CN114334883A - 半导体装置 - Google Patents

半导体装置 Download PDF

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Publication number
CN114334883A
CN114334883A CN202111121122.2A CN202111121122A CN114334883A CN 114334883 A CN114334883 A CN 114334883A CN 202111121122 A CN202111121122 A CN 202111121122A CN 114334883 A CN114334883 A CN 114334883A
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Prior art keywords
semiconductor device
semiconductor element
semiconductor
wire
opposing portion
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CN202111121122.2A
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English (en)
Inventor
北林拓也
益本宽之
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Mitsubishi Electric Corp
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Mitsubishi Electric Corp
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Publication of CN114334883A publication Critical patent/CN114334883A/zh
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Abstract

目的在于提供能够实现半导体装置的小型化的技术。半导体装置具有:绝缘基板;第1半导体元件,其与绝缘基板连接;导电部件,其配置于绝缘基板之上,包含在俯视观察时相对于第1半导体元件而彼此位于相反侧的第1相对部分以及第2相对部分;第1导线,其连接于第1半导体元件之上以及第1相对部分之上;以及第2导线,其连接于第1半导体元件之上以及第2相对部分之上,在俯视观察时相对于第1导线与第1半导体元件之间的连接点而位于与第1导线相反侧。

Description

半导体装置
技术领域
本发明涉及半导体装置。
背景技术
近年来,伴随半导体元件的小型化以及表面积的减小化,有时无法在半导体元件之上键合足够根数的导线,每1根导线的电流密度增加。并且,由于由该电流密度的增加引起的导线的发热,有时损害半导体装置的可靠性。提出了各种用于解决这样的问题的技术。例如在专利文献1中提出了下述技术,即,通过在母线之上、半导体元件之上、母线之上对导线进行缝焊键合,从而在半导体元件之上键合通常的2倍根数的导线。
专利文献1:日本特开2009-206140号公报
但是,在专利文献1的技术中,设置有母线的绝缘层是与半导体元件分离地配置的。在这样的结构中,为了使得母线不会从绝缘层的上部错开,需要将绝缘层的尺寸设定得较大。其结果,存在半导体装置的小型化困难这一问题。
发明内容
因此,本发明就是鉴于上述这样的问题而提出的,其目的在于提供能够实现半导体装置的小型化的技术。
本发明涉及的半导体装置具有:绝缘基板;第1半导体元件,其与所述绝缘基板连接;导电部件,其配置于所述绝缘基板之上,包含在俯视观察时相对于所述第1半导体元件而彼此位于相反侧、且彼此电连接的第1相对部分以及第2相对部分;第1导线,其连接于所述第1半导体元件之上以及所述第1相对部分之上;以及第2导线,其连接于所述第1半导体元件之上以及所述第2相对部分之上,在俯视观察时相对于所述第1导线与所述第1半导体元件之间的连接点而位于与所述第1导线相反侧。
发明的效果
根据本发明,第2导线在俯视观察时相对于第1导线与第1半导体元件之间的连接点而位于与第1导线相反侧,导电部件配置于连接有第1半导体元件的绝缘基板之上。根据这样的结构,能够使半导体装置小型化。
