CN115516637A - 阵列基板、阵列基板的制造方法与显示装置 - Google Patents

阵列基板、阵列基板的制造方法与显示装置 Download PDF

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CN115516637A
CN115516637A CN202180000793.5A CN202180000793A CN115516637A CN 115516637 A CN115516637 A CN 115516637A CN 202180000793 A CN202180000793 A CN 202180000793A CN 115516637 A CN115516637 A CN 115516637A
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substrate
layer
organic insulating
insulating layer
conductive layer
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张新秀
桑华煜
赵雪
谢晓冬
钟腾飞
徐文结
何敏
庞斌
吉强
张劲
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BOE Technology Group Co Ltd
Hefei Xinsheng Optoelectronics Technology Co Ltd
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BOE Technology Group Co Ltd
Hefei Xinsheng Optoelectronics Technology Co Ltd
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/12Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
    • H01L27/1214Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
    • H01L27/1248Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition or shape of the interlayer dielectric specially adapted to the circuit arrangement
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/12Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
    • H01L27/1214Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
    • H01L27/124Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or layout of the wiring layers specially adapted to the circuit arrangement, e.g. scanning lines in LCD pixel circuits
    • H01L27/1244Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or layout of the wiring layers specially adapted to the circuit arrangement, e.g. scanning lines in LCD pixel circuits for preventing breakage, peeling or short circuiting
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L25/00Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
    • H01L25/03Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes
    • H01L25/04Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers
    • H01L25/075Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L33/00
    • H01L25/0753Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L33/00 the devices being arranged next to each other
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
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    • H01L25/16Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof the devices being of types provided for in two or more different main groups of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. forming hybrid circuits
    • H01L25/167Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof the devices being of types provided for in two or more different main groups of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. forming hybrid circuits comprising optoelectronic devices, e.g. LED, photodiodes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/12Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
    • H01L27/1214Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
    • H01L27/124Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or layout of the wiring layers specially adapted to the circuit arrangement, e.g. scanning lines in LCD pixel circuits
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/48Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
    • H01L33/62Arrangements for conducting electric current to or from the semiconductor body, e.g. lead-frames, wire-bonds or solder balls
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2933/00Details relating to devices covered by the group H01L33/00 but not provided for in its subgroups
    • H01L2933/0008Processes
    • H01L2933/0033Processes relating to semiconductor body packages
    • H01L2933/0066Processes relating to semiconductor body packages relating to arrangements for conducting electric current to or from the semiconductor body

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  • Microelectronics & Electronic Packaging (AREA)
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  • Physics & Mathematics (AREA)
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  • Electroluminescent Light Sources (AREA)

Abstract

一种阵列基板、阵列基板的制造方法与显示装置,阵列基板包括:衬底(100)、第一导电层(310)、第二导电层(320)和至少两层有机绝缘层(510,520);第一导电层(310)设于衬底(100)的一侧;第二导电层(320)设于第一导电层(310)背离衬底(100)的一侧,且在衬底(100)上的正投影与第一导电层(310)在衬底(100)上的正投影具有交叠区,交叠区包括过孔区和走线区;至少两层有机绝缘层(510,520)设于第一导电层(310)与第二导电层(320)之间,且在衬底(100)上的正投影与走线区投影具有交叠。

Description

PCT国内申请,说明书已公开。

Claims (17)

  1. PCT国内申请,权利要求书已公开。
CN202180000793.5A 2021-04-16 2021-04-16 阵列基板、阵列基板的制造方法与显示装置 Pending CN115516637A (zh)

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Citations (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1429055A (zh) * 2001-11-09 2003-07-09 株式会社半导体能源研究所 发光设备及其制造方法
US20050041191A1 (en) * 2003-08-21 2005-02-24 Lg.Philips Lcd Co., Ltd. Chip-on-glass array substrate of liquid crystal display device and method of fabricating the same
CN102473369A (zh) * 2009-07-28 2012-05-23 夏普株式会社 配线基板及其制造方法、显示面板以及显示装置
CN102640292A (zh) * 2009-11-27 2012-08-15 株式会社半导体能源研究所 半导体装置和及其制造方法
CN104465652A (zh) * 2014-12-05 2015-03-25 上海天马微电子有限公司 一种阵列基板、显示装置及阵列基板的制作方法
CN106154757A (zh) * 2015-04-13 2016-11-23 华邦电子股份有限公司 掩模组
CN109671726A (zh) * 2019-01-04 2019-04-23 京东方科技集团股份有限公司 阵列基板及其制造方法、显示面板、显示装置
CN109742091A (zh) * 2019-01-10 2019-05-10 京东方科技集团股份有限公司 显示基板及其制备方法、显示装置
CN109935515A (zh) * 2017-12-18 2019-06-25 联华电子股份有限公司 形成图形的方法
CN111952323A (zh) * 2020-08-19 2020-11-17 京东方科技集团股份有限公司 一种显示基板的制备方法、显示基板及显示装置
CN112056005A (zh) * 2018-05-10 2020-12-08 夏普株式会社 显示装置
CN112505964A (zh) * 2020-11-20 2021-03-16 合肥鑫晟光电科技有限公司 发光基板及其制备方法、显示装置

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111524910A (zh) * 2020-04-29 2020-08-11 深圳市华星光电半导体显示技术有限公司 阵列基板及其制造方法、显示装置

Patent Citations (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1429055A (zh) * 2001-11-09 2003-07-09 株式会社半导体能源研究所 发光设备及其制造方法
US20050041191A1 (en) * 2003-08-21 2005-02-24 Lg.Philips Lcd Co., Ltd. Chip-on-glass array substrate of liquid crystal display device and method of fabricating the same
CN102473369A (zh) * 2009-07-28 2012-05-23 夏普株式会社 配线基板及其制造方法、显示面板以及显示装置
CN102640292A (zh) * 2009-11-27 2012-08-15 株式会社半导体能源研究所 半导体装置和及其制造方法
CN104465652A (zh) * 2014-12-05 2015-03-25 上海天马微电子有限公司 一种阵列基板、显示装置及阵列基板的制作方法
CN106154757A (zh) * 2015-04-13 2016-11-23 华邦电子股份有限公司 掩模组
CN109935515A (zh) * 2017-12-18 2019-06-25 联华电子股份有限公司 形成图形的方法
CN112056005A (zh) * 2018-05-10 2020-12-08 夏普株式会社 显示装置
CN109671726A (zh) * 2019-01-04 2019-04-23 京东方科技集团股份有限公司 阵列基板及其制造方法、显示面板、显示装置
CN109742091A (zh) * 2019-01-10 2019-05-10 京东方科技集团股份有限公司 显示基板及其制备方法、显示装置
CN111952323A (zh) * 2020-08-19 2020-11-17 京东方科技集团股份有限公司 一种显示基板的制备方法、显示基板及显示装置
CN112505964A (zh) * 2020-11-20 2021-03-16 合肥鑫晟光电科技有限公司 发光基板及其制备方法、显示装置

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