CN115025926A - 一种实现单面涂覆的链式沉积设备 - Google Patents
一种实现单面涂覆的链式沉积设备 Download PDFInfo
- Publication number
- CN115025926A CN115025926A CN202210825333.2A CN202210825333A CN115025926A CN 115025926 A CN115025926 A CN 115025926A CN 202210825333 A CN202210825333 A CN 202210825333A CN 115025926 A CN115025926 A CN 115025926A
- Authority
- CN
- China
- Prior art keywords
- roller
- belt
- conveyor belt
- outer ring
- deposition apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011248 coating agent Substances 0.000 title claims abstract description 80
- 238000000576 coating method Methods 0.000 title claims abstract description 80
- 230000008021 deposition Effects 0.000 title claims abstract description 35
- 239000007788 liquid Substances 0.000 claims abstract description 68
- 238000004140 cleaning Methods 0.000 claims abstract description 63
- 238000001035 drying Methods 0.000 claims abstract description 48
- 238000000034 method Methods 0.000 claims abstract description 23
- 238000005201 scrubbing Methods 0.000 claims description 46
- 238000007654 immersion Methods 0.000 claims description 30
- 239000007921 spray Substances 0.000 claims description 11
- 238000002791 soaking Methods 0.000 claims description 10
- 238000005554 pickling Methods 0.000 claims description 7
- 238000000861 blow drying Methods 0.000 claims description 6
- 238000005507 spraying Methods 0.000 claims description 5
- 238000005406 washing Methods 0.000 claims description 5
- 238000000889 atomisation Methods 0.000 claims description 3
- 238000007761 roller coating Methods 0.000 claims description 3
- 238000007650 screen-printing Methods 0.000 claims description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract description 48
- 229910052710 silicon Inorganic materials 0.000 abstract description 48
- 239000010703 silicon Substances 0.000 abstract description 48
- 235000012431 wafers Nutrition 0.000 description 40
- 238000000151 deposition Methods 0.000 description 13
- 239000000463 material Substances 0.000 description 5
- 239000000428 dust Substances 0.000 description 4
- 239000012535 impurity Substances 0.000 description 4
- 238000005034 decoration Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000007779 soft material Substances 0.000 description 2
