CN1253485C - 聚合物组合物及其用途 - Google Patents

聚合物组合物及其用途 Download PDF

Info

Publication number
CN1253485C
CN1253485C CNB028190815A CN02819081A CN1253485C CN 1253485 C CN1253485 C CN 1253485C CN B028190815 A CNB028190815 A CN B028190815A CN 02819081 A CN02819081 A CN 02819081A CN 1253485 C CN1253485 C CN 1253485C
Authority
CN
China
Prior art keywords
polymkeric substance
group
alkyl
monomer
acid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CNB028190815A
Other languages
English (en)
Chinese (zh)
Other versions
CN1561355A (zh
Inventor
L·F·罗德斯
R·维卡里
L·J·兰格斯多弗
A·A·索比克
E·P·博伊德
B·本乃特
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Bakelite Co Ltd
Original Assignee
Sumitomo Bakelite Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Bakelite Co Ltd filed Critical Sumitomo Bakelite Co Ltd
Publication of CN1561355A publication Critical patent/CN1561355A/zh
Application granted granted Critical
Publication of CN1253485C publication Critical patent/CN1253485C/zh
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • C08G61/02—Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes
    • C08G61/04—Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes only aliphatic carbon atoms
    • C08G61/06—Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes only aliphatic carbon atoms prepared by ring-opening of carbocyclic compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • C08G61/12—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G03F7/0395—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having a backbone with alicyclic moieties
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G03F7/0397—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having an alicyclic moiety in a side chain

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
CNB028190815A 2001-12-12 2002-12-12 聚合物组合物及其用途 Expired - Fee Related CN1253485C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US34052601P 2001-12-12 2001-12-12
US60/340,526 2001-12-12

Related Child Applications (1)

Application Number Title Priority Date Filing Date
CNB2005101269054A Division CN100413898C (zh) 2001-12-12 2002-12-12 聚合物组合物及其用途

Publications (2)

Publication Number Publication Date
CN1561355A CN1561355A (zh) 2005-01-05
CN1253485C true CN1253485C (zh) 2006-04-26

Family

ID=23333763

Family Applications (2)

Application Number Title Priority Date Filing Date
CNB2005101269054A Expired - Fee Related CN100413898C (zh) 2001-12-12 2002-12-12 聚合物组合物及其用途
CNB028190815A Expired - Fee Related CN1253485C (zh) 2001-12-12 2002-12-12 聚合物组合物及其用途

Family Applications Before (1)

Application Number Title Priority Date Filing Date
CNB2005101269054A Expired - Fee Related CN100413898C (zh) 2001-12-12 2002-12-12 聚合物组合物及其用途

Country Status (9)

Country Link
US (2) US6949609B2 (OSRAM)
EP (1) EP1461373B1 (OSRAM)
JP (1) JP4389158B2 (OSRAM)
KR (1) KR100880313B1 (OSRAM)
CN (2) CN100413898C (OSRAM)
AT (1) ATE354599T1 (OSRAM)
AU (1) AU2002358247A1 (OSRAM)
DE (1) DE60218342T2 (OSRAM)
WO (1) WO2003050158A1 (OSRAM)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7442487B2 (en) * 2003-12-30 2008-10-28 Intel Corporation Low outgassing and non-crosslinking series of polymers for EUV negative tone photoresists
US7101654B2 (en) * 2004-01-14 2006-09-05 Promerus Llc Norbornene-type monomers and polymers containing pendent lactone or sultone groups
US20050192409A1 (en) * 2004-02-13 2005-09-01 Rhodes Larry F. Polymers of polycyclic olefins having a polyhedral oligosilsesquioxane pendant group and uses thereof
DE602005011017D1 (de) * 2004-07-07 2008-12-24 Promerus Llc Lichtempfindliche dielektrische harzzusammensetzungen und ihre verwendungen
JP2006100563A (ja) * 2004-09-29 2006-04-13 Sumitomo Bakelite Co Ltd 半導体装置
JP5017793B2 (ja) * 2005-04-06 2012-09-05 Ｊｓｒ株式会社 環状オレフィン系付加重合体の製造方法
JP2006321912A (ja) * 2005-05-19 2006-11-30 Jsr Corp 環状オレフィン系付加重合体の製造方法
JP2007002082A (ja) * 2005-06-23 2007-01-11 Jsr Corp 環状オレフィン系付加重合体の製造方法
JP2007009044A (ja) * 2005-06-30 2007-01-18 Jsr Corp 環状オレフィン付加重合体の製造方法および環状オレフィン付加重合体
JP4956956B2 (ja) * 2005-10-12 2012-06-20 Ｊｓｒ株式会社 水素化触媒および水素化重合体の製造方法
JP4826242B2 (ja) * 2005-12-12 2011-11-30 Ｊｓｒ株式会社 環状オレフィン系付加重合体の製造方法
ES2708852T3 (es) * 2007-06-07 2019-04-11 Albemarle Corp Aductos, aductos y oligómeros, o aductos, oligómeros y polímeros de bajo peso molecular, y su preparación
EP2072536A1 (en) * 2007-12-17 2009-06-24 Lanxess Inc. Hydrogenation of diene-based polymers
JP2009256468A (ja) * 2008-04-16 2009-11-05 Asahi Glass Co Ltd 含フッ素重合体の製造方法
JP5051185B2 (ja) * 2009-06-16 2012-10-17 住友ベークライト株式会社 半導体装置および樹脂組成物
JP6210986B2 (ja) 2011-09-07 2017-10-11 マイクロケム コーポレイション 低表面エネルギー基板上にレリーフパターンを製作するためのエポキシ配合物及び方法
US11635688B2 (en) * 2012-03-08 2023-04-25 Kayaku Advanced Materials, Inc. Photoimageable compositions and processes for fabrication of relief patterns on low surface energy substrates
US8846295B2 (en) 2012-04-27 2014-09-30 International Business Machines Corporation Photoresist composition containing a protected hydroxyl group for negative development and pattern forming method using thereof
KR102373812B1 (ko) * 2014-03-12 2022-03-11 메르크 파텐트 게엠베하 유기 전자 조성물 및 이의 장치

