CN1211818A - 用于光刻法的孔装置及其制造方法 - Google Patents
用于光刻法的孔装置及其制造方法 Download PDFInfo
- Publication number
- CN1211818A CN1211818A CN98117900A CN98117900A CN1211818A CN 1211818 A CN1211818 A CN 1211818A CN 98117900 A CN98117900 A CN 98117900A CN 98117900 A CN98117900 A CN 98117900A CN 1211818 A CN1211818 A CN 1211818A
- Authority
- CN
- China
- Prior art keywords
- hole
- anchor clamps
- groove
- opening
- adhesive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/09—Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/04—Means for controlling the discharge
- H01J2237/045—Diaphragms
- H01J2237/0451—Diaphragms with fixed aperture
- H01J2237/0453—Diaphragms with fixed aperture multiple apertures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/317—Processing objects on a microscale
- H01J2237/3175—Lithography
- H01J2237/31793—Problems associated with lithography
- H01J2237/31794—Problems associated with lithography affecting masks
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Electron Beam Exposure (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
Description
Claims (7)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP238155/1997 | 1997-09-03 | ||
JP238155/97 | 1997-09-03 | ||
JP23815597A JP3168952B2 (ja) | 1997-09-03 | 1997-09-03 | 電子ビーム描画用アパーチャ装置とその製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1211818A true CN1211818A (zh) | 1999-03-24 |
CN1129172C CN1129172C (zh) | 2003-11-26 |
Family
ID=17026017
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN98117900A Expired - Fee Related CN1129172C (zh) | 1997-09-03 | 1998-09-03 | 用于光刻法的孔装置及其制造方法 |
Country Status (5)
Country | Link |
---|---|
US (1) | US6198109B1 (zh) |
JP (1) | JP3168952B2 (zh) |
KR (1) | KR100309300B1 (zh) |
CN (1) | CN1129172C (zh) |
TW (1) | TW405173B (zh) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5310660B2 (ja) * | 2010-07-01 | 2013-10-09 | 富士電機株式会社 | 半導体装置 |
JP6819509B2 (ja) * | 2017-08-10 | 2021-01-27 | 株式会社ニューフレアテクノロジー | マルチ荷電粒子ビーム描画装置 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4254174A (en) * | 1979-03-29 | 1981-03-03 | Massachusetts Institute Of Technology | Supported membrane composite structure and its method of manufacture |
JPH0650719B2 (ja) | 1985-03-29 | 1994-06-29 | キヤノン株式会社 | リソグラフイ−用マスク構造体 |
DE3524196C3 (de) | 1984-07-06 | 1994-08-04 | Canon Kk | Lithografiemaske |
US4800458A (en) * | 1985-09-24 | 1989-01-24 | Fuji Photo Film Co., Ltd. | Recording sheet bonded to a substrate in a magnetic disk |
ATA331185A (de) * | 1985-11-13 | 1994-05-15 | Ims Ionen Mikrofab Syst | Verfahren zum stabilisieren von masken |
EP0244496B1 (de) * | 1986-05-06 | 1991-01-16 | Ibm Deutschland Gmbh | Maske für die Ionen-, Elektronen- oder Röntgenstrahllithographie und Verfahren zur ihrer Herstellung |
US5258091A (en) * | 1990-09-18 | 1993-11-02 | Sumitomo Electric Industries, Ltd. | Method of producing X-ray window |
JPH0992610A (ja) | 1995-09-28 | 1997-04-04 | Nec Corp | 荷電ビーム描画装置 |
-
1997
- 1997-09-03 JP JP23815597A patent/JP3168952B2/ja not_active Expired - Fee Related
-
1998
- 1998-09-03 TW TW087114794A patent/TW405173B/zh not_active IP Right Cessation
- 1998-09-03 US US09/146,531 patent/US6198109B1/en not_active Expired - Fee Related
- 1998-09-03 CN CN98117900A patent/CN1129172C/zh not_active Expired - Fee Related
- 1998-09-03 KR KR1019980036297A patent/KR100309300B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
JP3168952B2 (ja) | 2001-05-21 |
TW405173B (en) | 2000-09-11 |
US6198109B1 (en) | 2001-03-06 |
KR100309300B1 (ko) | 2001-11-22 |
CN1129172C (zh) | 2003-11-26 |
JPH1187211A (ja) | 1999-03-30 |
KR19990029500A (ko) | 1999-04-26 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C06 | Publication | ||
PB01 | Publication | ||
ASS | Succession or assignment of patent right |
Owner name: NEC ELECTRONICS TAIWAN LTD. Free format text: FORMER OWNER: NIPPON ELECTRIC CO., LTD. Effective date: 20030604 |
|
C41 | Transfer of patent application or patent right or utility model | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20030604 Address after: Kanagawa, Japan Applicant after: NEC Corp. Address before: Tokyo, Japan Applicant before: NEC Corp. |
|
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
C19 | Lapse of patent right due to non-payment of the annual fee | ||
CF01 | Termination of patent right due to non-payment of annual fee | ||
REG | Reference to a national code |
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