附图说明
图1是表示实施方式1涉及的半导体装置的概略结构的剖视图。
图2是表示实施方式1涉及的半导体装置的结构的俯视图。
图3是表示实施方式1涉及的半导体装置的结构的侧视图。
图4是表示实施方式1涉及的半导体装置的结构的电路图。
图5是表示实施方式2涉及的半导体装置的结构的俯视图。
图6是表示实施方式3涉及的半导体装置的结构的俯视图。
图7是表示实施方式3涉及的半导体装置的结构的俯视图。
图8是表示实施方式4涉及的半导体装置的结构的俯视图。
图9是表示实施方式4涉及的半导体装置的结构的侧视图。
图10是表示实施方式5涉及的半导体装置的结构的俯视图。
图11是表示实施方式6涉及的半导体装置的结构的俯视图。
图12是表示实施方式6涉及的半导体装置的结构的侧视图。
图13是表示实施方式6涉及的半导体装置的结构的俯视图。
图14是表示实施方式7涉及的半导体装置的结构的俯视图。
具体实施方式
以下,一边参照附图一边对实施方式进行说明。在以下各实施方式中说明的特征都是例示,并非所有特征都是必须的。另外,在以下所示的说明中,在多个实施方式中,对相同的结构要素标注相同或者类似的标号,主要对不同的结构要素进行说明。另外,在以下所记载的说明中,“上”、“下”、“左”、“右”、“表”或者“背”等特定的位置和方向并非必须与实际实施时的方向一致。
<实施方式1>
下面,对本实施方式1涉及的半导体装置是半导体模块的情况进行说明。图1是表示本实施方式1涉及的半导体装置的概略结构的剖视图。此外,该图1是表示半导体装置的概略结构的图,因此,与图2及其后的图稍微不同。
图1的半导体装置具有基座板11、壳体12、盖部13、外部控制端子21、外部连接端子22、绝缘基板31、第1半导体元件33a、控制用导线34、发射极导线35、连接用导线36、封装材料37和多个电路图案32。此外,虽然在图1中未图示,但与第1半导体元件33a同样地,半导体装置具有第2半导体元件33b。
壳体12配置于由铜等金属构成的基座板11之上,将基座板11的一部分包围。通过基座板11以及壳体12而形成将第1半导体元件33a等收容于内部空间的容器体。盖部13通过将壳体12的开口堵塞,从而将容器体的内部空间密封。
外部控制端子21以及外部连接端子22各自例如由金属板等构成。外部控制端子21的一端位于壳体12的外部,与半导体装置的外部(例如外部端子)连接。外部控制端子21的另一端位于壳体12的内部、即容器体的内部空间,与半导体装置的内部的结构要素连接。同样地,外部连接端子22的一端位于壳体12的外部,外部连接端子22的另一端位于壳体12的内部。
在绝缘基板31的上表面之上以及下表面之上配置有由金属构成的电路图案32。此外,在绝缘基板31的上表面配置有彼此分离的多个电路图案32。
绝缘基板31经由绝缘基板31的下表面侧的电路图案32和焊料38a而与基座板11的被壳体12包围的部分连接。
第1半导体元件33a经由上表面侧的电路图案32和焊料38b而与绝缘基板31连接。第1半导体元件33a例如是IGBT(Insulated Gate Bipolar Transistor)以及MOSFET(MetalOxide Semiconductor Field Effect Transistor)等半导体开关元件。
控制用导线34将外部控制端子21中的位于内部空间的部分与在第1半导体元件33a之上配置的控制电极(例如栅极电极)连接。发射极导线35将在第1半导体元件33a之上配置的被控制电极(例如发射极电极)与电路图案32连接。连接用导线36将连接有发射极导线35的电路图案32与外部连接端子22中的位于内部空间的部分连接。
封装材料37例如是凝胶,将绝缘基板31、第1半导体元件33a、控制用导线34、发射极导线35、连接用导线36以及多个电路图案32等封装。
图2是表示本实施方式1涉及的半导体装置的结构的俯视图,图3是表示本实施方式1涉及的半导体装置的结构的侧视图。此外,在图2及图3中图示了图1的结构的一部分。
图1的绝缘基板31的上表面侧的电路图案32包含图2的集电极图案32a、发射极图案32b和控制用图案32c。此外,例如能够形成具有1mm左右的宽度的图案的湿蚀刻被用于集电极图案32a、发射极图案32b以及控制用图案32c等电路图案32的形成。
集电极图案32a是经由焊料38b而与第1半导体元件33a连接的电路图案32。此外,在图2中,与第1半导体元件33a同样地,图示了经由焊料38b而与集电极图案32a连接的第2半导体元件33b。第2半导体元件33b例如是PND(PN junction Diode)以及SBD(SchottkyBarrier Diode)等二极管。