- 239000004677 Nylon Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- 238000007774 anilox coating Methods 0.000 description 1
- 238000010923 batch production Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 238000007665 sagging Methods 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C1/00—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating
- B05C1/04—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to work of indefinite length
- B05C1/08—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to work of indefinite length using a roller or other rotating member which contacts the work along a generating line
- B05C1/0808—Details thereof, e.g. surface characteristics
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C1/00—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating
- B05C1/04—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to work of indefinite length
- B05C1/08—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to work of indefinite length using a roller or other rotating member which contacts the work along a generating line
- B05C1/086—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to work of indefinite length using a roller or other rotating member which contacts the work along a generating line a pool of coating material being formed between a roller, e.g. a dosing roller and an element cooperating therewith
- B05C1/0865—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to work of indefinite length using a roller or other rotating member which contacts the work along a generating line a pool of coating material being formed between a roller, e.g. a dosing roller and an element cooperating therewith the cooperating element being a roller, e.g. a coating roller
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C13/00—Means for manipulating or holding work, e.g. for separate articles
- B05C13/02—Means for manipulating or holding work, e.g. for separate articles for particular articles
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/67034—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67742—Mechanical parts of transfer devices
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Robotics (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
本发明公开了一种实现单面涂覆的链式沉积设备,包括传送带,传送带包括输送带;传送带的正上方设有液态源沉积装置;传送带的下部设有:对输送带外圈进行清洗的清洗装置,以及对输送带外圈进行干燥处理的干燥装置;且输送带转动过程中先经过清洗装置后经过干燥装置。本发明可使硅片仅有上表面涂覆液态源,实现硅片单面涂覆液态源,并使硅片下表面保持清洁;本发明可根据需要选择涂覆辊的软硬度,可解决涂覆辊和液态源的匹配问题。
