CN119403843A - 聚合物及其制造方法、感光性树脂组合物、固化物、以及单体化合物及其制造方法 - Google Patents

聚合物及其制造方法、感光性树脂组合物、固化物、以及单体化合物及其制造方法 Download PDF

Info

Publication number
CN119403843A
CN119403843A CN202380048853.XA CN202380048853A CN119403843A CN 119403843 A CN119403843 A CN 119403843A CN 202380048853 A CN202380048853 A CN 202380048853A CN 119403843 A CN119403843 A CN 119403843A
Authority
CN
China
Prior art keywords
group
polymer
acid
parts
meth
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202380048853.XA
Other languages
English (en)
Chinese (zh)
Inventor
寺田拓真
松浦洋树
游佐真一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Shokubai Co Ltd
Original Assignee
Nippon Shokubai Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Shokubai Co Ltd filed Critical Nippon Shokubai Co Ltd
Publication of CN119403843A publication Critical patent/CN119403843A/zh
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C67/00—Preparation of carboxylic acid esters
    • C07C67/04—Preparation of carboxylic acid esters by reacting carboxylic acids or symmetrical anhydrides onto unsaturated carbon-to-carbon bonds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C67/00—Preparation of carboxylic acid esters
    • C07C67/28—Preparation of carboxylic acid esters by modifying the hydroxylic moiety of the ester, such modification not being an introduction of an ester group
    • C07C67/293—Preparation of carboxylic acid esters by modifying the hydroxylic moiety of the ester, such modification not being an introduction of an ester group by isomerisation; by change of size of the carbon skeleton
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C67/00—Preparation of carboxylic acid esters
    • C07C67/30—Preparation of carboxylic acid esters by modifying the acid moiety of the ester, such modification not being an introduction of an ester group
    • C07C67/333—Preparation of carboxylic acid esters by modifying the acid moiety of the ester, such modification not being an introduction of an ester group by isomerisation; by change of size of the carbon skeleton
    • C07C67/343—Preparation of carboxylic acid esters by modifying the acid moiety of the ester, such modification not being an introduction of an ester group by isomerisation; by change of size of the carbon skeleton by increase in the number of carbon atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/52—Esters of acyclic unsaturated carboxylic acids having the esterified carboxyl group bound to an acyclic carbon atom
    • C07C69/533—Monocarboxylic acid esters having only one carbon-to-carbon double bond
    • C07C69/54—Acrylic acid esters; Methacrylic acid esters
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C08F20/26—Esters containing oxygen in addition to the carboxy oxygen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C08F20/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F20/28—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F265/00—Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00
    • C08F265/04—Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00 on to polymers of esters
    • C08F265/06—Polymerisation of acrylate or methacrylate esters on to polymers thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/08—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated side groups
    • C08F290/12—Polymers provided for in subclasses C08C or C08F
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/08—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated side groups
    • C08F290/12—Polymers provided for in subclasses C08C or C08F
    • C08F290/126—Polymers of unsaturated carboxylic acids or derivatives thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
CN202380048853.XA 2022-06-23 2023-06-19 聚合物及其制造方法、感光性树脂组合物、固化物、以及单体化合物及其制造方法 Pending CN119403843A (zh)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
JP2022101303 2022-06-23
JP2022-101303 2022-06-23
JP2022-179571 2022-11-09
JP2022179571 2022-11-09
JP2023063643 2023-04-10
JP2023-063643 2023-04-10
PCT/JP2023/022596 WO2023248976A1 (ja) 2022-06-23 2023-06-19 重合体及びその製造方法、感光性樹脂組成物、硬化物、並びに、単量体化合物及びその製造方法

Publications (1)

Publication Number Publication Date
CN119403843A true CN119403843A (zh) 2025-02-07

Family

ID=89379982

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202380048853.XA Pending CN119403843A (zh) 2022-06-23 2023-06-19 聚合物及其制造方法、感光性树脂组合物、固化物、以及单体化合物及其制造方法

Country Status (5)

Country Link
JP (1) JPWO2023248976A1 (https=)
KR (1) KR20250007561A (https=)
CN (1) CN119403843A (https=)
TW (1) TW202413484A (https=)
WO (1) WO2023248976A1 (https=)

