CN114395756A - 用于真空沉积配置的辊装置、具有辊的真空沉积配置及用于操作辊的方法 - Google Patents

用于真空沉积配置的辊装置、具有辊的真空沉积配置及用于操作辊的方法 Download PDF

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Publication number
CN114395756A
CN114395756A CN202210059990.0A CN202210059990A CN114395756A CN 114395756 A CN114395756 A CN 114395756A CN 202210059990 A CN202210059990 A CN 202210059990A CN 114395756 A CN114395756 A CN 114395756A
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CN
China
Prior art keywords
roller
heating
heating device
arrangement
deposition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202210059990.0A
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English (en)
Chinese (zh)
Inventor
A·索尔
J·亨里奇
T·德皮施
D·瓦格纳
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Applied Materials Inc
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Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Publication of CN114395756A publication Critical patent/CN114395756A/zh
Pending legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/46—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for heating the substrate
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C1/00—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating
    • B05C1/003—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating incorporating means for heating or cooling the liquid or other fluent material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/60—Deposition of organic layers from vapour phase
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/48—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation
    • C23C16/481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation by radiant heating of the substrate
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/30—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations
    • H10P72/33—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations into and out of processing chamber

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  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
CN202210059990.0A 2013-10-18 2014-10-17 用于真空沉积配置的辊装置、具有辊的真空沉积配置及用于操作辊的方法 Pending CN114395756A (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
EP13189388.5A EP2862956B1 (en) 2013-10-18 2013-10-18 Roller device for vacuum deposition arrangement, vacuum deposition arrangement with roller and method for operating a roller
EP13189388.5 2013-10-18
CN201480057242.2A CN105658840A (zh) 2013-10-18 2014-10-17 用于真空沉积配置的辊装置、具有辊的真空沉积配置及用于操作辊的方法
PCT/EP2014/072346 WO2015055828A1 (en) 2013-10-18 2014-10-17 Roller device for vacuum deposition arrangement, vacuum deposition arrangement with roller and method for operating a roller

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
CN201480057242.2A Division CN105658840A (zh) 2013-10-18 2014-10-17 用于真空沉积配置的辊装置、具有辊的真空沉积配置及用于操作辊的方法

Publications (1)

Publication Number Publication Date
CN114395756A true CN114395756A (zh) 2022-04-26

Family

ID=49447989

Family Applications (2)

Application Number Title Priority Date Filing Date
CN202210059990.0A Pending CN114395756A (zh) 2013-10-18 2014-10-17 用于真空沉积配置的辊装置、具有辊的真空沉积配置及用于操作辊的方法
CN201480057242.2A Pending CN105658840A (zh) 2013-10-18 2014-10-17 用于真空沉积配置的辊装置、具有辊的真空沉积配置及用于操作辊的方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
CN201480057242.2A Pending CN105658840A (zh) 2013-10-18 2014-10-17 用于真空沉积配置的辊装置、具有辊的真空沉积配置及用于操作辊的方法

Country Status (6)

Country Link
US (1) US20150110960A1 (enExample)
EP (1) EP2862956B1 (enExample)
JP (1) JP2016537504A (enExample)
KR (1) KR20160073404A (enExample)
CN (2) CN114395756A (enExample)
WO (1) WO2015055828A1 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101938874B1 (ko) * 2016-07-20 2019-01-15 주식회사 참트론 고품질 그래핀 합성을 위한 열처리 장비
KR102543516B1 (ko) * 2017-12-20 2023-06-13 엘지디스플레이 주식회사 롤투롤 증착용 드럼, 롤투롤 증착 장치 및 필름 롤
WO2020078557A1 (en) * 2018-10-18 2020-04-23 Applied Materials, Inc. Deposition apparatus, system and method for depositing a material on a substrate
CN110670021A (zh) * 2019-10-24 2020-01-10 湖南玉丰真空科学技术有限公司 一种用于真空镀膜机的高温加热辊装置
CN111509208A (zh) * 2020-04-26 2020-08-07 合肥国轩高科动力能源有限公司 一种锂离子电池负极材料及其制备方法和装置
CN115461491B (zh) * 2020-07-01 2024-08-23 应用材料公司 用于操作腔室的方法、用于处理基板的装置和基板处理系统
JP2022046262A (ja) * 2020-09-10 2022-03-23 トクデン株式会社 誘導発熱ローラ装置

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JP2002076394A (ja) * 2000-08-23 2002-03-15 Fuji Electric Co Ltd 薄膜半導体の製造装置
JP2002212744A (ja) * 2001-01-17 2002-07-31 Fuji Electric Co Ltd 薄膜半導体の製造装置
KR20030063265A (ko) * 2003-06-19 2003-07-28 주식회사 대현테크 플라스틱 제품의 진공증착 코팅장치
EP2216831A1 (en) * 2009-02-05 2010-08-11 Applied Materials, Inc. Modular PVD system for flex PV
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JP2002212744A (ja) * 2001-01-17 2002-07-31 Fuji Electric Co Ltd 薄膜半導体の製造装置
KR20030063265A (ko) * 2003-06-19 2003-07-28 주식회사 대현테크 플라스틱 제품의 진공증착 코팅장치
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Also Published As

Publication number Publication date
KR20160073404A (ko) 2016-06-24
EP2862956B1 (en) 2022-07-20
JP2016537504A (ja) 2016-12-01
CN105658840A (zh) 2016-06-08
US20150110960A1 (en) 2015-04-23
WO2015055828A1 (en) 2015-04-23
EP2862956A1 (en) 2015-04-22

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