CN112135924B - 成膜装置 - Google Patents

成膜装置 Download PDF

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CN112135924B
CN112135924B CN201880093587.1A CN201880093587A CN112135924B CN 112135924 B CN112135924 B CN 112135924B CN 201880093587 A CN201880093587 A CN 201880093587A CN 112135924 B CN112135924 B CN 112135924B
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film forming
infrared light
substrate
mist
heating
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CN112135924A (zh
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织田容征
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Toshiba Mitsubishi Electric Industrial Systems Corp
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Abstract

本发明的目的在于提供一种能够不降低成膜品质、成膜速度地、以低成本在基板上形成薄膜的成膜装置。而且，在本发明中，红外光照射器(2)配置于下部容器(62)内的从传送带(53)分离的位置。红外光照射器(2)从多个红外光灯(22)朝向上方照射红外光，执行对载置于带(52)的上表面的多个基板(10)的加热处理。在成膜室(6A)内，通过同时执行基于红外光照射器(2)的红外光照射的加热处理和基于薄膜形成喷嘴(1)的雾喷射处理，从而在载置于带(52)的上表面的基板(10)上形成薄膜。

Description

成膜装置
技术领域
本发明涉及用于太阳能电池等电子器件的制造中、在基板上形成薄膜的成膜装置。
背景技术
作为在基板上形成膜的方法，有化学气相沉积(CVD(Chemical VaporDeposition))法。但是，在化学气相沉积法中，需要真空下的成膜的情况多，除了真空泵等以外，还需要使用大型的真空容器。进而，在化学气相沉积法中，从成本等观点出发，存在难以采用大面积的基板作为被成膜的基板的问题。因此，能够进行大气压下的成膜处理的雾法受到关注。
作为与利用了雾法的成膜装置有关的现有技术，例如存在专利文献1的技术。
在专利文献1的技术中，从在包含雾喷射用喷嘴等的雾喷射头部的底面设置的原料溶液喷出口以及反应材料喷出口，对于配置于大气中的基板喷射被雾化的原料溶液以及反应材料。通过该喷射，在基板上形成膜。此外，反应材料是指有助于与原料溶液的反应的材料。
图3是表示以往的成膜装置的概略结构的说明图。如该图所示，作为基板载置部的基板装载台30在上表面载置有多个基板10。
基板装载台30具有基于真空吸附的吸附机构31，通过该吸附机构31，能够将所载置的多个基板10各自的整个背面吸附于基板装载台30的上表面上。而且，基板装载台30在吸附机构31的下方设置有加热机构32，通过该加热机构32，能够对载置于基板装载台30上表面的多个基板10执行加热处理。
薄膜形成喷嘴1(雾喷射部)执行从设置于喷射面1S的喷射口向下方喷射原料雾MT的雾喷射处理。另外，原料雾MT是将原料溶液雾化而得到的雾，能够通过薄膜形成喷嘴1将原料雾MT向大气中喷射。
薄膜形成喷嘴1、基板装载台30、在基板装载台30的上表面上载置的多个基板10全部被收纳于成膜室60中。成膜室60由上部容器68、下部容器69以及门67构成。成膜室60在进行成膜处理时，使门67为关闭状态而将上部容器68、下部容器69间的开口部封堵，由此能够将薄膜形成喷嘴1、基板装载台30以及多个基板10从外部隔断。
因此，通过使成膜室60的门67为关闭状态，在加热机构32的加热处理中，通过薄膜形成喷嘴1执行雾喷射处理，由此能够在载置于基板装载台30上表面的基板10上形成薄膜。
这样，以往的成膜装置通过同时执行基于薄膜形成喷嘴1的雾喷射处理和基于加热机构32的加热处理，由此在基板10上形成薄膜。
现有技术文献
专利文献
专利文献1：国际公开第2017/068625号
发明内容
发明解决的技术问题
如上所述，以往的成膜装置，一般是将加热机构32设置于在上表面上载置成为成膜对象物的基材即基板10的基板装载台30的内部，并将基板装载台30用作平面型加热机构。
在使用如基板装载台30那样的平面型加热机构的情况下，使基板装载台30的上表面与基板10的背面接触，使基板装载台30、基板10之间传热而执行基板10的加热处理。
但是，在基板10不是平板形状而呈现其下表面弯曲的结构、下表面有凹凸的结构的情况下，在平面型加热机构中，基板装载台30的上表面与基板10的背面的接触变为局部性的。因此，存在在加热机构32的加热处理的执行时基板10的加热变得不均匀、或在基板10产生翘曲而变形等问题。