发射极图案32b是包含第1相对部分32b1以及第2相对部分32b2的导电部件。第1相对部分32b1以及第2相对部分32b2在俯视观察时相对于第1半导体元件33a而彼此位于相反侧。此外,在图2的例子中,第2相对部分32b2相对于第1半导体元件33a而位于第1相对部分32b1的正对面,但如后面所述那样,不限于此。第1相对部分32b1以及第2相对部分32b2彼此电连接,具有相同电位。
控制用图案32c仅与外部控制端子21和第1半导体元件33a之间的控制用导线34连接。
图1的发射极导线35包含图2的第1导线即第1发射极导线35a以及第2导线即第2发射极导线35b。
第1发射极导线35a连接于第1半导体元件33a的被控制电极之上以及第1相对部分32b1之上。第2发射极导线35b连接于第1半导体元件33a的被控制电极之上以及第2相对部分32b2之上。
并且,如图2所示,第2发射极导线35b在俯视观察时相对于第1发射极导线35a与第1半导体元件33a之间的连接点而位于与第1发射极导线35a相反侧。在本实施方式1中,在俯视观察时,第1发射极导线35a的延伸方向与第2发射极导线35b的延伸方向形成平角(180度的角度)。但是,也可以如在实施方式7中说明的那样,在俯视观察时,第1发射极导线35a的延伸方向与第2发射极导线35b的延伸方向形成钝角(大于90度且小于180度的角度)。
此外,在图2的例子中,第1发射极导线35a以及第2发射极导线35b是被缝焊键合的1根导线,但不限于此,也可以是分离的。
第2半导体元件33b也与第1半导体元件33a同样地,通过第1发射极导线35a而与第1相对部分32b1连接,通过第2发射极导线35b而与第2相对部分32b2连接。
图4是与图2的结构对应的电路图。第2半导体元件33b即二极管与第1半导体元件33a即半导体开关元件并联连接,作为续流二极管起作用。
此外,图4的集电极配线41相当于图2的集电极图案32a。图4的发射极配线42相当于图2的发射极图案32b、第1发射极导线35a以及第2发射极导线35b。图4的控制配线43相当于图2的控制用图案32c以及控制用导线34。
<实施方式1的汇总>
根据上述这样的本实施方式1涉及的半导体装置,第2发射极导线35b在俯视观察时相对于第1发射极导线35a与第1半导体元件33a之间的连接点而位于与第1发射极导线35a相反侧。根据这样的结构,能够将导线依此键合至大致排列于一条直线上的发射极图案32b、第1半导体元件33a以及发射极图案32b。因此,即使在通常无法向第1半导体元件33a键合足够根数的导线的情况下,也能够对导线进行键合。因此,能够不使半导体装置大型化地维持导线的根数以及导线的发热,因而能够提高导线配线的可靠性。
另外,在本实施方式1中,在连接有第1半导体元件33a的绝缘基板31之上配置发射极图案32b。由此,能够减小俯视观察时的第1半导体元件33a与发射极图案32b之间的绝缘用的空间,因而能够使半导体装置小型化。另外,发射极图案32b的布局的变更变得容易,因此,能够提高半导体装置的制造中的通用性。
此外,本实施方式1涉及的半导体装置具有控制用图案32c,但也可以不具有控制用图案32c。但是,通过具有控制用图案32c,能够提高设计布局的自由度,因而能够期待半导体装置的进一步小型化。另外,本实施方式1涉及的半导体装置具有第2半导体元件33b,但也可以不具有第2半导体元件33b。
<实施方式2>
图5是表示本实施方式2涉及的半导体装置的结构的俯视图,是与图2对应的图。
如图5所示,本实施方式2涉及的半导体装置具有多个第1半导体元件33a以及多个第2半导体元件33b,但不具有控制用图案32c。
多个第1半导体元件33a各自与实施方式1的第1半导体元件33a同样地,通过第1发射极导线35a以及第2发射极导线35b而与发射极图案32b连接。由此,多个第1半导体元件33a彼此通过多个第1发射极导线35a、多个第2发射极导线35b、以及发射极图案32b而并联连接,因而能够并联驱动。同样地,多个第2半导体元件33b彼此通过多个第1发射极导线35a、多个第2发射极导线35b、以及发射极图案32b而并联连接。
根据上述这样的本实施方式2涉及的半导体装置,能够实现多个第1半导体元件33a的并联驱动,因此能够期待半导体装置的大容量化。
<实施方式3>
图6及图7是表示本实施方式3涉及的半导体装置的结构的俯视图,是与图2对应的图。
