CN114108062A - Tin plate bright edge defect control method and device - Google Patents
Tin plate bright edge defect control method and device Download PDFInfo
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- CN114108062A CN114108062A CN202111290881.1A CN202111290881A CN114108062A CN 114108062 A CN114108062 A CN 114108062A CN 202111290881 A CN202111290881 A CN 202111290881A CN 114108062 A CN114108062 A CN 114108062A
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/12—Process control or regulation
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/02—Tanks; Installations therefor
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/12—Process control or regulation
- C25D21/14—Controlled addition of electrolyte components
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/30—Electroplating: Baths therefor from solutions of tin
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Abstract
The invention discloses a method for controlling bright edge defects of a tin plate, which comprises the following steps: setting current densities of anode plates of electroplating bath sets, wherein the current densities of the anode plates of a first electroplating bath are concentrated in the electroplating bath set within a first current density range, and the current densities of the anode plates of the rest electroplating baths except the first electroplating bath are concentrated in the electroplating bath set within a second current density range; determining the number of the electroplating bath sets according to the current density of the anode plate; determining the target number and the arrangement position of the anode plate set in the electroplating bath set according to the width of the strip steel; electroplating the strip steel by utilizing electroplating solution according to the number of the electroplating baths and the number and the arrangement positions of the anode plates, wherein the electroplating solution is concentrated in the electroplating baths, and the concentration content of divalent tin ions in the electroplating solution is a set tin ion concentration value.
Description
Technical Field
The invention relates to the technical field of electroplating, in particular to a method and a device for controlling bright edge defects of a tin plate.
Background
With the continuous improvement of living standard of people, the demand on the metal food can is more and more, the main material for manufacturing the metal food can is the tin plate, and the process for manufacturing the food can has higher requirements on the tin plate electroplating process.
The prior tin plate electroplating process mainly comprises a soluble anode production method and an insoluble anode production method, and compared with insoluble anode electroplating, soluble anode electroplating equipment has the advantages of low investment, simple operation process, less tin mud generated by plating solution, low tin consumption and the like. Therefore, a large amount of soluble anode tin plating technology is adopted in industrial electroplating, but the contact area between the edge of the strip steel and the electroplating solution is larger during the production of the soluble anode, the electrodeposition is easier, the power line density at the edge of the strip steel opposite to the tin anode is higher, the passing current is larger, therefore, the tin layer at the edge of the strip steel is gathered and thickened, the insoluble anode is often additionally provided with an edge cover at the edge of the strip steel so as to reduce the influence of the edge effect, the soluble tin anode needs to replace the tin anode regularly so that the edge cover cannot be installed, the influence of the edge effect in the electroplating process is greatly analyzed according to domestic and foreign data and samples, and the tin layer at the edge of the strip steel is thickened to seriously form a bright edge defect. The bright edge defect causes low production efficiency due to poor welding when the can is manufactured by high-speed welding, so that the problem to be solved urgently is the influence of controlling the bright edge defect on the high-speed welding.
Disclosure of Invention
The embodiment of the application provides a method for controlling the bright edge defect of the tin plate, solves the problem that the production efficiency is low due to poor welding when the bright edge defect is welded at a high speed for manufacturing the can in the prior art, realizes the control of the bright edge defect in a reasonable range, and improves the production quality of products.
The invention provides a method for controlling bright edge defects of a tin plate, which comprises the following steps:
setting current densities of anode plates of electroplating bath sets, wherein the current densities of the anode plates of a first electroplating bath are concentrated in the electroplating bath set within a first current density range, and the current densities of the anode plates of the rest electroplating baths except the first electroplating bath are concentrated in the electroplating bath set within a second current density range;
determining the number of the electroplating bath sets according to the current density of the anode plate;
determining the target number and the arrangement position of the anode plate set in the electroplating bath set according to the width of the strip steel;
electroplating the strip steel by utilizing electroplating solution according to the number of the electroplating baths and the number and the arrangement positions of the anode plates, wherein the electroplating solution is concentrated in the electroplating baths, and the concentration content of divalent tin ions in the electroplating solution is a set tin ion concentration value.
