CN115598930A - 驱动装置及其控制方法、光刻装置和物品制造方法 - Google Patents

驱动装置及其控制方法、光刻装置和物品制造方法 Download PDF

Info

Publication number
CN115598930A
CN115598930A CN202210802453.0A CN202210802453A CN115598930A CN 115598930 A CN115598930 A CN 115598930A CN 202210802453 A CN202210802453 A CN 202210802453A CN 115598930 A CN115598930 A CN 115598930A
Authority
CN
China
Prior art keywords
stator
coils
linear motor
driving
mover
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202210802453.0A
Other languages
English (en)
Chinese (zh)
Inventor
星野勇人
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Publication of CN115598930A publication Critical patent/CN115598930A/zh
Pending legal-status Critical Current

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02K—DYNAMO-ELECTRIC MACHINES
    • H02K41/00—Propulsion systems in which a rigid body is moved along a path due to dynamo-electric interaction between the body and a magnetic field travelling along the path
    • H02K41/02—Linear motors; Sectional motors
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02P—CONTROL OR REGULATION OF ELECTRIC MOTORS, ELECTRIC GENERATORS OR DYNAMO-ELECTRIC CONVERTERS; CONTROLLING TRANSFORMERS, REACTORS OR CHOKE COILS
    • H02P25/00—Arrangements or methods for the control of AC motors characterised by the kind of AC motor or by structural details
    • H02P25/02—Arrangements or methods for the control of AC motors characterised by the kind of AC motor or by structural details characterised by the kind of motor
    • H02P25/06—Linear motors
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02P—CONTROL OR REGULATION OF ELECTRIC MOTORS, ELECTRIC GENERATORS OR DYNAMO-ELECTRIC CONVERTERS; CONTROLLING TRANSFORMERS, REACTORS OR CHOKE COILS
    • H02P25/00—Arrangements or methods for the control of AC motors characterised by the kind of AC motor or by structural details
    • H02P25/02—Arrangements or methods for the control of AC motors characterised by the kind of AC motor or by structural details characterised by the kind of motor
    • H02P25/06—Linear motors
    • H02P25/064—Linear motors of the synchronous type
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02P—CONTROL OR REGULATION OF ELECTRIC MOTORS, ELECTRIC GENERATORS OR DYNAMO-ELECTRIC CONVERTERS; CONTROLLING TRANSFORMERS, REACTORS OR CHOKE COILS
    • H02P25/00—Arrangements or methods for the control of AC motors characterised by the kind of AC motor or by structural details
    • H02P25/16—Arrangements or methods for the control of AC motors characterised by the kind of AC motor or by structural details characterised by the circuit arrangement or by the kind of wiring
    • H02P25/22—Multiple windings; Windings for more than three phases

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Combustion & Propulsion (AREA)
  • Electromagnetism (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Control Of Linear Motors (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
CN202210802453.0A 2021-07-07 2022-07-07 驱动装置及其控制方法、光刻装置和物品制造方法 Pending CN115598930A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2021-113134 2021-07-07
JP2021113134A JP7759200B2 (ja) 2021-07-07 2021-07-07 駆動装置の制御方法、駆動装置、リソグラフィ装置、および物品の製造方法

Publications (1)

Publication Number Publication Date
CN115598930A true CN115598930A (zh) 2023-01-13

Family

ID=82321546

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202210802453.0A Pending CN115598930A (zh) 2021-07-07 2022-07-07 驱动装置及其控制方法、光刻装置和物品制造方法

Country Status (5)

Country Link
US (3) US11754932B2 (https=)
EP (1) EP4116773A1 (https=)
JP (1) JP7759200B2 (https=)
KR (2) KR102905060B1 (https=)
CN (1) CN115598930A (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7759200B2 (ja) * 2021-07-07 2025-10-23 キヤノン株式会社 駆動装置の制御方法、駆動装置、リソグラフィ装置、および物品の製造方法

