CN114108062B - Method and device for controlling bright edge defect of tinned plate - Google Patents

Method and device for controlling bright edge defect of tinned plate Download PDF

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Publication number
CN114108062B
CN114108062B CN202111290881.1A CN202111290881A CN114108062B CN 114108062 B CN114108062 B CN 114108062B CN 202111290881 A CN202111290881 A CN 202111290881A CN 114108062 B CN114108062 B CN 114108062B
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tin
anode
electroplating
strip steel
current density
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CN114108062A (en
Inventor
宋浩
方圆
石云光
王雅晴
吴志国
孙超凡
王振文
周保欣
王爱红
吴双龙
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Shougang Group Co Ltd
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Shougang Group Co Ltd
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    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00Processes for servicing or operating cells for electrolytic coating
    • C25D21/12Process control or regulation
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/02Tanks; Installations therefor
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00Processes for servicing or operating cells for electrolytic coating
    • C25D21/12Process control or regulation
    • C25D21/14Controlled addition of electrolyte components
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/30Electroplating: Baths therefor from solutions of tin

Abstract

The invention discloses a method for controlling bright edge defects of a tinplate, which comprises the following steps: setting the current density of an anode plate of a plating bath set, wherein the current density of the anode plate of a first plating bath in the plating bath set is in a first current density range, and the current density of the anode plate of the rest plating baths except the first plating bath in the plating bath set is in a second current density range; determining the number of the electroplating bath sets to be used according to the current density of the anode plate; determining the target number and arrangement positions of anode plate sets in the electroplating tank according to the width of the strip steel; and through the number of electroplating tanks, the number and the arrangement positions of the anode plates are used for electroplating the strip steel by using electroplating liquid, wherein the electroplating liquid is arranged in the electroplating tank in a concentrated manner, and the concentration content of bivalent tin ions in the electroplating liquid is a set tin ion concentration value.

Description

Method and device for controlling bright edge defect of tinned plate
Technical Field
The invention relates to the technical field of electroplating, in particular to a method and a device for controlling bright edge defects of a tinned plate.
Background
With the continuous improvement of the living standard of people, the demands on the metal food cans are increasing, the main material used for manufacturing the metal food cans is an electroplated tin plate, and the manufacturing process of the food cans has higher demands on the electroplated tin plate.
The prior tin plate plating process mainly comprises a soluble anode production method and an insoluble anode production method, and compared with insoluble anode plating, the soluble anode plating equipment has the advantages of less investment, simple operation process, less tin mud generated by plating solution, less tin consumption and the like. Therefore, a large amount of soluble anode tinning technology is adopted in industrial electroplating, but the contact area between the edge of the strip steel and the electroplating solution is larger during the production of the soluble anode, the electrodeposition is easier, meanwhile, the power line density at the edge of the strip steel opposite to the tin anode is higher, the passing current is larger, therefore, the tin layer at the edge of the strip steel is gathered and thickened, an edge cover is additionally arranged at the edge of the strip steel to reduce the influence of edge effect, and the soluble tin anode needs to be replaced at regular time, so that the edge cover cannot be arranged, therefore, the influence of the edge effect in the electroplating process is greatly based on domestic and foreign data and sample analysis, and the edge tin layer at the edge of the strip steel is thickened and seriously forms bright edge defects. The problem that the production efficiency is low due to poor welding when the bright edge defect is welded at high speed for can making is solved urgently by controlling the influence of the bright edge defect on high-speed welding.
Disclosure of Invention
According to the method for controlling the bright edge defect of the tinned plate, the problem that in the prior art, when the tin is manufactured through high-speed welding, the production efficiency is low due to poor welding is solved, the bright edge defect is controlled in a reasonable range, and the production quality of products is improved.
