JPWO2022019254A1 - - Google Patents

Info

Publication number
JPWO2022019254A1
JPWO2022019254A1 JP2022537993A JP2022537993A JPWO2022019254A1 JP WO2022019254 A1 JPWO2022019254 A1 JP WO2022019254A1 JP 2022537993 A JP2022537993 A JP 2022537993A JP 2022537993 A JP2022537993 A JP 2022537993A JP WO2022019254 A1 JPWO2022019254 A1 JP WO2022019254A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2022537993A
Other languages
Japanese (ja)
Other versions
JP7515592B2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2022019254A1 publication Critical patent/JPWO2022019254A1/ja
Priority to JP2024105893A priority Critical patent/JP7717231B2/ja
Application granted granted Critical
Publication of JP7515592B2 publication Critical patent/JP7515592B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G63/00—Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
    • C08G63/91—Polymers modified by chemical after-treatment
    • C08G63/912—Polymers modified by chemical after-treatment derived from hydroxycarboxylic acids
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/38—Polymerisation using regulators, e.g. chain terminating agents, e.g. telomerisation
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • C08F220/14—Methyl esters, e.g. methyl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • C08F220/1804—C4-(meth)acrylate, e.g. butyl (meth)acrylate, isobutyl (meth)acrylate or tert-butyl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/34—Introducing sulfur atoms or sulfur-containing groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1003—Preparatory processes
    • C08G73/1007—Preparatory processes from tetracarboxylic acids or derivatives and diamines
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1067—Wholly aromatic polyimides, i.e. having both tetracarboxylic and diamino moieties aromatically bound
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L79/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
    • C08L79/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Optical Filters (AREA)
  • Materials For Photolithography (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
JP2022537993A 2020-07-22 2021-07-19 樹脂組成物、膜、光学フィルタ、固体撮像素子、画像表示装置、樹脂および化合物 Active JP7515592B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2024105893A JP7717231B2 (ja) 2020-07-22 2024-07-01 化合物

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020124897 2020-07-22
JP2020124897 2020-07-22
PCT/JP2021/026920 WO2022019254A1 (ja) 2020-07-22 2021-07-19 樹脂組成物、膜、光学フィルタ、固体撮像素子、画像表示装置、樹脂および化合物

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2024105893A Division JP7717231B2 (ja) 2020-07-22 2024-07-01 化合物

Publications (2)

Publication Number Publication Date
JPWO2022019254A1 true JPWO2022019254A1 (https=) 2022-01-27
JP7515592B2 JP7515592B2 (ja) 2024-07-12

Family

ID=79729586

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2022537993A Active JP7515592B2 (ja) 2020-07-22 2021-07-19 樹脂組成物、膜、光学フィルタ、固体撮像素子、画像表示装置、樹脂および化合物
JP2024105893A Active JP7717231B2 (ja) 2020-07-22 2024-07-01 化合物

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2024105893A Active JP7717231B2 (ja) 2020-07-22 2024-07-01 化合物

Country Status (5)

Country Link
JP (2) JP7515592B2 (https=)
KR (2) KR20250123943A (https=)
CN (2) CN119306932A (https=)
TW (1) TWI889869B (https=)
WO (1) WO2022019254A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2022176788A1 (ja) * 2021-02-18 2022-08-25 富士フイルム株式会社 樹脂組成物、膜、光学フィルタ、固体撮像素子、画像表示装置、樹脂および樹脂の製造方法
WO2025205735A1 (ja) * 2024-03-28 2025-10-02 富士フイルム株式会社 樹脂組成物、硬化物、積層体、硬化物の製造方法、積層体の製造方法、半導体デバイスの製造方法、及び、半導体デバイス

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58140048A (ja) * 1982-02-15 1983-08-19 Shiyoufuu:Kk トリメリツト酸エステルおよびその酸無水物
JPH08100061A (ja) * 1994-09-28 1996-04-16 Hitachi Chem Co Ltd ブロックコポリマ、その製造法、液晶配向材料、液晶配向膜、液晶挾持基板及び液晶表示素子
WO2001004170A1 (en) * 1999-07-08 2001-01-18 Mitsui Chemicals, Inc. Thermoplastic polymer having polar group, use thereof, and unsaturated compounds having polar group
JP2007220672A (ja) * 2006-02-14 2007-08-30 Samsung Sdi Co Ltd 高分子電解質膜とその製造方法及び燃料電池
JP2013125065A (ja) * 2011-12-13 2013-06-24 Nissan Chem Ind Ltd エステル基含有ジカルボン酸無水物、製造法及びその用途
JP2015151465A (ja) * 2014-02-14 2015-08-24 富士フイルム株式会社 着色樹脂組成物およびこれを用いた硬化膜、カラーフィルタおよびその製造方法、固体撮像素子ならびに画像表示装置
JP2019203084A (ja) * 2018-05-24 2019-11-28 東洋インキＳｃホールディングス株式会社 ブロックポリマー