Preferably, the first current density range is greater than the second current density range.
Preferably, the anode plate set is a tin anode strip set.
Preferably, the determining the number of the electroplating bath sets according to the current density of the tin anode strip includes:
determining the number of uses of the electroplating bath according to the current density of the tin anode strip set, wherein the current density of the tin anode strip set is inversely related to the number of uses of the electroplating bath.
Preferably, the target number and the arrangement position of the anode plates are determined according to the width of the strip steel; the method comprises the following steps:
finding the number of the tin anode strips corresponding to the width of the strip steel from the strip steel width table as the target number;
and determining the arrangement position of the tin anode strip set according to the width of the strip steel.
Preferably, the determining the arrangement position of the tin anode strip set according to the width of the strip steel includes:
and arranging the tin anode strips at the edges of the electroplating bath, wherein the tin anode strips are concentrated on the edges of the electroplating bath, and controlling the distance between the tin anode strips and the edges of the strip steel to be a set distance, wherein the set distance is determined according to the width of the strip steel.
Preferably, the determining the arrangement position of the strip steel according to the width of the strip steel includes:
and obtaining the residual tin anode strips except the tin anode strips at the edge part in the tin anode strip set, and arranging and distributing the intervals among the residual tin anode strips at equal intervals.
Preferably, the method further comprises: obtaining the divalent tin ions when the tin anode strip set is melted in the electroplating solution;
and adding the divalent tin ions into the electroplating bath set, and adjusting the concentration of the divalent tin ions in the electroplating solution to be the set tin ion concentration value.
The second aspect of the present invention also provides a device for controlling bright edge defects of a tin plate, comprising:
the current density control unit is used for setting the current density of the anode plates of the electroplating bath sets, wherein the current density of the anode plate of the first electroplating bath is in a first current density range in the electroplating bath sets, and the current density of the anode plate of the rest electroplating baths except the first electroplating bath is in a second current density range in the electroplating bath sets;
the electroplating bath distribution unit is used for determining the number of the electroplating bath sets according to the current density of the anode plate;
the anode plate distribution unit is used for determining the target number and the arrangement position of the anode plate set in the electroplating bath set according to the width of the strip steel;
and the tin ion concentration control unit is used for electroplating the strip steel by utilizing electroplating solution according to the using number of the electroplating baths, the number and the arrangement positions of the anode plates, wherein the electroplating solution is arranged in the electroplating baths in a centralized manner, and the concentration content of divalent tin ions in the electroplating solution is a set tin ion concentration value.
Preferably, the anode plate distribution unit is used for determining the target number and the arrangement position of the anode plate set in the electroplating bath set according to the width of the strip steel; finding the number of the tin anode strips corresponding to the width of the strip steel from the strip steel width table as the target number; and determining the arrangement position of the tin anode strip set according to the width of the strip steel. And arranging the tin anode strips at the edges of the electroplating bath, wherein the tin anode strips are concentrated on the edges of the electroplating bath, and controlling the distance between the tin anode strips and the edges of the strip steel to be a set distance, wherein the set distance is determined according to the width of the strip steel.
One or more technical solutions provided in the embodiments of the present application have at least the following technical effects or advantages: the current density of the anode plate of the electroplating bath set is set, the current density of the first anode plate pair in the first electroplating bath is set in the first current density range, the current density of the anode plates except the first anode plate pair in the first electroplating bath is set in the second current density range, the target quantity of the tin anode strips is selected according to the strip steel width table, the distance is determined according to the strip steel edges of the first tin anode strips, the distance between the residual tin anode strips is distributed in an equidistant arrangement mode, tin ions are added into the electroplating bath through the metering pump, the concentration of the tin ions in the electroplating bath is adjusted, the problem that in the prior art, the bright edge defect can cause low production efficiency due to poor welding during high-speed welding can manufacturing is solved, the bright edge defect is controlled in a reasonable range, and the production quality of products is improved.