The first aspect of the invention provides a method for controlling bright edge defects of a tinned plate, which comprises the following steps:
setting the current density of an anode plate of a plating bath set, wherein the current density of the anode plate of a first plating bath in the plating bath set is in a first current density range, and the current density of the anode plate of the rest plating baths except the first plating bath in the plating bath set is in a second current density range;
determining the number of the electroplating bath sets to be used according to the current density of the anode plate;
determining the target number and arrangement positions of anode plate sets in the electroplating tank according to the width of the strip steel;
and through the number of electroplating tanks, the number and the arrangement positions of the anode plates are used for electroplating the strip steel by using electroplating liquid, wherein the electroplating liquid is arranged in the electroplating tank in a concentrated manner, and the concentration content of bivalent tin ions in the electroplating liquid is a set tin ion concentration value.
Preferably, the first current density range is greater than the second current density range.
Preferably, the anode plate set is a tin anode bar set.
Preferably, the determining the number of the plating tank sets according to the current density of the tin anode strip includes:
and determining the number of the electroplating tanks according to the current density of the tin anode bar set, wherein the current density of the tin anode bar set is inversely related to the number of the electroplating tanks.
Preferably, the target number and arrangement positions of the anode plates are determined according to the width of the strip steel; comprising the following steps:
searching the number of tin anode strips corresponding to the width of the strip steel from the strip steel width table as the target number;
and determining the arrangement positions of the tin anode bar sets according to the width of the strip steel.
Preferably, the determining the arrangement position of the tin anode bar set according to the width of the strip steel includes:
and arranging the tin anode strips at the edges of the electroplating bath in a concentrated manner, and controlling the distance between the tin anode strips and the edges of the strip steel to be a set distance, wherein the set distance is determined according to the width of the strip steel.
Preferably, the determining the arrangement position of the strip steel according to the width of the strip steel includes:
and obtaining the rest tin anode strips except the edge tin anode strips in the tin anode strip set, and distributing the spacing between the rest tin anode strips according to equidistant arrangement.
Preferably, the method further comprises: obtaining the divalent tin ions when the tin anode bar set is melted in the electroplating solution;
and adding the divalent tin ions into the electroplating bath set, and adjusting the concentration of the divalent tin ions in the electroplating solution to be the set tin ion concentration value.
The second aspect of the present invention also provides a device for controlling bright edge defect of tin plate, comprising:
a current density control unit, configured to set current densities of anode plates of a plating tank set, where the current density of the anode plate of a first plating tank in the plating tank set is within a first current density range, and the current density of the anode plate of a remaining plating tank except the first plating tank in the plating tank set is within a second current density range;
the electroplating bath distribution unit is used for determining the number of the electroplating bath sets to be used according to the current density of the anode plate;
the anode plate distribution unit is used for determining the target number and arrangement positions of anode plate sets in the electroplating bath set according to the width of the strip steel;
and the tin ion concentration control unit is used for electroplating the strip steel by using electroplating liquid according to the number of the electroplating tanks and the number and arrangement positions of the anode plates, wherein the electroplating liquid is arranged in the electroplating tank set, and the concentration content of bivalent tin ions in the electroplating liquid is a set tin ion concentration value.
Preferably, the anode plate distribution unit is used for determining the target number and arrangement positions of the anode plate sets in the electroplating tank according to the width of the strip steel; searching the number of tin anode strips corresponding to the width of the strip steel from the strip steel width table as the target number; and determining the arrangement positions of the tin anode bar sets according to the width of the strip steel. And arranging the tin anode strips at the edges of the electroplating bath in a concentrated manner, and controlling the distance between the tin anode strips and the edges of the strip steel to be a set distance, wherein the set distance is determined according to the width of the strip steel.
One or more technical solutions provided in the embodiments of the present application at least have the following technical effects or advantages: because the current density of the anode plates of the electroplating bath set is set, the current density of the first anode plate pair in the first electroplating bath is set within a first current density range, the current density of the anode plates except the first anode plate pair in the first electroplating bath is set within a second current density range, then the target number of tin anode strips is selected according to a strip steel width table, the distances between the rest tin anode strips are distributed according to equidistant arrangement according to the strip steel edges of the first tin anode strips, then tin ions are added into the electroplating bath through a metering pump, and the tin ion concentration in the electroplating bath is regulated, so that the problem that the production efficiency is low due to poor welding when the bright edge defect is produced in high-speed welding in the prior art is solved, the bright edge defect is controlled within a reasonable range, and the production quality of products is improved.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings required for the description of the embodiments will be briefly described below, and it is obvious that the drawings in the following description are some embodiments of the present invention, and other drawings may be obtained according to these drawings without inventive effort for a person skilled in the art.
