CN115867793B - 荧光x射线分析装置 - Google Patents

荧光x射线分析装置

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Publication number
CN115867793B
CN115867793B CN202080102888.3A CN202080102888A CN115867793B CN 115867793 B CN115867793 B CN 115867793B CN 202080102888 A CN202080102888 A CN 202080102888A CN 115867793 B CN115867793 B CN 115867793B
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China
Prior art keywords
fluorescent
rays
sample
iron
sample chamber
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Active
Application number
CN202080102888.3A
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English (en)
Chinese (zh)
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CN115867793A (zh
Inventor
森久祐司
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Shimadzu Corp
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Shimadzu Corp
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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/223Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material by irradiating the sample with X-rays or gamma-rays and by measuring X-ray fluorescence
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00Investigating materials by wave or particle radiation
    • G01N2223/07Investigating materials by wave or particle radiation secondary emission
    • G01N2223/076X-ray fluorescence
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00Investigating materials by wave or particle radiation
    • G01N2223/30Accessories, mechanical or electrical features

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  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
CN202080102888.3A 2020-07-14 2020-07-14 荧光x射线分析装置 Active CN115867793B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2020/027312 WO2022013934A1 (ja) 2020-07-14 2020-07-14 蛍光x線分析装置

Publications (2)

Publication Number Publication Date
CN115867793A CN115867793A (zh) 2023-03-28
CN115867793B true CN115867793B (zh) 2025-08-05

Family

ID=79555359

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CN202080102888.3A Active CN115867793B (zh) 2020-07-14 2020-07-14 荧光x射线分析装置

Country Status (6)

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US (1) US12270773B2 (cg-RX-API-DMAC7.html)
EP (1) EP4184153A4 (cg-RX-API-DMAC7.html)
JP (1) JP7416254B2 (cg-RX-API-DMAC7.html)
CN (1) CN115867793B (cg-RX-API-DMAC7.html)
TW (1) TWI821667B (cg-RX-API-DMAC7.html)
WO (1) WO2022013934A1 (cg-RX-API-DMAC7.html)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109964119A (zh) * 2016-06-02 2019-07-02 维卡科技简易股份公司 用于校准传感器的过程、用于在线监测液体的变化的自动方法和相关传感器

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2336652A1 (de) 1973-07-18 1975-01-30 Siemens Ag Schichtsystem zur absorption von roentgenstrahlen
US4150179A (en) 1977-12-19 1979-04-17 University College Cardiff Hot dip aluminizing of steel strip
JPH06330346A (ja) 1993-05-24 1994-11-29 Nippon Steel Corp アルミメッキ鋼板
JP3166638B2 (ja) * 1996-11-29 2001-05-14 株式会社島津製作所 蛍光x線分析装置
US6266390B1 (en) 1998-09-21 2001-07-24 Spectramet, Llc High speed materials sorting using x-ray fluorescence
CA2393011C (en) 2002-07-11 2008-02-26 Janghyun Choi Production method for aluminum alloy coated steel sheet
JP2004197151A (ja) 2002-12-18 2004-07-15 Lucite Japan Kk 耐食性鉄材の製造方法
JP4166099B2 (ja) 2003-02-14 2008-10-15 Tdk株式会社 試料容器
JP4854005B2 (ja) 2006-02-24 2012-01-11 エスアイアイ・ナノテクノロジー株式会社 蛍光x線分析装置
JP2011022163A (ja) 2010-10-29 2011-02-03 Shimadzu Corp X線分析装置
JP2013108726A (ja) 2011-11-24 2013-06-06 Mitsubishi Electric Corp 検知装置、及び、検知方法
JP6305327B2 (ja) 2014-12-04 2018-04-04 株式会社日立ハイテクサイエンス 蛍光x線分析装置
JP2016114394A (ja) * 2014-12-12 2016-06-23 日鐵住金建材株式会社 放射能汚染物質隔離容器
US10175184B2 (en) * 2015-06-22 2019-01-08 Moxtek, Inc. XRF analyzer for light element detection
JP6642372B2 (ja) * 2016-10-14 2020-02-05 株式会社島津製作所 X線分析装置
US10914694B2 (en) * 2017-08-23 2021-02-09 Government Of The United States Of America, As Represented By The Secretary Of Commerce X-ray spectrometer

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109964119A (zh) * 2016-06-02 2019-07-02 维卡科技简易股份公司 用于校准传感器的过程、用于在线监测液体的变化的自动方法和相关传感器

Also Published As

Publication number Publication date
EP4184153A4 (en) 2024-04-17
US12270773B2 (en) 2025-04-08
JPWO2022013934A1 (cg-RX-API-DMAC7.html) 2022-01-20
WO2022013934A1 (ja) 2022-01-20
JP7416254B2 (ja) 2024-01-17
EP4184153A1 (en) 2023-05-24
CN115867793A (zh) 2023-03-28
US20230251214A1 (en) 2023-08-10
TW202202835A (zh) 2022-01-16
TWI821667B (zh) 2023-11-11

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