CN111747897A - 一种六芳基双咪唑类光引发剂及其应用 - Google Patents

一种六芳基双咪唑类光引发剂及其应用 Download PDF

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Publication number
CN111747897A
CN111747897A CN201910248688.8A CN201910248688A CN111747897A CN 111747897 A CN111747897 A CN 111747897A CN 201910248688 A CN201910248688 A CN 201910248688A CN 111747897 A CN111747897 A CN 111747897A
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CN
China
Prior art keywords
meth
photosensitive resin
acrylate
compound
resin composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201910248688.8A
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English (en)
Chinese (zh)
Inventor
钱晓春
杨金梁
严春霞
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Changzhou Zhengjie Intelligent Manufacturing Technology Co., Ltd
Original Assignee
Changzhou Green Photosensitive Materials Co ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Changzhou Green Photosensitive Materials Co ltd filed Critical Changzhou Green Photosensitive Materials Co ltd
Priority to CN201910248688.8A priority Critical patent/CN111747897A/zh
Priority to JP2021558511A priority patent/JP7212971B2/ja
Priority to KR1020217035296A priority patent/KR20210143909A/ko
Priority to PCT/CN2020/081293 priority patent/WO2020200020A1/zh
Publication of CN111747897A publication Critical patent/CN111747897A/zh
Pending legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D233/00—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings
    • C07D233/54—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having two double bonds between ring members or between ring members and non-ring members
    • C07D233/66—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having two double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D233/88—Nitrogen atoms, e.g. allantoin
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D233/00—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings
    • C07D233/54—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having two double bonds between ring members or between ring members and non-ring members
    • C07D233/64—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having two double bonds between ring members or between ring members and non-ring members with substituted hydrocarbon radicals attached to ring carbon atoms, e.g. histidine
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Nonlinear Science (AREA)
  • Optics & Photonics (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Liquid Crystal (AREA)
CN201910248688.8A 2019-03-29 2019-03-29 一种六芳基双咪唑类光引发剂及其应用 Pending CN111747897A (zh)

Priority Applications (4)

Application Number Priority Date Filing Date Title
CN201910248688.8A CN111747897A (zh) 2019-03-29 2019-03-29 一种六芳基双咪唑类光引发剂及其应用
JP2021558511A JP7212971B2 (ja) 2019-03-29 2020-03-26 ヘキサアリールビスイミダゾール類光開始剤及びその使用
KR1020217035296A KR20210143909A (ko) 2019-03-29 2020-03-26 헥사아릴비스이미다졸계 광개시제 및 이의 응용
PCT/CN2020/081293 WO2020200020A1 (zh) 2019-03-29 2020-03-26 一种六芳基双咪唑类光引发剂及其应用

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201910248688.8A CN111747897A (zh) 2019-03-29 2019-03-29 一种六芳基双咪唑类光引发剂及其应用

Publications (1)

Publication Number Publication Date
CN111747897A true CN111747897A (zh) 2020-10-09

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CN201910248688.8A Pending CN111747897A (zh) 2019-03-29 2019-03-29 一种六芳基双咪唑类光引发剂及其应用

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Country Link
JP (1) JP7212971B2 (ko)
KR (1) KR20210143909A (ko)
CN (1) CN111747897A (ko)
WO (1) WO2020200020A1 (ko)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112062721A (zh) * 2019-05-23 2020-12-11 常州正洁智造科技有限公司 能够提升体系稳定性的habi类光引发剂及其应用
WO2022199625A1 (zh) * 2021-03-26 2022-09-29 常州正洁智造科技有限公司 一种具有提升的体系色相稳定性的感光性树脂组合物

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113637027B (zh) * 2021-07-22 2022-04-05 海南师范大学 一种苯基三氮唑二羧酸-罗丹明b衍生物荧光探针及其制备方法与应用

Citations (4)

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CN1705646A (zh) * 2002-10-15 2005-12-07 昭和电工株式会社 六芳基二咪唑化合物和含有该化合物的光聚合引发剂组合物
CN101386599A (zh) * 2008-10-31 2009-03-18 上海优佰信息科技有限公司 六芳基二咪唑类化合物及其制备方法和用途及含其组合物
CN101418051A (zh) * 2008-12-01 2009-04-29 常州强力电子新材料有限公司 一种含有不对称性六芳基双咪唑光引发剂及其制备方法
CN111258180A (zh) * 2018-11-30 2020-06-09 常州格林感光新材料有限公司 六芳基双咪唑类混合光引发剂及应用

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BE635804A (ko) * 1962-03-21
CN101233435A (zh) * 2005-07-29 2008-07-30 富士胶片株式会社 液晶显示元件用感光性树脂组合物、使用其的滤色片及其制造方法以及液晶显示元件
JP2007332045A (ja) * 2006-06-12 2007-12-27 Showa Denko Kk ヘキサアリールビイミダゾール化合物および該化合物を含む光重合性組成物
CA2723846C (en) 2008-05-08 2017-02-07 Dentsply Detrey Gmbh Radical polymerisation initiators for light-curable dental materials
JP5639096B2 (ja) 2012-02-02 2014-12-10 富士フイルム株式会社 感光性着色組成物、カラーフィルタ、カラーフィルタの製造方法、液晶表示装置、有機ｅｌ表示装置、及び固体撮像素子
TWI544278B (zh) * 2014-05-28 2016-08-01 奇美實業股份有限公司 感光性樹脂組成物及其應用

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1705646A (zh) * 2002-10-15 2005-12-07 昭和电工株式会社 六芳基二咪唑化合物和含有该化合物的光聚合引发剂组合物
CN101386599A (zh) * 2008-10-31 2009-03-18 上海优佰信息科技有限公司 六芳基二咪唑类化合物及其制备方法和用途及含其组合物
CN101418051A (zh) * 2008-12-01 2009-04-29 常州强力电子新材料有限公司 一种含有不对称性六芳基双咪唑光引发剂及其制备方法
CN111258180A (zh) * 2018-11-30 2020-06-09 常州格林感光新材料有限公司 六芳基双咪唑类混合光引发剂及应用

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112062721A (zh) * 2019-05-23 2020-12-11 常州正洁智造科技有限公司 能够提升体系稳定性的habi类光引发剂及其应用
CN112062721B (zh) * 2019-05-23 2023-06-30 常州正洁智造科技有限公司 能够提升体系稳定性的habi类光引发剂及其应用
WO2022199625A1 (zh) * 2021-03-26 2022-09-29 常州正洁智造科技有限公司 一种具有提升的体系色相稳定性的感光性树脂组合物

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KR20210143909A (ko) 2021-11-29
JP7212971B2 (ja) 2023-01-26
WO2020200020A1 (zh) 2020-10-08
JP2022528671A (ja) 2022-06-15

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Effective date of registration: 20201202

Address after: No.8 Qianjia Road, Yaoguan Town, Wujin District, Changzhou City, Jiangsu Province

Applicant after: Changzhou Zhengjie Intelligent Manufacturing Technology Co., Ltd

Address before: 213127 -2, 199 Wei An Road, Xinbei District, Changzhou, Jiangsu.

Applicant before: CHANGZHOU GREEN PHOTOSENSITIVE MATERIALS Co.,Ltd.

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