CN112339412B - 微细结构转印装置以及微细结构转印方法 - Google Patents

微细结构转印装置以及微细结构转印方法 Download PDF

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Publication number
CN112339412B
CN112339412B CN202010788246.5A CN202010788246A CN112339412B CN 112339412 B CN112339412 B CN 112339412B CN 202010788246 A CN202010788246 A CN 202010788246A CN 112339412 B CN112339412 B CN 112339412B
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China
Prior art keywords
sheet
platen roller
roller
mold
guide roller
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Chinese (zh)
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CN112339412A (zh
Inventor
中山幸德
今井裕晃
岸村敏治
中泽良仁
渡濑直树
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Ameco Technology Co ltd
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Ameco Technology Co ltd
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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41FPRINTING MACHINES OR PRESSES
    • B41F16/00Transfer printing apparatus
    • B41F16/0006Transfer printing apparatus for printing from an inked or preprinted foil or band
    • B41F16/004Presses of the reciprocating type
    • B41F16/0053Presses of the reciprocating type with means for applying print under pressure only, e.g. using pressure sensitive adhesive
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B29C59/04Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing using rollers or endless belts
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41FPRINTING MACHINES OR PRESSES
    • B41F13/00Common details of rotary presses or machines
    • B41F13/02Conveying or guiding webs through presses or machines
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41FPRINTING MACHINES OR PRESSES
    • B41F19/00Apparatus or machines for carrying out printing operations combined with other operations
    • B41F19/007Apparatus or machines for carrying out printing operations combined with other operations with selective printing mechanisms, e.g. ink-jet or thermal printers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41FPRINTING MACHINES OR PRESSES
    • B41F23/00Devices for treating the surfaces of sheets, webs, or other articles in connection with printing
    • B41F23/04Devices for treating the surfaces of sheets, webs, or other articles in connection with printing by heat drying, by cooling, by applying powders
    • B41F23/0403Drying webs
    • B41F23/0406Drying webs by radiation
    • B41F23/0409Ultraviolet dryers
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16Coating processes; Apparatus therefor
    • G03F7/161Coating processes; Apparatus therefor using a previously coated surface, e.g. by stamping or by transfer lamination
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor
    • G03F7/2002Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2012Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image using liquid photohardening compositions, e.g. for the production of reliefs such as flexographic plates or stamps

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Moulding By Coating Moulds (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Materials For Medical Uses (AREA)
CN202010788246.5A 2019-08-09 2020-08-07 微细结构转印装置以及微细结构转印方法 Active CN112339412B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2019147429A JP6694101B1 (ja) 2019-08-09 2019-08-09 微細構造転写装置及び微細構造転写方法
JP2019-147429 2019-08-09

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CN112339412A CN112339412A (zh) 2021-02-09
CN112339412B true CN112339412B (zh) 2022-08-12

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JP (1) JP6694101B1 (ko)
KR (1) KR102438070B1 (ko)
CN (1) CN112339412B (ko)
TW (1) TWI754978B (ko)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2021182532A1 (ja) * 2020-03-11 2021-09-16 Scivax株式会社 インプリント装置
JP7475646B2 (ja) 2020-04-24 2024-04-30 Aiメカテック株式会社 微細構造転写装置及び微細構造転写方法
KR102237277B1 (ko) * 2020-07-01 2021-04-07 주식회사 기가레인 나노 임프린트용 레플리카 몰드 제작 장치
CN113885295B (zh) * 2020-07-01 2024-03-08 吉佳蓝科技股份有限公司 纳米压印用复制模制作装置