Description
技术领域
本发明涉及一种实现单面涂覆的链式沉积设备。
背景技术
光伏电池片制备过程中,需要对硅片进行单面涂覆液态源,如仅在硅片一侧表面滚涂液态源。一般是采用辊道平置传送硅片,并通过辊道正上方的涂覆辊对硅片的上表面滚涂液态源。为了控制液态源的滚涂厚度,需要将辊道的一个传动辊设置在涂覆辊正下方,硅片经过该传动辊与涂覆辊之间的间隙,涂覆辊可在硅片上表面涂覆一层一定厚度的液态源。
但批量生产时,辊道上的硅片是间隔排列的,辊道传送方向上相邻两个硅片之间有一定间隔。故涂覆辊正下方并非一直有硅片,在前一硅片已经过涂覆辊而后一硅片还未到达涂覆辊正下方时,涂覆辊上的液态源可能会掉落在传动辊上,即涂覆辊正下方的传动辊也带有了液态源;后续硅片经过传动辊与涂覆辊之间的间隙时,硅片的下表面会与传动辊上的液态源接触,进而硅片的下表面也会沾上一定量的液态源,这样硅片就不是仅单面沉积液态源了,会影响后续制程,甚至影响最终所制备光伏电池片的性能。
另外,目前辊道一般采用硬质传动辊来传送硅片,相应的,涂覆辊就只能选用硬度较小的材质(如采用软辊),这限制了涂覆辊的材料选型范围,会导致涂覆辊与液态源匹配度较差。
发明内容
为解决现有技术的缺陷,本发明提供一种实现单面涂覆的链式沉积设备,包括传送带,传送带包括:用于平置传送硅片的输送带;传送带的正上方设有:用于对(输送带上)硅片上表面沉积液态源的液态源沉积装置;传送带的下部设有:用于对输送带外圈进行干燥处理的干燥装置。
优选的,所述干燥装置包括:用于吹干输送带外圈的吹干装置(如风刀)。
优选的,所述吹干装置的气源为:室温气体,或经过加热的气体。
优选的,所述干燥装置包括:用于烘干输送带外圈的烘干装置。
优选的,所述烘干装置包括:可供输送带通行的烘箱;输送带在烘箱中通行,且烘箱加热烘干在烘箱中通行的输送带。
优选的,所述传送带的下部还设有:用于对输送带外圈进行清洗的清洗装置;且输送带转动过程中先经过清洗装置后经过干燥装置。
优选的,所述清洗装置包括:用于对输送带外圈进行浸洗的浸洗装置;且输送带转动过程中先经过浸洗装置后经过干燥装置。
优选的,所述浸洗装置包括:存有清洗液的浸洗槽;
所述传送带的下部还设有:用于引导输送带浸入浸洗槽的浸洗辊;浸洗辊位于输送带的内圈,且浸洗辊的底部浸入浸洗槽中;
且输送带转动过程中先经过浸洗槽后经过干燥装置。
优选的,所述清洗装置包括:用于对输送带外圈进行喷洗的喷洗装置(如对输送带外圈喷洒清洗液的喷嘴);且输送带转动过程中先经过喷洗装置后经过干燥装置。
优选的,所述清洗装置包括:用于对输送带外圈进行擦洗的擦洗装置;且输送带转动过程中先经过擦洗装置后经过干燥装置。
优选的,所述擦洗装置包括:用于对输送带外圈进行擦洗的擦洗辊;擦洗辊位于输送带的外圈;擦洗辊配有:用于去除擦洗辊上液体的挤液辊;挤液辊贴靠擦洗辊;且输送带转动过程中先经过擦洗辊后经过干燥装置。
优选的,所述液态源沉积装置为滚涂装置、喷涂装置、超声雾化沉积装置、丝网印刷装置。
优选的,所述滚涂装置包括:用于对(输送带上)硅片上表面滚涂液态源的涂覆辊。
优选的,所述传送带还包括:用于支撑输送带的支撑辊;支撑辊位于输送带的内圈,且支撑辊位于涂覆辊正下方。
优选的,所述涂覆辊为软辊,且支撑辊为硬辊;或者,涂覆辊为硬辊,且支撑辊为软辊。
优选的,所述传送带还包括:用于驱动输送带转动的一对传动辊;该对传动辊位于输送带的内圈,且该对传动辊分设在传送带两端。
优选的,所述输送带为软性皮带输送带或链板输送带。
优选的,所述涂覆辊还配有带液辊和供液管。
优选的,所述输送带通过擦洗辊和浸洗辊进行张紧。
本发明的优点和有益效果在于:
1)本发明在传送带的下部设置干燥装置,可在输送带外圈回转至传送带上部之前,对输送带外圈进行干燥处理,使回转至传送带上部的输送带外圈保持干燥,使输送带外圈上附着的液态源挥发;进而避免硅片在传送带上传送时,硅片下表面沾着输送带外圈上的液态源;可使硅片仅有上表面涂覆液态源,实现硅片单面涂覆液态源。
2)针对某些液态源在干燥处理时可能不易挥发,以及传送带传送过程中输送带外圈可能会附着一些灰尘杂质等;本发明还在传送带的下部设置清洗装置,且使输送带转动过程中先经过清洗装置后经过干燥装置;清洗装置可对输送带外圈进行清洗(包括浸洗、喷洗、擦洗),可在干燥处理之前将输送带外圈上附着的液态源以及灰尘杂质等清洗掉;干燥装置可对清洗后的输送带外圈进行干燥处理,使回转至传送带上部的输送带外圈保持干燥洁净;进而避免硅片在传送带上传送时,硅片下表面沾着输送带外圈上的液态源,或者硅片下表面被输送带外圈上的灰尘杂质等污染;可使硅片仅有上表面涂覆液态源,实现硅片单面涂覆液态源,并使硅片下表面保持清洁。
3)本发明采用输送带传送硅片,且采用支撑辊来支撑输送带;支撑辊既可以采用硬辊(硬质材质)又可以采用软辊(软性材质),如:支撑辊采用软辊且涂覆辊采用硬辊,或者,支撑辊采用硬辊且涂覆辊采用软辊;故涂覆辊也是既可以采用硬辊(硬质材质)又可以采用软辊(软性材质),进而可根据需要选择涂覆辊的软硬度,可解决涂覆辊和液态源的匹配问题。
附图说明
图1是本发明的示意图。
具体实施方式
下面结合附图和实施例,对本发明的具体实施方式作进一步描述。以下实施例仅用于更加清楚地说明本发明的技术方案,而不能以此来限制本发明的保护范围。