FIG. 1 is a flow chart of a method for controlling bright edge defects of a tin plate according to the present embodiment;
FIG. 2 is a schematic diagram of the structure of the plating tank provided in the present embodiment;
FIG. 3 is a schematic view of the plating tank according to the present embodiment;
fig. 4 is a schematic structural diagram of an apparatus for controlling bright edge defects of a tin plate according to the present embodiment.
Detailed Description
The embodiment of the application solves the problems that in the prior art, the bright edge defect can cause poor welding when a can is manufactured by high-speed welding, can manufacturing factories often need to adopt means of edge batch production, inverted printing top row, increased trimming amount and the like, and seriously affects the production efficiency,
the technical scheme of the embodiment of the application aims to solve the technical problems, and the overall thought is as follows:
a method for controlling bright edge defect of a tinplate comprises the following steps: setting the current density of an anode plate of a plating bath set, wherein the current density of the anode plate of a first plating bath in the plating bath set is in a first current density range, and the current density of the anode plate of the rest plating baths except the first plating bath in the plating bath set is in a second current density range;
determining the number of the electroplating bath sets to be used according to the current density of the anode plate;
determining the target number and arrangement positions of anode plate sets in the electroplating tank according to the width of the strip steel;
and through the number of electroplating tanks, the number and the arrangement positions of the anode plates are used for electroplating the strip steel by using electroplating liquid, wherein the electroplating liquid is arranged in the electroplating tank in a concentrated manner, and the concentration content of bivalent tin ions in the electroplating liquid is a set tin ion concentration value.
One or more technical solutions provided in the embodiments of the present application at least have the following technical effects or advantages: because the current density of the anode plates of the electroplating bath set is set, the current density of the first anode plate pair in the first electroplating bath is set within a first current density range, the current density of the anode plates except the first anode plate pair in the first electroplating bath is set within a second current density range, then the target number of tin anode strips is selected according to a strip steel width table, the distances between the rest tin anode strips are distributed according to equidistant arrangement according to the strip steel edges of the first tin anode strips, then tin ions are added into the electroplating bath through a metering pump, and the tin ion concentration in the electroplating bath is regulated, so that the problem that the production efficiency is low due to poor welding when the bright edge defect is produced in high-speed welding in the prior art is solved, the bright edge defect is controlled within a reasonable range, and the production quality of products is improved.
In order to better understand the above technical solutions, the following detailed description will refer to the accompanying drawings and specific embodiments.
First, the term "and/or" appearing herein is merely an association relationship describing associated objects, meaning that there may be three relationships, e.g., a and/or B, may represent: a exists alone, A and B exist together, and B exists alone. In addition, the character "/" herein generally indicates that the front and rear associated objects are an "or" relationship.
