CN116157264B - 转印膜、层叠体的制造方法、电路配线的制造方法 - Google Patents

转印膜、层叠体的制造方法、电路配线的制造方法 Download PDF

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Publication number
CN116157264B
CN116157264B CN202180063024.XA CN202180063024A CN116157264B CN 116157264 B CN116157264 B CN 116157264B CN 202180063024 A CN202180063024 A CN 202180063024A CN 116157264 B CN116157264 B CN 116157264B
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layer
mass
photosensitive composition
meth
temporary support
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Chinese (zh)
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CN116157264A (zh
Inventor
有年阳平
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Fujifilm Corp
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Fujifilm Corp
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00—Layered products comprising a layer of synthetic resin
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/02—Physical, chemical or physicochemical properties
    • B32B7/023—Optical properties
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • General Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Human Computer Interaction (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Laminated Bodies (AREA)
CN202180063024.XA 2020-09-28 2021-09-09 转印膜、层叠体的制造方法、电路配线的制造方法 Active CN116157264B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020-162005 2020-09-28
JP2020162005 2020-09-28
PCT/JP2021/033130 WO2022065049A1 (ja) 2020-09-28 2021-09-09 転写フィルム、積層体の製造方法、回路配線の製造方法

Publications (2)

Publication Number Publication Date
CN116157264A CN116157264A (zh) 2023-05-23
CN116157264B true CN116157264B (zh) 2025-07-04

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CN202180063024.XA Active CN116157264B (zh) 2020-09-28 2021-09-09 转印膜、层叠体的制造方法、电路配线的制造方法

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Country Link
JP (1) JP7416969B2 (https=)
CN (1) CN116157264B (https=)
WO (1) WO2022065049A1 (https=)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009092818A (ja) * 2007-10-05 2009-04-30 Fujifilm Corp 感光性転写材料、カラーフィルタおよびその製造方法
CN103261966A (zh) * 2010-12-16 2013-08-21 日立化成株式会社 感光性元件、抗蚀图案的形成方法以及印刷布线板的制造方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09138499A (ja) * 1995-09-12 1997-05-27 Nippon Paint Co Ltd 水現像性フレキソ印刷用印刷板
JP5155621B2 (ja) 2007-08-14 2013-03-06 三菱樹脂株式会社 光触媒層の転写用キャリアフィルム
JP2017013387A (ja) 2015-07-02 2017-01-19 三菱樹脂株式会社 基材レス両面粘着シート用離型フィルム
WO2018061506A1 (ja) * 2016-09-29 2018-04-05 富士フイルム株式会社 タッチパネルの製造方法
WO2019146380A1 (ja) 2018-01-24 2019-08-01 富士フイルム株式会社 感光性転写材料及びその製造方法、樹脂パターンの製造方法、並びに、回路配線の製造方法
JPWO2020158316A1 (ja) * 2019-01-29 2021-12-09 富士フイルム株式会社 感光性転写材料、樹脂パターンの製造方法、回路配線の製造方法、タッチパネルの製造方法、並びに、フィルム及びその製造方法
JP7463905B2 (ja) 2019-09-27 2024-04-09 東レ株式会社 ドライフィルムレジスト用二軸配向ポリエステルフィルム
JP6954502B1 (ja) * 2020-03-26 2021-10-27 東洋紡株式会社 薄膜層転写用積層体
JP2022052031A (ja) 2020-09-23 2022-04-04 東レ株式会社 二軸配向ポリエステルフィルム

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009092818A (ja) * 2007-10-05 2009-04-30 Fujifilm Corp 感光性転写材料、カラーフィルタおよびその製造方法
CN103261966A (zh) * 2010-12-16 2013-08-21 日立化成株式会社 感光性元件、抗蚀图案的形成方法以及印刷布线板的制造方法

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WO2022065049A1 (ja) 2022-03-31
CN116157264A (zh) 2023-05-23
JPWO2022065049A1 (https=) 2022-03-31
JP7416969B2 (ja) 2024-01-17

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