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06306251A (ja) * 1993-02-25 1994-11-01 Dainippon Ink & Chem Inc 水性用樹脂組成物
JP3994486B2 (ja) * 1997-04-14 2007-10-17 住友化学株式会社 化学増幅型ポジ型レジスト組成物およびそのための共重合体
JP4790153B2 (ja) 2000-09-01 2011-10-12 富士通株式会社 ネガ型レジスト組成物、レジストパターンの形成方法及び電子デバイスの製造方法
EP1308434B1 (en) * 2001-11-01 2006-03-15 Nippon Shokubai Co., Ltd. (Meth)acryloyl group-containing compound and method for producing the same
JP3892294B2 (ja) 2001-12-26 2007-03-14 株式会社日本触媒 光硬化性組成物
JP4851140B2 (ja) * 2005-08-09 2012-01-11 三菱レイヨン株式会社 （メタ）アクリル酸エステル、重合体、レジスト組成物、およびパターンが形成された基板の製造方法
JP2008088368A (ja) * 2006-10-04 2008-04-17 Canon Inc 高分子化合物を含有する組成物の製造方法、組成物、及び液体付与方法
JP4957497B2 (ja) * 2007-02-08 2012-06-20 日油株式会社 ポリヘミアセタールエステル、硬化樹脂用組成物及び硬化樹脂の分解方法
WO2009070172A1 (en) * 2007-11-30 2009-06-04 Henkel Ag & Co. Kgaa Curable resins containing acetal, ketal, acetal ester, or ketal ester linkages
JP5517860B2 (ja) * 2009-10-16 2014-06-11 富士フイルム株式会社 感光性樹脂組成物、硬化膜の形成方法、硬化膜、有機ｅｌ表示装置、及び、液晶表示装置
JP5678820B2 (ja) * 2011-06-30 2015-03-04 三菱レイヨン株式会社 多官能（メタ）アクリル酸エステルの製造方法
JP6498518B2 (ja) * 2015-05-12 2019-04-10 株式会社クラレ ブロック共重合体ならびにその製造方法および用途
JP6783605B2 (ja) * 2016-09-27 2020-11-11 株式会社日本触媒 樹脂組成物
JP7255335B2 (ja) * 2018-06-05 2023-04-11 東洋インキＳｃホールディングス株式会社 近赤外線吸収性組成物および近赤外線カットフィルタ

Also Published As

Publication number Publication date
KR20250007561A (ko) 2025-01-14
TW202413484A (zh) 2024-04-01
WO2023248976A1 (ja) 2023-12-28
JPWO2023248976A1 (https=) 2023-12-28

Similar Documents

Publication Publication Date Title
JP7175346B2 (ja) 感光性樹脂組成物、硬化膜、有機ｅｌ素子における発光層の区画用のバンク、有機ｅｌ素子用の基板、有機ｅｌ素子、硬化膜の製造方法、バンクの製造方法、及び有機ｅｌ素子の製造方法
CN107315318B (zh) 感光性组合物
KR101963931B1 (ko) 흑색 감광성 수지 조성물, 이를 이용한 블랙매트릭스 및 이를 구비한 화상 표시 장치
JP6404557B2 (ja) 硬化性樹脂組成物
JP7716466B2 (ja) 共重合体、共重合体溶液、感光性樹脂組成物、硬化物、共重合体の製造方法、及び、共重合体溶液の製造方法
CN107003604B (zh) 感光性树脂组成物、彩色滤光片的制造方法、彩色滤光片以及液晶显示装置
JP6785122B2 (ja) 感光性組成物、及び硬化膜の形成方法
TWI663475B (zh) Curable resin composition and color filter
CN109471330A (zh) 感光性组合物和其中使用的光聚合引发剂
CN119403843A (zh) 聚合物及其制造方法、感光性树脂组合物、固化物、以及单体化合物及其制造方法
JP7688727B2 (ja) アルカリ可溶性樹脂、感光性樹脂組成物及びその硬化物
JP2025127347A (ja) 重合体、重合体組成物、樹脂組成物、硬化物、重合体の保存方法、及び、重合体組成物の保存方法
JP2023075463A (ja) 共重合体、共重合体溶液、感光性樹脂組成物、硬化物、共重合体の製造方法
JP7449153B2 (ja) 熱硬化性樹脂、その製造方法、及び、硬化性樹脂組成物
JP6825870B2 (ja) 感光性樹脂組成物、硬化膜、カラーフィルタ、及び硬化膜の製造方法
CN104871044B (zh) 彩色滤光片、黑色矩阵、或电路形成用固化性树脂组合物
CN111542554B (zh) 聚合物、固化性树脂组合物及其用途
JP7764151B2 (ja) 硬化性樹脂組成物、感光性樹脂組成物、硬化物、及び硬化性樹脂組成物の製造方法
WO2024203692A1 (ja) レジスト用重合体、感光性樹脂組成物、層間絶縁膜、及び、重合体の製造方法
CN120188110A (zh) 感光性树脂组合物、固化物、以及间隔壁
KR20250022137A (ko) 감광성 수지 조성물, 수지 경화막 및 화상 표시 소자
KR20160044204A (ko) 옥심 에스테르계 화합물 및 이를 포함하는 광중합성 조성물
TW202428629A (zh) 共聚物及感光性樹脂組成物
CN118742581A (zh) 聚合物及其感光性树脂组合物
JP2023049678A (ja) 感光性樹脂組成物、及び、その用途

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination