CN115398338A - 固化性树脂组合物、干膜、固化物和印刷电路板 - Google Patents

固化性树脂组合物、干膜、固化物和印刷电路板 Download PDF

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Publication number
CN115398338A
CN115398338A CN202180028109.4A CN202180028109A CN115398338A CN 115398338 A CN115398338 A CN 115398338A CN 202180028109 A CN202180028109 A CN 202180028109A CN 115398338 A CN115398338 A CN 115398338A
Authority
CN
China
Prior art keywords
group
resin composition
resin
curable resin
parts
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202180028109.4A
Other languages
English (en)
Chinese (zh)
Inventor
内山强
赖田一树
福田晋一朗
宫部英和
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Taiyo Holdings Co Ltd
Original Assignee
Taiyo Ink Mfg Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Taiyo Ink Mfg Co Ltd filed Critical Taiyo Ink Mfg Co Ltd
Publication of CN115398338A publication Critical patent/CN115398338A/zh
Pending legal-status Critical Current

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Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/22Secondary treatment of printed circuits
    • H05K3/28Applying non-metallic protective coatings

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Materials For Photolithography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
CN202180028109.4A 2020-04-14 2021-04-13 固化性树脂组合物、干膜、固化物和印刷电路板 Pending CN115398338A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020-072546 2020-04-14
JP2020072546A JP2021170054A (ja) 2020-04-14 2020-04-14 硬化性樹脂組成物、ドライフィルム、硬化物およびプリント配線板
PCT/JP2021/015290 WO2021210570A1 (ja) 2020-04-14 2021-04-13 硬化性樹脂組成物、ドライフィルム、硬化物およびプリント配線板

Publications (1)

Publication Number Publication Date
CN115398338A true CN115398338A (zh) 2022-11-25

Family

ID=78084873

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202180028109.4A Pending CN115398338A (zh) 2020-04-14 2021-04-13 固化性树脂组合物、干膜、固化物和印刷电路板

Country Status (5)

Country Link
JP (1) JP2021170054A (ko)
KR (1) KR20230008035A (ko)
CN (1) CN115398338A (ko)
TW (1) TW202204460A (ko)
WO (1) WO2021210570A1 (ko)

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61243869A (ja) 1985-04-19 1986-10-30 Taiyo Ink Seizo Kk レジストインキ組成物
JP5380034B2 (ja) * 2008-10-09 2014-01-08 太陽ホールディングス株式会社 黒色ソルダーレジスト組成物及びその硬化物
JP5766671B2 (ja) * 2012-09-05 2015-08-19 株式会社タムラ製作所 黒色硬化性樹脂組成物およびそれを用いたプリント配線基板
JP6093563B2 (ja) * 2012-12-11 2017-03-08 株式会社カネカ 黒色感光性樹脂組成物及びその利用
JP7324595B2 (ja) * 2018-03-30 2023-08-10 太陽ホールディングス株式会社 黒色感光性樹脂組成物、その硬化物、およびリジッドフレキシブルプリント配線板
JP6820982B2 (ja) * 2018-08-03 2021-01-27 株式会社タムラ製作所 黒色硬化性樹脂組成物およびプリント配線基板

Also Published As

Publication number Publication date
KR20230008035A (ko) 2023-01-13
JP2021170054A (ja) 2021-10-28
TW202204460A (zh) 2022-02-01
WO2021210570A1 (ja) 2021-10-21

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Effective date of registration: 20230705

Address after: Saitama Prefecture, Japan

Applicant after: TAIYO HOLDINGS Co.,Ltd.

Address before: Saitama Prefecture, Japan

Applicant before: TAIYO INK MFG. Co.,Ltd.

TA01 Transfer of patent application right
CB02 Change of applicant information

Address after: Saitama Prefecture, Japan

Applicant after: TAIYO HOLDINGS Co.,Ltd.

Address before: Saitama Prefecture, Japan

Applicant before: TAIYO HOLDINGS Co.,Ltd.

CB02 Change of applicant information