CN1294455C - 成像设备 - Google Patents

成像设备 Download PDF

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Publication number
CN1294455C
CN1294455C CNB028235606A CN02823560A CN1294455C CN 1294455 C CN1294455 C CN 1294455C CN B028235606 A CNB028235606 A CN B028235606A CN 02823560 A CN02823560 A CN 02823560A CN 1294455 C CN1294455 C CN 1294455C
Authority
CN
China
Prior art keywords
radiation
substrate
image
image detection
patterned beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CNB028235606A
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English (en)
Chinese (zh)
Other versions
CN1596387A (zh
Inventor
K·D·范德马斯特
A·J·布利克
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Netherlands BV
Original Assignee
ASML Netherlands BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML Netherlands BV filed Critical ASML Netherlands BV
Publication of CN1596387A publication Critical patent/CN1596387A/zh
Application granted granted Critical
Publication of CN1294455C publication Critical patent/CN1294455C/zh
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/70516—Calibration of components of the microlithographic apparatus, e.g. light sources, addressable masks or detectors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Length Measuring Devices By Optical Means (AREA)
CNB028235606A 2001-11-27 2002-11-27 成像设备 Expired - Fee Related CN1294455C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP01204567 2001-11-27
EP01204567.0 2001-11-27

Publications (2)

Publication Number Publication Date
CN1596387A CN1596387A (zh) 2005-03-16
CN1294455C true CN1294455C (zh) 2007-01-10

Family

ID=8181314

Family Applications (1)

Application Number Title Priority Date Filing Date
CNB028235606A Expired - Fee Related CN1294455C (zh) 2001-11-27 2002-11-27 成像设备

Country Status (7)

Country Link
US (1) US7379579B2 (https=)
EP (1) EP1449032B1 (https=)
JP (1) JP4290553B2 (https=)
KR (1) KR100674245B1 (https=)
CN (1) CN1294455C (https=)
DE (1) DE60230663D1 (https=)
WO (1) WO2003046662A1 (https=)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1324138A3 (en) * 2001-12-28 2007-12-19 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
JP4929444B2 (ja) * 2004-09-27 2012-05-09 国立大学法人東北大学 パターン描画装置および方法
US7177012B2 (en) * 2004-10-18 2007-02-13 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7403865B2 (en) * 2004-12-28 2008-07-22 Asml Netherlands B.V. System and method for fault indication on a substrate in maskless applications
US7233384B2 (en) * 2005-06-13 2007-06-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method, and device manufactured thereby for calibrating an imaging system with a sensor
KR20080103564A (ko) * 2006-02-16 2008-11-27 가부시키가이샤 니콘 노광 장치, 노광 방법 및 디바이스 제조 방법
US9645502B2 (en) * 2011-04-08 2017-05-09 Asml Netherlands B.V. Lithographic apparatus, programmable patterning device and lithographic method
DE102011076083A1 (de) 2011-05-18 2012-11-22 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Projektionsdisplay und Verfahren zum Anzeigen eines Gesamtbildes für Projektionsfreiformflächen oder verkippte Projektionsflächen
JP6676942B2 (ja) * 2015-12-01 2020-04-08 株式会社ニコン 制御装置及び制御方法、露光装置及び露光方法、デバイス製造方法、データ生成方法、並びに、プログラム
TWI724642B (zh) * 2019-11-20 2021-04-11 墨子光電有限公司 微製像設備及其加工方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2049964A (en) * 1979-05-01 1980-12-31 Agfa Gevaert Nv Simultaneously projecting two images of a subject in register
WO1992011567A1 (en) * 1990-12-21 1992-07-09 Eastman Kodak Company Method and apparatus for selectively varying the exposure of a photosensitive medium
US5142132A (en) * 1990-11-05 1992-08-25 Litel Instruments Adaptive optic wafer stepper illumination system
EP0552953A1 (en) * 1992-01-21 1993-07-28 Hughes Aircraft Company Apparatus and method for micropatterning surfaces
US6278514B1 (en) * 1998-12-28 2001-08-21 Canon Kabushiki Kaisha Exposure apparatus

