CN117957622A - 变压器芯片 - Google Patents

变压器芯片 Download PDF

Info

Publication number
CN117957622A
CN117957622A CN202280062916.2A CN202280062916A CN117957622A CN 117957622 A CN117957622 A CN 117957622A CN 202280062916 A CN202280062916 A CN 202280062916A CN 117957622 A CN117957622 A CN 117957622A
Authority
CN
China
Prior art keywords
coil
substrate
wiring
transformer chip
connection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202280062916.2A
Other languages
English (en)
Chinese (zh)
Inventor
樋口彻
桑原英治
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rohm Co Ltd
Original Assignee
Rohm Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rohm Co Ltd filed Critical Rohm Co Ltd
Publication of CN117957622A publication Critical patent/CN117957622A/zh
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/80Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple passive components, e.g. resistors, capacitors or inductors
    • H10D86/85Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple passive components, e.g. resistors, capacitors or inductors characterised by only passive components
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F27/00Details of transformers or inductances, in general
    • H01F27/28Coils; Windings; Conductive connections
    • H01F27/2804Printed windings
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F27/00Details of transformers or inductances, in general
    • H01F27/28Coils; Windings; Conductive connections
    • H01F27/32Insulating of coils, windings, or parts thereof
    • H01F27/323Insulation between winding turns, between winding layers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/01Manufacture or treatment
    • H10D84/02Manufacture or treatment characterised by using material-based technologies
    • H10D84/03Manufacture or treatment characterised by using material-based technologies using Group IV technology, e.g. silicon technology or silicon-carbide [SiC] technology
    • H10D84/038Manufacture or treatment characterised by using material-based technologies using Group IV technology, e.g. silicon technology or silicon-carbide [SiC] technology using silicon technology, e.g. SiGe
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F27/00Details of transformers or inductances, in general
    • H01F27/28Coils; Windings; Conductive connections
    • H01F27/2804Printed windings
    • H01F2027/2809Printed windings on stacked layers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F27/00Details of transformers or inductances, in general
    • H01F27/28Coils; Windings; Conductive connections
    • H01F27/32Insulating of coils, windings, or parts thereof
    • H01F27/327Encapsulating or impregnating

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Coils Or Transformers For Communication (AREA)
CN202280062916.2A 2021-09-21 2022-09-16 变压器芯片 Pending CN117957622A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2021153289 2021-09-21
JP2021-153289 2021-09-21
PCT/JP2022/034857 WO2023048105A1 (ja) 2021-09-21 2022-09-16 トランスチップ

Publications (1)

Publication Number Publication Date
CN117957622A true CN117957622A (zh) 2024-04-30

Family

ID=85719478

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202280062916.2A Pending CN117957622A (zh) 2021-09-21 2022-09-16 变压器芯片

Country Status (5)

Country Link
US (1) US20240222353A1 (https=)
JP (1) JPWO2023048105A1 (https=)
CN (1) CN117957622A (https=)
DE (1) DE112022004527T5 (https=)
WO (1) WO2023048105A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US12224103B2 (en) * 2021-06-15 2025-02-11 Intel Corporation Angled inductor with small form factor
US20240038439A1 (en) * 2022-07-28 2024-02-01 Qualcomm Incorporated Inductor packages employing wire bonds over a lead frame to form integrated inductor(s), and related integrated circuit (ic) packages and fabrication methods

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5284452A (en) * 1975-12-31 1977-07-14 Fujitsu Ltd Method of manufacturing coil
JPH04354308A (ja) * 1991-05-31 1992-12-08 Sumitomo Electric Ind Ltd トランス
KR100250225B1 (ko) * 1996-11-19 2000-04-01 윤종용 집적회로용 인덕터 및 그 제조방법
JP3527105B2 (ja) * 1998-09-28 2004-05-17 富士通アクセス株式会社 プリント基板
FR2793943B1 (fr) * 1999-05-18 2001-07-13 Memscap Micro-composants du type micro-inductance ou micro- transformateur, et procede de fabrication de tels micro- composants
JP2005347286A (ja) * 2002-05-29 2005-12-15 Ajinomoto Co Inc コイル内蔵多層基板、半導体チップ、及びそれらの製造方法
JP3800540B2 (ja) * 2003-01-31 2006-07-26 Tdk株式会社 インダクタンス素子の製造方法と積層電子部品と積層電子部品モジュ−ルとこれらの製造方法
JP6841634B2 (ja) 2016-11-08 2021-03-10 ローム株式会社 電子部品

Also Published As

Publication number Publication date
DE112022004527T5 (de) 2024-09-12
JPWO2023048105A1 (https=) 2023-03-30
WO2023048105A1 (ja) 2023-03-30
US20240222353A1 (en) 2024-07-04

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