CN112592277A - 由二环己基甲酮合成的可降解型树脂单体及其制备方法 - Google Patents

由二环己基甲酮合成的可降解型树脂单体及其制备方法 Download PDF

Info

Publication number
CN112592277A
CN112592277A CN202011541814.8A CN202011541814A CN112592277A CN 112592277 A CN112592277 A CN 112592277A CN 202011541814 A CN202011541814 A CN 202011541814A CN 112592277 A CN112592277 A CN 112592277A
Authority
CN
China
Prior art keywords
resin monomer
preparation
dicyclohexyl ketone
raw material
degradable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202011541814.8A
Other languages
English (en)
Inventor
傅志伟
潘惠英
蒋小惠
毕景峰
李嫚嫚
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shanghai Bodong Chemical Technology Co ltd
Original Assignee
Shanghai Bodong Chemical Technology Co ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shanghai Bodong Chemical Technology Co ltd filed Critical Shanghai Bodong Chemical Technology Co ltd
Priority to CN202011541814.8A priority Critical patent/CN112592277A/zh
Publication of CN112592277A publication Critical patent/CN112592277A/zh
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/52Esters of acyclic unsaturated carboxylic acids having the esterified carboxyl group bound to an acyclic carbon atom
    • C07C69/533Monocarboxylic acid esters having only one carbon-to-carbon double bond
    • C07C69/54Acrylic acid esters; Methacrylic acid esters
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C29/00Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom not belonging to a six-membered aromatic ring
    • C07C29/09Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom not belonging to a six-membered aromatic ring by hydrolysis
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C67/00Preparation of carboxylic acid esters
    • C07C67/14Preparation of carboxylic acid esters from carboxylic acid halides
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D305/00Heterocyclic compounds containing four-membered rings having one oxygen atom as the only ring hetero atoms
    • C07D305/02Heterocyclic compounds containing four-membered rings having one oxygen atom as the only ring hetero atoms not condensed with other rings
    • C07D305/04Heterocyclic compounds containing four-membered rings having one oxygen atom as the only ring hetero atoms not condensed with other rings having no double bonds between ring members or between ring members and non-ring members
    • C07D305/06Heterocyclic compounds containing four-membered rings having one oxygen atom as the only ring hetero atoms not condensed with other rings having no double bonds between ring members or between ring members and non-ring members with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to the ring atoms
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02Silicon compounds
    • C07F7/08Compounds having one or more C—Si linkages
    • C07F7/18Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
    • C07F7/1804Compounds having Si-O-C linkages
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02Silicon compounds
    • C07F7/08Compounds having one or more C—Si linkages
    • C07F7/18Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
    • C07F7/1804Compounds having Si-O-C linkages
    • C07F7/1872Preparation; Treatments not provided for in C07F7/20
    • C07F7/188Preparation; Treatments not provided for in C07F7/20 by reactions involving the formation of Si-O linkages
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02Silicon compounds
    • C07F7/08Compounds having one or more C—Si linkages
    • C07F7/18Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
    • C07F7/1804Compounds having Si-O-C linkages
    • C07F7/1872Preparation; Treatments not provided for in C07F7/20
    • C07F7/1892Preparation; Treatments not provided for in C07F7/20 by reactions not provided for in C07F7/1876 - C07F7/1888
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2601/00Systems containing only non-condensed rings
    • C07C2601/12Systems containing only non-condensed rings with a six-membered ring
    • C07C2601/14The ring being saturated
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P20/00Technologies relating to chemical industry
    • Y02P20/50Improvements relating to the production of bulk chemicals
    • Y02P20/55Design of synthesis routes, e.g. reducing the use of auxiliary or protecting groups

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)

Abstract

本发明属于可降解型光刻胶树脂单体,公开了一种由二环己基甲酮合成的可降解型树脂单体及其制备方法,树脂单体的结构式如下:
Figure DDA0002854933700000011
其中R为烷基或杂烷基。其制备方法为,原料Ⅰ的羟基经保护,得到中间体Ⅱ;原料Ⅰ包括以下结构通式