在本实施方式3中,与实施方式2的图5的结构中具有控制用图案32c的结构相同。也可以如图6所示,在多个第1半导体元件33a各自设置有控制用图案32c,也可以如图7所示,在多个第1半导体元件33a设置有共用的1个控制用图案32c。根据这样的结构,与实施方式2的结构相比,能够提高设计布局的自由度,因而,能够期待半导体装置的小型化。
此外,如本实施方式3所示,在控制用图案32c配置于集电极图案32a等其它电路图案32的端部的情况下,能够降低控制用导线34与其它电路图案32电连接的可能性。
<实施方式4>
图8是表示本实施方式4涉及的半导体装置的结构的俯视图,是与图2对应的图。图9是表示本实施方式4涉及的半导体装置的结构的侧视图,是与图3对应的图。
如图9所示,在本实施方式4中,多个第1半导体元件33a的控制电极之间的控制用导线34与控制电极缝焊键合。由此,在本实施方式4中,并非针对多个第1半导体元件33a分别设置多个控制用导线34,而是针对多个第1半导体元件33a设置1个控制用导线34。控制用导线34只要与大于或等于1个控制电极缝焊键合即可。根据上述这样的本实施方式4涉及的半导体装置,控制用导线34的配线变得容易。
另外,如图8所示,在本实施方式4中,控制用导线34从第1发射极导线35a中的远离第2发射极导线35b的一端至第2发射极导线35b中的远离第1发射极导线35a的一端为止之间的上方穿过。根据这样的结构,控制用导线34的配线变得容易。此外,也可以与图8的例子不同,在第1发射极导线35a以及第2发射极导线35b分离的情况下,构成为控制用导线34从第1发射极导线35a与第2发射极导线35b之间的部分的上方穿过。
<实施方式5>
图10是表示本实施方式5涉及的半导体装置的结构的俯视图,是与图2对应的图。
如图10所示,在本实施方式5中,第2半导体元件33b连接于第1半导体元件33a与第1相对部分32b1之间的第1发射极导线35a、或者第1半导体元件33a与第2相对部分32b2之间的第2发射极导线35b。
根据这样的本实施方式5涉及的半导体装置,第1半导体元件33a以及第2半导体元件33b共用第1发射极导线35a或者第2发射极导线35b。由此,能够减少半导体装置整体的导线的根数,因而能够期待半导体装置的小型化或者大容量化。
<实施方式6>
图11是表示本实施方式6涉及的半导体装置的结构的俯视图,是与图2对应的图。图12是表示本实施方式6涉及的半导体装置的结构的侧视图,是与图3对应的图。
实施方式1~5涉及的导电部件是包含第1相对部分32b1以及第2相对部分32b2的发射极图案32b。与此相对,本实施方式6涉及的导电部件如图11及图12所示包含发射极图案32b、第1铜块32b3以及第2铜块32b4,该发射极图案32b不包含第1相对部分32b1以及第2相对部分32b2。
如图12所示,第1铜块32b3以及第2铜块32b4对应于第1相对部分32b1以及第2相对部分32b2,经由焊料38c而配置于发射极图案32b之上。在仅通过焊料38c无法支撑第1铜块32b3以及第2铜块32b4的情况下,也可以如图12所示,在第1铜块32b3以及第2铜块32b4与集电极图案32a之间配置绝缘部件39。另外,也可以如图13所示,配置多个第1铜块32b3以及多个第2铜块32b4。
根据上述这样的本实施方式6涉及的半导体装置,能够使用不包含第1相对部分32b1以及第2相对部分32b2的发射极图案32b。由此,能够减小俯视观察时的第1半导体元件33a与第1相对部分32b1以及第2相对部分32b2之间的绝缘用的空间,因而能够使半导体装置小型化。
<实施方式7>
图14是表示本实施方式7涉及的半导体装置的结构的俯视图,是与图2对应的图。
在实施方式1~6中,在俯视观察时,第2相对部分32b2相对于第1半导体元件33a而位于第1相对部分32b1的正对面。并且,在俯视观察时,第1发射极导线35a的延伸方向与第2发射极导线35b的延伸方向形成平角。
与此相对,在本实施方式7中,如图14所示,在俯视观察时,相对于第1半导体元件33a,第2相对部分32b2从第1相对部分32b1的正对面的位置错开。并且,第1发射极导线35a的延伸方向与第2发射极导线35b的延伸方向形成钝角,它们之间的角度θ大于90度且小于180度。
根据上述这样的本实施方式7涉及的半导体装置,能够提高设计布局的自由度而不损害导线配线的可靠性,因而能够期待半导体装置的小型化或者大容量化。
<实施方式8>
