TW202319841A - 直接描繪裝置及其控制方法 - Google Patents

直接描繪裝置及其控制方法 Download PDF

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Publication number
TW202319841A
TW202319841A TW111133310A TW111133310A TW202319841A TW 202319841 A TW202319841 A TW 202319841A TW 111133310 A TW111133310 A TW 111133310A TW 111133310 A TW111133310 A TW 111133310A TW 202319841 A TW202319841 A TW 202319841A
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TW
Taiwan
Prior art keywords
pattern
substrate
direct
hole
error data
Prior art date
Application number
TW111133310A
Other languages
English (en)
Chinese (zh)
Inventor
三宅健
李棏
Original Assignee
日商三榮技研股份有限公司
日商Ｅｏｒｉｃ股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商三榮技研股份有限公司, 日商Ｅｏｒｉｃ股份有限公司 filed Critical 日商三榮技研股份有限公司
Publication of TW202319841A publication Critical patent/TW202319841A/zh

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7019—Calibration
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7046—Strategy, e.g. mark, sensor or wavelength selection

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
TW111133310A 2021-09-03 2022-09-02 直接描繪裝置及其控制方法 TW202319841A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2021143710 2021-09-03
JP2021-143710 2021-09-03

Publications (1)

Publication Number Publication Date
TW202319841A true TW202319841A (zh) 2023-05-16

Family

ID=85411249

Family Applications (1)

Application Number Title Priority Date Filing Date
TW111133310A TW202319841A (zh) 2021-09-03 2022-09-02 直接描繪裝置及其控制方法

Country Status (5)

Country Link
JP (1) JP7837024B2 (https=)
KR (1) KR20240055034A (https=)
CN (1) CN117882014A (https=)
TW (1) TW202319841A (https=)
WO (1) WO2023032962A1 (https=)

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005311145A (ja) * 2004-04-23 2005-11-04 Canon Inc 露光装置、露光方法、デバイス製造方法、パターン形成装置および位置合わせ方法
JP2007220937A (ja) * 2006-02-17 2007-08-30 Toppan Printing Co Ltd 基板の重ね描画方法
JP2011158718A (ja) * 2010-02-01 2011-08-18 Hitachi High-Technologies Corp 露光装置、露光方法、及び表示用パネル基板の製造方法
KR101059811B1 (ko) * 2010-05-06 2011-08-26 삼성전자주식회사 마스크리스 노광 장치와 마스크리스 노광에서 오버레이를 위한 정렬 방법
JP2014066870A (ja) * 2012-09-26 2014-04-17 Hitachi High-Technologies Corp パターン形成方法及び装置、露光装置並びに表示用パネル製造方法
JP6900284B2 (ja) * 2017-09-27 2021-07-07 株式会社Ｓｃｒｅｅｎホールディングス 描画装置および描画方法

Also Published As

Publication number Publication date
JPWO2023032962A1 (https=) 2023-03-09
JP7837024B2 (ja) 2026-03-30
CN117882014A (zh) 2024-04-12
WO2023032962A1 (ja) 2023-03-09
KR20240055034A (ko) 2024-04-26

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