CN119306932A - 树脂组合物、膜、滤光器、固体摄像元件、图像显示装置、树脂及化合物 - Google Patents
树脂组合物、膜、滤光器、固体摄像元件、图像显示装置、树脂及化合物 Download PDFInfo
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- CN119306932A CN119306932A CN202411425699.6A CN202411425699A CN119306932A CN 119306932 A CN119306932 A CN 119306932A CN 202411425699 A CN202411425699 A CN 202411425699A CN 119306932 A CN119306932 A CN 119306932A
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G63/00—Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
- C08G63/91—Polymers modified by chemical after-treatment
- C08G63/912—Polymers modified by chemical after-treatment derived from hydroxycarboxylic acids
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/22—Absorbing filters
- G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/38—Polymerisation using regulators, e.g. chain terminating agents, e.g. telomerisation
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/12—Esters of monohydric alcohols or phenols
- C08F220/14—Methyl esters, e.g. methyl (meth)acrylate
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/12—Esters of monohydric alcohols or phenols
- C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
- C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
- C08F220/1804—C4-(meth)acrylate, e.g. butyl (meth)acrylate, isobutyl (meth)acrylate or tert-butyl (meth)acrylate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
- C08F8/34—Introducing sulfur atoms or sulfur-containing groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1003—Preparatory processes
- C08G73/1007—Preparatory processes from tetracarboxylic acids or derivatives and diamines
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1067—Wholly aromatic polyimides, i.e. having both tetracarboxylic and diamino moieties aromatically bound
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L79/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
- C08L79/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Optical Filters (AREA)
- Materials For Photolithography (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2020124897 | 2020-07-22 | ||
| JP2020-124897 | 2020-07-22 | ||
| CN202180044097.4A CN115916902B (zh) | 2020-07-22 | 2021-07-19 | 树脂组合物、膜、滤光器、固体摄像元件、图像显示装置、树脂及化合物 |
| PCT/JP2021/026920 WO2022019254A1 (ja) | 2020-07-22 | 2021-07-19 | 樹脂組成物、膜、光学フィルタ、固体撮像素子、画像表示装置、樹脂および化合物 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202180044097.4A Division CN115916902B (zh) | 2020-07-22 | 2021-07-19 | 树脂组合物、膜、滤光器、固体摄像元件、图像显示装置、树脂及化合物 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN119306932A true CN119306932A (zh) | 2025-01-14 |
Family
ID=79729586
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202411425699.6A Pending CN119306932A (zh) | 2020-07-22 | 2021-07-19 | 树脂组合物、膜、滤光器、固体摄像元件、图像显示装置、树脂及化合物 |
| CN202180044097.4A Active CN115916902B (zh) | 2020-07-22 | 2021-07-19 | 树脂组合物、膜、滤光器、固体摄像元件、图像显示装置、树脂及化合物 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202180044097.4A Active CN115916902B (zh) | 2020-07-22 | 2021-07-19 | 树脂组合物、膜、滤光器、固体摄像元件、图像显示装置、树脂及化合物 |
Country Status (5)
| Country | Link |
|---|---|
| JP (2) | JP7515592B2 (https=) |
| KR (2) | KR20250123943A (https=) |
| CN (2) | CN119306932A (https=) |
| TW (1) | TWI889869B (https=) |
| WO (1) | WO2022019254A1 (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2022176788A1 (ja) * | 2021-02-18 | 2022-08-25 | 富士フイルム株式会社 | 樹脂組成物、膜、光学フィルタ、固体撮像素子、画像表示装置、樹脂および樹脂の製造方法 |
| WO2025205735A1 (ja) * | 2024-03-28 | 2025-10-02 | 富士フイルム株式会社 | 樹脂組成物、硬化物、積層体、硬化物の製造方法、積層体の製造方法、半導体デバイスの製造方法、及び、半導体デバイス |