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5011958B2 (https=) * 1971-11-22 1975-05-08
US5017673A (en) * 1989-10-12 1991-05-21 Basf Corporation Nonionically stabilized polyester urethane resin for water-borne coating compositions
JP2612524B2 (ja) * 1991-07-09 1997-05-21 株式会社巴川製紙所 ポリアニリン誘導体およびその製造方法
EP2150568B1 (en) * 2007-05-29 2016-03-23 Youl Chon Chemical Co. Ltd. Chain-end functionalized methoxy poly(ethylene glycol)and metal nano-particles using the same
JP5909468B2 (ja) * 2012-08-31 2016-04-26 富士フイルム株式会社 分散組成物、これを用いた硬化性組成物、透明膜、マイクロレンズ、及び固体撮像素子
JP6746888B2 (ja) * 2014-09-30 2020-08-26 東レ株式会社 ディスプレイ用支持基板、それを用いたカラーフィルターおよびその製造方法、有機ｅｌ素子およびその製造方法、ならびにフレキシブル有機ｅｌディスプレイ
JP6589305B2 (ja) 2015-03-13 2019-10-16 東洋インキＳｃホールディングス株式会社 カラーフィルタ用着色組成物、およびカラーフィルタ
US10983436B2 (en) * 2016-03-18 2021-04-20 Toray Industries, Inc. Negative-type photosensitive resin composition, cured film, display device provided with cured film, and production method therefor
WO2018097279A1 (ja) * 2016-11-28 2018-05-31 東洋インキＳｃホールディングス株式会社 （メタ）アクリル系重合体、（メタ）アクリル系ブロック共重合体、顔料分散体、感光性着色組成物、カラーフィルタ、インキ組成物、複合ブロック共重合体、顔料分散剤、及び、コーティング剤
JP6841242B2 (ja) * 2016-12-26 2021-03-10 東レ株式会社 有機ｅｌ表示装置
WO2018155104A1 (ja) * 2017-02-23 2018-08-30 富士フイルム株式会社 感光性組成物、硬化膜、カラーフィルタ、固体撮像素子および画像表示装置
WO2019065902A1 (ja) * 2017-09-29 2019-04-04 東レ株式会社 感光性樹脂組成物、硬化膜、硬化膜を具備する素子及び有機ｅｌディスプレイ、並びに有機ｅｌディスプレイの製造方法
JP7255182B2 (ja) * 2017-10-31 2023-04-11 東レ株式会社 ネガ型感光性樹脂組成物、硬化膜、並びに有機ｅｌディスプレイ及びその製造方法
JP7172980B2 (ja) * 2018-01-31 2022-11-16 東レ株式会社 ネガ型感光性樹脂組成物、硬化膜、硬化膜を具備する素子及び表示装置並びにその製造方法

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58140048A (ja) * 1982-02-15 1983-08-19 Shiyoufuu:Kk トリメリツト酸エステルおよびその酸無水物
JPH08100061A (ja) * 1994-09-28 1996-04-16 Hitachi Chem Co Ltd ブロックコポリマ、その製造法、液晶配向材料、液晶配向膜、液晶挾持基板及び液晶表示素子
WO2001004170A1 (en) * 1999-07-08 2001-01-18 Mitsui Chemicals, Inc. Thermoplastic polymer having polar group, use thereof, and unsaturated compounds having polar group
JP2007220672A (ja) * 2006-02-14 2007-08-30 Samsung Sdi Co Ltd 高分子電解質膜とその製造方法及び燃料電池
JP2013125065A (ja) * 2011-12-13 2013-06-24 Nissan Chem Ind Ltd エステル基含有ジカルボン酸無水物、製造法及びその用途
JP2015151465A (ja) * 2014-02-14 2015-08-24 富士フイルム株式会社 着色樹脂組成物およびこれを用いた硬化膜、カラーフィルタおよびその製造方法、固体撮像素子ならびに画像表示装置
JP2019203084A (ja) * 2018-05-24 2019-11-28 東洋インキＳｃホールディングス株式会社 ブロックポリマー

Also Published As

Publication number Publication date
JP2024124473A (ja) 2024-09-12
CN115916902B (zh) 2024-10-22
TWI889869B (zh) 2025-07-11
KR20230016676A (ko) 2023-02-02
CN115916902A (zh) 2023-04-04
KR102846367B1 (ko) 2025-08-14
JP7515592B2 (ja) 2024-07-12
KR20250123943A (ko) 2025-08-18
CN119306932A (zh) 2025-01-14
TW202208470A (zh) 2022-03-01
JP7717231B2 (ja) 2025-08-01
WO2022019254A1 (ja) 2022-01-27

Similar Documents

Publication Publication Date Title
BR112023005462A2 (https=)
BR112023012656A2 (https=)
BR112023009656A2 (https=)
JPWO2022019254A1 (https=)
BR112023011738A2 (https=)
BR112023006729A2 (https=)
BR102021018859A2 (https=)
BR102021015500A2 (https=)
BR102021007058A2 (https=)
BR102020022030A2 (https=)
BR112023016292A2 (https=)
BR112023011539A2 (https=)
BR112023011610A2 (https=)
BR112023008976A2 (https=)
BR102021020147A2 (https=)
BR102021018926A2 (https=)
BR102021018167A2 (https=)
BR102021017576A2 (https=)
BR102021016837A2 (https=)
BR102021016551A2 (https=)
BR102021016375A2 (https=)
BR102021016176A2 (https=)
BR102021016200A2 (https=)
BR102021015566A2 (https=)
BR102021015450A8 (https=)

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20221212

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20240116

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20240308

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20240618

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20240702

R150 Certificate of patent or registration of utility model

Ref document number: 7515592

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150