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20020018195A1 (en) * 2000-06-23 2002-02-14 Kazunori Iwamoto Moving mechanism in exposure apparatus, and exposure apparatus having the same
JP2006067761A (ja) * 2004-08-30 2006-03-09 Canon Inc 駆動装置
JP2008118729A (ja) * 2006-10-31 2008-05-22 Nsk Ltd 電動パワーステアリング装置
US20160233809A1 (en) * 2015-02-08 2016-08-11 Hyperloop Technologies, Inc. Dynamic linear stator segment control
CN110275398A (zh) * 2018-03-16 2019-09-24 佳能株式会社 台驱动装置、光刻装置和物品制造方法
CN112904677A (zh) * 2019-12-04 2021-06-04 佳能株式会社 搬送装置、曝光装置以及物品的制造方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04308450A (ja) * 1991-04-03 1992-10-30 Ricoh Co Ltd リニア直流モータ
JP3613291B2 (ja) * 1995-03-08 2005-01-26 株式会社ニコン 露光装置
JP3501559B2 (ja) 1995-06-27 2004-03-02 キヤノン株式会社 リニア・モータ装置
US6590355B1 (en) * 1999-06-07 2003-07-08 Nikon Corporation Linear motor device, stage device, and exposure apparatus
CA2343830C (en) * 2000-05-12 2005-02-08 Seiko Epson Corporation Drive mechanism control device and method
JP3724338B2 (ja) * 2000-06-09 2005-12-07 松下電工株式会社 扉開閉装置
JP4094799B2 (ja) * 2000-06-22 2008-06-04 日本トムソン株式会社 可動マグネット型リニアモータを内蔵したスライド装置
JP2012108608A (ja) * 2010-11-15 2012-06-07 Smc Corp アクチュエータ用駆動制御装置及びアクチュエータの駆動制御方法
JP6653179B2 (ja) * 2016-01-14 2020-02-26 Thk株式会社 リニアモータの制御装置及び制御方法
US10734912B2 (en) * 2016-08-24 2020-08-04 Beckhoff Automation Gmbh Stator device for a linear motor, linear drive system, and method for operating a stator device
JP7759200B2 (ja) * 2021-07-07 2025-10-23 キヤノン株式会社 駆動装置の制御方法、駆動装置、リソグラフィ装置、および物品の製造方法

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20020018195A1 (en) * 2000-06-23 2002-02-14 Kazunori Iwamoto Moving mechanism in exposure apparatus, and exposure apparatus having the same
JP2006067761A (ja) * 2004-08-30 2006-03-09 Canon Inc 駆動装置
US20070279614A1 (en) * 2004-08-30 2007-12-06 Canon Kabushiki Kaisha Linear Motor and Exposure Apparatus Having the Same
JP2008118729A (ja) * 2006-10-31 2008-05-22 Nsk Ltd 電動パワーステアリング装置
US20160233809A1 (en) * 2015-02-08 2016-08-11 Hyperloop Technologies, Inc. Dynamic linear stator segment control
CN110275398A (zh) * 2018-03-16 2019-09-24 佳能株式会社 台驱动装置、光刻装置和物品制造方法
CN112904677A (zh) * 2019-12-04 2021-06-04 佳能株式会社 搬送装置、曝光装置以及物品的制造方法

Also Published As

Publication number Publication date
EP4116773A1 (en) 2023-01-11
US20250021023A1 (en) 2025-01-16
US11754932B2 (en) 2023-09-12
JP7759200B2 (ja) 2025-10-23
KR20230008607A (ko) 2023-01-16
TW202304123A (zh) 2023-01-16
US12130560B2 (en) 2024-10-29
KR20260006527A (ko) 2026-01-13
KR102905060B1 (ko) 2025-12-29
US20230375946A1 (en) 2023-11-23
US20230011753A1 (en) 2023-01-12
JP2023009675A (ja) 2023-01-20

Similar Documents

Publication Publication Date Title
US11381196B2 (en) Stage driving apparatus, lithography apparatus, and method of manufacturing article
US20020117903A1 (en) Linear motor and stage apparatus, exposure apparatus, and device manufacturing method using the same
KR20260006527A (ko) 구동장치, 구동장치의 제어 방법, 리소그래피 장치, 및 물품의 제조 방법
KR102794589B1 (ko) 스테이지 장치, 리소그래피 장치, 및 물품제조방법
US7602088B2 (en) Linear motor and exposure apparatus having the same
EP4120022B1 (en) Exposure apparatus and method of manufacturing article
TWI922702B (zh) 驅動裝置及其控制方法、光刻裝置和物品製造方法
KR20090114458A (ko) 평면 모터, 위치 결정 장치, 노광 장치 및 디바이스 제조 방법
JP2025538084A (ja) リニアアクチュエータ用の冷却システム
JP2000029530A (ja) ステージ装置、およびこれを用いた露光装置ならびにデバイス製造方法
US9804507B2 (en) Stage apparatus, lithography apparatus, and article manufacturing method
US20050156473A1 (en) Polyphase linear motor and its drive method, and stage device, exposure system, and device manufacturing method using the polyphase linear motor
CN114326319B (zh) 载置台装置、光刻装置以及物品的制造方法
JP7022527B2 (ja) ステージ装置、リソグラフィ装置、および物品製造方法
TW200842507A (en) Moving apparatus
JP2002254270A (ja) ステージ装置およびこれを用いた露光装置ならびにデバイス製造方法

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination