CN1179206C - 基片检验装置 - Google Patents

基片检验装置 Download PDF

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Publication number
CN1179206C
CN1179206C CNB011120509A CN01112050A CN1179206C CN 1179206 C CN1179206 C CN 1179206C CN B011120509 A CNB011120509 A CN B011120509A CN 01112050 A CN01112050 A CN 01112050A CN 1179206 C CN1179206 C CN 1179206C
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CN
China
Prior art keywords
substrate
light source
seat
along
laser light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CNB011120509A
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English (en)
Chinese (zh)
Other versions
CN1341853A (zh
Inventor
藤崎畅夫
永见理
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Olympus Corp
Original Assignee
Olympus Optical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Olympus Optical Co Ltd filed Critical Olympus Optical Co Ltd
Publication of CN1341853A publication Critical patent/CN1341853A/zh
Application granted granted Critical
Publication of CN1179206C publication Critical patent/CN1179206C/zh
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/958—Inspecting transparent materials or objects, e.g. windscreens
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G01N2021/8854—Grading and classifying of flaws
    • G01N2021/8861—Determining coordinates of flaws
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G01N2021/8887—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges based on image processing techniques
    • G01N2021/8893—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges based on image processing techniques providing a video image and a processed signal for helping visual decision

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Biochemistry (AREA)
  • Pathology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Nonlinear Science (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • General Health & Medical Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Manufacturing & Machinery (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Signal Processing (AREA)
  • Optics & Photonics (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Length Measuring Devices By Optical Means (AREA)
CNB011120509A 2000-09-05 2001-03-26 基片检验装置 Expired - Fee Related CN1179206C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP268945/2000 2000-09-05
JP2000268945A JP2002082067A (ja) 2000-09-05 2000-09-05 基板検査装置

Publications (2)

Publication Number Publication Date
CN1341853A CN1341853A (zh) 2002-03-27
CN1179206C true CN1179206C (zh) 2004-12-08

Family

ID=18755644

Family Applications (2)

Application Number Title Priority Date Filing Date
CN01208700U Expired - Fee Related CN2470821Y (zh) 2000-09-05 2001-03-26 基片检验装置
CNB011120509A Expired - Fee Related CN1179206C (zh) 2000-09-05 2001-03-26 基片检验装置

Family Applications Before (1)

Application Number Title Priority Date Filing Date
CN01208700U Expired - Fee Related CN2470821Y (zh) 2000-09-05 2001-03-26 基片检验装置

Country Status (4)

Country Link
JP (1) JP2002082067A (enExample)
KR (1) KR100885560B1 (enExample)
CN (2) CN2470821Y (enExample)
TW (1) TW493071B (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100480784C (zh) * 2007-01-11 2009-04-22 友达光电股份有限公司 烧机测试装置