本发明的目的在于解决上述那样的问题点，提供一种能够不降低成膜品质、成膜速度地、以低成本在基板上形成薄膜的成膜装置。
用于解决技术问题的手段
本发明的成膜装置，其特征在于，具备：基板载置部，载置基板；加热机构，与所述基板载置部以分离的方式设置，具有红外光灯，执行加热处理，在所述加热处理中从所述红外光灯照射红外光来将所述基板加热；以及雾喷射部，执行雾喷射处理，在所述雾喷射处理中，向所述基板的表面喷射将原料溶液雾化而得到的原料雾，通过同时执行基于所述加热机构的所述加热处理和基于所述雾喷射部的所述雾喷射处理，由此在所述基板的表面形成薄膜。
发明效果
技术方案1所述的本申请发明的成膜装置，具备加热机构，该加热机构与基板载置部以分离的方式设置，执行通过从红外光灯照射红外光来加热基板的加热处理。
因此，技术方案1所述的本申请发明，能够与基板不具有接触关系地通过加热机构直接加热基板，因此能够不使基板变形地与基板的形状无关地进行均匀的加热。
其结果，技术方案1所述的本申请发明的成膜装置能够不降低成膜品质、成膜速度地、以低成本在基板上形成薄膜。
本发明的目的、特征、方面以及优点通过以下的详细说明和附图而变得更加清楚。
附图说明
图1是表示本发明的实施方式1的成膜装置的概略结构的说明图。
图2是表示本发明的实施方式2的成膜装置的概略结构的说明图。
图3是表示以往的成膜装置的概略结构的说明图。
具体实施方式
＜实施方式1＞
图1是表示本发明的实施方式1的成膜装置的概略结构的说明图。在图1中记载了XYZ正交坐标系。
如图1所示，实施方式1的成膜装置11包括成膜室6A、薄膜形成喷嘴1、红外光照射器2以及输送机53作为主要构成要素。
作为基板载置部的输送机53在带52的上表面载置有多个基板10。输送机53具备在左右(-X方向，+X方向)两端设置的输送用的一对辊51和架设于一对辊51的环状的输送用的带52。
输送机53能够通过一对辊51的旋转驱动，使上方侧(+Z方向侧)的带52沿着输送方向(X方向)移动。
输送机53的一对辊51设置于成膜室6A外，带52的中央部设置于成膜室6A内，能够经由在成膜室6A的左右(-X方向、+X方向)侧面的一部分设置的一对开口部63在成膜室6A的内部与外部之间移动。
薄膜形成喷嘴1、输送机53的一部分、在输送机53的带52的上表面载置的多个基板10以及红外光照射器2收纳于成膜室6A内。
成膜室6A由上部容器61、下部容器62以及一对开口部63构成。在Z方向即高度方向上，一对开口部63位于上部容器61与下部容器62之间。因此，在成膜室6A内的开口部63、63之间设置的输送机53配置于比下部容器62高、且比上部容器61低的位置。
作为加热机构的红外光照射器2通过未图示的固定机构被固定在下部容器62内的与输送机53分离的位置。
另外，红外光照射器2被配置于成膜室6A内的俯视时与带52的上表面重叠的位置。
红外光照射器2由灯载置台21以及多个红外光灯22构成，在灯载置台21的上部安装有多个红外光灯22。因此，红外光照射器2能够从多个红外光灯22朝向上方(+Z方向)照射红外光。通过由红外光照射器2进行的上述的红外光照射，能够执行对在带52的上表面载置的多个基板10的加热处理。
作为雾喷射部的薄膜形成喷嘴1通过未图示的固定机构被固定配置于上部容器61内。此时，薄膜形成喷嘴1以喷射面1S与带52的上表面相对置的位置关系配置。
薄膜形成喷嘴1执行从设置于喷射面1S的喷射口向下方(-Z方向)喷射原料雾MT的雾喷射处理。另外，原料雾MT是将原料溶液雾化而得到的雾，能够通过薄膜形成喷嘴1将原料雾MT向大气中喷射。
成膜室6A在进行成膜处理时，通过气帘7将上部容器61、下部容器62间的开口部63封堵，由此能够将薄膜形成喷嘴1、载置于带52上的多个基板10以及红外光照射器2从外部隔断。
因此，实施方式1的成膜装置11能够通过气帘7使成膜室6A的一对开口部63成为关闭状态，并使输送机53的带52沿着输送方向(X方向)移动而设定成膜环境。
而且，成膜装置11在上述成膜环境下，同时执行基于红外光照射器2的红外光照射的加热处理和基于薄膜形成喷嘴1的雾喷射处理，由此在成膜室6A内，在载置于带52上表面的基板10上形成薄膜。
这样，实施方式1的成膜装置11具备红外光照射器2作为加热机构，该红外光照射器2与作为基板载置部的输送机53分离而设置，并执行从红外光灯22照射红外光而直接加热多个基板10的加热处理。
因此，实施方式1的成膜装置11，能够与基板10不具有接触关系地通过红外光照射器2直接加热基板10，因此能够不使基板10变形地、与基板10的形状无关地进行均匀的加热。
其结果，实施方式1的成膜装置11，能够不降低成膜品质、成膜速度地、以低成本在基板10上形成薄膜。
进而，实施方式1的成膜装置11，通过在成膜室6A内设置作为加热机构的红外光照射器2，由此能够不经由成膜室6A地、向基板10照射红外光，相应地能够提高红外光的照射效率。
另外，来自位于输送机53的下方(-Z方向)的红外光照射器2的红外光的照射朝向上方(+Z方向)进行，因此红外光经由输送机53的带52(上方侧及下方侧)照射到多个基板10。
考虑到这一点，考虑由一对线状的输送机链的组合构成带52而设为存在红外光通过用的开口部分的结构的第1对应、和将不吸收红外光而红外光的透射性优异的红外光透射材料作为带52的构成材料的第2对应。
因此，关于带52，通过采用上述第1及第2对应中的至少一个对应，能够将由带52引起的红外光的吸收程度抑制在必要最小限度。