Drawings
In order to more clearly illustrate the technical solutions in the embodiments of the present invention, the drawings needed to be used in the description of the embodiments are briefly introduced below, and it is obvious that the drawings in the following description are some embodiments of the present invention, and it is obvious for those skilled in the art to obtain other drawings based on the drawings without creative efforts.
FIG. 1 is a flowchart illustrating a method for controlling bright edge defects of a tin plate according to an embodiment of the present invention;
FIG. 2 is a schematic diagram of a power supply structure of the electroplating tank provided in the present embodiment;
FIG. 3 is a schematic structural view of a plating bath provided in the present embodiment;
fig. 4 is a schematic structural diagram of the apparatus for controlling bright edge defects of a tin plate according to the present embodiment.
Detailed Description
The embodiment of the application provides a method for controlling the bright edge defect of the tin plate, solves the problems that the bright edge defect in the prior art can cause poor welding when a can is manufactured by high-speed welding, a can manufacturing factory often needs to adopt means such as edge batch production, printing top row inversion, increasing the trimming amount and the like, and the production efficiency is seriously influenced,
in order to solve the technical problems, the general idea of the embodiment of the application is as follows:
a tin plate bright edge defect control method comprises the following steps: setting current densities of anode plates of electroplating bath sets, wherein the current densities of the anode plates of a first electroplating bath are concentrated in the electroplating bath set within a first current density range, and the current densities of the anode plates of the rest electroplating baths except the first electroplating bath are concentrated in the electroplating bath set within a second current density range;
determining the number of the electroplating bath sets according to the current density of the anode plate;
determining the target number and the arrangement position of the anode plate set in the electroplating bath set according to the width of the strip steel;
electroplating the strip steel by utilizing electroplating solution according to the number of the electroplating baths and the number and the arrangement positions of the anode plates, wherein the electroplating solution is concentrated in the electroplating baths, and the concentration content of divalent tin ions in the electroplating solution is a set tin ion concentration value.
One or more technical solutions provided in the embodiments of the present application have at least the following technical effects or advantages: the current density of the anode plate of the electroplating bath set is set, the current density of the first anode plate pair in the first electroplating bath is set in the first current density range, the current density of the anode plates except the first anode plate pair in the first electroplating bath is set in the second current density range, the target quantity of the tin anode strips is selected according to the strip steel width table, the distance is determined according to the strip steel edges of the first tin anode strips, the distance between the residual tin anode strips is distributed in an equidistant arrangement mode, tin ions are added into the electroplating bath through the metering pump, the concentration of the tin ions in the electroplating bath is adjusted, the problem that in the prior art, the bright edge defect can cause low production efficiency due to poor welding during high-speed welding can manufacturing is solved, the bright edge defect is controlled in a reasonable range, and the production quality of products is improved.
In order to better understand the technical solution, the technical solution will be described in detail with reference to the drawings and the specific embodiments.
First, it is stated that the term "and/or" appearing herein is merely one type of associative relationship that describes an associated object, meaning that three types of relationships may exist, e.g., a and/or B may mean: a exists alone, A and B exist simultaneously, and B exists alone. In addition, the character "/" herein generally indicates that the former and latter related objects are in an "or" relationship.
Examples
As shown in fig. 1, a method for controlling bright edge defects of a tin plate includes:
s101, setting current density of an anode plate of an electroplating bath set, wherein the current density of the anode plate of a first electroplating bath of the electroplating bath set is in a first current density range, and the current density of the anode plate of the rest electroplating baths except the first electroplating bath of the electroplating bath set is in a second current density range;
the embodiment of the invention can be based on a soluble tin anode electroplating process, when the band steel is plated with tin, the current density of the anode plate determines the thickness of a tin coating of the band steel, the current density of the anode plate set is one of the keys for controlling the bright edge defect of the band steel, alternating current is rectified to become direct current, the positive electrode of the direct current is connected with the anode plate set in a current collection way, and the resistance of the anode plate set is considered to be unchanged, so the current density of the anode plate set is adjusted by adjusting the direct current, wherein the current density of the anode plate of the first electroplating tank in the electroplating tank set is 15-17A/dm in the first current density range2Or 16-18A/dm2The current density of the anode plate of the rest electroplating baths except the first electroplating bath in the electroplating bath set is 10-14A/dm in the second current density range2Or 12-15A/dm2。
Specifically, the first current density range of the set of tin anode strips in the plating bath is greater than the second current density range. As shown in fig. 2, the electroplating apparatus is provided with an ac power supply 201, the ac power supply 201 can provide an ac current, the ac current is rectified by a rectifier module 202 to be converted into a dc current, the rectifier module 202 adopted by the electroplating apparatus is a controllable rectifier module to convert the ac current into a required dc current, and a dc current positive pole 204 and a dc current negative pole 203 are led out of the rectifier module 202. The direct current anode 204 is electrically connected with the tin anode strip to be used as an anode for electroplating, and the direct current cathode 203 is electrically connected with the strip steel to be used as a cathode for electroplating. By controlling the magnitude of the dc current output by the rectifier module 202, the current density on the tin anode strip can be controlled.