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4491628A (en) 1982-08-23 1985-01-01 International Business Machines Corporation Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone
GB9120773D0 (en) * 1991-10-01 1991-11-13 Ici Plc Modified olefin polymers
US5372912A (en) 1992-12-31 1994-12-13 International Business Machines Corporation Radiation-sensitive resist composition and process for its use
US5468819A (en) 1993-11-16 1995-11-21 The B.F. Goodrich Company Process for making polymers containing a norbornene repeating unit by addition polymerization using an organo (nickel or palladium) complex
US6294616B1 (en) * 1995-05-25 2001-09-25 B. F. Goodrich Company Blends and alloys of polycyclic polymers
JP3804138B2 (ja) 1996-02-09 2006-08-02 Ｊｓｒ株式会社 ＡｒＦエキシマレーザー照射用感放射線性樹脂組成物
RU2194295C2 (ru) * 1996-03-07 2002-12-10 З Би. Эф. Гудрич Кампэни Фоторезистная композиция и полимер
US6294615B1 (en) * 1997-12-08 2001-09-25 Tosch Corporation Copolymer, cationic high molecular weight flocculating agent comprising the copolymer, and process for producing the copolymer

Also Published As

Publication number Publication date
KR20040065209A (ko) 2004-07-21
JP2005511833A (ja) 2005-04-28
DE60218342T2 (de) 2007-10-31
DE60218342D1 (de) 2007-04-05
US6949609B2 (en) 2005-09-27
CN100413898C (zh) 2008-08-27
JP4389158B2 (ja) 2009-12-24
KR100880313B1 (ko) 2009-01-28
HK1071385A1 (en) 2005-07-15
US7612146B2 (en) 2009-11-03
EP1461373B1 (en) 2007-02-21
EP1461373A1 (en) 2004-09-29
ATE354599T1 (de) 2007-03-15
AU2002358247A1 (en) 2003-06-23
US20030176583A1 (en) 2003-09-18
CN1789300A (zh) 2006-06-21
WO2003050158A1 (en) 2003-06-19
US20060025540A1 (en) 2006-02-02
CN1561355A (zh) 2005-01-05

Similar Documents

Publication Publication Date Title
CN1253485C (zh) 聚合物组合物及其用途
CN1249105C (zh) 环烯烃聚合催化剂及聚合方法
CN1198181C (zh) 包括具有酸不稳定侧基的多环聚合物的光刻胶组合物
CN1251021C (zh) 含包括酸不稳定侧基的多环聚合物的光刻胶组合物
CN1777624A (zh) 用非烯烃链转移剂制备的乙烯基加成多环烯烃聚合物及其用途
CN1148396C (zh) 包含具有酸不稳定侧基的多环聚合物的光刻胶组合物
CN1208360C (zh) 使用10族金属配合物进行降冰片烯型单体的模内加成聚合
CN1267460C (zh) 催化组合物、其制备方法、聚合体系和制备加聚物的方法
CN1210317C (zh) 含有官能取代基的多环烯烃的加聚物
CN1555387A (zh) 制造光学波导管的聚合物组合物、由此制造的光学波导管及制造此波导管的方法
CN1092212C (zh) 可聚合组合物,交联聚合物的制备方法和可交联聚合物
CN1092213C (zh) 可聚合组合物,交联聚合物的制备方法和可交联聚合物
CN1185164A (zh) 可阳离子聚合的单体的均聚物和共聚物及其制备方法
CN1177346A (zh) 含有碳氟化合物阴离子的可用能量活化的盐
CN1585781A (zh) 制备含有酯或乙酰功能基团的降冰片烯基加成聚合物的方法
CN1891721A (zh) 催化组合物及其制备，以及在从烯键式不饱和单体制备聚合物中的应用
CN1715300A (zh) 催化组合物及其制备和在由烯不饱和单体制备聚合物中的应用
CN1737015A (zh) 催化组合物及其制备，以及在从烯键不饱和单体制备聚合物中的应用
HK1071385B (en) Polymeric compositions and uses therefor
HK1030992B (en) Photoresist compositions comprising polycyclic polymers with acid labile pendant groups
HK1035545B (en) Catalyst and methods for polymerizing cycloolefins
CN101031595A (zh) 用于环烯烃潜聚合的单组分阳离子钯前引发剂
HK1030425B (en) Photoresist compositions comprising polycyclic polymers with acid labile pendant groups
HK1106256A (en) Single component cationic palladium proinitiators for the latent polymerization of cycloolefins
CN1902515A (zh) 光波导及其形成方法

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
REG Reference to a national code

Ref country code: HK

Ref legal event code: DE

Ref document number: 1071385

Country of ref document: HK

C14 Grant of patent or utility model
GR01 Patent grant
C17 Cessation of patent right
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20060426

Termination date: 20131212