CN111971423A - Co阳极及使用有Co阳极的Co电镀方法 - Google Patents

Co阳极及使用有Co阳极的Co电镀方法 Download PDF

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Publication number
CN111971423A
CN111971423A CN201880091917.3A CN201880091917A CN111971423A CN 111971423 A CN111971423 A CN 111971423A CN 201880091917 A CN201880091917 A CN 201880091917A CN 111971423 A CN111971423 A CN 111971423A
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CN
China
Prior art keywords
anode
purity
fine particles
particles
plating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
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CN201880091917.3A
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English (en)
Chinese (zh)
Inventor
村田周平
小井土由将
浅野孝幸
神永贤吾
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JX Nippon Mining and Metals Corp
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JX Nippon Mining and Metals Corp
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Filing date
Publication date
Application filed by JX Nippon Mining and Metals Corp filed Critical JX Nippon Mining and Metals Corp
Publication of CN111971423A publication Critical patent/CN111971423A/zh
Pending legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/10—Electrodes, e.g. composition, counter electrode
    • C25D17/12—Shape or form
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/10—Electrodes, e.g. composition, counter electrode
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electroplating Methods And Accessories (AREA)
CN201880091917.3A 2018-03-28 2018-10-03 Co阳极及使用有Co阳极的Co电镀方法 Pending CN111971423A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2018-063008 2018-03-28
JP2018063008A JP6960363B2 (ja) 2018-03-28 2018-03-28 Ｃｏアノード、Ｃｏアノードを用いた電気Ｃｏめっき方法及びＣｏアノードの評価方法
PCT/JP2018/037118 WO2019187250A1 (ja) 2018-03-28 2018-10-03 Ｃｏアノード及びＣｏアノードを用いた電気Ｃｏめっき方法

Publications (1)

Publication Number Publication Date
CN111971423A true CN111971423A (zh) 2020-11-20

Family

ID=68060989

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201880091917.3A Pending CN111971423A (zh) 2018-03-28 2018-10-03 Co阳极及使用有Co阳极的Co电镀方法

Country Status (7)

Country Link
US (1) US20210010149A1 (ko)
JP (1) JP6960363B2 (ko)
KR (1) KR102435667B1 (ko)
CN (1) CN111971423A (ko)
SG (1) SG11202009378RA (ko)
TW (1) TWI683040B (ko)
WO (1) WO2019187250A1 (ko)

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5667665A (en) * 1995-03-14 1997-09-16 Japan Energy Corporation Process of producing high purity cobalt
JPH11315392A (ja) * 1999-03-19 1999-11-16 Japan Energy Corp コバルトの精製方法
US20050000821A1 (en) * 2001-11-16 2005-01-06 White Tamara L Anodes for electroplating operations, and methods of forming materials over semiconductor substrates
CN102933740A (zh) * 2011-04-19 2013-02-13 Jx日矿日石金属株式会社 铟靶及其制造方法
US20160168728A1 (en) * 2013-12-02 2016-06-16 Jx Nippon Mining & Metals Corporation High purity cobalt chloride and manufacturing method therefor
CN107849716A (zh) * 2016-03-09 2018-03-27 Ｊｘ金属株式会社 高纯度锡及其制造方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3416993A1 (de) * 1984-05-09 1985-11-21 Gerhard Collardin GmbH, 5000 Köln Waessrige, saure, nickel- und cobalt-ionen enthaltende elektrolyte zur galvanischen abscheidung von harten, anlaufbestaendigen, weiss glaenzenden legierungsueberzuegen
JPS62278293A (ja) * 1986-05-26 1987-12-03 C Uyemura & Co Ltd 電子部品の製造方法
KR100512644B1 (ko) * 2000-05-22 2005-09-07 가부시키 가이샤 닛코 마테리알즈 금속의 고 순도화 방법
JP4076751B2 (ja) 2001-10-22 2008-04-16 日鉱金属株式会社 電気銅めっき方法、電気銅めっき用含リン銅アノード及びこれらを用いてめっきされたパーティクル付着の少ない半導体ウエハ
JP3611545B2 (ja) * 2001-12-20 2005-01-19 株式会社荏原製作所 めっき装置
CN1297364C (zh) * 2005-05-18 2007-01-31 北京科技大学 沉淀－还原制备纳米钴粉的方法
US7897265B2 (en) * 2006-01-26 2011-03-01 Hamilton Sundstrand Corporation Low cost, environmentally favorable, chromium plate replacement coating for improved wear performance
CN103726097B (zh) 2007-11-01 2016-08-17 Jx日矿日石金属株式会社 铜阳极或含磷铜阳极、在半导体晶片上电镀铜的方法及粒子附着少的半导体晶片
JP5544527B2 (ja) * 2009-03-02 2014-07-09 国立大学法人信州大学 複合めっき皮膜及びその形成方法並びに電解めっき液
JP5281186B1 (ja) * 2012-10-25 2013-09-04 Ｊｘ日鉱日石金属株式会社 インジウムターゲット及びその製造方法
CN103966627B (zh) * 2014-04-30 2017-01-11 兰州金川新材料科技股份有限公司 一种降低高纯钴中杂质Fe含量的方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5667665A (en) * 1995-03-14 1997-09-16 Japan Energy Corporation Process of producing high purity cobalt
JPH11315392A (ja) * 1999-03-19 1999-11-16 Japan Energy Corp コバルトの精製方法
US20050000821A1 (en) * 2001-11-16 2005-01-06 White Tamara L Anodes for electroplating operations, and methods of forming materials over semiconductor substrates
CN102933740A (zh) * 2011-04-19 2013-02-13 Jx日矿日石金属株式会社 铟靶及其制造方法
US20160168728A1 (en) * 2013-12-02 2016-06-16 Jx Nippon Mining & Metals Corporation High purity cobalt chloride and manufacturing method therefor
CN107849716A (zh) * 2016-03-09 2018-03-27 Ｊｘ金属株式会社 高纯度锡及其制造方法

Also Published As

Publication number Publication date
WO2019187250A1 (ja) 2019-10-03
US20210010149A1 (en) 2021-01-14
SG11202009378RA (en) 2020-10-29
KR20200128097A (ko) 2020-11-11
KR102435667B1 (ko) 2022-08-25
JP6960363B2 (ja) 2021-11-05
TW201942423A (zh) 2019-11-01
JP2019173104A (ja) 2019-10-10
TWI683040B (zh) 2020-01-21

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