CN114208028A - 压电振子及其制造方法 - Google Patents

压电振子及其制造方法 Download PDF

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Publication number
CN114208028A
CN114208028A CN202080056557.0A CN202080056557A CN114208028A CN 114208028 A CN114208028 A CN 114208028A CN 202080056557 A CN202080056557 A CN 202080056557A CN 114208028 A CN114208028 A CN 114208028A
Authority
CN
China
Prior art keywords
layer
electrodes
electrode
piezoelectric
quartz
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202080056557.0A
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English (en)
Chinese (zh)
Inventor
尾岛茂夫
后正纪
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Murata Manufacturing Co Ltd
Original Assignee
Murata Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Murata Manufacturing Co Ltd filed Critical Murata Manufacturing Co Ltd
Publication of CN114208028A publication Critical patent/CN114208028A/zh
Pending legal-status Critical Current

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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00Piezoelectric or electrostrictive devices
    • H10N30/80Constructional details
    • H10N30/87Electrodes or interconnections, e.g. leads or terminals
    • H10N30/875Further connection or lead arrangements, e.g. flexible wiring boards, terminal pins
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/02Details
    • H03H9/05Holders or supports
    • H03H9/10Mounting in enclosures
    • H03H9/1007Mounting in enclosures for bulk acoustic wave [BAW] devices
    • H03H9/1014Mounting in enclosures for bulk acoustic wave [BAW] devices the enclosure being defined by a frame built on a substrate and a cap, the frame having no mechanical contact with the BAW device
    • H03H9/1021Mounting in enclosures for bulk acoustic wave [BAW] devices the enclosure being defined by a frame built on a substrate and a cap, the frame having no mechanical contact with the BAW device the BAW device being of the cantilever type
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H3/00Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
    • H03H3/007Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
    • H03H3/02Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H3/00Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
    • H03H3/007Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
    • H03H3/02Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
    • H03H3/04Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks for obtaining desired frequency or temperature coefficient
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/02Details
    • H03H9/05Holders or supports
    • H03H9/0504Holders or supports for bulk acoustic wave devices
    • H03H9/0514Holders or supports for bulk acoustic wave devices consisting of mounting pads or bumps
    • H03H9/0519Holders or supports for bulk acoustic wave devices consisting of mounting pads or bumps for cantilever
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/15Constructional features of resonators consisting of piezoelectric or electrostrictive material
    • H03H9/17Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator
    • H03H9/19Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator consisting of quartz
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H3/00Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
    • H03H3/007Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
    • H03H3/02Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
    • H03H3/04Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks for obtaining desired frequency or temperature coefficient
    • H03H2003/0414Resonance frequency
    • H03H2003/0485Resonance frequency during the manufacture of a cantilever

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  • Physics & Mathematics (AREA)
  • Acoustics & Sound (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
CN202080056557.0A 2019-09-26 2020-05-14 压电振子及其制造方法 Pending CN114208028A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2019175977 2019-09-26
JP2019-175977 2019-09-26
PCT/JP2020/019308 WO2021059581A1 (ja) 2019-09-26 2020-05-14 圧電振動子及びその製造方法

Publications (1)

Publication Number Publication Date
CN114208028A true CN114208028A (zh) 2022-03-18

Family

ID=75166005

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202080056557.0A Pending CN114208028A (zh) 2019-09-26 2020-05-14 压电振子及其制造方法

Country Status (4)

Country Link
US (1) US12376497B2 (https=)
JP (1) JP7273377B2 (https=)
CN (1) CN114208028A (https=)
WO (1) WO2021059581A1 (https=)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07308317A (ja) * 1994-05-17 1995-11-28 Olympus Optical Co Ltd 超音波探触子
US20050275316A1 (en) * 2004-06-14 2005-12-15 Fuji Xerox Co., Ltd. Piezoelectric element, inkjet recording head and inkjet recording device
CN1795610A (zh) * 2003-05-26 2006-06-28 株式会社村田制作所 压电电子元件,其制造工艺,和通信装置
JP2009207068A (ja) * 2008-02-29 2009-09-10 Kyocera Kinseki Corp 圧電デバイス
JP2010232806A (ja) * 2009-03-26 2010-10-14 Seiko Epson Corp 圧電振動子、圧電発振器、電子機器、及び圧電振動子の製造方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57107624A (en) * 1980-12-25 1982-07-05 Seikosha Co Ltd Piezoelectric oscillator
JPS62165421A (ja) * 1986-01-16 1987-07-22 Murata Mfg Co Ltd 電子部品およびその製造方法
JPH1141051A (ja) * 1997-07-16 1999-02-12 Matsushita Electric Ind Co Ltd 圧電共振部品およびその製造方法
JP2003198312A (ja) 2001-12-25 2003-07-11 Seiko Epson Corp 圧電デバイスとその製造方法、及び圧電デバイスを利用した携帯電話装置ならびに圧電デバイスを利用した電子機器
JP4852850B2 (ja) 2005-02-03 2012-01-11 セイコーエプソン株式会社 圧電振動素子、圧電振動子、圧電発振器、周波数安定化方法、及び圧電振動子の製造方法
US7794063B2 (en) * 2006-03-15 2010-09-14 Brother Kogyo Kabushiki Kaisha Liquid-droplet jetting head and liquid-droplet jetting apparatus
JP5346182B2 (ja) * 2008-07-30 2013-11-20 富士フイルム株式会社 体腔内超音波探触子
WO2012140936A1 (ja) * 2011-04-11 2012-10-18 株式会社村田製作所 電子部品及び電子部品の製造方法
US9881741B2 (en) * 2014-12-11 2018-01-30 Murata Manufacturing Co., Ltd. Multilayer ceramic electronic component

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07308317A (ja) * 1994-05-17 1995-11-28 Olympus Optical Co Ltd 超音波探触子
CN1795610A (zh) * 2003-05-26 2006-06-28 株式会社村田制作所 压电电子元件,其制造工艺,和通信装置
US20050275316A1 (en) * 2004-06-14 2005-12-15 Fuji Xerox Co., Ltd. Piezoelectric element, inkjet recording head and inkjet recording device
JP2009207068A (ja) * 2008-02-29 2009-09-10 Kyocera Kinseki Corp 圧電デバイス
JP2010232806A (ja) * 2009-03-26 2010-10-14 Seiko Epson Corp 圧電振動子、圧電発振器、電子機器、及び圧電振動子の製造方法

Also Published As

Publication number Publication date
US20220199892A1 (en) 2022-06-23
US12376497B2 (en) 2025-07-29
WO2021059581A1 (ja) 2021-04-01
JP7273377B2 (ja) 2023-05-15
JPWO2021059581A1 (https=) 2021-04-01

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