Examples
As shown in fig. 1, a method for controlling bright edge defect of a tin plate includes:
s101, setting current density of an anode plate of a plating bath set, wherein the current density of the anode plate of a first plating bath in the plating bath set is in a first current density range, and the current density of the anode plate of the rest plating baths except the first plating bath in the plating bath set is in a second current density range;
the embodiment of the invention can be based on a soluble tin anode plating process, when the strip steel is tinned, the current density of the anode plate determines the thickness of a tinned layer of the strip steel, the current density of the anode plate set is one of keys for controlling the bright edge defect of the strip steel, alternating current is changed into direct current after rectification, the positive electrode of the direct current is connected with the anode plate in a collecting way, and the resistance of the anode plate set is considered to be unchanged, so that the current density of the anode plate set is regulated by regulating the direct current, wherein the current density of the anode plate of the first electroplating bath in the electroplating bath is 15-17A/dm in the range of the first current density 2 Or 16-18A/dm 2 The anode plate current density of the rest plating tank except the first plating tank is in the second current density range of 10-14A/dm 2 Or 12-15A/dm 2
Specifically, the first current density range of the set of tin anode bars in the plating bath set is greater than the second current density range. As shown in fig. 2, the electroplating device is provided with an ac power supply 201, the ac power supply 201 can provide ac current, the ac current is rectified by a rectifying module 202 to be changed into dc current, the rectifying module 202 adopted by the electroplating device is a controllable rectifying module, the ac current is converted into required dc current, and a dc current positive electrode 204 and a dc current negative electrode 203 are led out from the rectifying module 202. The direct current positive electrode 204 is electrically connected with the tin anode strip and serves as an anode for electroplating, and the direct current negative electrode 203 is electrically connected with the strip steel and serves as a cathode for electroplating. By controlling the magnitude of the direct current output by the rectifying module 202, the current density on the tin anode strip can be controlled.
By adopting the scheme, the current density of the tin anode bar set concentrated in the electroplating bath is controlled in a reasonable range, the rule of the first current density and the second current density is reflected, reference conditions are provided for adjusting the current density of the tin anode bar set, the reasonable distribution of the current density of the tin anode bar set provides conditions for the thickness uniform distribution of the tin coating, the problem that the production efficiency is low due to poor welding when the bright edge defect is produced in high-speed welding in the prior art is solved, and the bright edge defect is controlled in a reasonable range.
S102: and determining the number of the electroplating bath sets to be used according to the current density of the anode plate sets.
Specifically, the plating tank is a main device for plating tin on the strip steel, and the number of plating tank sets also affects the bright edge defect of the strip steel.
Specifically, the plating tank set is a main device for plating strip steel, as shown in fig. 3, a sink roller 303 is disposed in the plating tank 301, the sink roller 303 can move the strip steel in the plating tank set, and the tinned strip steel is moved to the next plating tank by the sink roller 303, wherein the number of the plating tank set is determined according to the current density on the tin anode strip set, and the larger the current density is, the smaller the number of the plating tank set is. For example, the first plating tank has a first pair of anode plates with a current density of 15A/dm 2 The number of electroplating baths in the electroplating bath set is 8, and the current density of the first pair of anode plates of the first electroplating bath is 20A/dm 2 The number of electroplating baths in the electroplating bath set is 7, and the current density of the first pair of anode plates of the first electroplating bath is 25A/dm 2 The number of electroplating baths in the electroplating bath set is 6.
S103: determining the target number and arrangement positions of anode plate sets in the electroplating tank according to the width of the strip steel;
specifically, the target number of anode plate sets in the electroplating bath is determined according to the width of strip steel, the anode plate sets used in the embodiment of the invention are tin anode bar sets, the tin anode bar sets are hung on an anode plate set support, the target number of tin anode bars is selected according to the following standard, the width range of the strip steel is over 880mm, and the target number of tin anode bars is 9 tin anode bars; the width of the strip steel ranges from 810mm to 880mm, and the target number of the tin anode strips is 8 tin anode strips; the width range of the strip steel is below 810mm, and the target number of the tin anode strips is 7 tin anode strips; the arrangement of the tin anode bar sets is that the distance between the edge of the tin anode bar on the anode plate bracket in the electroplating bath and the strip steel is adjusted to a certain distance according to the width of the strip steel, and the rest tin anode bars in the tin anode bar sets are distributed at equal intervals.
Searching the number of tin anode strips corresponding to the width of the strip steel from the strip steel width table as the target number;
specifically, the anode plate used in the invention is tin anode strips, the target number of the tin anode strips is determined by the width of the strip steel, the width of the strip steel is obtained from a strip steel width table, and the width range of the strip steel corresponds to the target number of the tin anode strips.
