CN114253075A - 喷墨用感光性树脂组合物 - Google Patents

喷墨用感光性树脂组合物 Download PDF

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Publication number
CN114253075A
CN114253075A CN202111105516.9A CN202111105516A CN114253075A CN 114253075 A CN114253075 A CN 114253075A CN 202111105516 A CN202111105516 A CN 202111105516A CN 114253075 A CN114253075 A CN 114253075A
Authority
CN
China
Prior art keywords
meth
resin composition
photosensitive resin
acrylic compound
phosphorus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202111105516.9A
Other languages
English (en)
Chinese (zh)
Inventor
冈本吉生
荣西弘
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tamura Corp
Original Assignee
Tamura Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tamura Corp filed Critical Tamura Corp
Publication of CN114253075A publication Critical patent/CN114253075A/zh
Pending legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/02—Printing inks
    • C09D11/10—Printing inks based on artificial resins
    • C09D11/101—Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/30—Inkjet printing inks
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/28—Applying non-metallic protective coatings
    • H05K3/285—Permanent coating compositions
    • H05K3/287—Photosensitive compositions

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Wood Science & Technology (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Materials For Photolithography (AREA)
  • Ink Jet Recording Methods And Recording Media Thereof (AREA)
CN202111105516.9A 2020-09-23 2021-09-22 喷墨用感光性树脂组合物 Pending CN114253075A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2020159065A JP7220691B2 (ja) 2020-09-23 2020-09-23 感光性樹脂組成物
JP2020-159065 2020-09-23

Publications (1)

Publication Number Publication Date
CN114253075A true CN114253075A (zh) 2022-03-29

Family

ID=80791679

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202111105516.9A Pending CN114253075A (zh) 2020-09-23 2021-09-22 喷墨用感光性树脂组合物

Country Status (3)

Country Link
JP (1) JP7220691B2 (ja)
CN (1) CN114253075A (ja)
TW (1) TW202223002A (ja)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20240075803A (ko) * 2021-09-30 2024-05-29 닛테츠 케미컬 앤드 머티리얼 가부시키가이샤 할로겐 프리 난연 경화성 수지 조성물, 프리프레그, 금속장 적층판, 및 프린트 배선판

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5620700B2 (ja) 2010-03-30 2014-11-05 富士フイルム株式会社 インクジェット記録用インク組成物、インクジェット記録方法、及び、印刷物
JP2012140491A (ja) 2010-12-28 2012-07-26 Fujifilm Corp インク組成物、インクジェット記録方法、及び、印刷物
JP2014141568A (ja) 2013-01-23 2014-08-07 Jnc Corp 光硬化性インクジェットインクおよびその用途
JP6993154B2 (ja) 2017-09-27 2022-01-13 株式会社タムラ製作所 感光性樹脂組成物
US20210017410A1 (en) 2018-03-30 2021-01-21 Taiyo Ink Mfg. Co., Ltd. Curable composition for inkjet, cured product of same, and electronic component comprising said cured product
JP6918163B2 (ja) 2019-03-08 2021-08-11 株式会社タムラ製作所 感光性樹脂組成物

Also Published As

Publication number Publication date
TW202223002A (zh) 2022-06-16
JP7220691B2 (ja) 2023-02-10
JP2022052593A (ja) 2022-04-04

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