By adopting the scheme, the current density of the tin anode strip set concentrated by the electroplating bath is controlled in a reasonable range, the rule of the first current density and the second current density is reflected, a reference condition is provided for adjusting the current density of the tin anode strip set, the current density of the tin anode strip set is reasonably distributed to provide a condition for uniform thickness distribution of a tin coating, the problem that the production efficiency is low due to poor welding when the bright edge defect is used for manufacturing a can by high-speed welding in the prior art is solved, and the bright edge defect is controlled in a reasonable range.
S102: and determining the number of the electroplating bath sets according to the current collection density of the anode plate.
Specifically, the electroplating bath is a main device for plating the tin of the strip steel, the number of the electroplating bath sets also influences the bright edge defect of the strip steel, and the current density of the anode plate collector is inversely related to the number of the electroplating bath sets in the embodiment of the invention, namely the larger the current density of the anode plate is, the smaller the number of the electroplating bath sets is.
Specifically, the plating tank set is a main device for plating strip steel, and as shown in fig. 3, a sink roll 303 is provided in the plating tank 301, the sink roll 303 can move the strip steel collectively in the plating tank, and the strip steel to be plated with tin is moved to the next plating tank by the sink roll 303, wherein the number of the plating tank set is determined by the current density on the tin anode strip set, and the larger the current density is, the smaller the number of the plating tank set is. For example, the first anode plate pair of the first electroplating bath has a current density of 15A/dm2The number of the electroplating baths in the electroplating bath set is 8, and the current density of the first anode plate pair of the first electroplating bath is 20A/dm2The number of the electroplating baths in the electroplating bath set is 7, and the current density of the first anode plate pair of the first electroplating bath is 25A/dm2The number of the electroplating baths in the electroplating bath set is 6.
S103: determining the target number and the arrangement position of the anode plate set in the electroplating bath set according to the width of the strip steel;
specifically, the target number of the anode plate sets in the electroplating bath is determined according to the width of strip steel, the anode plate sets used in the embodiment of the invention are tin anode strip sets, the tin anode strip sets are hung on an anode plate set support, the target number of the tin anode strips is selected according to the following standard, the width range of the strip steel is more than 880mm, and the target number of the tin anode strips is 9 tin anode strips; the width range of the strip steel is between 810 and 880mm, and the target number of the tin anode strips is 8 tin anode strips; the width range of the strip steel is below 810mm, and the target number of the tin anode strips is 7 tin anode strips; the tin anode strips are distributed in a manner that the distance between the edge of the tin anode strip on the anode plate support in the electroplating bath and the strip steel is adjusted to a certain distance according to the width of the strip steel, and the rest tin anode strips concentrated by the tin anode strips are distributed at equal intervals.
Finding the number of the tin anode strips corresponding to the width of the strip steel from the strip steel width table as the target number;
specifically, the anode plate used in the invention is a tin anode strip, the target number of the tin anode strip is determined by the width of the strip steel, the width of the strip steel is obtained from a strip steel width table, and the width range of the strip steel corresponds to the target number of the tin anode strip.