Specifically, the width range of the strip steel is more than 880mm, the target number of the tin anode strips is 9 tin anode strips, the width range of the strip steel is between 810 and 880, the target number of the tin anode strips is 8 tin anode strips, the width range of the strip steel is less than 810mm, and the target number of the tin anode strips is 7 tin anode strips.
The target number of the tin anode strips is reasonably selected according to the strip steel width table, so that proper tin ions are provided for strip steel tin plating, the thickness of a tin plating layer is ensured, the bright edge defect is controlled in a reasonable range, the problems that in the prior art, the bright edge defect can cause poor welding when a tank is manufactured by high-speed welding, a tank manufacturing factory often needs to adopt means of edge batch production, inverted printing top row, increased trimming amount and the like, and the production efficiency is seriously influenced are solved,
specifically, when the arrangement position of the tin anode bar set is determined according to the width of the strip steel, the distance between the edge part of the first tin anode bar in the tin anode bar set and the strip steel can be controlled to be a set distance, and the rest tin anode bars except the first tin anode bar are arranged equidistantly.
For example, as shown in fig. 3, anode plate supports are arranged on two sides of the sink roll 303, guide rollers are arranged at the bottoms of the anode plate supports, the positions of the anode plate supports can be adjusted, so that the positions of the anode plates are adjusted, tin anode strips 302 are hung on the anode plate supports, the set distance between the edges of the tin anode strips 302 on the anode plate supports and the strip steel is adjusted, the set distance is determined according to the specification of the strip steel, and the rest tin anode strips 304 in the tin anode strips are distributed at equal intervals.
Due to the adoption of the scheme, in the electroplating bath, the first pair of tin anode strips in the first electroplating bath keep a set distance from the edge of the strip steel, the remaining tin anode strips except the first pair of tin anode strips in the first electroplating bath are arranged at the arrangement positions of the tin anode strips through the guide rail on the anode plate support, the tin anode strips are distributed at equal intervals, and after the tin anode strips are melted, generated stannous ions can be uniformly distributed on the strip steel, so that the tin plating layer of the strip steel is kept uniform, and a positive effect is played on reducing the bright edge defect of the strip steel.
S104: and through the number of electroplating tanks, the number and the arrangement positions of the anode plates are used for electroplating the strip steel by using electroplating liquid, wherein the electroplating liquid is arranged in the electroplating tank in a concentrated manner, and the concentration content of bivalent tin ions in the electroplating liquid is a set tin ion concentration value.
Wherein, the plating solution contains deposition salts such as cyanide, sulfate ions and the like, the plating solution is contained in a plating bath, after direct current is supplied to a tin anode strip, the tin anode strip becomes tin ions after electrolytic melting in the plating solution, the tin ions are dissolved in the plating solution, the generated tin ions contain divalent tin ions and tetravalent tin ions, the tetravalent tin ions form tin ion precipitates, the divalent tin ions are used for tinning strip steel to form a tin coating, the concentration of the divalent tin ions in the plating solution is a set tin ion concentration value, wherein the set tin ion concentration value is controlled within a range of 16-18g/L, and the set tin ion concentration value can be controlled within a range of 17-19 g/L.
Specifically, when the tin anode bar set is melted in the electroplating solution, divalent tin ions are obtained; and adding the divalent tin ions into the electroplating bath set, and adjusting the concentration of the divalent tin ions in the electroplating solution to be the set tin ion concentration value.
In the practical application process, the electroplating solution is contained in an electroplating bath, after direct current is conducted on the tin anode strip, the tin anode strip is changed into tin ions after electrolytic melting in the electroplating solution, the tin ions are dissolved in the electroplating solution, the generated tin ions comprise divalent tin ions and tetravalent tin ions, the tetravalent tin ions form tin ion precipitation, the divalent tin ions are used for tinning strip steel to form a tinning layer, the concentration content of the divalent tin ions in the electroplating solution is a set tin ion concentration value, and the set tin ion concentration value is controlled within the range of 16-18 g/L.
