TWI889869B - 樹脂組成物、膜、濾光器、固體攝像元件、圖像顯示裝置、樹脂及化合物 - Google Patents

樹脂組成物、膜、濾光器、固體攝像元件、圖像顯示裝置、樹脂及化合物

Info

Publication number
TWI889869B
TWI889869B TW110126157A TW110126157A TWI889869B TW I889869 B TWI889869 B TW I889869B TW 110126157 A TW110126157 A TW 110126157A TW 110126157 A TW110126157 A TW 110126157A TW I889869 B TWI889869 B TW I889869B
Authority
TW
Taiwan
Prior art keywords
group
formula
resin composition
compounds
japanese patent
Prior art date
Application number
TW110126157A
Other languages
English (en)
Chinese (zh)
Other versions
TW202208470A (zh
Inventor
牧野雅臣
川島敬史
Original Assignee
日商富士軟片股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商富士軟片股份有限公司 filed Critical 日商富士軟片股份有限公司
Publication of TW202208470A publication Critical patent/TW202208470A/zh
Application granted granted Critical
Publication of TWI889869B publication Critical patent/TWI889869B/zh

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/38—Polymerisation using regulators, e.g. chain terminating agents, e.g. telomerisation
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • C08F220/14—Methyl esters, e.g. methyl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • C08F220/1804—C4-(meth)acrylate, e.g. butyl (meth)acrylate, isobutyl (meth)acrylate or tert-butyl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/34—Introducing sulfur atoms or sulfur-containing groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G63/00—Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
    • C08G63/91—Polymers modified by chemical after-treatment
    • C08G63/912—Polymers modified by chemical after-treatment derived from hydroxycarboxylic acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1003—Preparatory processes
    • C08G73/1007—Preparatory processes from tetracarboxylic acids or derivatives and diamines
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1067—Wholly aromatic polyimides, i.e. having both tetracarboxylic and diamino moieties aromatically bound
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L79/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
    • C08L79/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Optical Filters (AREA)
  • Materials For Photolithography (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
TW110126157A 2020-07-22 2021-07-16 樹脂組成物、膜、濾光器、固體攝像元件、圖像顯示裝置、樹脂及化合物 TWI889869B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2020124897 2020-07-22
JP2020-124897 2020-07-22

Publications (2)

Publication Number Publication Date
TW202208470A TW202208470A (zh) 2022-03-01
TWI889869B true TWI889869B (zh) 2025-07-11

Family

ID=79729586

Family Applications (1)

Application Number Title Priority Date Filing Date
TW110126157A TWI889869B (zh) 2020-07-22 2021-07-16 樹脂組成物、膜、濾光器、固體攝像元件、圖像顯示裝置、樹脂及化合物

Country Status (5)

Country Link
JP (2) JP7515592B2 (https=)
KR (2) KR20250123943A (https=)
CN (2) CN119306932A (https=)
TW (1) TWI889869B (https=)
WO (1) WO2022019254A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2022176788A1 (ja) * 2021-02-18 2022-08-25 富士フイルム株式会社 樹脂組成物、膜、光学フィルタ、固体撮像素子、画像表示装置、樹脂および樹脂の製造方法
WO2025205735A1 (ja) * 2024-03-28 2025-10-02 富士フイルム株式会社 樹脂組成物、硬化物、積層体、硬化物の製造方法、積層体の製造方法、半導体デバイスの製造方法、及び、半導体デバイス

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58140048A (ja) * 1982-02-15 1983-08-19 Shiyoufuu:Kk トリメリツト酸エステルおよびその酸無水物
JPH08100061A (ja) * 1994-09-28 1996-04-16 Hitachi Chem Co Ltd ブロックコポリマ、その製造法、液晶配向材料、液晶配向膜、液晶挾持基板及び液晶表示素子
CN1360605A (zh) * 1999-07-08 2002-07-24 三井化学株式会社 含极性基团的热塑性聚合物、其用途以及含极性基团的不饱和化合物
TW201533178A (zh) * 2014-02-14 2015-09-01 富士軟片股份有限公司 著色樹脂組成物及使用其的硬化膜、彩色濾光片及其製造方法、固體攝像元件及圖像顯示裝置
TW201920374A (zh) * 2017-09-29 2019-06-01 日商東麗股份有限公司 感光性樹脂組成物、硬化膜、具備硬化膜之元件及有機ｅｌ顯示器、以及有機ｅｌ顯示器之製造方法
JP2019203084A (ja) * 2018-05-24 2019-11-28 東洋インキＳｃホールディングス株式会社 ブロックポリマー