Description

由二环己基甲酮合成的可降解型树脂单体及其制备方法
技术领域
本发明涉及可降解型光刻胶树脂单体技术领域,特别涉及一种由二环己基甲酮合成的可降解型树脂单体及其制备方法。
背景技术
光刻材料(特指光刻胶),又称光致抗蚀剂,是光刻技术中涉及的最关键的功能性化学材料,主要成分是树脂、光致产酸剂、以及相应的添加剂和溶剂,这类材料具有光(包括可见光、紫外线、电子束等)化学敏感性,经光化学反应,本身在显影液中的溶解性发生变化。
光刻胶中所使用的树脂是由多种树脂单体共聚而成的聚合物,其中酸敏树脂单体是实现曝光前后树脂在显影液中溶解差异的重要组成部分,常见的酸敏树脂单体只有一个酸敏基团,其聚合物树脂为线性,曝光区域和未曝光区域的溶解度差异是通过酸敏基团曝光后脱保护形成的,线性聚合物主链并不会断开。因此,现有光刻胶由于酸敏树脂单体的特定结构,存在光刻图案分辨率较低的问题。
发明内容
本发明要解决的技术问题是克服现有技术的缺陷,提供一种由二环己基甲酮合成的可降解型树脂单体及其制备方法。
为了解决上述技术问题,本发明提供了如下的技术方案:
本发明一种由二环己基甲酮合成的可降解型树脂单体,所述树脂单体结构通式如下:
Figure BDA0002854933690000011
其中R为烷基或杂烷基。
进一步地,所述树脂单体包括以下结构:
Figure BDA0002854933690000021
上述可降解型树脂单体的制备方法,包括以下合成步骤:
S1,原料Ⅰ的羟基经保护,得到中间体Ⅱ;所述原料Ⅰ包括以下结构通式
Figure BDA0002854933690000022
R为烷基或杂烷基。
S2,二环己基甲酮在所述中间体Ⅱ与金属形成的格氏试剂的条件下,经还原得到含有一个羟基的中间体Ⅲ;
S3,所述中间体Ⅲ经脱保护,得到含有两个羟基的中间体Ⅳ;
S4,所述中间体Ⅳ与丙烯酸类化合物经酯化反应,得到树脂单体Ⅴ。
进一步地,S1中,所述原料Ⅰ的羟基经苄基或硅醚基的保护,得到中间体Ⅱ。
合成路线:
Figure BDA0002854933690000023
其中,R为烷基或杂烷基,R’为保护基团。
进一步地,S1中,所述原料Ⅰ的羟基经苄基或硅醚基的保护,得到中间体Ⅱ。
进一步地,所述原料Ⅰ具体包括以下结构:
Figure BDA0002854933690000024
与现有技术相比,本发明的有益效果如下:
(1)树脂单体上还含有叔丁基结构,在曝光时,树脂上的光致产酸剂基团会产生磺酸,在酸的作用下,叔丁基结构会断开,导致聚合主链断开,产生小的片段,改善光刻图形的边缘粗糙度,提高光刻胶的分辨率,同时形成具有良好碱溶行的羟基,有利于显影过程中的溶解,增加曝光后在光刻胶在显影液中溶解速度,增大光刻胶的对比度。
(2)二环己基甲酮的环状结构也在很大程度上增加了光刻胶耐刻蚀性,树脂单体的多酯基结构也增加了其在脂溶性溶剂中的溶解性,方便旋涂均匀。
(3)本发明的合成路线简单,操作方便。
具体实施方式
应当理解,此处所描述的优选实施例仅用于说明和解释本发明,并不用于限定本发明。
实施例1
Figure BDA0002854933690000031
化合物1-2的制备:
将叔丁基二甲基氯硅烷(13g,86.3mmol)溶于四氢呋喃(50g)中,然后在0℃氮气保护下,将上述混合液滴加到含有2-溴乙醇1-1(10g,80.0mmol)、三乙胺(10g,98.8mmol)和4-二甲氨基吡啶(1g,8.2mmol)的四氢呋喃(100g)溶液中,搅拌3小时。产生的悬浮液经过滤得到滤液,将滤液浓缩,经减压蒸馏提纯,得到化合物1-2(15.5g,64.8mmol,摩尔收率81.0%)。
化合物1-3的制备:
将化合物1-2(13g,54.3mmol)溶于乙醚(100g)中,在氮气保护下,将上述混合液滴加到含有镁(1.3g,54.2mmol)的乙醚(30g)中,在25℃下,搅拌1小时。然后将二环己基甲酮(10g,51.5mmol)溶于乙醚(80g)中,滴入上述混合液中,搅拌3小时。将反应液淬灭,然后过滤,滤液用乙酸乙酯萃取,将得到有机层合并,并用盐水洗涤,无水硫酸钠干燥,浓缩得到粗产品。将粗产物用乙酸乙酯和己烷重结晶,得到化合物1-3(15g,42.3mmol,摩尔收率82.2%)。
化合物1-4的制备:
在25℃氮气保护下,将1mol/L的四丁基氟化铵四氢呋喃溶液(46mL,46mmol)滴加到含有化合物1-3(15g,42.3mmol)的四氢呋喃(100g)溶液中,搅拌3小时。反应液用饱和氯化铵溶液淬灭,加入乙酸乙酯萃取,合并有机相进行浓缩,得到粗产品,粗产品经硅胶柱纯化得到化合物1-4(9g,37.4mmol,摩尔收率88.5%)。
树脂单体1-5的制备:
将化合物1-4(9g,37.4mmol),三乙胺(8g,79.1mmol)溶于二氯甲烷(150g)中,然后在0℃,氮气保护下将甲基丙烯酰氯(8g,76.5mmol)滴加到上述混合液中搅拌30分钟,然后在室温下继续搅拌4小时。加饱和碳酸氢钠溶液,萃取,浓缩萃取液,得到粗产品,粗产品经柱层析纯化,得到树脂单体1-5(12g,31.9mmol,摩尔收率85.1%)。
实施例2
Figure BDA0002854933690000041
化合物2-2的制备:
将叔丁基二甲基氯硅烷(10g,66.3mmol)溶于四氢呋喃(50g)中,然后在0℃氮气保护下,将上述混合液滴加到含有3-溴甲基-3-羟甲基-1-氧杂环丁烷1-1(10g,55.2mmol)、三乙胺(8g,79.1mmol)和4-二甲氨基吡啶(1g,8.2mmol)的四氢呋喃(100g)溶液中中,搅拌3小时。产生的悬浮液经过滤得到滤液,将滤液浓缩,经减压蒸馏提纯,得到化合物2-2(13g,44.0mmol,摩尔收率79.7%)。
化合物2-3的制备:
将化合物2-2(13g,44.0mmol)溶于乙醚(100g)中,在氮气保护下,将上述混合液滴加到含有镁(1.2g,50mmol)的乙醚(30g)中,在25℃下,搅拌1小时。然后将二环己基甲酮(8g,41.2mmol)溶于乙醚(80g)中,滴入上述混合液中,搅拌3小时。将反应液淬灭,然后过滤,滤液用乙酸乙酯萃取,将得到有机层合并,并用盐水洗涤,无水硫酸钠干燥,浓缩得到粗产品。将粗产物用乙酸乙酯和己烷重结晶,得到化合物2-3(12.5g,30.4mmol,摩尔收率73.9%)。
化合物2-4的制备:
在25℃氮气保护下,将1mol/L的四丁基氟化铵四氢呋喃溶液(32mL,32mmol)滴加到含有化合物2-3(12.5g,30.4mmol)的四氢呋喃(100g)溶液中,搅拌3小时。反应液用饱和氯化铵溶液淬灭,加入乙酸乙酯萃取,合并有机相进行浓缩,得到粗产品,粗产品经硅胶柱纯化得到化合物2-4(8g,27.0mmol,摩尔收率88.7%)。
树脂单体2-5的制备:
将化合物2-4(8g,27.0mmol),三乙胺(6g,59.3mmol)溶于二氯甲烷(150g)中,然后在0℃,氮气保护下将甲基丙烯酰氯(6g,57.4mmol)滴加到上述混合液中搅拌30分钟,然后在室温下继续搅拌4小时。加饱和碳酸氢钠溶液,萃取,浓缩萃取液,得到粗产品,粗产品经柱层析纯化,得到树脂单体2-5(10g,23.1mmol,摩尔收率85.7%)。
最后应说明的是:以上所述仅为本发明的优选实施例而已,并不用于限制本发明,尽管参照前述实施例对本发明进行了详细的说明,对于本领域的技术人员来说,其依然可以对前述各实施例所记载的技术方案进行修改,或者对其中部分技术特征进行等同替换。凡在本发明的精神和原则之内,所作的任何修改、等同替换、改进等,均应包含在本发明的保护范围之内。