One or more technical solutions provided in the embodiments of the present application at least have the following technical effects or advantages: due to the adoption of the current density of the anode plate provided with the electroplating bath set, wherein the current density of the anode plate of the first electroplating bath in the electroplating bath set is in a first current density range, and the current density of the anode plate of the rest electroplating baths except the first electroplating bath in the electroplating bath set is in a second current density range; determining the number of the electroplating bath sets to be used according to the current density of the anode plate; determining the target number and arrangement positions of anode plate sets in the electroplating tank according to the width of the strip steel; and through the number of electroplating tanks, the number and the arrangement positions of the anode plates are used for electroplating the strip steel by using electroplating liquid, wherein the electroplating liquid is arranged in the electroplating tank in a concentrated manner, and the concentration content of bivalent tin ions in the electroplating liquid is a set tin ion concentration value.
For example: the thickness specification of the strip steel is 0.19mm, the width specification is 1035mm, the strip steel is subjected to alkali washing oil removal and acid washing to remove ferric oxide, the strip steel enters an electroplating section, and the strip steel is set to be 2.0g/m on two sides of a coating 2 The running speed of the strip steel is 400m/min, 9 tin anode strips are used in each electroplating tank, the width of each tin anode strip is 76mm, the interval between the tin anode strips is adjusted to 34mm, the electroplating current efficiency is set to be 85%, and the first pair of anode current densities of the first electroplating tank are set to be 15A/dm respectively 2 The current density of the rest electrode plates except the first pair of anodes of the first electroplating tank is 10-12A/dm 2 8 electroplating baths are started in the electroplating bath set, tin ions of the electroplating solution are added into the electroplating bath set through a metering pump, and the set tin ion concentration value is adjusted to 16g/L. The thickness of the finally obtained tinning layer is 2.0g/m 2 The width of the bright edge of the tin plate is 1.5mm, and the mass of the tin layer at the edge is 2.2g/m 2 The mass of the middle tin layer is 2.0g/m 2 . The tin amount at the edge of the tin plate is not more than 20% of the tin amount at the middle part, and the width of the bright edge is less than or equal to 1.5 mm.
Example two
Based on the same inventive concept, the invention also provides a device for controlling the bright edge defect of the tinplate, as shown in fig. 4, comprising:
a current density control unit 401, configured to set current densities of anode plates of a plating tank set, where the current density of the anode plate of a first plating tank in the plating tank set is within a first current density range, and the current density of the anode plate of a remaining plating tank except the first plating tank in the plating tank set is within a second current density range;
plating tank distribution unit 402, configured to determine the number of plating tanks used according to the current density of the anode plate;
an anode plate distribution unit 403, configured to determine a target number and arrangement positions of anode plate sets in the plating tank according to the width of the strip steel;
and the tin ion concentration control unit 404 is configured to electroplate the strip steel by using an electroplating solution according to the number and the arrangement position of the anode plates and the number and the arrangement position of the electroplating tanks, wherein the electroplating solution is set in the electroplating tank set, and the divalent tin ion concentration content in the electroplating solution is a set tin ion concentration value.
A current density control unit 401 for setting the current density of the anode plate of the plating tank set,
specifically, the current density of the anode plate of the first plating tank in the plating tank set is in a first current density range, and the current density of the anode plate of the rest plating tanks except the first plating tank in the plating tank set is in a second current density range; the first current density range is greater than the second current density range. The anode plate set is a tin anode bar set.
And a plating tank distribution unit 402, configured to determine the number of plating tank sets used according to the current density of the tin anode strip.
Specifically, the number of the electroplating baths is determined according to the current density of the tin anode bar sets, wherein the current density of the tin anode bar sets is inversely related to the number of the electroplating baths.
An anode plate distribution unit 403, specifically configured to determine a target number and arrangement positions of the anode plates according to the width of the strip steel;
specifically, the number of tin anode bars corresponding to the width of the strip steel is searched out from the strip steel width table as the target number; and determining the arrangement positions of the tin anode bar sets according to the width of the strip steel. And arranging the tin anode strips at the edges of the electroplating bath in a concentrated manner, and controlling the distance between the tin anode strips and the edges of the strip steel to be a set distance, wherein the set distance is determined according to the width of the strip steel. And obtaining the rest tin anode strips except the edge tin anode strips in the tin anode strip set, and distributing the spacing between the rest tin anode strips according to equidistant arrangement.