Specifically, the width range of the strip steel is more than 880mm, the target number of the tin anode strips is 9 tin anode strips, the width range of the strip steel is between 810 and 880, the target number of the tin anode strips is 8 tin anode strips, the width range of the strip steel is less than 810mm, and the target number of the tin anode strips is 7 tin anode strips.
Because the target quantity of the tin anode strips is reasonably selected according to the width table of the strip steel, the tin anode strips provide proper tin ions for the tin plating of the strip steel, the thickness of a tin plating layer is ensured, the bright edge defect is controlled in a reasonable range, the problems that the welding is poor when the tin plating is carried out at high speed, the tin making factory always needs to adopt the means of edge batch production, inverted printing top row, increased trimming amount and the like, and the production efficiency is seriously influenced in the prior art are indirectly solved,
specifically, when the arrangement position of the tin anode strip set is determined according to the width of the strip steel, the distance between the edge of the first tin anode strip in the tin anode strip set and the strip steel can be controlled to be a set distance, and the rest tin anode strips except the first tin anode strip are arranged at equal intervals.
For example, as shown in fig. 3, anode plate supports are arranged on two sides of the sink roll 303, guide rollers are arranged at the bottoms of the anode plate supports, the positions of the anode plate supports can be adjusted, so that the positions of the anode plates are adjusted, tin anode strips 302 are hung on the anode plate supports, the set distance is adjusted between the edge of the tin anode strips 302 on the anode plate supports and strip steel, the set distance is determined according to the specification of the strip steel, and the rest tin anode strips 304 in the tin anode strips are distributed at equal intervals.
By adopting the scheme, in the electroplating bath, the first pair of tin anode strips in the first electroplating bath and the edge of the strip steel keep a set distance, the tin anode strips except the first pair of tin anode strips in the first electroplating bath are arranged at the arrangement positions of the tin anode strips through the guide rail on the anode plate support and are arranged according to equal-distance distribution, and after the tin anode strips are melted, the generated divalent tin ions can be uniformly distributed on the strip steel, so that the tin coating of the strip steel keeps uniform, thereby playing a positive role in reducing the bright edge defect of the strip steel.
S104: electroplating the strip steel by utilizing electroplating solution according to the number of the electroplating baths and the number and the arrangement positions of the anode plates, wherein the electroplating solution is concentrated in the electroplating baths, and the concentration content of divalent tin ions in the electroplating solution is a set tin ion concentration value.
The electroplating solution contains deposition salt, such as cyanide ions and sulfate ions, and is contained in an electroplating bath to be concentrated, after direct current is conducted on a tin anode strip, the tin anode strip is electrolyzed and melted in the electroplating solution to become tin ions, the tin ions are dissolved in the electroplating solution, the generated tin ions contain bivalent tin ions and tetravalent tin ions, the tetravalent tin ions form tin ion precipitates, the bivalent tin ions are used for forming a tin coating layer on the band steel for tin plating, the concentration of the bivalent tin ions in the electroplating solution is a set tin ion concentration value, the set tin ion concentration value is controlled within a range of 16-18g/L, and the set tin ion concentration value can be controlled within a range of 17-19 g/L.
Specifically, the divalent tin ions are obtained when the tin anode strip set is melted in the plating solution; and adding the divalent tin ions into the electroplating bath set, and adjusting the concentration of the divalent tin ions in the electroplating solution to be the set tin ion concentration value.
In the practical application process, the electroplating solution is contained in the electroplating bath and concentrated, after direct current is conducted on the tin anode strips, the tin anode strips are electrolyzed and melted in the electroplating solution to become tin ions, the tin ions are dissolved in the electroplating solution, the generated tin ions comprise bivalent tin ions and tetravalent tin ions, the tetravalent tin ions form tin ion precipitates, the bivalent tin ions are used for forming a tin plating layer on the band steel for tin plating, the concentration content of the bivalent tin ions in the electroplating solution is a set tin ion concentration value, and the set tin ion concentration value is controlled within the range of 16-18 g/L.