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5011958B2 (https=) * 1971-11-22 1975-05-08
US5017673A (en) * 1989-10-12 1991-05-21 Basf Corporation Nonionically stabilized polyester urethane resin for water-borne coating compositions
JP2612524B2 (ja) * 1991-07-09 1997-05-21 株式会社巴川製紙所 ポリアニリン誘導体およびその製造方法
KR100813242B1 (ko) * 2006-02-14 2008-03-13 삼성에스디아이 주식회사 고분자 전해질막, 이의 제조 방법 및 이를 구비한 연료전지
EP2150568B1 (en) * 2007-05-29 2016-03-23 Youl Chon Chemical Co. Ltd. Chain-end functionalized methoxy poly(ethylene glycol)and metal nano-particles using the same
JP2013125065A (ja) * 2011-12-13 2013-06-24 Nissan Chem Ind Ltd エステル基含有ジカルボン酸無水物、製造法及びその用途
JP5909468B2 (ja) * 2012-08-31 2016-04-26 富士フイルム株式会社 分散組成物、これを用いた硬化性組成物、透明膜、マイクロレンズ、及び固体撮像素子
JP6746888B2 (ja) * 2014-09-30 2020-08-26 東レ株式会社 ディスプレイ用支持基板、それを用いたカラーフィルターおよびその製造方法、有機ｅｌ素子およびその製造方法、ならびにフレキシブル有機ｅｌディスプレイ
JP6589305B2 (ja) 2015-03-13 2019-10-16 東洋インキＳｃホールディングス株式会社 カラーフィルタ用着色組成物、およびカラーフィルタ
US10983436B2 (en) * 2016-03-18 2021-04-20 Toray Industries, Inc. Negative-type photosensitive resin composition, cured film, display device provided with cured film, and production method therefor
WO2018097279A1 (ja) * 2016-11-28 2018-05-31 東洋インキＳｃホールディングス株式会社 （メタ）アクリル系重合体、（メタ）アクリル系ブロック共重合体、顔料分散体、感光性着色組成物、カラーフィルタ、インキ組成物、複合ブロック共重合体、顔料分散剤、及び、コーティング剤
JP6841242B2 (ja) * 2016-12-26 2021-03-10 東レ株式会社 有機ｅｌ表示装置
WO2018155104A1 (ja) * 2017-02-23 2018-08-30 富士フイルム株式会社 感光性組成物、硬化膜、カラーフィルタ、固体撮像素子および画像表示装置
JP7255182B2 (ja) * 2017-10-31 2023-04-11 東レ株式会社 ネガ型感光性樹脂組成物、硬化膜、並びに有機ｅｌディスプレイ及びその製造方法
JP7172980B2 (ja) * 2018-01-31 2022-11-16 東レ株式会社 ネガ型感光性樹脂組成物、硬化膜、硬化膜を具備する素子及び表示装置並びにその製造方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58140048A (ja) * 1982-02-15 1983-08-19 Shiyoufuu:Kk トリメリツト酸エステルおよびその酸無水物
JPH08100061A (ja) * 1994-09-28 1996-04-16 Hitachi Chem Co Ltd ブロックコポリマ、その製造法、液晶配向材料、液晶配向膜、液晶挾持基板及び液晶表示素子
CN1360605A (zh) * 1999-07-08 2002-07-24 三井化学株式会社 含极性基团的热塑性聚合物、其用途以及含极性基团的不饱和化合物
TW201533178A (zh) * 2014-02-14 2015-09-01 富士軟片股份有限公司 著色樹脂組成物及使用其的硬化膜、彩色濾光片及其製造方法、固體攝像元件及圖像顯示裝置
TW201920374A (zh) * 2017-09-29 2019-06-01 日商東麗股份有限公司 感光性樹脂組成物、硬化膜、具備硬化膜之元件及有機ｅｌ顯示器、以及有機ｅｌ顯示器之製造方法
JP2019203084A (ja) * 2018-05-24 2019-11-28 東洋インキＳｃホールディングス株式会社 ブロックポリマー

Also Published As

Publication number Publication date
JP2024124473A (ja) 2024-09-12
CN115916902B (zh) 2024-10-22
KR20230016676A (ko) 2023-02-02
CN115916902A (zh) 2023-04-04
KR102846367B1 (ko) 2025-08-14
JP7515592B2 (ja) 2024-07-12
KR20250123943A (ko) 2025-08-18
CN119306932A (zh) 2025-01-14
TW202208470A (zh) 2022-03-01
JP7717231B2 (ja) 2025-08-01
WO2022019254A1 (ja) 2022-01-27
JPWO2022019254A1 (https=) 2022-01-27

Similar Documents

Publication Publication Date Title
JP7717231B2 (ja) 化合物
JP2024009929A (ja) 着色感光性組成物、膜、カラーフィルタ、固体撮像素子および画像表示装置
JP2025063188A (ja) 着色感光性組成物、硬化物、カラーフィルタ、固体撮像素子、画像表示装置、及び、非対称ジケトピロロピロール化合物
JP7425093B2 (ja) 着色樹脂組成物、膜、カラーフィルタ、固体撮像素子、及び、画像表示装置
TWI895462B (zh) 樹脂組成物、膜、濾光器、固體攝像元件、圖像顯示裝置、樹脂及化合物
JP7836307B2 (ja) 樹脂組成物、膜、光学フィルタ、固体撮像素子および画像表示装置
TWI885081B (zh) 樹脂組成物、膜、濾光器、固體攝像元件及圖像顯示裝置
TWI890700B (zh) 組成物、膜、硬化膜及其製造方法、近紅外線透射濾波器、固體攝像元件以及紅外線感測器
JP7822360B2 (ja) 樹脂組成物、膜、光学フィルタ、固体撮像素子、画像表示装置、樹脂および樹脂の製造方法
TWI884292B (zh) 樹脂組成物、膜、濾光器、固體攝像元件、圖像顯示裝置及樹脂
TW202212260A (zh) 感光性組成物、膜、濾色器、固體攝像元件及圖像顯示裝置
JP7820350B2 (ja) 樹脂組成物、膜、光学フィルタ、固体撮像素子、画像表示装置、樹脂および樹脂の製造方法
WO2023182017A1 (ja) 着色組成物、膜、カラーフィルタ、固体撮像素子および画像表示装置