And the tin ion concentration control unit 404 is configured to electroplate the strip steel by using an electroplating solution according to the number and the arrangement position of the anode plates and the number and the arrangement position of the electroplating tanks, wherein the electroplating solution is set in the electroplating tank set, and the divalent tin ion concentration content in the electroplating solution is a set tin ion concentration value.
Specifically, when the tin anode bar set is melted in the electroplating solution, divalent tin ions are obtained; and adding the divalent tin ions into the electroplating bath set, and adjusting the concentration of the divalent tin ions in the electroplating solution to be the set tin ion concentration value.
Because the current density of the anode plates of the electroplating bath set is set, the current density of the first anode plate pair in the first electroplating bath is set within a first current density range, the current density of the anode plates except the first anode plate pair in the first electroplating bath is set within a second current density range, then the target number of tin anode strips is selected according to a strip steel width table, the distances between the rest tin anode strips are distributed according to equidistant arrangement according to the strip steel edges of the first tin anode strips, then tin ions are added into the electroplating bath through a metering pump, and the tin ion concentration in the electroplating bath is regulated, so that the problem that the production efficiency is low due to poor welding when the bright edge defect is produced in high-speed welding in the prior art is solved, the bright edge defect is controlled within a reasonable range, and the production quality of products is improved.
While preferred embodiments of the present invention have been described, additional variations and modifications in those embodiments may occur to those skilled in the art once they learn of the basic inventive concepts. It is therefore intended that the following claims be interpreted as including the preferred embodiments and all such alterations and modifications as fall within the scope of the invention. It will be apparent to those skilled in the art that various modifications and variations can be made to the present invention without departing from the spirit or scope of the invention. Thus, it is intended that the present invention also include such modifications and alterations insofar as they come within the scope of the appended claims or the equivalents thereof.

Claims (7)

1. The method for controlling the bright edge defect of the tinplate is characterized by comprising the following steps of:
setting the current density of an anode plate of a plating bath set, wherein the current density of the anode plate of a first plating bath in the plating bath set is in a first current density range, and the current density of the anode plate of the rest plating baths except the first plating bath in the plating bath set is in a second current density range;
determining the number of the electroplating bath sets to be used according to the current density of the anode plate;
determining the target number and arrangement positions of anode plate sets in the electroplating tank according to the width of the strip steel, wherein the method comprises the following steps:
the number of tin anode strips corresponding to the width of the strip steel is searched out from a strip steel width table to serve as the target number;
wherein, belted steel width table is: the width range of the strip steel is over 880mm, and the target number of the tin anode strips is 9 tin anode strips; the width of the strip steel ranges from 810mm to 880mm, and the target number of the tin anode strips is 8 tin anode strips; the width range of the strip steel is below 810mm, and the target number of the tin anode strips is 7 tin anode strips;
according to the width of the strip steel, determining the arrangement position of the tin anode strip set comprises the following steps:
arranging the tin anode strips at the edges of the electroplating bath in a centralized manner, and controlling the distance between the tin anode strips and the edges of the strip steel to be a set distance, wherein the set distance is determined according to the width of the strip steel;
obtaining the rest tin anode strips except the edge tin anode strips in the tin anode strip set, and distributing the rest tin anode strips at equal intervals;
and through the number of electroplating tanks, the number and the arrangement positions of the anode plates are used for electroplating the strip steel by using electroplating liquid, wherein the electroplating liquid is arranged in the electroplating tank in a concentrated manner, and the concentration content of bivalent tin ions in the electroplating liquid is a set tin ion concentration value.
2. The bright-edge defect control method of claim 1, wherein the first current density range is greater than the second current density range.