Family Cites Families (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0247654A (ja) * 1988-08-09 1990-02-16 Brother Ind Ltd 圧力現像装置
JP4220282B2 (ja) 2003-03-20 2009-02-04 株式会社日立製作所 ナノプリント装置、及び微細構造転写方法
JP4061220B2 (ja) 2003-03-20 2008-03-12 株式会社日立製作所 ナノプリント装置、及び微細構造転写方法
JP4466074B2 (ja) 2003-12-26 2010-05-26 株式会社日立製作所 微細金属構造体とその製造方法、並びに微細金型とデバイス
JP4154529B2 (ja) 2004-08-27 2008-09-24 株式会社日立プラントテクノロジー 微細構造転写装置
JP4665608B2 (ja) 2005-05-25 2011-04-06 株式会社日立プラントテクノロジー 微細構造転写装置
JP2008091123A (ja) * 2006-09-29 2008-04-17 Toppan Printing Co Ltd 凸版、印刷機、有機電子デバイスの製造方法、及び凸版の製造方法
EP2256788A4 (en) 2008-03-07 2011-03-30 Showa Denko Kk UV NANO-PRINTING LITHOGRAPHY METHOD, RESIN FOAM MOLD AND METHOD FOR PRODUCING THE SAME, MAGNETIC MEDIUM AND METHOD FOR PRODUCING THE SAME, AND MAGNETIC RECORDING / READING APPARATUS
JP2011066100A (ja) * 2009-09-16 2011-03-31 Bridgestone Corp 光硬化性転写シート、及びこれを用いた凹凸パターンの形成方法
JPWO2011089836A1 (ja) * 2010-01-19 2013-05-23 株式会社日立産機システム パターン転写装置及びパターン転写方法
WO2012070546A1 (ja) * 2010-11-22 2012-05-31 旭硝子株式会社 転写装置及び樹脂パターン製造方法
KR101883193B1 (ko) * 2011-03-31 2018-07-30 도레이 카부시키가이샤 미세구조 전사 필름의 제조 방법 및 제조 장치
JP2013229532A (ja) * 2012-04-27 2013-11-07 Hitachi Ltd 微細構造転写装置および微細構造転写方法
KR20150020282A (ko) * 2012-05-24 2015-02-25 아사히 가라스 가부시키가이샤 광학 부재의 제조 방법, 광학 부재, 보호 필름이 부착된 광학 부재 및 광학 패널의 제조 방법
JP5912996B2 (ja) * 2012-08-23 2016-04-27 東芝機械株式会社 転写装置
JP5940940B2 (ja) * 2012-08-31 2016-06-29 東芝機械株式会社 転写装置および転写方法
JP6092561B2 (ja) * 2012-10-01 2017-03-08 東芝機械株式会社 被成形体組立体、被成形体組立体の製造装置および被成形体組立体の製造方法
KR20140109624A (ko) * 2013-03-06 2014-09-16 삼성전자주식회사 대면적 임프린트 장치 및 방법
JP6032492B2 (ja) * 2013-05-24 2016-11-30 パナソニックIpマネジメント株式会社 微細パターン形成方法、及び微細パターン形成装置
WO2015072572A1 (ja) * 2013-11-18 2015-05-21 Scivax株式会社 離型装置及び離型方法
TW201616553A (zh) * 2014-07-17 2016-05-01 Soken Kagaku Kk 分步重複式壓印裝置以及方法
JP6421980B2 (ja) * 2015-03-02 2018-11-14 パナソニックIpマネジメント株式会社 インプリント装置
JP6738732B2 (ja) * 2015-06-23 2020-08-12 東レ株式会社 表面構造フィルムの製造方法および製造装置
JP6578883B2 (ja) * 2015-10-26 2019-09-25 大日本印刷株式会社 フィルムモールド及びインプリント方法
WO2018008326A1 (ja) * 2016-07-05 2018-01-11 パナソニックIpマネジメント株式会社 モールド、インプリント装置及びインプリント方法
KR102409912B1 (ko) * 2017-03-31 2022-06-17 삼성디스플레이 주식회사 임프린트 장치 및 이의 박리 결함 검출 방법
KR102448904B1 (ko) * 2017-07-31 2022-09-29 삼성디스플레이 주식회사 임프린트 장치 및 임프린트 방법
KR20190032050A (ko) * 2017-09-19 2019-03-27 삼성전자주식회사 임프린트 장치 및 디스플레이 패널 제조 방법

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JP6694101B1 (ja) 2020-05-13
KR102438070B1 (ko) 2022-08-31
TWI754978B (zh) 2022-02-11
TW202113923A (zh) 2021-04-01
JP2021028933A (ja) 2021-02-25
KR20210018154A (ko) 2021-02-17
CN112339412A (zh) 2021-02-09

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