One or more technical solutions provided in the embodiments of the present application have at least the following technical effects or advantages: the current density of the anode plate provided with the electroplating bath set is adopted, wherein the current density of the anode plate of the first electroplating bath is concentrated in the electroplating bath set within a first current density range, and the current density of the anode plate of the rest electroplating baths except the first electroplating bath is concentrated in the electroplating bath set within a second current density range; determining the number of the electroplating bath sets according to the current density of the anode plate; determining the target number and the arrangement position of the anode plate set in the electroplating bath set according to the width of the strip steel; electroplating the strip steel by utilizing electroplating solution according to the number of the electroplating baths and the number and the arrangement positions of the anode plates, wherein the electroplating solution is concentrated in the electroplating baths, and the concentration content of divalent tin ions in the electroplating solution is a set tin ion concentration value.
For example: the thickness specification of the strip steel is 0.19mm, the width specification is 1035mm, the strip steel is subjected to alkali cleaning oil removal and acid cleaning to remove iron oxide, the strip steel enters an electroplating section, and the set coating of the strip steel is 2.0g/m on two sides2The running speed of the strip steel is 400m/min, 9 tin anode strips are used in each electroplating bath, the width of each tin anode strip is 76mm, the distance between the tin anode strips is adjusted to 34mm, the electroplating current efficiency is set to be 85%, and the first pair of anode current densities of the first electroplating bath are respectively set to be 15A/dm2The current density of the other electrode plates except the first pair of anodes of the first electroplating bath is 10-12A/dm2And 8 electroplating baths are started in the electroplating bath set, the tin ions in the electroplating solution are added into the electroplating bath set through a metering pump, and the set tin ion concentration value is adjusted to 16 g/L. The thickness of the tin plating layer obtained finally is 2.0g/m2The width of the bright edge of the tin-plated plate is 1.5mm, and the mass of the tin layer at the edge part is 2.2g/m2The mass of the middle tin layer is 2.0g/m2. The tin content of the edge part of the tin-plated plate is not more than 20 percent of the tin-plated content of the middle part, and the width of the bright edge is not more than1.5 mm.
Example two
Based on the same inventive concept, the invention also provides a device for controlling the bright edge defect of the tin plate, as shown in fig. 4, comprising:
a current density control unit 401, configured to set a current density of an anode plate of a plating tank set, where the current density of the anode plate of a first plating tank of the plating tank set is within a first current density range, and the current density of the anode plate of a remaining plating tank except the first plating tank of the plating tank set is within a second current density range;
a plating tank distribution unit 402, configured to determine the number of plating tank sets to be used according to the current density of the anode plate;
an anode plate distribution unit 403, configured to determine, according to the width of the strip steel, a target number and an arrangement position of the anode plate set in the electroplating bath set;
and a tin ion concentration control unit 404, configured to electroplate the strip steel by using an electroplating solution according to the number of the electroplating baths, the number of the anode plates, and the arrangement positions, where the electroplating solution is concentrated in the electroplating baths, and a concentration content of divalent tin ions in the electroplating solution is a set tin ion concentration value.
A current density control unit 401 for setting the current density of the anode plate of the electroplating bath set,
specifically, the current density of the anode plate of the first electroplating bath is concentrated in the first current density range, and the current density of the anode plate of the rest electroplating baths except the first electroplating bath is concentrated in the electroplating baths is in the second current density range; the first current density range is greater than the second current density range. The anode plate set is a tin anode strip set.
A plating bath distribution unit 402 for determining the number of plating bath sets to be used according to the current density of the tin anode strip.
Specifically, the number of uses of the electroplating bath is determined according to the current density of the tin anode strip set, wherein the current density of the tin anode strip set is inversely related to the number of uses of the electroplating bath.
The anode plate distribution unit 403 is specifically configured to determine the target number and arrangement positions of the anode plates according to the width of the strip steel;
specifically, the number of tin anode strips corresponding to the width of the strip steel is searched from the strip steel width table to serve as the target number; and determining the arrangement position of the tin anode strip set according to the width of the strip steel. And arranging the tin anode strips at the edges of the electroplating bath, wherein the tin anode strips are concentrated on the edges of the electroplating bath, and controlling the distance between the tin anode strips and the edges of the strip steel to be a set distance, wherein the set distance is determined according to the width of the strip steel. And obtaining the residual tin anode strips except the tin anode strips at the edge part in the tin anode strip set, and arranging and distributing the intervals among the residual tin anode strips at equal intervals.