3. The method of claim 1, wherein the anode plate set is a tin anode bar set.
4. The method of claim 1, wherein determining the number of plating baths based on the current density of the tin anode strip comprises:
and determining the number of the electroplating tanks according to the current density of the tin anode bar set, wherein the current density of the tin anode bar set is inversely related to the number of the electroplating tanks.
5. The bright-edge defect control method of claim 1, further comprising:
obtaining the divalent tin ions when the tin anode bar set is melted in the electroplating solution;
and adding the divalent tin ions into the electroplating bath set, and adjusting the concentration of the divalent tin ions in the electroplating solution to be the set tin ion concentration value.
6. The utility model provides a device of bright wisdom defect control of tinplate which characterized in that includes:
a current density control unit, configured to set current densities of anode plates of a plating tank set, where the current density of the anode plate of a first plating tank in the plating tank set is within a first current density range, and the current density of the anode plate of a remaining plating tank except the first plating tank in the plating tank set is within a second current density range;
the electroplating bath distribution unit is used for determining the number of the electroplating bath sets to be used according to the current density of the anode plate;
the anode plate distribution unit is used for determining the target number and arrangement positions of anode plate sets in the electroplating bath set according to the width of the strip steel;
the tin ion concentration control unit is used for electroplating the strip steel by using electroplating liquid according to the number of the electroplating tanks and the number and arrangement positions of the anode plates, wherein the electroplating liquid is arranged in the electroplating tank set, and the concentration content of bivalent tin ions in the electroplating liquid is a set tin ion concentration value;
the anode plate distribution unit is specifically configured to:
the number of tin anode strips corresponding to the width of the strip steel is searched out from a strip steel width table to serve as the target number;
wherein, belted steel width table is: the width range of the strip steel is over 880mm, and the target number of the tin anode strips is 9 tin anode strips; the width of the strip steel ranges from 810mm to 880mm, and the target number of the tin anode strips is 8 tin anode strips; the width range of the strip steel is below 81 and Omm, and the target number of the tin anode strips is 7 tin anode strips;
according to the width of the strip steel, determining the arrangement position of the tin anode strip set comprises the following steps:
arranging the tin anode strips at the edges of the electroplating bath in a centralized manner, and controlling the distance between the tin anode strips and the edges of the strip steel to be a set distance, wherein the set distance is determined according to the width of the strip steel;
and obtaining the rest tin anode strips except the edge tin anode strips in the tin anode strip set, and distributing the spacing between the rest tin anode strips according to equidistant arrangement.
7. The apparatus for controlling bright-edge defect of a tin plate according to claim 6, wherein the anode plate distribution unit is configured to determine a target number and arrangement position of anode plate sets in the plating tank set according to a width of the strip steel; searching the number of tin anode strips corresponding to the width of the strip steel from the strip steel width table as the target number; according to the width of the strip steel, determining the arrangement positions of the tin anode strip sets; and arranging the tin anode strips at the edges of the electroplating bath in a concentrated manner, and controlling the distance between the tin anode strips and the edges of the strip steel to be a set distance, wherein the set distance is determined according to the width of the strip steel.
CN202111290881.1A 2021-11-02 2021-11-02 Method and device for controlling bright edge defect of tinned plate Active CN114108062B (en)

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Publication number Priority date Publication date Assignee Title
JP2003247100A (en) * 2002-02-25 2003-09-05 Kobe Steel Ltd Continuous electric plating method of metal strip
CN105063729A (en) * 2015-08-26 2015-11-18 中冶南方工程技术有限公司 Strip steel electroplating anode device with controllable electric field
CN107740173B (en) * 2017-09-15 2020-12-15 首钢京唐钢铁联合有限责任公司 Edge quality control method of high-tin-content tin plate
CN108950613B (en) * 2018-08-06 2020-11-13 首钢集团有限公司 Preparation method of tin plate and application of tin plate prepared by same
CN110552052B (en) * 2019-09-05 2022-02-22 首钢京唐钢铁联合有限责任公司 Method and device for controlling electrotinning anode current

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