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3406677A1 (de) * 1984-02-24 1985-09-05 Fa. Carl Zeiss, 7920 Heidenheim Einrichtung zur kompensation der auswanderung eines laserstrahls
JP2501436B2 (ja) * 1986-10-31 1996-05-29 富士通株式会社 パタ−ンデ−タ検査装置
JP2796316B2 (ja) * 1988-10-24 1998-09-10 株式会社日立製作所 欠陥または異物の検査方法およびその装置
JPH03265815A (ja) * 1990-03-16 1991-11-26 Kobe Steel Ltd レーザビームによる描画装置
US5229889A (en) * 1991-12-10 1993-07-20 Hughes Aircraft Company Simple adaptive optical system
JP2710527B2 (ja) * 1992-10-21 1998-02-10 大日本スクリーン製造株式会社 周期性パターンの検査装置
JPH06250108A (ja) * 1993-02-22 1994-09-09 Hitachi Ltd 補償光学装置とこれを用いた天体望遠鏡，光データリンク，レーザ加工機
JPH088161A (ja) * 1994-06-20 1996-01-12 Mitsubishi Electric Corp 転写シミュレータ装置
WO1997034171A2 (en) * 1996-02-28 1997-09-18 Johnson Kenneth C Microlens scanner for microlithography and wide-field confocal microscopy
JPH10177589A (ja) * 1996-12-18 1998-06-30 Mitsubishi Electric Corp パターン比較検証装置、パターン比較検証方法およびパターン比較検証プログラムを記録した媒体
JP4159139B2 (ja) * 1998-05-14 2008-10-01 リコーマイクロエレクトロニクス株式会社 光像形成装置、光加工装置並びに露光装置
SE519397C2 (sv) * 1998-12-16 2003-02-25 Micronic Laser Systems Ab System och metod för mikrolitografiskt ritande av högprecisionsmönster
TWI282909B (en) * 1999-12-23 2007-06-21 Asml Netherlands Bv Lithographic apparatus and a method for manufacturing a device
JP2001255664A (ja) * 2000-03-14 2001-09-21 Fuji Photo Film Co Ltd 画像露光方法
JP4364459B2 (ja) * 2000-12-07 2009-11-18 富士通株式会社 光信号交換器の制御装置および制御方法
JP2002367900A (ja) * 2001-06-12 2002-12-20 Yaskawa Electric Corp 露光装置および露光方法
CN1582407A (zh) * 2001-09-12 2005-02-16 麦克罗尼克激光系统公司 使用空间光调制器的改进方法和装置

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2049964A (en) * 1979-05-01 1980-12-31 Agfa Gevaert Nv Simultaneously projecting two images of a subject in register
US5142132A (en) * 1990-11-05 1992-08-25 Litel Instruments Adaptive optic wafer stepper illumination system
WO1992011567A1 (en) * 1990-12-21 1992-07-09 Eastman Kodak Company Method and apparatus for selectively varying the exposure of a photosensitive medium
EP0552953A1 (en) * 1992-01-21 1993-07-28 Hughes Aircraft Company Apparatus and method for micropatterning surfaces
US6278514B1 (en) * 1998-12-28 2001-08-21 Canon Kabushiki Kaisha Exposure apparatus

Also Published As

Publication number Publication date
CN1596387A (zh) 2005-03-16
US7379579B2 (en) 2008-05-27
WO2003046662A1 (en) 2003-06-05
EP1449032A1 (en) 2004-08-25
JP4290553B2 (ja) 2009-07-08
DE60230663D1 (de) 2009-02-12
KR100674245B1 (ko) 2007-01-25
US20050062948A1 (en) 2005-03-24
JP2005510860A (ja) 2005-04-21
KR20040054804A (ko) 2004-06-25
EP1449032B1 (en) 2008-12-31

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Termination date: 20171127