And a tin ion concentration control unit 404, configured to electroplate the strip steel by using an electroplating solution according to the number of the electroplating baths, the number of the anode plates, and the arrangement positions, where the electroplating solution is concentrated in the electroplating baths, and a concentration content of divalent tin ions in the electroplating solution is a set tin ion concentration value.
Specifically, the divalent tin ions are obtained when the tin anode strip set is melted in the plating solution; and adding the divalent tin ions into the electroplating bath set, and adjusting the concentration of the divalent tin ions in the electroplating solution to be the set tin ion concentration value.
The current density of the anode plate of the electroplating bath set is set, the current density of the first anode plate pair in the first electroplating bath is set in the first current density range, the current density of the anode plates except the first anode plate pair in the first electroplating bath is set in the second current density range, the target quantity of the tin anode strips is selected according to the strip steel width table, the distance is determined according to the strip steel edges of the first tin anode strips, the distance between the residual tin anode strips is distributed in an equidistant arrangement mode, tin ions are added into the electroplating bath through the metering pump, the concentration of the tin ions in the electroplating bath is adjusted, the problem that in the prior art, the bright edge defect can cause low production efficiency due to poor welding during high-speed welding can manufacturing is solved, the bright edge defect is controlled in a reasonable range, and the production quality of products is improved.
While preferred embodiments of the present invention have been described, additional variations and modifications in those embodiments may occur to those skilled in the art once they learn of the basic inventive concepts. Therefore, it is intended that the appended claims be interpreted as including preferred embodiments and all such alterations and modifications as fall within the scope of the invention. It will be apparent to those skilled in the art that various changes and modifications may be made in the present invention without departing from the spirit and scope of the invention. Thus, if such modifications and variations of the present invention fall within the scope of the claims of the present invention and their equivalents, the present invention is also intended to include such modifications and variations.
Claims (10)
1. A tin plate bright edge defect control method is characterized by comprising the following steps:
setting current densities of anode plates of electroplating bath sets, wherein the current densities of the anode plates of a first electroplating bath are concentrated in the electroplating bath set within a first current density range, and the current densities of the anode plates of the rest electroplating baths except the first electroplating bath are concentrated in the electroplating bath set within a second current density range;
determining the number of the electroplating bath sets according to the current density of the anode plate;
determining the target number and the arrangement position of the anode plate set in the electroplating bath set according to the width of the strip steel;
electroplating the strip steel by utilizing electroplating solution according to the number of the electroplating baths and the number and the arrangement positions of the anode plates, wherein the electroplating solution is concentrated in the electroplating baths, and the concentration content of divalent tin ions in the electroplating solution is a set tin ion concentration value.
2. The method of claim 1, wherein the first current density range is greater than the second current density range.
3. The bright edge defect control method of claim 1, wherein the set of anode plates are a set of tin anode bars.
4. The method for controlling bright edge defects according to claim 1, wherein the determining the number of plating bath sets to be used according to the current density of the tin anode strip comprises:
determining the number of uses of the electroplating bath according to the current density of the tin anode strip set, wherein the current density of the tin anode strip set is inversely related to the number of uses of the electroplating bath.
5. The bright edge defect control method according to claim 1, wherein the target number and arrangement position of the anode plates are determined according to the width of the strip steel; the method comprises the following steps:
finding the number of the tin anode strips corresponding to the width of the strip steel from the strip steel width table as the target number;
and determining the arrangement position of the tin anode strip set according to the width of the strip steel.
6. The bright edge defect control method of claim 5, wherein the determining the arrangement position of the tin anode strip set according to the width of the strip steel comprises:
and arranging the tin anode strips at the edges of the electroplating bath, wherein the tin anode strips are concentrated on the edges of the electroplating bath, and controlling the distance between the tin anode strips and the edges of the strip steel to be a set distance, wherein the set distance is determined according to the width of the strip steel.
