CN114929942A - 电铸工艺 - Google Patents

电铸工艺 Download PDF

Info

Publication number
CN114929942A
CN114929942A CN202080087142.XA CN202080087142A CN114929942A CN 114929942 A CN114929942 A CN 114929942A CN 202080087142 A CN202080087142 A CN 202080087142A CN 114929942 A CN114929942 A CN 114929942A
Authority
CN
China
Prior art keywords
layer
substrate
photoresist
layers
intermediate structure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202080087142.XA
Other languages
English (en)
Chinese (zh)
Inventor
M·H·L·H·库斯特斯
J·A·W·穆宁霍夫
N·希尔登布兰德
R·G·J·J·艾伯茨
J·H·M·布伦肖特
H·G·克诺尔
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Veken Pte Ltd
Original Assignee
Veken Pte Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Veken Pte Ltd filed Critical Veken Pte Ltd
Publication of CN114929942A publication Critical patent/CN114929942A/zh
Pending legal-status Critical Current

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00—Electroforming
    • C25D1/003—3D structures, e.g. superposed patterned layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00—Electroforming
    • C25D1/04—Wires; Strips; Foils
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00—Electroforming
    • C25D1/10—Moulds; Masks; Masterforms
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/50—Electroplating: Baths therefor from solutions of platinum group metals
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/02—Electroplating of selected surface areas
    • C25D5/022—Electroplating of selected surface areas using masking means
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/10—Electroplating with more than one layer of the same or of different metals
    • C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
CN202080087142.XA 2019-12-20 2020-12-18 电铸工艺 Pending CN114929942A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
NL2024542 2019-12-20
NL2024542A NL2024542B1 (en) 2019-12-20 2019-12-20 Electroforming process
PCT/NL2020/050804 WO2021125959A1 (en) 2019-12-20 2020-12-18 Electroforming process

Publications (1)

Publication Number Publication Date
CN114929942A true CN114929942A (zh) 2022-08-19

Family

ID=69156478

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202080087142.XA Pending CN114929942A (zh) 2019-12-20 2020-12-18 电铸工艺

Country Status (8)

Country Link
US (1) US20230035647A1 (de)
EP (1) EP4077768A1 (de)
JP (1) JP2023507177A (de)
KR (1) KR20220118447A (de)
CN (1) CN114929942A (de)
NL (1) NL2024542B1 (de)
TW (1) TW202132626A (de)
WO (1) WO2021125959A1 (de)

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7241689B2 (en) 2003-02-04 2007-07-10 Microfabrica Inc. Microprobe tips and methods for making
NL1031259C2 (nl) 2006-03-01 2007-09-04 Stork Veco Bv Elektroformeringswerkwijze.

Also Published As

Publication number Publication date
WO2021125959A1 (en) 2021-06-24
US20230035647A1 (en) 2023-02-02
TW202132626A (zh) 2021-09-01
KR20220118447A (ko) 2022-08-25
EP4077768A1 (de) 2022-10-26
NL2024542B1 (en) 2021-09-02
JP2023507177A (ja) 2023-02-21

Similar Documents

Publication Publication Date Title
JP6010580B2 (ja) 隣接する層が完全には重なり合わない多層金属構造のｌｉｇａ−ｕｖによる製造方法及びそれにより得られる構造
US9284654B2 (en) Process for fabricating a monolayer or multilayer metal structure in LIGA technology, and structure obtained
CN102124409B (zh) 通过uv-liga技术制造多层级金属部件的方法
CN101918617B (zh) 制造金属微结构的方法和通过该方法获得的微结构
KR20110075041A (ko) 이종 ｌｉｇａ 방법
US3703450A (en) Method of making precision conductive mesh patterns
CN112987491A (zh) 制造钟表组件的方法和根据这种方法获得的组件
KR102520739B1 (ko) 타임피스 컴포넌트를 제조하는 방법 및 이 방법으로부터 획득된 컴포넌트
KR101843035B1 (ko) 모판 및 마스크의 제조 방법
JP2007070678A (ja) 電鋳型、電鋳型の製造方法及び電鋳部品の製造方法
CN114929942A (zh) 电铸工艺
JPS63303737A (ja) スクリ−ン印刷用メタルマスク、及びその製造法
JP4674735B2 (ja) 電鋳メタルの製造方法
JP4164592B2 (ja) スタンパの製造方法
US11181868B2 (en) Method for manufacturing a timepiece component and component obtained by this method
JP2000258258A (ja) 温度センサ及びその製造方法
KR100248517B1 (ko) 마이크로 코일의 제조방법
JP2023007654A (ja) 電鋳型及び電鋳型を用いた電鋳品の製造方法
WO2004064156A1 (en) Laminate made by electro-forming and method for manufacturing the same
JPH08142333A (ja) ノズルプレートの母型及びノズルプレートの製造方法
WO2005076334A1 (en) Electro-forming master and the same-master-manufacturing method, and metal minute pattern made by the master
JP2001026895A (ja) 電鋳用母型、その製造方法、電鋳用母型を用いた突起部を有する構造体の製造方法
JPS63166226A (ja) Ｘ線露光用マスクの製造方法

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination