CN115072991B - 磁记录介质基板用玻璃、磁记录介质基板、磁记录介质和磁记录再生装置用玻璃间隔物 - Google Patents

磁记录介质基板用玻璃、磁记录介质基板、磁记录介质和磁记录再生装置用玻璃间隔物 Download PDF

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Publication number
CN115072991B
CN115072991B CN202210793597.4A CN202210793597A CN115072991B CN 115072991 B CN115072991 B CN 115072991B CN 202210793597 A CN202210793597 A CN 202210793597A CN 115072991 B CN115072991 B CN 115072991B
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China
Prior art keywords
glass
magnetic recording
recording medium
content
medium substrate
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Chinese (zh)
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CN115072991A (zh
Inventor
佐藤浩一
桥本和明
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Hoya Corp
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Hoya Corp
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
    • C03C3/085—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
    • C03C3/085—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal
    • C03C3/087—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal containing calcium oxide, e.g. common sheet or container glass
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
    • C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/095—Glass compositions containing silica with 40% to 90% silica, by weight containing rare earths
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/097—Glass compositions containing silica with 40% to 90% silica, by weight containing phosphorus, niobium or tantalum
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62—Record carriers characterised by the selection of the material
    • G11B5/64—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent
    • G11B5/65—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent characterised by its composition
    • G11B5/658—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent characterised by its composition containing oxygen, e.g. molecular oxygen or magnetic oxide
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62—Record carriers characterised by the selection of the material
    • G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62—Record carriers characterised by the selection of the material
    • G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
    • G11B5/739—Magnetic recording media substrates
    • G11B5/73911—Inorganic substrates
    • G11B5/73921—Glass or ceramic substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Geochemistry & Mineralogy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Inorganic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Physics & Mathematics (AREA)
  • Glass Compositions (AREA)
  • Magnetic Record Carriers (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Holding Or Fastening Of Disk On Rotational Shaft (AREA)
CN202210793597.4A 2016-11-14 2017-11-14 磁记录介质基板用玻璃、磁记录介质基板、磁记录介质和磁记录再生装置用玻璃间隔物 Active CN115072991B (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202210793597.4A CN115072991B (zh) 2016-11-14 2017-11-14 磁记录介质基板用玻璃、磁记录介质基板、磁记录介质和磁记录再生装置用玻璃间隔物

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2016-221389 2016-11-14
JP2016221389 2016-11-14
PCT/JP2017/040833 WO2018088563A1 (ja) 2016-11-14 2017-11-14 磁気記録媒体基板用ガラス、磁気記録媒体基板、磁気記録媒体および磁気記録再生装置用ガラススペーサ
CN201780069628.9A CN109923083B (zh) 2016-11-14 2017-11-14 磁记录介质基板用玻璃、磁记录介质基板、磁记录介质和磁记录再生装置用玻璃间隔物
CN202210793597.4A CN115072991B (zh) 2016-11-14 2017-11-14 磁记录介质基板用玻璃、磁记录介质基板、磁记录介质和磁记录再生装置用玻璃间隔物

Related Parent Applications (1)

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CN115072991A CN115072991A (zh) 2022-09-20
CN115072991B true CN115072991B (zh) 2024-07-19

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CN201780069628.9A Active CN109923083B (zh) 2016-11-14 2017-11-14 磁记录介质基板用玻璃、磁记录介质基板、磁记录介质和磁记录再生装置用玻璃间隔物

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Country Status (5)

Country Link
US (4) US11081133B2 (enExample)
JP (4) JP6694074B2 (enExample)
CN (2) CN115072991B (enExample)
SG (1) SG10202102247RA (enExample)
WO (1) WO2018088563A1 (enExample)

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WO2019221102A1 (ja) * 2018-05-16 2019-11-21 Hoya株式会社 磁気記録媒体基板用ガラス、磁気記録媒体基板、磁気記録媒体、磁気記録再生装置用ガラススペーサおよび磁気記録再生装置
JP7389545B2 (ja) * 2018-12-10 2023-11-30 Hoya株式会社 磁気記録媒体基板用ガラス、磁気記録媒体基板、磁気記録媒体
JP7229357B2 (ja) * 2019-07-22 2023-02-27 Hoya株式会社 磁気記録媒体基板用または磁気記録再生装置用ガラススペーサ用のガラス、磁気記録媒体基板、磁気記録媒体、磁気記録再生装置用ガラススペーサおよび磁気記録再生装置
KR102809471B1 (ko) * 2019-07-29 2025-05-19 에이지씨 가부시키가이샤 지지 유리 기판
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WO2021117897A1 (ja) 2019-12-13 2021-06-17 Hoya株式会社 磁気記録媒体基板用または磁気記録再生装置用ガラススペーサ用のガラス、磁気記録媒体基板、磁気記録媒体、磁気記録再生装置用ガラススペーサおよび磁気記録再生装置
CN116964013A (zh) * 2021-03-05 2023-10-27 豪雅株式会社 磁记录介质基板用玻璃或磁记录再生装置用玻璃间隔物用的玻璃、磁记录介质基板、磁记录介质、磁记录再生装置用玻璃间隔物和磁记录再生装置
WO2022186393A1 (ja) * 2021-03-05 2022-09-09 Hoya株式会社 磁気記録媒体基板用または磁気記録再生装置用ガラススペーサ用のガラス、磁気記録媒体基板、磁気記録媒体、磁気記録再生装置用ガラススペーサおよび磁気記録再生装置
CN117486486A (zh) * 2022-07-20 2024-02-02 荣耀终端有限公司 一种钇铝硅酸盐玻璃、制备方法及电子设备
CN119836403A (zh) * 2022-09-08 2025-04-15 豪雅株式会社 磁记录介质基板用玻璃、磁记录介质基板和磁记录再生装置
JPWO2024190443A1 (enExample) * 2023-03-13 2024-09-19
WO2024219375A1 (ja) * 2023-04-17 2024-10-24 Ａｇｃ株式会社 ガラス
WO2024238181A1 (en) * 2023-05-18 2024-11-21 Corning Incorporated Lithium-free ion exchangeable glasses
WO2025206374A1 (ja) * 2024-03-29 2025-10-02 Hoya株式会社 磁気記録装置、及び積層構造体

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CN115072991A (zh) 2022-09-20
JP6694074B2 (ja) 2020-05-13
JP2024069356A (ja) 2024-05-21
JP7734777B2 (ja) 2025-09-05
CN109923083A (zh) 2019-06-21
US20190362754A1 (en) 2019-11-28
JP7454021B2 (ja) 2024-03-21
US20230103236A1 (en) 2023-03-30
JP2020121920A (ja) 2020-08-13
US12040003B2 (en) 2024-07-16
WO2018088563A1 (ja) 2018-05-17
JPWO2018088563A1 (ja) 2019-10-10
US20240321310A1 (en) 2024-09-26
US11551714B2 (en) 2023-01-10
CN109923083B (zh) 2022-07-26
SG10202102247RA (en) 2021-04-29
JP7135024B2 (ja) 2022-09-12
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