以下叙述第2对应的具体例。作为红外光透射材料，例如可以考虑锗、硅、硫化锌、硒化锌等。但是，需要满足作为带52使用所用的强度。
另外，从红外光照射器2照射的红外光的波长，优选采用避开原料雾MT的吸收波长区域而设定的第1变形例。作为实现第1变形例的具体的设定，考虑将从红外光照射器2照射的红外光的波长设定为700～900nm的范围。这是因为，通过上述具体的设定，能够避免使用了设想的溶剂的原料雾MT的吸收波长区域。
如上述具体设定那样，如果将从红外光照射器2照射的红外光的波长设定为700～900nm的范围，则在成膜原料溶液的溶剂为水或者甲苯的情况下会成为原料雾MT的吸收波长区域以外这一情况被确认为已知的事实。
成膜装置11采用上述第1变形例，由此起到如下效果：能够避免原料雾蒸发现象的发生，原料雾蒸发现象是指，原料雾MT吸收从红外光照射器2照射的红外光、从而原料雾MT被加热而蒸发这样。
特别地，作为第1变形例，采用将红外光的波长设定为700～900nm这样的上述具体的设定，由此起到能够针对设想的全部原料的原料雾MT而避免上述原料雾蒸发现象发生的效果。
＜实施方式2＞
图2是表示本发明的实施方式2的成膜装置的概略结构的说明图。在图2中记载了XYZ正交坐标系。
如图2所示，实施方式2的成膜装置12包括成膜室6B、薄膜形成喷嘴1、红外光照射器2以及输送机53作为主要构成要素。
以下，对与实施方式1的成膜装置11共通的构成部标注相同符号并适当省略说明，以实施方式2的成膜装置12的特征部位为中心进行说明。
薄膜形成喷嘴1、输送机53的一部分以及在输送机53的带52的上表面载置的多个基板10被收纳于成膜室6B。成膜室6B由上部容器61、下部容器62B以及一对开口部63构成，一对开口部63设置于成膜室6B的左右侧面的一部分。另外，在Z方向即高度方向上，一对开口部63位于上部容器61与下部容器62B之间。
成膜室6B将不吸收从红外光照射器2照射的红外光而透射性优异的红外光透射材料作为构成材料。具体而言，成膜室6B采用石英玻璃作为构成材料。
作为加热机构的红外光照射器2，在下部容器62B外的下方(-Z方向)通过未图示的固定机构被固定在从输送机53分离的位置。
另外，红外光照射器2配置成膜室6B内的在俯视时与带52的上表面重叠的位置。
红外光照射器2从多个红外光灯22向上方照射红外光，由此能够经由下部容器62B以及带52对载置于带52的上表面的多个基板10执行加热处理。
成膜室6B在进行成膜处理时，通过气帘7将上部容器61、下部容器62B间的开口部63封堵，由此能够将薄膜形成喷嘴1以及载置于带52上的多个基板10从外部隔断。
因此，实施方式2的成膜装置12，通过气帘7使成膜室6B的一对开口部63成为关闭状态，并使输送机53的带52在输送方向(X方向)上移动，由此能够设定成膜环境。
而且，成膜装置12在上述成膜环境下，同时执行基于红外光照射器2的红外光照射的加热处理和基于薄膜形成喷嘴1的雾喷射处理，由此在成膜室6B内，在载置于带52的上表面的基板10上形成薄膜。
这样，实施方式2的成膜装置12，具备红外光照射器2作为加热机构，该红外光照射器2与作为基板载置部的带52以分离的方式设置，并执行从红外光灯22照射红外光而对多个基板10进行加热的加热处理。
因此，实施方式2的成膜装置12，与实施方式1同样，能够与基板10不具有接触关系地通过红外光照射器2将基板10加热，因此能够不使基板10变形地、与基板10的形状无关地进行均匀的加热。
其结果是，实施方式2的成膜装置12与实施方式1同样，能够不会降低成膜品质、成膜速度地、以低成本在基板10上形成薄膜。
进而，实施方式2的成膜装置12，通过将红外光照射器2设置在成膜室6B外，由此能够实现红外光灯22的更换等、红外光照射器2的维护的简化。
此外，实施方式2的成膜装置12的成膜室6B，将从红外光灯22照射的红外光的透射性优异的红外光透射材料即石英玻璃作为构成材料，因此起到如下效果：能够将经由成膜室6B的下部容器62的底面将基板10加热时的由下部容器62的底面引起的红外光的吸收程度抑制在必要最小限度。
另外，若将成膜室6B中的至少下部容器62B的底面的构成材料设为作为红外光透射材料的石英玻璃，则能够发挥上述效果。
另外，作为红外光透射材料，除了石英玻璃以外，还可以考虑例如以下的材料。硼硅酸玻璃、蓝宝石、氟化钙、氟化钡、氟化镁、氟化锂等对近红外光的透射率高，因此可以被认为是石英玻璃以外的红外光透射材料。即，成膜室6B的构成材料只要包含石英玻璃、硼硅酸玻璃、蓝宝石、氟化钙、氟化钡、氟化镁、以及氟化锂中的至少一种即可。
另外，在实施方式2的成膜装置12中也是，与实施方式1同样地、可以采用与基于带52的红外光吸收有关的上述第1及第2对应中的至少一个对应。
进而，在实施方式2的成膜装置12中，与实施方式1同样地、关于从红外光照射器2照射的红外光的波长，可以采用上述第1变形例(包括在实施方式1中叙述的具体的设定)。
另外，本发明能够在其发明的范围内将各实施方式自由地组合，或者适当地对各实施方式进行变形、省略。
详细地说明了本发明，但上述的说明在所有的方面都是例示，本发明并不限定于此。应理解为能够在不脱离本发明的范围的情况下设想未例示的无数个变形例。
附图标记说明
1 薄膜形成喷嘴
2 红外光照射器
11，12 成膜装置
21 灯载置台
22 红外光灯
6A，6B 成膜室
51 辊
52 带
53 输送机
61 上部容器
62，62B 下部容器
63 开口部