在本实施方式8中,第1半导体元件33a以及第2半导体元件33b的至少任一者包含宽带隙半导体。宽带隙半导体例如包含碳化硅(SiC)、氮化镓(GaN)、金刚石。根据这样的本实施方式8,能够期待半导体装置的小型化以及并联化。
此外,能够对各实施方式以及各变形例自由地进行组合,或者对各实施方式以及各变形例适当地进行变形、省略。
标号的说明
21外部控制端子,31绝缘基板,32b发射极图案,32b1第1相对部分,32b2第2相对部分,32b3第1铜块,32b4第2铜块,32c控制用图案,33a第1半导体元件,33b第2半导体元件,34控制用导线,35a第1发射极导线,35b第2发射极导线。

Claims (9)

1.一种半导体装置,其具有:
绝缘基板;
第1半导体元件,其与所述绝缘基板连接;
导电部件,其配置于所述绝缘基板之上,包含在俯视观察时相对于所述第1半导体元件而彼此位于相反侧、且彼此电连接的第1相对部分以及第2相对部分;
第1导线,其连接于所述第1半导体元件之上以及所述第1相对部分之上;以及
第2导线,其连接于所述第1半导体元件之上以及所述第2相对部分之上,在俯视观察时相对于所述第1导线与所述第1半导体元件之间的连接点而位于与所述第1导线相反侧。
2.根据权利要求1所述的半导体装置,其中,
多个所述第1半导体元件彼此通过所述导电部件、多个所述第1导线、以及多个所述第2导线而并联连接。
3.根据权利要求1或2所述的半导体装置,其中,
该半导体装置还具有:
外部控制端子,其与所述半导体装置的外部连接;以及
控制用图案,其配置于所述绝缘基板之上,仅与所述外部控制端子和所述第1半导体元件之间的控制用导线连接。
4.根据权利要求2所述的半导体装置,其中,
所述多个第1半导体元件的控制电极之间的控制用导线与所述控制电极缝焊键合。
5.根据权利要求2所述的半导体装置,其中,
与所述第1半导体元件连接的控制用导线从所述第1导线中的远离所述第2导线的一端至所述第2导线中的远离所述第1导线的一端为止之间的上方穿过。
6.根据权利要求1或2所述的半导体装置,其中,
还具有第2半导体元件,该第2半导体元件配置于所述绝缘基板之上,与所述第1半导体元件和所述第1相对部分之间的所述第1导线、或者所述第1半导体元件和所述第2相对部分之间的所述第2导线连接。
7.根据权利要求1或2所述的半导体装置,其中,
所述导电部件包含:
发射极图案,其配置于所述绝缘基板之上;以及
第1铜块以及第2铜块,它们配置于所述发射极图案之上,分别对应于所述第1相对部分以及所述第2相对部分。
8.根据权利要求1至7中任一项所述的半导体装置,其中,
在俯视观察时,所述第1导线的延伸方向与所述第2导线的延伸方向形成钝角。
9.根据权利要求1至8中任一项所述的半导体装置,其中,
所述第1半导体元件包含宽带隙半导体。
CN202111121122.2A 2020-09-30 2021-09-24 半导体装置 Pending CN114334883A (zh)

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JPH0758272A (ja) 1993-08-20 1995-03-03 Origin Electric Co Ltd 電力用半導体装置
JPH0878619A (ja) 1994-09-07 1996-03-22 Hitachi Ltd 電力用半導体装置
JP4449219B2 (ja) 2001-01-04 2010-04-14 日産自動車株式会社 半導体実装構造
JP2006156479A (ja) 2004-11-25 2006-06-15 Toyota Motor Corp パワー半導体装置
JP2009206140A (ja) 2008-02-26 2009-09-10 Sumitomo Electric Ind Ltd パワーモジュール
JP6200759B2 (ja) 2013-10-09 2017-09-20 株式会社日立製作所 半導体装置およびその製造方法
KR102041645B1 (ko) * 2014-01-28 2019-11-07 삼성전기주식회사 전력반도체 모듈
JP2017107937A (ja) 2015-12-08 2017-06-15 三菱電機株式会社 電力用半導体装置
JP2018186302A (ja) 2018-08-20 2018-11-22 三菱電機株式会社 半導体装置およびそれを備える半導体モジュール
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