7. The bright edge defect control method of claim 6, wherein the determining the arrangement position of the strip steel according to the width of the strip steel comprises:
and obtaining the residual tin anode strips except the tin anode strips at the edge part in the tin anode strip set, and arranging and distributing the intervals among the residual tin anode strips at equal intervals.
8. The bright edge defect control method of claim 1, further comprising:
obtaining the divalent tin ions when the tin anode strip set is melted in the electroplating solution;
and adding the divalent tin ions into the electroplating bath set, and adjusting the concentration of the divalent tin ions in the electroplating solution to be the set tin ion concentration value.
9. The utility model provides a device of tinned plate bright edge defect control which characterized in that includes:
the current density control unit is used for setting the current density of the anode plates of the electroplating bath sets, wherein the current density of the anode plate of the first electroplating bath is in a first current density range in the electroplating bath sets, and the current density of the anode plate of the rest electroplating baths except the first electroplating bath is in a second current density range in the electroplating bath sets;
the electroplating bath distribution unit is used for determining the number of the electroplating bath sets according to the current density of the anode plate;
the anode plate distribution unit is used for determining the target number and the arrangement position of the anode plate set in the electroplating bath set according to the width of the strip steel;
and the tin ion concentration control unit is used for electroplating the strip steel by utilizing electroplating solution according to the using number of the electroplating baths, the number and the arrangement positions of the anode plates, wherein the electroplating solution is arranged in the electroplating baths in a centralized manner, and the concentration content of divalent tin ions in the electroplating solution is a set tin ion concentration value.
10. The bright edge defect control device of claim 9, wherein the anode plate distribution unit is configured to determine a target number and an arrangement position of the anode plate set in the electroplating bath set according to a width of the strip steel; finding the number of the tin anode strips corresponding to the width of the strip steel from the strip steel width table as the target number; determining the arrangement position of the tin anode strip set according to the width of the strip steel; and arranging the tin anode strips at the edges of the electroplating bath, wherein the tin anode strips are concentrated on the edges of the electroplating bath, and controlling the distance between the tin anode strips and the edges of the strip steel to be a set distance, wherein the set distance is determined according to the width of the strip steel.
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Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003247100A (en) * | 2002-02-25 | 2003-09-05 | Kobe Steel Ltd | Continuous electric plating method of metal strip |
| CN105063729A (en) * | 2015-08-26 | 2015-11-18 | 中冶南方工程技术有限公司 | Strip steel electroplating anode device with controllable electric field |
| CN107740173A (en) * | 2017-09-15 | 2018-02-27 | 首钢京唐钢铁联合有限责任公司 | A kind of quality of edges control method of high tin amount tin plate |
| CN108950613A (en) * | 2018-08-06 | 2018-12-07 | 首钢集团有限公司 | A kind of preparation method of tin plate and the application of thus obtained tin plate |
| CN110552052A (en) * | 2019-09-05 | 2019-12-10 | 首钢京唐钢铁联合有限责任公司 | method and device for controlling electrotinning anode current |
-
2021
- 2021-11-02 CN CN202111290881.1A patent/CN114108062B/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003247100A (en) * | 2002-02-25 | 2003-09-05 | Kobe Steel Ltd | Continuous electric plating method of metal strip |
| CN105063729A (en) * | 2015-08-26 | 2015-11-18 | 中冶南方工程技术有限公司 | Strip steel electroplating anode device with controllable electric field |
| CN107740173A (en) * | 2017-09-15 | 2018-02-27 | 首钢京唐钢铁联合有限责任公司 | A kind of quality of edges control method of high tin amount tin plate |
| CN108950613A (en) * | 2018-08-06 | 2018-12-07 | 首钢集团有限公司 | A kind of preparation method of tin plate and the application of thus obtained tin plate |
| CN110552052A (en) * | 2019-09-05 | 2019-12-10 | 首钢京唐钢铁联合有限责任公司 | method and device for controlling electrotinning anode current |
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