Family Cites Families (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5011958B2 (https=) * | 1971-11-22 | 1975-05-08 | ||
| JPS58140048A (ja) * | 1982-02-15 | 1983-08-19 | Shiyoufuu:Kk | トリメリツト酸エステルおよびその酸無水物 |
| US5017673A (en) * | 1989-10-12 | 1991-05-21 | Basf Corporation | Nonionically stabilized polyester urethane resin for water-borne coating compositions |
| JP2612524B2 (ja) * | 1991-07-09 | 1997-05-21 | 株式会社巴川製紙所 | ポリアニリン誘導体およびその製造方法 |
| JPH08100061A (ja) * | 1994-09-28 | 1996-04-16 | Hitachi Chem Co Ltd | ブロックコポリマ、その製造法、液晶配向材料、液晶配向膜、液晶挾持基板及び液晶表示素子 |
| KR20020016869A (ko) * | 1999-07-08 | 2002-03-06 | 나까니시 히로유끼 | 극성기 함유 열가소성 중합체, 그 용도 및 극성기 함유불포화 화합물 |
| KR100813242B1 (ko) * | 2006-02-14 | 2008-03-13 | 삼성에스디아이 주식회사 | 고분자 전해질막, 이의 제조 방법 및 이를 구비한 연료전지 |
| EP2150568B1 (en) * | 2007-05-29 | 2016-03-23 | Youl Chon Chemical Co. Ltd. | Chain-end functionalized methoxy poly(ethylene glycol)and metal nano-particles using the same |
| JP2013125065A (ja) * | 2011-12-13 | 2013-06-24 | Nissan Chem Ind Ltd | エステル基含有ジカルボン酸無水物、製造法及びその用途 |
| JP5909468B2 (ja) * | 2012-08-31 | 2016-04-26 | 富士フイルム株式会社 | 分散組成物、これを用いた硬化性組成物、透明膜、マイクロレンズ、及び固体撮像素子 |
| JP6019050B2 (ja) * | 2014-02-14 | 2016-11-02 | 富士フイルム株式会社 | 着色樹脂組成物およびこれを用いた硬化膜、カラーフィルタおよびその製造方法、固体撮像素子ならびに画像表示装置 |
| JP6746888B2 (ja) * | 2014-09-30 | 2020-08-26 | 東レ株式会社 | ディスプレイ用支持基板、それを用いたカラーフィルターおよびその製造方法、有機el素子およびその製造方法、ならびにフレキシブル有機elディスプレイ |
| JP6589305B2 (ja) | 2015-03-13 | 2019-10-16 | 東洋インキScホールディングス株式会社 | カラーフィルタ用着色組成物、およびカラーフィルタ |
| US10983436B2 (en) * | 2016-03-18 | 2021-04-20 | Toray Industries, Inc. | Negative-type photosensitive resin composition, cured film, display device provided with cured film, and production method therefor |
| WO2018097279A1 (ja) * | 2016-11-28 | 2018-05-31 | 東洋インキScホールディングス株式会社 | (メタ)アクリル系重合体、(メタ)アクリル系ブロック共重合体、顔料分散体、感光性着色組成物、カラーフィルタ、インキ組成物、複合ブロック共重合体、顔料分散剤、及び、コーティング剤 |
| JP6841242B2 (ja) * | 2016-12-26 | 2021-03-10 | 東レ株式会社 | 有機el表示装置 |
| WO2018155104A1 (ja) * | 2017-02-23 | 2018-08-30 | 富士フイルム株式会社 | 感光性組成物、硬化膜、カラーフィルタ、固体撮像素子および画像表示装置 |
| WO2019065902A1 (ja) * | 2017-09-29 | 2019-04-04 | 東レ株式会社 | 感光性樹脂組成物、硬化膜、硬化膜を具備する素子及び有機elディスプレイ、並びに有機elディスプレイの製造方法 |
| JP7255182B2 (ja) * | 2017-10-31 | 2023-04-11 | 東レ株式会社 | ネガ型感光性樹脂組成物、硬化膜、並びに有機elディスプレイ及びその製造方法 |
| JP7172980B2 (ja) * | 2018-01-31 | 2022-11-16 | 東レ株式会社 | ネガ型感光性樹脂組成物、硬化膜、硬化膜を具備する素子及び表示装置並びにその製造方法 |
| JP7095404B2 (ja) * | 2018-05-24 | 2022-07-05 | 東洋インキScホールディングス株式会社 | ブロックポリマー |
-
2021
- 2021-07-16 TW TW110126157A patent/TWI889869B/zh active
- 2021-07-19 CN CN202411425699.6A patent/CN119306932A/zh active Pending
- 2021-07-19 KR KR1020257026471A patent/KR20250123943A/ko active Pending
- 2021-07-19 WO PCT/JP2021/026920 patent/WO2022019254A1/ja not_active Ceased
- 2021-07-19 KR KR1020227045784A patent/KR102846367B1/ko active Active
- 2021-07-19 CN CN202180044097.4A patent/CN115916902B/zh active Active
- 2021-07-19 JP JP2022537993A patent/JP7515592B2/ja active Active
-
2024
- 2024-07-01 JP JP2024105893A patent/JP7717231B2/ja active Active
Also Published As
| Publication number | Publication date |
|---|---|
| JP2024124473A (ja) | 2024-09-12 |
| CN115916902B (zh) | 2024-10-22 |
| TWI889869B (zh) | 2025-07-11 |
| KR20230016676A (ko) | 2023-02-02 |
| CN115916902A (zh) | 2023-04-04 |
| KR102846367B1 (ko) | 2025-08-14 |
| JP7515592B2 (ja) | 2024-07-12 |
| KR20250123943A (ko) | 2025-08-18 |
| TW202208470A (zh) | 2022-03-01 |
| JP7717231B2 (ja) | 2025-08-01 |
| WO2022019254A1 (ja) | 2022-01-27 |
| JPWO2022019254A1 (https=) | 2022-01-27 |
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