CN117821971A - 一种用于生化传感的衬底及制备方法 - Google Patents
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Abstract
本发明公开了一种用于生化传感的衬底及制备方法，涉及生化传感器技术领域。该用于生化传感的衬底及制备方法，能够制作小尺寸生化传感器，电极稳定性比印刷电极好，同时，利用退火金颗粒和光刻沉积金属工艺，能够制备出小尺寸高稳定性和高均一性金属电极，这种粗糙表面可以很好的增强电极与传感材料的吸附力，提高传感芯片的灵敏度和稳定性。
Description
技术领域
本发明涉及生化传感器技术领域，具体为一种用于生化传感的衬底及制备方法。
背景技术
金属电极是比较常见的生化传感芯片衬底，通过印刷方式可以在衬底上获得表面粗糙的电极薄膜，这种粗糙表面可以很好的增强电极与传感材料的吸附力，提高传感芯片的灵敏度和稳定性。
印刷的电极尺寸通常较大，印刷的电极表面形貌不易控制，当生化传感芯片尺寸减小，要求电极尺寸减小和电极均一性提高时，印刷的方式制作电极不再合适，此时就需要用到光刻技术来克服这一问题，但是，传统光刻工艺获得的电极表面比较平坦，这不利于传感材料的吸附和固定。为此，我们提出一种用于生化传感的衬底及制备方法，首选在衬底上制备比较均匀的金纳米颗粒，然后用光刻工艺在衬底上制作电极，这样制作出的电极表面粗糙，能够提高对传感材料的固定能力。
发明内容
(一)解决的技术问题
针对现有技术的不足，本发明提供了一种用于生化传感的衬底及制备方法，能够制备出小尺寸高稳定性和高均一性金属电极，这种粗糙表面可以很好的增强电极与传感材料的吸附力，提高传感芯片的灵敏度和稳定性等。
(二)技术方案
为实现以上目的，本发明通过以下技术方案予以实现：一种用于生化传感的衬底及制备方法，包括以下步骤：
S1:准备材料，准备所需的衬底；
S2:覆膜，在衬底的表面通过电子蒸发镀膜机，在真空条件下利用电子束进行直接加热金，使金气化并向衬底输运，在基底上凝结形成金薄膜；
S3:退火，将上述S2获得的覆盖金膜的衬底放置在真空炉中进行退火处理，获得表面覆盖金纳米颗粒的衬底；
S4:光刻，在带有金纳米颗粒的衬底上均匀覆上一层光刻胶，通过特定的光波照射在光刻胶上，可以对光刻胶进行选择性曝光，然后使用显影液溶解掉被照射的区域，完成光刻过程中电极图形的制作；
S5:气相沉积，通过化学气相沉积技术，在上述光刻后的衬底上，利用金属有机配合物向衬底表面沉积金属薄膜，在高真空的条件下，将金属有机配合物蒸发，使其分子从气相进入沉积室内部，然后再衬底的表面形成金属薄膜；
S6:超声，超声波的振动转换成电极与样品表面的摩擦运动，在摩擦过程中，上述衬底表面的氧化层会破坏掉，并且产生热量使金属薄膜变软，分子更活跃；同时对其施加压力，使电极端面与金属面互相浸入而形成分子间的熔合，此时表面粗糙的微型电极制作完毕。
作为本发明的进一步技术方案，所述步骤S1中的衬底选择表层有二氧化硅层的硅衬底或是石英衬底。
作为本发明的进一步技术方案，所述步骤S2中电子束蒸发形成金膜为2-8nm。
作为本发明的进一步技术方案，所述步骤S3中真空炉退火的温度为500-600℃，退火时间为1-3h。
作为本发明的进一步技术方案，所述步骤S5中的金属有机配合物为金化合物或者钛化合物，其可以通过喷雾、化学气相沉积或者溅射的方式获得。
作为本发明的进一步技术方案，所述步骤S5中沉积的薄膜为钛2-4nm或者金50-300nm。
(三)有益效果
本发明提供了一种用于生化传感的衬底及制备方法，具备以下有益效果：
本发明制备的电极能够制作小尺寸生化传感器，电极稳定性比印刷电极好，同时，利用退火金颗粒和光刻沉积金属工艺，能够制备出小尺寸高稳定性和高均一性金属电极，这种粗糙表面可以很好的增强电极与传感材料的吸附力，提高传感芯片的灵敏度和稳定性。
附图说明
图1为本发明一种用于生化传感的衬底及制备方法中衬底的示意图；
图2为本发明一种用于生化传感的衬底及制备方法中衬底表面覆盖金膜的示意图；
图3为本发明一种用于生化传感的衬底及制备方法中衬底表面覆盖金纳米颗粒的示意图；
图4为本发明一种用于生化传感的衬底及制备方法中涂抹光刻胶后的示意图；
图5为本发明一种用于生化传感的衬底及制备方法中沉积后的示意图；
图6为本发明一种用于生化传感的衬底及制备方法中成品的示意图。
图中：1、衬底；2、金膜；3、金纳米颗粒；4、光刻胶；5、粗糙金膜。
具体实施方式
下面将结合本发明实施例中的附图，对本发明实施例中的技术方案进行清楚、完整地描述，显然，所描述的实施例仅仅是本发明一部分实施例，而不是全部的实施例。基于本发明中的实施例，本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例，都属于本发明保护的范围。