Claims (5)

1.一种由二环己基甲酮合成的可降解型树脂单体,其特征在于,所述树脂单体结构通式如下:
Figure FDA0002854933680000011
其中R为烷基或杂烷基。
2.根据权利要求1所述的由二环己基甲酮合成的可降解型树脂单体,其特征在于,所述树脂单体包括以下结构:
Figure FDA0002854933680000012
3.由二环己基甲酮合成的可降解型树脂单体的制备方法,其特征在于,包括以下合成步骤:
S1,原料Ⅰ的羟基经保护,得到中间体Ⅱ;
S2,二环己基甲酮在所述中间体Ⅱ与金属形成的格氏试剂的条件下,经还原得到含有一个羟基的中间体Ⅲ;
S3,所述中间体Ⅲ经脱保护,得到含有两个羟基的中间体Ⅳ;
S4,所述中间体Ⅳ与丙烯酸类化合物经酯化反应,得到树脂单体Ⅴ;
合成路线为:树脂单体的合成路线具体为:
Figure FDA0002854933680000013
其中,R为烷基或杂烷基,R’为保护基团。
4.根据权利要求3所述的由二环己基甲酮合成的可降解型树脂单体的制备方法,其特征在于,S1中,所述原料Ⅰ的羟基经苄基或硅醚基的保护,得到中间体Ⅱ。
5.根据权利要求3所述的由二环己基甲酮合成的可降解型树脂单体的制备方法,其特征在于,所述原料Ⅰ具体包括以下结构:
Figure FDA0002854933680000021
CN202011541814.8A 2020-12-23 2020-12-23 由二环己基甲酮合成的可降解型树脂单体及其制备方法 Pending CN112592277A (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202011541814.8A CN112592277A (zh) 2020-12-23 2020-12-23 由二环己基甲酮合成的可降解型树脂单体及其制备方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202011541814.8A CN112592277A (zh) 2020-12-23 2020-12-23 由二环己基甲酮合成的可降解型树脂单体及其制备方法