Families Citing this family (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100576030C (zh) * 2002-02-26 2009-12-30 乐金显示有限公司 检查液晶板的设备和制作液晶显示器的方法
KR100898781B1 (ko) * 2002-06-14 2009-05-20 엘지디스플레이 주식회사 외관검사장치 및 이를 이용한 액정표시장치의 제조방법
KR100853775B1 (ko) * 2002-06-14 2008-08-25 엘지디스플레이 주식회사 테이블 손상 위치 검출 지그
US7272254B2 (en) * 2003-07-09 2007-09-18 General Electric Company System and method for analyzing and identifying flaws in a manufactured part
JP2006049384A (ja) * 2004-07-30 2006-02-16 Laserfront Technologies Inc ガントリー型ｘｙステージ
KR100599060B1 (ko) * 2004-08-31 2006-07-12 주식회사 디이엔티 평판 표시패널 검사용 광조사방법 및 광조사장치
KR100596333B1 (ko) * 2004-09-22 2006-07-06 주식회사 에이디피엔지니어링 기판 외관 검사 장치
JP4653500B2 (ja) 2005-01-18 2011-03-16 オリンパス株式会社 座標検出装置及び被検体検査装置
JP2006266748A (ja) * 2005-03-22 2006-10-05 Mitsutoyo Corp 画像測定装置
KR100688985B1 (ko) * 2005-08-05 2007-03-08 삼성전자주식회사 기판검사장치 및 그의 제어방법
KR101166828B1 (ko) * 2005-12-29 2012-07-19 엘지디스플레이 주식회사 평판표시장치용 검사장비 및 검사 방법
CN1987436B (zh) * 2006-12-27 2010-04-21 友达光电股份有限公司 基板检测设备及玻璃基板检测设备
TWI409499B (zh) * 2007-10-19 2013-09-21 Hon Hai Prec Ind Co Ltd 顯微鏡用載物台
KR101011721B1 (ko) * 2008-07-25 2011-01-28 한국에너지기술연구원 집광용 반사판 시험장치
KR200461270Y1 (ko) * 2010-01-20 2012-07-03 한화폴리드리머 주식회사 스마트 윈도우용 검사장치
JP5530984B2 (ja) * 2010-07-26 2014-06-25 株式会社ジャパンディスプレイ 検査装置及び検査方法
US8854616B2 (en) 2011-08-03 2014-10-07 Shenzhen China Star Optoelectronics Technology Co., Ltd. Visual inspection apparatus for glass substrate of liquid crystal display and inspection method thereof
CN102393576A (zh) * 2011-08-03 2012-03-28 深圳市华星光电技术有限公司 液晶显示器中玻璃基板的目视检查机及检查方法
WO2014023343A1 (de) * 2012-08-07 2014-02-13 Carl Zeiss Industrielle Messtechnik Gmbh KOORDINATENMESSGERÄT MIT WEIßLICHTSENSOR
CN102997795B (zh) * 2012-12-03 2015-10-21 京东方科技集团股份有限公司 一种摩擦装置和整机设备
CN103604815B (zh) * 2013-11-26 2016-01-13 上海海事大学 玻璃晶片检测装置与标定方法
CN103837552A (zh) * 2014-03-14 2014-06-04 苏州精创光学仪器有限公司 触摸屏保护玻璃外观缺陷检测系统
CN104977306A (zh) * 2014-04-08 2015-10-14 上海微电子装备有限公司 一种表面缺陷检测系统及方法
CN104297259A (zh) * 2014-11-04 2015-01-21 苏州精创光学仪器有限公司 触摸屏保护玻璃外观缺陷检测方法
CN104765172A (zh) * 2015-04-27 2015-07-08 京东方科技集团股份有限公司 一种检测液晶屏的设备和方法
CN105783795A (zh) * 2016-04-15 2016-07-20 中国科学院上海光学精密机械研究所 大型环抛机抛光胶盘平面度的测量装置及其测量方法
CN107664646A (zh) * 2016-07-29 2018-02-06 上海微电子装备（集团）股份有限公司 一种全自动外观缺陷检查装置及方法
CN107064173A (zh) * 2017-01-03 2017-08-18 中国科学院上海光学精密机械研究所 大型平面光学元件表面疵病的检测装置和检测方法
CN106646957B (zh) * 2017-03-14 2018-07-20 惠科股份有限公司 一种显示单元制程控制方法及系统
JP2019169608A (ja) * 2018-03-23 2019-10-03 株式会社ディスコ 研削装置
CN111487035B (zh) * 2019-01-25 2022-02-01 舜宇光学（浙江）研究院有限公司 一种用于近眼检测系统的对准方法及其系统
CN112129775B (zh) * 2020-09-23 2023-03-24 哈尔滨工业大学 一种匀光棒条形光源及基于该光源的光学元件损伤检测装置

Family Cites Families (6)

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JPH0715167A (ja) * 1993-06-21 1995-01-17 Sharp Corp 挿入位置指示器
JPH0735701A (ja) * 1993-07-23 1995-02-07 Sharp Corp パターン目視検査装置
JPH10325780A (ja) * 1997-05-23 1998-12-08 Matsushita Electric Ind Co Ltd ディスプレイ画面検査装置
KR19990025834A (ko) * 1997-09-18 1999-04-06 윤종용 반도체 소자 검사 장치의 검사기판용 지지대
JP4166340B2 (ja) * 1997-09-24 2008-10-15 オリンパス株式会社 基板検査装置
JP4385419B2 (ja) * 1998-11-30 2009-12-16 株式会社ニコン 外観検査方法及び外観検査装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100480784C (zh) * 2007-01-11 2009-04-22 友达光电股份有限公司 烧机测试装置

Also Published As

Publication number Publication date
JP2002082067A (ja) 2002-03-22
KR100885560B1 (ko) 2009-02-24
CN2470821Y (zh) 2002-01-09
CN1341853A (zh) 2002-03-27
KR20020019376A (ko) 2002-03-12
TW493071B (en) 2002-07-01

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C10 Entry into substantive examination
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Granted publication date: 20041208

Termination date: 20140326