CN111929989A - 感光性树脂组合物及其制备方法、感光性有机载体及黄光浆料 - Google Patents
感光性树脂组合物及其制备方法、感光性有机载体及黄光浆料 Download PDFInfo
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- CN111929989A CN111929989A CN202010886340.4A CN202010886340A CN111929989A CN 111929989 A CN111929989 A CN 111929989A CN 202010886340 A CN202010886340 A CN 202010886340A CN 111929989 A CN111929989 A CN 111929989A
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- methacrylate
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- acrylate
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- photosensitive resin
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Materials For Photolithography (AREA)
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CN202010886340.4A CN111929989B (zh) | 2020-08-28 | 2020-08-28 | 感光性树脂组合物及其制备方法、感光性有机载体及黄光浆料 |
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CN202010886340.4A CN111929989B (zh) | 2020-08-28 | 2020-08-28 | 感光性树脂组合物及其制备方法、感光性有机载体及黄光浆料 |
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CN111929989A true CN111929989A (zh) | 2020-11-13 |
CN111929989B CN111929989B (zh) | 2022-03-15 |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN116543950A (zh) * | 2023-07-03 | 2023-08-04 | 乾宇微纳技术(深圳)有限公司 | 黄光浆料及其制备方法和其在异质结太阳能电池中的应用 |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1403874A (zh) * | 2001-08-07 | 2003-03-19 | 株式会社村田制作所 | 感光性导电胶、导体图形形成法和陶瓷多层构件制法 |
US6800420B2 (en) * | 2001-12-31 | 2004-10-05 | Industrial Technology Research Institute | Photosensitive thick film composition |
CN1690852A (zh) * | 2004-04-26 | 2005-11-02 | 太阳油墨股份有限公司 | 银浆用玻璃组合物、使用该组合物的感光性银浆、电极图形和等离子体显示板 |
CN101206397A (zh) * | 2006-12-22 | 2008-06-25 | 太阳油墨制造株式会社 | 感光性树脂组合物以及用其得到的烧成物图案的制造方法 |
CN101313368A (zh) * | 2005-11-30 | 2008-11-26 | 东丽株式会社 | 玻璃糊剂、使用该玻璃糊剂的显示器的制造方法及显示器 |
CN102918459A (zh) * | 2010-08-27 | 2013-02-06 | 东丽株式会社 | 感光性糊剂、图案的形成方法和平面显示器面板用部件的制造方法 |
CN110335700A (zh) * | 2019-06-28 | 2019-10-15 | 乾宇电子材料(苏州)有限公司 | 高温烧结型黄光导电浆料、导电线路及制备方法 |
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2020
- 2020-08-28 CN CN202010886340.4A patent/CN111929989B/zh active Active
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1403874A (zh) * | 2001-08-07 | 2003-03-19 | 株式会社村田制作所 | 感光性导电胶、导体图形形成法和陶瓷多层构件制法 |
US6800420B2 (en) * | 2001-12-31 | 2004-10-05 | Industrial Technology Research Institute | Photosensitive thick film composition |
CN1690852A (zh) * | 2004-04-26 | 2005-11-02 | 太阳油墨股份有限公司 | 银浆用玻璃组合物、使用该组合物的感光性银浆、电极图形和等离子体显示板 |
CN101313368A (zh) * | 2005-11-30 | 2008-11-26 | 东丽株式会社 | 玻璃糊剂、使用该玻璃糊剂的显示器的制造方法及显示器 |
CN101206397A (zh) * | 2006-12-22 | 2008-06-25 | 太阳油墨制造株式会社 | 感光性树脂组合物以及用其得到的烧成物图案的制造方法 |
CN102918459A (zh) * | 2010-08-27 | 2013-02-06 | 东丽株式会社 | 感光性糊剂、图案的形成方法和平面显示器面板用部件的制造方法 |
CN110335700A (zh) * | 2019-06-28 | 2019-10-15 | 乾宇电子材料(苏州)有限公司 | 高温烧结型黄光导电浆料、导电线路及制备方法 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN116543950A (zh) * | 2023-07-03 | 2023-08-04 | 乾宇微纳技术(深圳)有限公司 | 黄光浆料及其制备方法和其在异质结太阳能电池中的应用 |
CN116543950B (zh) * | 2023-07-03 | 2023-10-17 | 乾宇微纳技术(深圳)有限公司 | 黄光浆料及其制备方法和其在异质结太阳能电池中的应用 |
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Address after: 518000 Building 1, Hengtai Yu Building, Tangwei Community, Fenghuang Street, Guangming District, Shenzhen City, Guangdong Province, 514-2 (one photo multi site enterprise) Patentee after: Qianyu Micro Nano Technology (Shenzhen) Co.,Ltd. Patentee after: Qianyu Electronic Materials (Suzhou) Co.,Ltd. Patentee after: Qianyu electronic materials (Dongguan) Co.,Ltd. Patentee after: QIANYE TECHNOLOGY DEVELOPMENT (DONGGUAN) Co.,Ltd. Address before: 518000 Room 401, No.7, LianJian Industrial Park, Huarong Road, Tongsheng community, Dalang street, Longhua District, Shenzhen City, Guangdong Province Patentee before: HANYU ELECTRONIC MATERIAL (SHENZHEN) Co.,Ltd. Patentee before: Qianyu Electronic Materials (Suzhou) Co.,Ltd. Patentee before: Qianyu electronic materials (Dongguan) Co.,Ltd. Patentee before: QIANYE TECHNOLOGY DEVELOPMENT (DONGGUAN) Co.,Ltd. |
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Effective date of registration: 20230726 Address after: 518000 Building 1, Hengtai Yu Building, Tangwei Community, Fenghuang Street, Guangming District, Shenzhen City, Guangdong Province, 514-2 (one photo multi site enterprise) Patentee after: Qianyu Micro Nano Technology (Shenzhen) Co.,Ltd. Patentee after: Qianyu Electronic Materials (Suzhou) Co.,Ltd. Patentee after: Qianyu electronic materials (Dongguan) Co.,Ltd. Address before: 518000 Building 1, Hengtai Yu Building, Tangwei Community, Fenghuang Street, Guangming District, Shenzhen City, Guangdong Province, 514-2 (one photo multi site enterprise) Patentee before: Qianyu Micro Nano Technology (Shenzhen) Co.,Ltd. Patentee before: Qianyu Electronic Materials (Suzhou) Co.,Ltd. Patentee before: Qianyu electronic materials (Dongguan) Co.,Ltd. Patentee before: QIANYE TECHNOLOGY DEVELOPMENT (DONGGUAN) Co.,Ltd. |