方法
JP5059231B2 (ja) 2010-05-18 2012-10-24 オリンパスメディカルシステムズ株式会社 医療装置
DE102017110241A1 (de) * 2017-05-11 2018-11-15 Nanoscribe Gmbh Verfahren zum Erzeugen einer 3D-Struktur mittels Laserlithographie sowie Computerprogrammprodukt

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0448735A1 (en) * 1990-03-23 1991-10-02 Ushio Denki Kabushiki Kaisha Method of exposing a peripheral part of wafer
CN1166688A (zh) * 1996-03-19 1997-12-03 三星电管株式会社 用于无荧光体吸收膜的阴极射线管的屏盘曝光装置
US5854671A (en) * 1993-05-28 1998-12-29 Nikon Corporation Scanning exposure method and apparatus therefor and a projection exposure apparatus and method which selectively chooses between static exposure and scanning exposure

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61160929A (ja) * 1985-01-09 1986-07-21 Toshiba Corp 荷電ビ−ム露光方法
JPH01214120A (ja) * 1988-02-23 1989-08-28 Nippon Telegr & Teleph Corp <Ntt> パタン形成方法
US5040165A (en) * 1988-03-03 1991-08-13 Hitachi Maxell, Ltd. Optical information recording medium and method of fabricating the same
JPH0239515A (ja) * 1988-07-29 1990-02-08 Fujitsu Ltd 荷電ビーム露光方法
JPH0298848A (ja) * 1988-10-04 1990-04-11 Fuji Photo Film Co Ltd 情報記録媒体の製造方法
US6252845B1 (en) * 1997-08-05 2001-06-26 Matsushita Electric Industrial Co., Ltd. High density optical disk, apparatus for reproducing optical disk and method for producing optical disk master
JPH1186346A (ja) * 1997-09-09 1999-03-30 Sony Corp 光ディスク、光ディスクの製造方法及び光ディスク原盤の製造方法
TW449672B (en) 1997-12-25 2001-08-11 Nippon Kogaku Kk Process and apparatus for manufacturing photomask and method of manufacturing the same
US5981962A (en) * 1998-01-09 1999-11-09 International Business Machines Corporation Distributed direct write lithography system using multiple variable shaped electron beams
JP2000011464A (ja) * 1998-06-29 2000-01-14 Fujitsu Ltd 電子ビーム照射方法及び装置
US6694503B2 (en) * 2000-02-03 2004-02-17 Gakkohojin Ritsumeikan Processing device and method of processing material with ultraviolet light or light of shorter wavelength than ultraviolet light
JP2001236646A (ja) * 2000-02-22 2001-08-31 Pioneer Electronic Corp 情報記録装置ならびに情報記録方法
JP2002116531A (ja) * 2000-10-11 2002-04-19 Hitachi Ltd マスクの製造方法
US7914711B2 (en) * 2002-01-24 2011-03-29 Dphi Acquisitions, Inc. Use of mother stamper for optical disk molding

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0448735A1 (en) * 1990-03-23 1991-10-02 Ushio Denki Kabushiki Kaisha Method of exposing a peripheral part of wafer
US5854671A (en) * 1993-05-28 1998-12-29 Nikon Corporation Scanning exposure method and apparatus therefor and a projection exposure apparatus and method which selectively chooses between static exposure and scanning exposure
CN1166688A (zh) * 1996-03-19 1997-12-03 三星电管株式会社 用于无荧光体吸收膜的阴极射线管的屏盘曝光装置

Also Published As

Publication number Publication date
EP1497698A1 (en) 2005-01-19
AU2003224565A1 (en) 2003-11-10
US20050174556A1 (en) 2005-08-11
JP2011095754A (ja) 2011-05-12
WO2003091805A1 (en) 2003-11-06
US7468784B2 (en) 2008-12-23
JP5248574B2 (ja) 2013-07-31
CN1646993A (zh) 2005-07-27
JP2005524104A (ja) 2005-08-11

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Granted publication date: 20070502

Termination date: 20120424