CN1126644A - 放电激发型脉冲激光装置 - Google Patents

放电激发型脉冲激光装置 Download PDF

Info

Publication number
CN1126644A
CN1126644A CN95115694A CN95115694A CN1126644A CN 1126644 A CN1126644 A CN 1126644A CN 95115694 A CN95115694 A CN 95115694A CN 95115694 A CN95115694 A CN 95115694A CN 1126644 A CN1126644 A CN 1126644A
Authority
CN
China
Prior art keywords
discharge electrode
main discharge
pulse generating
saturable
pulse
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN95115694A
Other languages
English (en)
Chinese (zh)
Inventor
南谷靖史
中谷元
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Publication of CN1126644A publication Critical patent/CN1126644A/zh
Pending legal-status Critical Current

Links

Images

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/0971—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited
    • H01S3/09713—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited with auxiliary ionisation, e.g. double discharge excitation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/038—Electrodes, e.g. special shape, configuration or composition
    • H01S3/0384—Auxiliary electrodes, e.g. for pre-ionisation or triggering, or particular adaptations therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Lasers (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
CN95115694A 1994-11-04 1995-11-03 放电激发型脉冲激光装置 Pending CN1126644A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP271210/94 1994-11-04
JP6271210A JPH08132321A (ja) 1994-11-04 1994-11-04 放電励起パルスレーザ装置

Publications (1)

Publication Number Publication Date
CN1126644A true CN1126644A (zh) 1996-07-17

Family

ID=17496887

Family Applications (1)

Application Number Title Priority Date Filing Date
CN95115694A Pending CN1126644A (zh) 1994-11-04 1995-11-03 放电激发型脉冲激光装置

Country Status (7)

Country Link
US (1) US5708676A (enExample)
JP (1) JPH08132321A (enExample)
KR (1) KR0157700B1 (enExample)
CN (1) CN1126644A (enExample)
CA (1) CA2161989C (enExample)
DE (1) DE19541031A1 (enExample)
TW (1) TW289873B (enExample)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101599613B (zh) * 2009-01-13 2011-02-02 上海微电子装备有限公司 预电离与主放电时序控制装置及方法
CN102143821B (zh) * 2008-09-02 2012-09-12 三菱电机株式会社 放电加工机用电源装置
CN103022858A (zh) * 2012-12-07 2013-04-03 华中科技大学 一种电晕预电离装置
CN105322425A (zh) * 2014-08-04 2016-02-10 株式会社天田米亚基 激光装置
CN107026384A (zh) * 2017-05-02 2017-08-08 中国工程物理研究院激光聚变研究中心 一种为固体激光放大器泵浦能量的氙灯装置

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU726789B2 (en) * 1997-02-12 2000-11-23 Siemens Aktiengesellschaft Arrangement and method for generating coded high-frequency signals
US6456643B1 (en) 1999-03-31 2002-09-24 Lambda Physik Ag Surface preionization for gas lasers
US6650679B1 (en) 1999-02-10 2003-11-18 Lambda Physik Ag Preionization arrangement for gas laser
US6188144B1 (en) * 1998-11-11 2001-02-13 Komatsu Ltd Power supply unit for pulsed laser using magnetic switch
US6757315B1 (en) 1999-02-10 2004-06-29 Lambda Physik Ag Corona preionization assembly for a gas laser
JP3427889B2 (ja) * 1999-12-21 2003-07-22 ウシオ電機株式会社 ＡｒＦエキシマレーザ装置及びフッ素レーザ装置
WO2001084678A2 (en) * 2000-04-18 2001-11-08 Lambda Physik Ag Stabilization technique for high repetition rate gas discharge lasers
DE10025561A1 (de) 2000-05-24 2001-12-06 Siemens Ag Energieautarker Hochfrequenzsender
US6763049B1 (en) * 2000-06-15 2004-07-13 Lambda Emi Very high repetition rate power supply system and method
RU2181225C2 (ru) * 2000-07-05 2002-04-10 Закрытое акционерное общество "Энергомаштехника" Импульсно-периодический проточный газоразрядный лазер
US6671302B2 (en) 2000-08-11 2003-12-30 Lambda Physik Ag Device for self-initiated UV pre-ionization of a repetitively pulsed gas laser
US6693938B1 (en) * 2000-09-08 2004-02-17 Komatsu Ltd. Discharge circuit for pulsed laser
US6535540B1 (en) * 2000-09-13 2003-03-18 Komatsu Ltd. Discharge device for pulsed laser
DE10150128C2 (de) * 2001-10-11 2003-10-02 Enocean Gmbh Drahtloses Sensorsystem
US7545839B2 (en) * 2003-01-02 2009-06-09 Optiswitch Technology Corporation Apparatus and method for driving a pulsed laser diode
US11870215B2 (en) * 2020-03-23 2024-01-09 Lumentum Operations Llc Reconfigurable laser pulse generating circuit