本发明一种实现单面涂覆的链式沉积设备,包括传送带;传送带包括:用于平置传送硅片的输送带,用于驱动输送带循环转动的一对传动辊;该对传动辊位于输送带的内圈,且该对传动辊分设在传送带两端;输送带为软性皮带输送带或链板输送带;
所述传送带的正上方设有:用于对(输送带上)硅片上表面沉积液态源的液态源沉积装置;
所述传送带的下部设有:用于对输送带外圈进行清洗的清洗装置,以及用于对输送带外圈进行干燥处理的干燥装置;且输送带循环转动过程中先经过清洗装置后经过干燥装置。
具体的:
1)所述液态源沉积装置可采用如下几种装置中的一种或几种:滚涂装置、喷涂装置、超声雾化沉积装置、丝网印刷装置;
所述滚涂装置可采用:用于对(输送带上)硅片上表面滚涂液态源的涂覆辊;所述传送带还包括:用于支撑输送带的支撑辊;支撑辊位于输送带的内圈,且支撑辊位于涂覆辊正下方;所述涂覆辊为软辊,且支撑辊为硬辊;或者,涂覆辊为硬辊,且支撑辊为软辊;所述涂覆辊还可配有带液辊和供液管。
2)所述清洗装置可采用如下几种装置中的一种或几种:用于对输送带外圈进行浸洗的浸洗装置,用于对输送带外圈进行喷洗的喷洗装置,用于对输送带外圈进行擦洗的擦洗装置;
所述浸洗装置可采用:存有清洗液的浸洗槽;所述传送带的下部还设有:用于引导输送带浸入浸洗槽的浸洗辊;浸洗辊位于输送带的内圈,且浸洗辊的底部浸入浸洗槽中;且输送带转动过程中先经过浸洗装置/浸洗槽后经过干燥装置;
所述喷洗装置可采用:用于对输送带外圈喷洒清洗液的喷嘴;且输送带转动过程中先经过喷洗装置/喷嘴后经过干燥装置;
所述擦洗装置可采用:用于对输送带外圈进行擦洗的擦洗辊;擦洗辊位于输送带的外圈;擦洗辊配有:用于去除擦洗辊上液体的挤液辊;挤液辊贴靠擦洗辊;且输送带转动过程中先经过擦洗辊后经过干燥装置。
3)所述干燥装置可采用如下几种装置中的一种或几种:用于吹干输送带外圈的吹干装置,用于烘干输送带外圈的烘干装置;
所述吹干装置可采用风刀;吹干装置的气源可采用:室温气体,或经过加热的气体;
所述烘干装置可采用:可供输送带通行的烘箱;输送带在烘箱中通行,且烘箱加热烘干在烘箱中通行的输送带。
更具体的:
所述供液管、带液辊、涂覆辊、传动辊、输送带、擦洗辊、浸洗辊可采用耐腐蚀无污染的非金属材质。
所述带液辊可采用表面光滑辊、螺纹辊、网纹辊或花辊。
所述涂覆辊、支撑辊、擦洗辊、浸洗辊分别可采用塑料辊、陶瓷辊、胶辊或海绵辊。
所述皮带输送带可采用尼龙、PE、硅胶、特氟龙等材质。
本发明的具体实施例如下:
如图1所示,本发明一种实现单面涂覆的链式沉积设备,包括传送带;传送带包括:用于平置传送硅片8的皮带输送带1,用于驱动皮带输送带1循环转动的第一传动辊21、第二传动辊22,用于支撑皮带输送带1的支撑辊23;第一传动辊21、第二传动辊22位于皮带输送带1的内圈,且第一传动辊21、第二传动辊22分设在传送带两端;
所述传送带的正上方设有:用于对(皮带输送带1上)硅片8上表面滚涂液态源的涂覆辊31;所述支撑辊23位于皮带输送带1的内圈,且支撑辊23位于涂覆辊31正下方;涂覆辊31还可配有带液辊32和供液管4;
所述传送带的下部设有:用于对皮带输送带1外圈进行擦洗的第一擦洗辊51,存有清洗液的浸洗槽6,用于引导皮带输送带1浸入浸洗槽6的浸洗辊52,用于对皮带输送带1外圈进行擦洗的第二擦洗辊53,用于吹干皮带输送带1外表面的风刀7;第一擦洗辊51、第二擦洗辊53位于皮带输送带1的外圈;浸洗辊52位于皮带输送带1的内圈,且浸洗辊52的底部浸入浸洗槽6中;
所述皮带输送带1通过第一擦洗辊51、浸洗辊52和第二擦洗辊53进行张紧;且皮带输送带1循环转动过程中依次经过第一擦洗辊51、浸洗辊52/浸洗槽6、第二擦洗辊53、风刀7、第一传动辊21、支撑辊23/涂覆辊31、第二传动辊22。
第一传动辊21、第二传动辊22驱动皮带输送带1循环转动;
皮带输送带1外圈转动至传送带下部时,皮带输送带1外圈先经过第一擦洗辊51的擦洗,然后皮带输送带1外圈被浸洗辊52引入存有清洗液的浸洗槽6进行浸洗,然后皮带输送带1外圈经过第二擦洗辊53的擦洗,浸洗和两次擦洗可将输送带1外圈上附着的液态源以及灰尘杂质等清洗掉;然后清洗后的皮带输送带1外圈经过风刀7吹干,使皮带输送带1外圈残留的清洗液去除,此时皮带输送带1外圈干燥洁净;
干燥洁净的皮带输送带1外圈转动至传送带上部时,将待涂覆液态源的硅片8平置在皮带输送带1外圈上;皮带输送带1平置传送硅片8;液态源通过供液管4输送至带液辊32和涂覆辊31之间,且涂覆辊31正下方设有支撑辊23;硅片8随皮带输送带1经过支撑辊23与涂覆辊31之间的间隙,涂覆辊31可在硅片8上表面涂覆一层一定厚度的液态源,且支撑辊23可防止涂覆时涂覆辊31下方的皮带输送带1受力下垂;
由于皮带输送带1外圈先经过浸洗、擦洗和吹干,再承载传送硅片8,故可保证与硅片8下表面接触的皮带输送带1外圈是干燥洁净的,可使硅片8仅有上表面涂覆液态源,实现硅片8单面涂覆液态源,并使硅片8下表面保持清洁。
以上所述仅是本发明的优选实施方式,应当指出,对于本技术领域的普通技术人员来说,在不脱离本发明技术原理的前提下,还可以做出若干改进和润饰,这些改进和润饰也应视为本发明的保护范围。
Claims (18)
1.一种实现单面涂覆的链式沉积设备,其特征在于,包括传送带,传送带包括输送带;传送带的正上方设有液态源沉积装置;传送带的下部设有对输送带外圈进行干燥处理的干燥装置。