请参阅图1-6，本发明提供一种技术方案：一种用于生化传感的衬底及制备方法，包括以下步骤：
S1:准备材料，准备所需的衬底1；
S2:覆膜，在衬底1的表面通过电子蒸发镀膜机，在真空条件下利用电子束进行直接加热金，使金气化并向衬底1运输，在基底上凝结形成金薄膜2；
S3:退火，将上述S2获得的覆盖金膜的衬底放置在真空炉中进行退火处理，获得表面覆盖金纳米颗粒3的衬底1；
S4:光刻，在带有金纳米颗粒3的衬底1上均匀覆上一层光刻胶4，通过特定的光波照射在光刻胶4上，可以对光刻胶4进行选择性曝光，然后使用显影液溶解掉被照射的区域，完成光刻过程中电极图形的制作；
S5:气相沉积，通过化学气相沉积技术，在上述光刻后的衬底1上，利用金属有机配合物向衬底表面沉积金属薄膜，在高真空的条件下，将金属有机配合物蒸发，使其分子从气相进入沉积室内部，然后再衬底的表面形成带有部分金纳米颗粒3的粗糙金膜5；
S6:超声，超声波的振动转换成电极与样品表面的摩擦运动，在摩擦过程中，上述衬底1表面的氧化层会破坏掉，并且产生热量使粗糙金膜5变软，分子更活跃；同时对其施加压力，使电极端面与金属面互相浸入而形成分子间的熔合，此时表面粗糙的微型电极制作完毕。
优选的，所述步骤S1中的衬底1选择表层有二氧化硅层的硅衬底或是石英衬底。
优选的，所述步骤S2中电子束蒸发形成金膜为2-8nm。
优选的，所述步骤S3中真空炉退火的温度为500-600℃，退火时间为1-3h。
优选的，所述步骤S5中的金属有机配合物为金化合物或者钛化合物，其可以通过喷雾、化学气相沉积或者溅射的方式获得。
优选的，所述步骤S5中沉积的薄膜为钛2-4nm或者金50-300nm。
需要说明的是，在本文中，诸如第一和第二等之类的关系术语仅仅用来将一个实体或者操作与另一个实体或操作区分开来，而不一定要求或者暗示这些实体或操作之间存在任何这种实际的关系或者顺序。而且，术语“包括”、“包含”或者其任何其他变体意在涵盖非排他性的包含，从而使得包括一系列要素的过程、方法、物品或者设备不仅包括那些要素，而且还包括没有明确列出的其他要素，或者是还包括为这种过程、方法、物品或者设备所固有的要素。在没有更多限制的情况下。由语句“包括一个......限定的要素，并不排除在包括所述要素的过程、方法、物品或者设备中还存在另外的相同要素”，该文中出现的电器元件均与外界的主控器及220V市电电连接，并且主控器可为计算机等起到控制的常规已知设备。
尽管已经示出和描述了本发明的实施例，对于本领域的普通技术人员而言，可以理解在不脱离本发明的原理和精神的情况下可以对这些实施例进行多种变化、修改、替换和变型，本发明的范围由所附权利要求及其等同物限定。
Claims (6)
1.一种用于生化传感的衬底及制备方法，其特征在于，包括以下步骤：
S1:准备材料，准备所需的衬底1；
S2:覆膜，在衬底1的表面通过电子蒸发镀膜机，在真空条件下利用电子束进行直接加热金，使金气化并向衬底1运输，在基底上凝结形成金薄膜2；
S3:退火，将上述S2获得的覆盖金膜的衬底放置在真空炉中进行退火处理，获得表面覆盖金纳米颗粒3的衬底1；
S4:光刻，在带有金纳米颗粒3的衬底1上均匀覆上一层光刻胶4，通过特定的光波照射在光刻胶4上，可以对光刻胶4进行选择性曝光，然后使用显影液溶解掉被照射的区域，完成光刻过程中电极图形的制作；
S5:气相沉积，通过化学气相沉积技术，在上述光刻后的衬底1上，利用金属有机配合物向衬底表面沉积金属薄膜，在高真空的条件下，将金属有机配合物蒸发，使其分子从气相进入沉积室内部，然后再衬底的表面形成带有部分金纳米颗粒3的粗糙金膜5；
S6:超声，超声波的振动转换成电极与样品表面的摩擦运动，在摩擦过程中，上述衬底1表面的氧化层会破坏掉，并且产生热量使粗糙金膜5变软，分子更活跃；同时对其施加压力，使电极端面与金属面互相浸入而形成分子间的熔合，此时表面粗糙的微型电极制作完毕。
2.根据权利要求1所述的一种用于生化传感的衬底及制备方法，其特征在于：所述步骤S1中的衬底1选择表层有二氧化硅层的硅衬底或是石英衬底。
3.根据权利要求1所述的一种用于生化传感的衬底及制备方法，其特征在于：所述步骤S2中电子束蒸发形成金膜为2-8nm。
4.根据权利要求1所述的一种用于生化传感的衬底及制备方法，其特征在于：所述步骤S3中真空炉退火的温度为500-600℃，退火时间为1-3h。
5.根据权利要求1所述的一种用于生化传感的衬底及制备方法，其特征在于：所述步骤S5中的金属有机配合物为金化合物或者钛化合物，其可以通过喷雾、化学气相沉积或者溅射的方式获得。
6.根据权利要求1所述的一种用于生化传感的衬底及制备方法，其特征在于：所述步骤S5中沉积的薄膜为钛2-4nm或者金50-300nm。
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