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62282475A (ja) * 1986-05-30 1987-12-08 Mitsubishi Electric Corp レ−ザ装置
JPS63197390A (ja) * 1987-02-12 1988-08-16 Mitsui Petrochem Ind Ltd パルスレ−ザ励起電源装置
JPS63304682A (ja) * 1987-06-03 1988-12-12 Nikon Corp エキシマレ−ザ装置
JPH077857B2 (ja) * 1989-05-17 1995-01-30 三菱電機株式会社 放電励起パルスレーザ装置
JPH04133378A (ja) * 1990-09-25 1992-05-07 Mitsubishi Electric Corp 放電励起パルスレーザ装置
US5181217A (en) * 1991-02-27 1993-01-19 Mitsubishi Denki Kabushiki Kaisha Laser oscillator circuit
JPH05218547A (ja) * 1992-01-30 1993-08-27 Mitsubishi Electric Corp 放電励起パルスレーザ装置
JPH05283777A (ja) * 1992-03-31 1993-10-29 Toshiba Corp ガスレーザ発振装置
JPH05327088A (ja) * 1992-05-22 1993-12-10 Toshiba Corp ガスレーザ発振装置

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102143821B (zh) * 2008-09-02 2012-09-12 三菱电机株式会社 放电加工机用电源装置
CN101599613B (zh) * 2009-01-13 2011-02-02 上海微电子装备有限公司 预电离与主放电时序控制装置及方法
CN103022858A (zh) * 2012-12-07 2013-04-03 华中科技大学 一种电晕预电离装置
CN105322425A (zh) * 2014-08-04 2016-02-10 株式会社天田米亚基 激光装置
CN107026384A (zh) * 2017-05-02 2017-08-08 中国工程物理研究院激光聚变研究中心 一种为固体激光放大器泵浦能量的氙灯装置
CN107026384B (zh) * 2017-05-02 2023-07-21 中国工程物理研究院激光聚变研究中心 一种为固体激光放大器泵浦能量的氙灯装置

Also Published As

Publication number Publication date
KR0157700B1 (ko) 1998-12-01
TW289873B (enExample) 1996-11-01
CA2161989C (en) 1999-05-25
CA2161989A1 (en) 1996-05-05
US5708676A (en) 1998-01-13
JPH08132321A (ja) 1996-05-28
KR960019870A (ko) 1996-06-17
DE19541031A1 (de) 1996-05-09

Similar Documents

Publication Publication Date Title
CN1126644A (zh) 放电激发型脉冲激光装置
JP2025169386A (ja) ナノ秒パルサー回路での効率的なエネルギー回収
US20080036301A1 (en) Photon Initiated Marxed Modulators
CN1223240C (zh) 具有介质阻碍放电的放电灯的电子镇流器
US8173075B2 (en) Device for generation of pulsed corona discharge
KR20190137923A (ko) 자유 전하들, 오존 및 광을 생성하는 에너지 효율적인 플라즈마 프로세스들
CN1836356A (zh) 用于对电池充电的系统和方法
US20160046489A1 (en) Ozone generator
CN1288942C (zh) 介质势垒放电灯的运行方法，用于该方法的镇流器和具有该镇流器的照明系统
EP0589494B1 (en) Discharge exciting pulse laser device
Rao et al. A novel all solid-state sub-microsecond pulse generator for dielectric barrier discharges
Song et al. Design and analysis of an LCC resonant converter for xenon flash lamp simmer circuit
JPS5996788A (ja) 高電圧パルス放電励起装置
KR20010030403A (ko) 자외선을 방출하는 가스 레이저장치
KR20020090298A (ko) 유전체 배리어 방전 램프 점등장치
CN1272232A (zh) 脉冲气体激光发生装置
Van Goor et al. Improved x‐ray switched XeCl laser
CN117792142B (zh) 一种大功率高频脉冲等离子体电源及其充放电方法
Korotkov et al. A High-Power Diode–Dynistor Generator for Gas-Discharge Technologies
US7750578B2 (en) Discharge lamp ballast apparatus
CN1032122A (zh) 气体净化电滤器的电源装置
JPH05160485A (ja) パルスレーザ用パルス発生装置
RU2200984C2 (ru) Способ управления высокочастотным плазменным дисплеем
JP3847329B2 (ja) パルス放電装置
Rao et al. An efficient all solid-state pulsed generator for pulsed discharges

Legal Events

Date Code Title Description
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C06 Publication
PB01 Publication
C01 Deemed withdrawal of patent application (patent law 1993)
WD01 Invention patent application deemed withdrawn after publication