2.根据权利要求1所述的实现单面涂覆的链式沉积设备,其特征在于,所述干燥装置包括:吹干输送带外圈的吹干装置。
3.根据权利要求2所述的实现单面涂覆的链式沉积设备,其特征在于,所述吹干装置的气源为:室温气体,或经过加热的气体。
4.根据权利要求1所述的实现单面涂覆的链式沉积设备,其特征在于,所述干燥装置包括:烘干输送带外圈的烘干装置。
5.根据权利要求4所述的实现单面涂覆的链式沉积设备,其特征在于,所述烘干装置包括:可供输送带通行的烘箱;输送带在烘箱中通行,且烘箱加热烘干输送带。
6.根据权利要求1所述的实现单面涂覆的链式沉积设备,其特征在于,所述传送带的下部还设有:对输送带外圈进行清洗的清洗装置;且输送带转动过程中先经过清洗装置后经过干燥装置。
7.根据权利要求6所述的实现单面涂覆的链式沉积设备,其特征在于,所述清洗装置包括:对输送带外圈进行浸洗的浸洗装置;且输送带转动过程中先经过浸洗装置后经过干燥装置。
8.根据权利要求7所述的实现单面涂覆的链式沉积设备,其特征在于,所述浸洗装置包括:存有清洗液的浸洗槽;
所述传送带的下部还设有:引导输送带浸入浸洗槽的浸洗辊;浸洗辊的底部浸入浸洗槽中;
且输送带转动过程中先经过浸洗槽后经过干燥装置。
9.根据权利要求6所述的实现单面涂覆的链式沉积设备,其特征在于,所述清洗装置包括:对输送带外圈进行喷洗的喷洗装置;且输送带转动过程中先经过喷洗装置后经过干燥装置。
10.根据权利要求6所述的实现单面涂覆的链式沉积设备,其特征在于,所述清洗装置包括:对输送带外圈进行擦洗的擦洗装置;且输送带转动过程中先经过擦洗装置后经过干燥装置。
11.根据权利要求10所述的实现单面涂覆的链式沉积设备,其特征在于,所述擦洗装置包括:对输送带外圈进行擦洗的擦洗辊;擦洗辊配有:去除擦洗辊上液体的挤液辊;挤液辊贴靠擦洗辊;且输送带转动过程中先经过擦洗辊后经过干燥装置。
12.根据权利要求1所述的实现单面涂覆的链式沉积设备,其特征在于,所述液态源沉积装置为滚涂装置、喷涂装置、超声雾化沉积装置、丝网印刷装置。
13.根据权利要求12所述的实现单面涂覆的链式沉积设备,其特征在于,所述滚涂装置包括涂覆辊。
14.根据权利要求13所述的实现单面涂覆的链式沉积设备,其特征在于,所述传送带还包括:支撑输送带的支撑辊;支撑辊位于涂覆辊正下方。
15.根据权利要求14所述的实现单面涂覆的链式沉积设备,其特征在于,所述涂覆辊为软辊,且支撑辊为硬辊;或者,涂覆辊为硬辊,且支撑辊为软辊。
16.根据权利要求1所述的实现单面涂覆的链式沉积设备,其特征在于,所述传送带还包括:驱动输送带转动的一对传动辊;该对传动辊分设在传送带两端。
17.根据权利要求1所述的实现单面涂覆的链式沉积设备,其特征在于,所述输送带为皮带输送带或链板输送带。
18.根据权利要求1所述的实现单面涂覆的链式沉积设备,其特征在于,所述涂覆辊还配有带液辊和供液管。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202210825333.2A CN115025926A (zh) | 2022-07-14 | 2022-07-14 | 一种实现单面涂覆的链式沉积设备 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202210825333.2A CN115025926A (zh) | 2022-07-14 | 2022-07-14 | 一种实现单面涂覆的链式沉积设备 |
Publications (1)
Publication Number | Publication Date |
---|---|
CN115025926A true CN115025926A (zh) | 2022-09-09 |
Family
ID=83129003
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN202210825333.2A Pending CN115025926A (zh) | 2022-07-14 | 2022-07-14 | 一种实现单面涂覆的链式沉积设备 |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN115025926A (zh) |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003205658A (ja) * | 2002-01-11 | 2003-07-22 | Konica Corp | 搬送装置 |
US20040046852A1 (en) * | 2000-05-30 | 2004-03-11 | Le Pham | Dual-web transport belt cleaning apparatus and method |
CN201632438U (zh) * | 2010-02-11 | 2010-11-17 | 童舟 | 数码喷印机传送带自动清洗和风干装置 |
TW201618861A (zh) * | 2014-11-18 | 2016-06-01 | Asia Neo Tech Ind Co Ltd | 迴圈移動之傳動元件沾染塗料的清洗方法及其裝置 |
CN106468037A (zh) * | 2015-08-20 | 2017-03-01 | 维美德技术有限公司 | 处理纤维幅材的设备 |