Publications (1)

Publication Number Publication Date
CN112592277A true CN112592277A (zh) 2021-04-02

Family

ID=75200763

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202011541814.8A Pending CN112592277A (zh) 2020-12-23 2020-12-23 由二环己基甲酮合成的可降解型树脂单体及其制备方法

Country Status (1)

Country Link
CN (1) CN112592277A (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113416177A (zh) * 2021-06-24 2021-09-21 徐州博康信息化学品有限公司 主链可降解型光刻胶树脂单体及其制备方法和应用

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004042477A1 (en) * 2002-11-04 2004-05-21 Dongjin Semichem Co., Ltd. Chemically amplified polymer having pendant group with dicyclohexyl and resist composition comprising the same

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004042477A1 (en) * 2002-11-04 2004-05-21 Dongjin Semichem Co., Ltd. Chemically amplified polymer having pendant group with dicyclohexyl and resist composition comprising the same

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113416177A (zh) * 2021-06-24 2021-09-21 徐州博康信息化学品有限公司 主链可降解型光刻胶树脂单体及其制备方法和应用
CN113416177B (zh) * 2021-06-24 2022-10-25 徐州博康信息化学品有限公司 主链可降解型光刻胶树脂单体及其制备方法和应用

Similar Documents

Publication Publication Date Title
CN111138281A (zh) 一种光刻胶树脂单体及其合成方法
CN111138410A (zh) 含金刚烷结构的光刻胶产酸树脂单体及其合成方法
CN111704601A (zh) 一种由3,5-二羟基环己酮合成的可降解型光刻胶产酸树脂单体及其制备方法
CN112679499A (zh) 一种由苦参碱合成的磺酸锍盐类光产酸剂及其合成方法
CN111072482A (zh) 由螺[2.5]癸烷-6,8-二酮合成的光刻胶树脂单体及其合成方法
CN111056945A (zh) 由螺[5.5]十一烷-3,9-二酮合成的光刻胶树脂单体及其合成方法
CN111138287A (zh) 由六氢-1h-茚-1,3(2h)-二酮合成的光刻胶树脂单体及其合成方法
CN112592277A (zh) 由二环己基甲酮合成的可降解型树脂单体及其制备方法
KR100314761B1 (ko) 노르보르넨에 콜릭산, 디옥시콜릭산 또는 리소콜릭산 유도체를 결합시킨 단량체를 이용한 중합체 및 이를 함유하는 포토레지스트 조성물
CN111138288A (zh) 含五元环状β-酮结构的光刻胶树脂单体及其合成方法
CN113493382A (zh) 一种碱溶性良好的光刻胶酸敏树脂单体及其合成方法和应用
CN112661741A (zh) 一种含米氏酸结构的光刻胶树脂单体及其合成方法
CN112645923A (zh) 一种含光酸产生剂的光刻胶树脂单体及其合成方法
CN112679461A (zh) 一种增加溶解差的光刻胶树脂单体及其合成方法
CN112159341A (zh) 一种光刻胶树脂单体
CN111100007A (zh) 由羧酸化合物合成的光刻胶树脂单体及其合成方法
CN111056947A (zh) 由α-柏木烯合成的光刻胶树脂单体及其合成方法
CN113429292A (zh) 一种光刻胶树脂单体及其合成方法和应用
CN112661769B (zh) 由5-(羟甲基)-1,3-环己二酮合成的树脂单体及其制备方法
CN113429293A (zh) 一种由2-环戊基环戊酮合成的可降解型树脂单体及其制备方法和应用
CN112794834A (zh) 由1,6-二噁螺[2.5]辛烷合成的可降解型树脂单体及其制备方法
CN111777587A (zh) 由氧杂螺[4.5]癸烷二酮合成的可降解型光刻胶树脂单体及其合成方法
CN112390718A (zh) 由三甲基二环[2.2.2]辛烷二酮合成的可降解型光刻胶树脂单体及其合成方法
CN111138280A (zh) 由3-乙基双环[3.3.1]壬烷-2,4-二酮合成的光刻胶树脂单体及其合成方法
CN111777583A (zh) 由吡喃-3,5-二酮合成的可降解型光刻胶树脂单体及其合成方法

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
RJ01 Rejection of invention patent application after publication
RJ01 Rejection of invention patent application after publication

Application publication date: 20210402