Claims (4)

1.一种成膜装置，具备：基板载置部（53），载置基板（10）；加热机构（2），与所述基板载置部以分离的方式设置，具有红外光灯（22），执行从所述红外光灯照射红外光而将所述基板加热的加热处理；以及雾喷射部（1），执行雾喷射处理，在所述雾喷射处理中，向所述基板的表面喷射将原料溶液雾化而得到的原料雾（MT），从所述红外光灯照射的红外光的波长与所述原料雾的吸收波长区域不重复，通过同时执行基于所述加热机构的所述加热处理和基于所述雾喷射部的所述雾喷射处理，从而在所述基板的表面形成薄膜，从所述红外光灯照射的红外光的波长被设定为700nm~900nm。
2.根据权利要求1所述的成膜装置，其中，还具备：成膜室（6A），在内部收容所述基板、所述加热机构以及所述雾喷射部。
3.根据权利要求1所述的成膜装置，其中，还具备：成膜室（6B），在内部收容所述基板及所述雾喷射部，所述加热机构配置于所述成膜室外，经由所述成膜室执行所述加热处理，所述成膜室将相对于从所述加热机构的所述红外光灯照射的红外光而言透射性优异的红外光透射材料作为构成材料。
4.根据权利要求3所述的成膜装置，其中，所述红外光透射材料包括石英玻璃、硼硅酸玻璃、蓝宝石、氟化钙、氟化钡、氟化镁、以及氟化锂中的至少一种。
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CN112135924A (zh) 2020-12-25
JP7139085B2 (ja) 2022-09-20
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KR20210005221A (ko) 2021-01-13
TW202000317A (zh) 2020-01-01
JPWO2019234918A1 (ja) 2020-12-17
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WO2019234918A1 (ja) 2019-12-12
DE112018007709T5 (de) 2021-02-18

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