CN107660075A (zh) * | 2016-07-25 | 2018-02-02 | 科峤工业股份有限公司 | 印刷电路基板上塞孔油墨的整平方法及其装置 |
CN110712434A (zh) * | 2018-07-13 | 2020-01-21 | 柯尼卡美能达株式会社 | 输送带装置以及图像记录系统 |
-
2022
- 2022-07-14 CN CN202210825333.2A patent/CN115025926A/zh active Pending
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20040046852A1 (en) * | 2000-05-30 | 2004-03-11 | Le Pham | Dual-web transport belt cleaning apparatus and method |
JP2003205658A (ja) * | 2002-01-11 | 2003-07-22 | Konica Corp | 搬送装置 |
CN201632438U (zh) * | 2010-02-11 | 2010-11-17 | 童舟 | 数码喷印机传送带自动清洗和风干装置 |
TW201618861A (zh) * | 2014-11-18 | 2016-06-01 | Asia Neo Tech Ind Co Ltd | 迴圈移動之傳動元件沾染塗料的清洗方法及其裝置 |
CN106468037A (zh) * | 2015-08-20 | 2017-03-01 | 维美德技术有限公司 | 处理纤维幅材的设备 |
CN107660075A (zh) * | 2016-07-25 | 2018-02-02 | 科峤工业股份有限公司 | 印刷电路基板上塞孔油墨的整平方法及其装置 |
CN110712434A (zh) * | 2018-07-13 | 2020-01-21 | 柯尼卡美能达株式会社 | 输送带装置以及图像记录系统 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP2877216B2 (ja) | 洗浄装置 | |
CA2630885C (en) | Apparatus and method for wet-chemical processing of flat, thin substrates in a continuous method | |
US4282825A (en) | Surface treatment device | |
EP1039506A3 (en) | Apparatus for cleaning and drying substrates | |
EP1054457B1 (en) | Method and apparatus for manufacturing a semiconductor device | |
KR100323502B1 (ko) | 액정표시패널의 제조방법 및 이것에 사용되는 세정장치 | |
JPH04154122A (ja) | 基板処理装置及び同方法 | |
US6365531B1 (en) | Cleaning and drying method and apparatus for manufacturing semiconductor devices | |
JP3494622B2 (ja) | コーティング膜の製造方法 | |
KR20050009695A (ko) | 기판의 처리 장치 및 처리 방법 | |
JP2003104544A (ja) | 方形基板の湿式処理装置 | |
JP3341727B2 (ja) | ウエット装置 | |
JP2010114123A (ja) | 基板処理装置及び基板洗浄方法 | |
CN115025926A (zh) | 一种实现单面涂覆的链式沉积设备 | |
JP3628919B2 (ja) | 基板処理装置および基板処理方法 | |
CN104379527A (zh) | 化学研磨装置 | |
CN218308680U (zh) | 一种喷涂设备 | |
JPH11217240A (ja) | ガラス板面の酸処理方法およびその装置 | |
JP2002239485A (ja) | 基板の洗浄装置及び洗浄方法 | |
JP2543007B2 (ja) | ウエ−ハ枚葉洗浄装置 | |
JPH09232268A (ja) | 基板処理装置 | |
JPH1126419A (ja) | ウエハ洗浄装置及びウエハ研磨システム | |
KR940022733A (ko) | 기판처리장치 | |
CN104379526A (zh) | 化学研磨装置 | |
JP2001176781A (ja) | 膜形成装置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
RJ01 | Rejection of invention patent application after publication |
Application publication date: 20220909 |
|
RJ01 | Rejection of invention patent application after publication |