CN117882014A - 直接描绘装置及其控制方法 - Google Patents

直接描绘装置及其控制方法 Download PDF

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Publication number
CN117882014A
CN117882014A CN202280058943.2A CN202280058943A CN117882014A CN 117882014 A CN117882014 A CN 117882014A CN 202280058943 A CN202280058943 A CN 202280058943A CN 117882014 A CN117882014 A CN 117882014A
Authority
CN
China
Prior art keywords
pattern
substrate
direct drawing
error data
direct
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202280058943.2A
Other languages
English (en)
Chinese (zh)
Inventor
三宅健
李德
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Japanese Eoric Co ltd
Sanei Giken Co Ltd
Original Assignee
Japanese Eoric Co ltd
Sanei Giken Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japanese Eoric Co ltd, Sanei Giken Co Ltd filed Critical Japanese Eoric Co ltd
Publication of CN117882014A publication Critical patent/CN117882014A/zh
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7019—Calibration
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7046—Strategy, e.g. mark, sensor or wavelength selection

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
CN202280058943.2A 2021-09-03 2022-08-30 直接描绘装置及其控制方法 Pending CN117882014A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2021143710 2021-09-03
JP2021-143710 2021-09-03
PCT/JP2022/032547 WO2023032962A1 (ja) 2021-09-03 2022-08-30 直接描画装置及びその制御方法

Publications (1)

Publication Number Publication Date
CN117882014A true CN117882014A (zh) 2024-04-12

Family

ID=85411249

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202280058943.2A Pending CN117882014A (zh) 2021-09-03 2022-08-30 直接描绘装置及其控制方法

Country Status (5)

Country Link
JP (1) JP7837024B2 (https=)
KR (1) KR20240055034A (https=)
CN (1) CN117882014A (https=)
TW (1) TW202319841A (https=)
WO (1) WO2023032962A1 (https=)

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005311145A (ja) * 2004-04-23 2005-11-04 Canon Inc 露光装置、露光方法、デバイス製造方法、パターン形成装置および位置合わせ方法
JP2007220937A (ja) * 2006-02-17 2007-08-30 Toppan Printing Co Ltd 基板の重ね描画方法
JP2011158718A (ja) * 2010-02-01 2011-08-18 Hitachi High-Technologies Corp 露光装置、露光方法、及び表示用パネル基板の製造方法
KR101059811B1 (ko) * 2010-05-06 2011-08-26 삼성전자주식회사 마스크리스 노광 장치와 마스크리스 노광에서 오버레이를 위한 정렬 방법
JP2014066870A (ja) * 2012-09-26 2014-04-17 Hitachi High-Technologies Corp パターン形成方法及び装置、露光装置並びに表示用パネル製造方法
JP6900284B2 (ja) * 2017-09-27 2021-07-07 株式会社Ｓｃｒｅｅｎホールディングス 描画装置および描画方法

Also Published As

Publication number Publication date
JPWO2023032962A1 (https=) 2023-03-09
JP7837024B2 (ja) 2026-03-30
WO2023032962A1 (ja) 2023-03-09
TW202319841A (zh) 2023-05-16
KR20240055034A (ko) 2024-04-26

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